JPH04181216A - Production of liquid crystal display element substrate - Google Patents
Production of liquid crystal display element substrateInfo
- Publication number
- JPH04181216A JPH04181216A JP2310779A JP31077990A JPH04181216A JP H04181216 A JPH04181216 A JP H04181216A JP 2310779 A JP2310779 A JP 2310779A JP 31077990 A JP31077990 A JP 31077990A JP H04181216 A JPH04181216 A JP H04181216A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- film
- liquid crystal
- crystal display
- display element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 44
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000005507 spraying Methods 0.000 claims abstract description 14
- 229920000620 organic polymer Polymers 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 abstract description 17
- 239000007921 spray Substances 0.000 abstract description 7
- 239000011521 glass Substances 0.000 abstract description 6
- 238000009826 distribution Methods 0.000 abstract description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 abstract description 5
- 239000004926 polymethyl methacrylate Substances 0.000 abstract description 5
- 238000003825 pressing Methods 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 abstract description 2
- 230000008021 deposition Effects 0.000 abstract description 2
- 229920000642 polymer Polymers 0.000 abstract description 2
- 239000008096 xylene Substances 0.000 abstract description 2
- 238000007599 discharging Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 19
- 239000010410 layer Substances 0.000 description 11
- 239000002952 polymeric resin Substances 0.000 description 10
- 238000009499 grossing Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000011247 coating layer Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- -1 Evokin Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、デイスプレィ装置である液晶表示素子および
その製造方法ならびに液晶表示素子に用いる液晶表示素
子基板およびその製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a liquid crystal display element that is a display device, a method for manufacturing the same, a liquid crystal display element substrate used in the liquid crystal display element, and a method for manufacturing the same.
従来の技術
液晶表示素子に使用する基板は、平滑性と平坦性を必要
とし、これらに欠けると液晶表示素子として2枚の基板
間のギャップが不均一になり表示品位が低下する。特に
STN型液晶において、その影響は顕著である。ここで
平滑性は細かな凹凸よりなる粗さに関する性能であり、
スムースネスと一般的にいわれる。また平坦性とは基板
のうねり状の起伏に関する性能でありフラットネスと一
般的にいわれる。基板表面に起伏があると、この上に薄
膜の透明導電膜を形成する場合に透明導電膜の断線やシ
ョートが発生しゃすい。またカラーフィルタ基板では表
面の起伏による光拡散現象により光透過性が損なわれ、
カラーフィルタの機能が低下することもある。基板を平
滑、平坦化するために、いくつかの試みがなされている
が、カラーフィルタ上に塗布膜層を設けたものを従来の
方法の一例として説明する。2. Description of the Related Art Substrates used in liquid crystal display devices require smoothness and flatness, and if these characteristics are lacking, the gap between the two substrates in the liquid crystal display device becomes uneven and the display quality deteriorates. This effect is particularly noticeable in STN type liquid crystals. Here, smoothness is the performance related to roughness consisting of fine irregularities,
This is commonly referred to as smoothness. Furthermore, flatness refers to the performance related to the undulations of the substrate, and is generally referred to as flatness. If the substrate surface has undulations, disconnection or short-circuiting of the transparent conductive film is likely to occur when a thin transparent conductive film is formed thereon. In addition, the light transmittance of color filter substrates is impaired due to the light diffusion phenomenon caused by the undulations of the surface.
The function of the color filter may also deteriorate. Although several attempts have been made to smooth and planarize the substrate, a method in which a coating film layer is provided on a color filter will be described as an example of a conventional method.
第4図はカラーフィルタ上に透明な塗布膜層を形成した
基板の断面図を示すものである。第4図でカラーフィル
タ着色膜2はガラス基板1上に数μmの膜厚で形成され
ており、この上に変性シリコーン、エボキン、アクリル
樹脂などで構成されるワニスによる膜厚数μmの塗布膜
層4を形成したものである。FIG. 4 shows a cross-sectional view of a substrate on which a transparent coating layer is formed on a color filter. In Fig. 4, the color filter colored film 2 is formed on a glass substrate 1 with a thickness of several μm, and on top of this is a coating film of varnish made of modified silicone, Evokin, acrylic resin, etc. with a thickness of several μm. Layer 4 was formed.
発明が解決しようとする課題
しかしながら液晶表示素子基板においては、上記のよう
な一般的な樹脂を塗布して平滑、平坦化層を形成する方
法では、塗布膜層表面にきわめて細かいあばた状の起伏
が発生したり、カラーフィルタ表面やカラーフィルタ着
色膜自体の相互の起伏や段差が残るなどして高い平滑性
2平坦性が得られず、特にSTN型液晶には使用できる
ものが得られ難かった。塗布膜に平滑、平坦化加工した
押圧板を押しつけて表面状態を転写する押圧成型法によ
れば、平滑性、平坦性は得られるものの接触式であり、
押圧板等の表面欠陥の転写、汚れの付着、押圧および剥
離時の基板の破損などが生じやすかった。また押圧板等
消耗品、特殊な押圧成型装置の使用が必要であった。Problems to be Solved by the Invention However, in the case of liquid crystal display element substrates, the above-mentioned method of coating a general resin to form a smoothing and flattening layer produces extremely fine pock-like undulations on the surface of the coating layer. High smoothness and flatness could not be obtained due to the occurrence of unevenness and unevenness of the color filter surface and the color filter colored film itself, making it difficult to obtain a product that could be used particularly for STN type liquid crystals. According to the press molding method, which transfers the surface condition by pressing a smoothed and flattened press plate onto the coating film, smoothness and flatness can be obtained, but it is a contact method.
Transfer of surface defects such as the pressing plate, adhesion of dirt, and damage to the substrate during pressing and peeling were likely to occur. In addition, it was necessary to use consumables such as a press plate and a special press molding device.
本発明は上記問題点に鑑み、簡単な製造方法で平滑性、
平坦性が高く液晶表示素子に使用可能なレベルの基板を
、容易で安価に提供することを目的としている。In view of the above problems, the present invention provides smoothness and smoothness with a simple manufacturing method.
The purpose is to easily and inexpensively provide a substrate that has high flatness and can be used for liquid crystal display elements.
課題を解決するための手段
自由回転が容易な分子構造よりなる有機高分子樹脂を加
熱しながら噴霧させたのち、有機高分子の液状流動温度
以上の加熱により熱工2ルギーを与えて分子の自由回転
を促し、平滑性と平坦性の良好な基板を得るものである
。Means to Solve the Problem After spraying an organic polymer resin with a molecular structure that allows for easy free rotation while heating, the molecules are freed by applying heat treatment by heating above the liquid flow temperature of the organic polymer. The purpose is to promote rotation and obtain a substrate with good smoothness and flatness.
作用
有機高分子樹脂に溶剤等を加えて粘度を低下させて塗布
したり加熱すると、流動により平滑化が進む、これはレ
ベリングとして産業上利用されている。しかし一般に使
用されている方法では、粘度低下を溶剤等に依ったり、
使用する有機高分子の分子量が致方から数十万と大きい
上、その分布が大きいので流動性が不充分になることが
あった。When a solvent or the like is added to an organic polymer resin to lower its viscosity and the resin is coated or heated, smoothing progresses due to flow, and this is used industrially as leveling. However, commonly used methods rely on solvents etc. to reduce the viscosity.
The molecular weight of the organic polymer used is as large as several hundreds of thousands, and its distribution is large, resulting in insufficient fluidity.
この結果平滑性、平坦性の程度はSTNタイプ液晶など
に要求されるレベルの達成には不充分で、下地の段差が
残ったり表面にきわめて細かい起伏が発生したりした。As a result, the degree of smoothness and flatness was insufficient to achieve the level required for STN type liquid crystals, etc., and steps in the base remained and extremely fine undulations occurred on the surface.
また塗布膜の耐薬品性や耐溶剤性が不充分な場合があっ
た。Further, the chemical resistance and solvent resistance of the coating film were sometimes insufficient.
有機高分子樹脂は分子構造中に自由回転の可能な分子が
あれば与えられたエネルギーにより流動が活発になる(
文献:高分子材料便覧、昭和48年発行、高分子学会編
、コロナ社刊、P1076)から、分子量を小さ(し、
また分子量分布を小さくして最小活動セグメントである
分子鎖の自由回転が活発になるような材料で構成し、加
熱噴霧したのち基板を加熱処理する。If an organic polymer resin has molecules that can freely rotate in its molecular structure, it will actively flow due to the energy given to it (
Literature: Polymer Materials Handbook, published in 1970, edited by the Society of Polymer Science, published by Corona Publishing, p. 1076).
In addition, it is made of a material that has a small molecular weight distribution so that free rotation of the molecular chain, which is the minimum active segment, becomes active, and after heating and spraying, the substrate is heat-treated.
加熱しながら噴霧することにより有機高分子樹脂は微粒
子化、低粘度化し、また加熱により基板付着時のエネル
ギーが高くなっているから、基板への密着力は高く、付
着時の平滑、平坦性は高(なる。次いで加熱処理におい
て、この樹脂の液状流動温度以上の熱エネルギーを与え
ると、分子の自由回転が活発化し樹脂自体の粘度が極度
に低下して、流動状態になって高い平滑性、平坦性が得
られ、なおかつ広い面積で均一に発現する。By spraying while heating, the organic polymer resin becomes fine particles and has a low viscosity, and since heating increases the energy when adhering to the substrate, the adhesion to the substrate is high, and the smoothness and flatness when adhering is low. Then, during heat treatment, when heat energy is applied above the liquid flow temperature of this resin, the free rotation of the molecules becomes active and the viscosity of the resin itself is extremely reduced, resulting in a fluid state and high smoothness. Flatness can be obtained, and it can be expressed uniformly over a wide area.
このように、自由回転が容易な分子構造よりなる有機高
分子樹脂層を、加熱噴霧法により基板上に形成させた後
、熱エネルギーを与える一連の工程によって、平滑性、
平坦性がともに良好な基板を得ることができる。In this way, an organic polymer resin layer with a molecular structure that can easily rotate freely is formed on a substrate by a heated spraying method, and then a series of steps applying thermal energy is applied to improve smoothness and smoothness.
A substrate with good flatness can be obtained.
実施例 以下本発明の一実施例を図面により説明する。Example An embodiment of the present invention will be described below with reference to the drawings.
先ず、第2図(a)に示すカラーフィルタ基板は、ガラ
ス基板1上に印¥11方式により赤色(R)、緑色(G
)、青色(B)の各インクを印刷してカラーフィルタと
しての着色膜2 (2R,2G、2B)を幅90μm、
膜厚的2.0μmのストライプ状に形成している0着色
膜2の表面起伏(R,G、B、の高さの差)は最大段差
で1.0μmであった。ここに平均分子量的2000で
あり、分子量分布が1500〜2500のポリメチルメ
タクリレートのキシレン溶液(45%濃度)を第3図に
示すような、吐出に空気圧でなく材料への押圧によって
噴霧させる加熱噴霧装置6で、加熱エアレススプレイノ
ズル7を60’Cに加熱して噴霧を行ない、室温放置し
た後、基板を200℃に加熱して、4μmの膜厚を得た
(第1図)。First, the color filter substrate shown in Fig. 2(a) is prepared by marking red (R) and green (G
), blue (B) ink was printed to form a colored film 2 (2R, 2G, 2B) with a width of 90 μm as a color filter.
The surface undulations (difference in height of R, G, and B) of the zero-colored film 2 formed in stripes with a film thickness of 2.0 μm were 1.0 μm at the maximum step. Here, a xylene solution (45% concentration) of polymethyl methacrylate with an average molecular weight of 2,000 and a molecular weight distribution of 1,500 to 2,500 is heated and atomized by pressure on the material rather than air pressure during ejection, as shown in Figure 3. In the apparatus 6, the heated airless spray nozzle 7 was heated to 60'C for spraying, and after being left at room temperature, the substrate was heated to 200C to obtain a film thickness of 4 μm (FIG. 1).
このときの表面起伏は最大段差で0.07μmになり、
当初の着色M2の厚み、2.0μmおよびR,G、Bの
高さの差である最大段差1.0μmから大幅に減少して
平滑、平坦化の目的を達している。100膠離れた別の
測定点においても最大段差は0.07μmであり広い部
分にわたって均一に発現している。また、平均分子量5
000 (分布約3000〜10000)、および3万
のポリメチルメタクリレートを用いて同様の確認を行っ
たが最大段差が、0.6μm、0.7μmとなり平滑。The surface undulation at this time is 0.07 μm at the maximum step,
The original thickness of the colored M2 is 2.0 μm and the maximum height difference of 1.0 μm, which is the height difference between R, G, and B, has been significantly reduced to achieve the purpose of smoothing and flattening. Even at another measurement point 100 mm apart, the maximum step difference was 0.07 μm, which was uniform over a wide area. In addition, the average molecular weight 5
000 (distribution about 3,000 to 10,000) and 30,000 polymethyl methacrylate were used to confirm the same, but the maximum step difference was 0.6 μm and 0.7 μm, making it smooth.
平坦化は得られなかった。このように分子量が小さ(、
与えられるエネルギーにより流動性が高まるもの、すな
わち分子の自由回転が容易な分子構造により構成された
有機高分子樹脂の加熱噴霧、およびその後の加熱処理で
得られる平滑、平坦化効果を確認した。No flattening was obtained. In this way, the molecular weight is small (,
We confirmed the smoothing and flattening effects obtained by heated spraying of an organic polymer resin whose fluidity is increased by the applied energy, that is, a molecular structure that allows molecules to easily rotate freely, and by subsequent heat treatment.
なお、溶剤に対する樹脂比率が高いので塗布膜層は高密
度であり、また耐薬品性、耐溶剤性は実用レベルにあっ
た。In addition, since the ratio of resin to solvent was high, the coating layer had high density, and the chemical resistance and solvent resistance were at a practical level.
なお、本実施例ではポリメチルメタクリレートで説明し
たがポリメチルメタクリレート、ポリスチレンなど他の
有機高分子樹脂でも同様の効果が確認された。また活発
な自由回転を得るために分子量を小さくするほか、−C
−C−のような自由回転の容易な結合を多く持った構造
の樹脂も選択することができる。また、エアレス噴霧の
ほか、空気圧で噴霧するエアスプレィ、椀状の回転体を
高速回転させて遠心力で噴霧させるヘル弐など、他の噴
霧方式でも材料を吐出時に加熱することにより実施が可
能である。In this example, polymethyl methacrylate was used, but similar effects were confirmed with other organic polymer resins such as polymethyl methacrylate and polystyrene. In addition to reducing the molecular weight to obtain active free rotation, -C
It is also possible to select a resin having a structure such as -C- that has many bonds that can easily rotate freely. In addition to airless spraying, other spraying methods can also be used by heating the material during discharge, such as air spray, which uses pneumatic pressure, and Hell-2, which uses a bowl-shaped rotating body to rotate at high speed and spray using centrifugal force. .
発明の効果
自由回転が容易な分子構造よりなる有機高分子樹脂を基
板上に加熱噴霧により付着形成して、もとからある基板
の起伏を平滑、平坦化することができる。Effects of the Invention By depositing an organic polymer resin having a molecular structure that allows free rotation on a substrate by heating and spraying, the original undulations of the substrate can be smoothed and flattened.
さらに、基板表面は平滑、平坦化時に非接触であるので
、接触法で形成する場合に生ずる押圧板等の表面欠陥の
転写、汚れの付着、押圧および剥離時に生じやすい塗膜
のむらや基板の破損などを解消することができる。また
、押圧板等の消耗品などの使用も必要ないので、安価で
容易に平滑。Furthermore, since the surface of the substrate is smooth and non-contact during flattening, transfer of surface defects such as pressure plates that occur when forming using the contact method, adhesion of dirt, unevenness of the coating film that is likely to occur during pressing and peeling, and damage to the substrate. etc. can be resolved. In addition, there is no need to use consumables such as pressure plates, so smoothing is easy and inexpensive.
平坦な基板が得られる。また基板上に薄膜の透明導tM
を形成する場合、基板表面の平滑性、平坦性が高いので
着膜、フォトリソグラフィ性が良好になり透明導it膜
の断線、ショートの発生も減少する。またカラーフィル
タ表面は平滑性が高くなり光拡散現象がなく、カラーフ
ィルタの機能を高く発揮することができる。A flat substrate is obtained. In addition, a thin film of transparent conductor tM is placed on the substrate.
When forming a transparent conductive IT film, the smoothness and flatness of the substrate surface are high, so film deposition and photolithography properties are improved, and the occurrence of disconnections and short circuits in the transparent conductive IT film is reduced. In addition, the color filter surface has high smoothness and there is no light diffusion phenomenon, so that the color filter function can be highly exhibited.
また液晶表示素子として組み立てたときに、基板間のギ
ヤノブが均一になり、表示品位の高いものが得られる。Furthermore, when assembled as a liquid crystal display element, the gear knobs between the substrates become uniform, resulting in a high display quality.
本発明の方法によればこのようにカラーフィルタ表面の
平滑、平坦化に、特に優れた効果を有するものであるが
、この他に一般ガラス表面を同様処理することによって
、研磨ガラスの代わりに安価なガラス基板が提供できる
など、平滑、平坦性が必要な基板に広範囲に適用できる
ものである。The method of the present invention has a particularly excellent effect on smoothing and flattening the surface of a color filter, but in addition, by similarly treating the surface of general glass, it can be used as an inexpensive substitute for polished glass. It can be applied to a wide range of substrates that require smoothness and flatness, such as providing a glass substrate with a smooth surface.
第1図は本発明の一実施例における平滑、平坦化層を形
成したカラーフィルタ基板の断面図、第2図(a)は第
1図の本発明の一実施例に用いた平滑。
平坦化層を形成する前のカラーフィルタ基板の断面図、
第2図(b)は本発明の一実施例における有機高分子を
加熱噴霧により付着形成した後で、加熱処理によって平
滑、平坦化層を形成する前のカラーフィルタ基板の断面
図、第3図は本発明の一実施例における加熱噴霧装置に
よる有機高分子樹脂の付着形成の様子を示す概念図、第
4図は従来例で、塗布膜層を形成したカラーフィルタ基
板の断面図である。
1・・・・・・ガラス基板、2・・・・・・着色膜(2
R:赤色、2G:緑色、2B;青色)、3・・・・・・
平滑、平坦化層、4・・・・・・塗布膜層、5・・・・
・・カラーフィルタ基板、6・・・・・・加熱噴霧装置
、7・・・・・・加熱エアレススプレィノズル、8・・
・・・・有機高分子樹脂層。FIG. 1 is a cross-sectional view of a color filter substrate on which a smoothing and flattening layer is formed according to an embodiment of the present invention, and FIG. A cross-sectional view of a color filter substrate before forming a flattening layer,
FIG. 2(b) is a cross-sectional view of a color filter substrate according to an embodiment of the present invention, after an organic polymer is deposited by heating spraying and before a smoothing and flattening layer is formed by heat treatment. 4 is a conceptual diagram showing how organic polymer resin is deposited and formed by a heated spraying device in an embodiment of the present invention, and FIG. 4 is a sectional view of a color filter substrate on which a coating film layer is formed, according to a conventional example. 1...Glass substrate, 2...Colored film (2
R: red, 2G: green, 2B: blue), 3...
Smoothing, flattening layer, 4... Coating film layer, 5...
... Color filter substrate, 6 ... Heating spray device, 7 ... Heating airless spray nozzle, 8 ...
...Organic polymer resin layer.
Claims (1)
いて加熱噴霧法により付着形成した平滑,平坦層を有す
る液晶表示素子基板の製造方法。(2)請求項(1)記
載の製造方法により得られた構造を有する液晶表示素子
基板。 (3)液晶表示素子用カラーフィルタが備わった請求項
(1)記載の液晶表示素子基板の製造方法を構成要素と
する液晶表示素子の製造方法。 (4)液晶表示素子用カラーフィルタが備わった請求項
(2)記載の液晶表示素子基板を構成要素とする液晶表
示素子。[Scope of Claims] (1) A method for producing a liquid crystal display element substrate having a smooth and flat layer formed by depositing an organic polymer having a molecular structure that allows free rotation by a heated spraying method. (2) A liquid crystal display element substrate having a structure obtained by the manufacturing method according to claim (1). (3) A method for manufacturing a liquid crystal display element, comprising the method for manufacturing a liquid crystal display element substrate according to claim (1), which comprises a color filter for the liquid crystal display element. (4) A liquid crystal display element comprising the liquid crystal display element substrate according to claim (2), which is provided with a color filter for liquid crystal display element.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2310779A JPH04181216A (en) | 1990-11-15 | 1990-11-15 | Production of liquid crystal display element substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2310779A JPH04181216A (en) | 1990-11-15 | 1990-11-15 | Production of liquid crystal display element substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04181216A true JPH04181216A (en) | 1992-06-29 |
Family
ID=18009373
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2310779A Pending JPH04181216A (en) | 1990-11-15 | 1990-11-15 | Production of liquid crystal display element substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04181216A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0735401A2 (en) * | 1995-03-31 | 1996-10-02 | Canon Kabushiki Kaisha | Color filter, method of producing the same and liquid crystal display device |
US5894360A (en) * | 1995-01-17 | 1999-04-13 | Alps Electric Co., Ltd. | Liquid crystal display having an SiO2 flattening layer |
-
1990
- 1990-11-15 JP JP2310779A patent/JPH04181216A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5894360A (en) * | 1995-01-17 | 1999-04-13 | Alps Electric Co., Ltd. | Liquid crystal display having an SiO2 flattening layer |
EP0735401A2 (en) * | 1995-03-31 | 1996-10-02 | Canon Kabushiki Kaisha | Color filter, method of producing the same and liquid crystal display device |
EP0735401A3 (en) * | 1995-03-31 | 1997-03-19 | Canon Kk | Color filter, method of producing the same and liquid crystal display device |
US6341862B1 (en) | 1995-03-31 | 2002-01-29 | Canon Kabushiki Kaisha | Color filter, method of producing the same and liquid crystal display device |
KR100320690B1 (en) * | 1995-03-31 | 2002-06-20 | 미다라이 후지오 | Color filter, its manufacturing method and liquid crystal display device |
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