JPH04181215A - Production of liquid crystal display element substrate - Google Patents

Production of liquid crystal display element substrate

Info

Publication number
JPH04181215A
JPH04181215A JP2310778A JP31077890A JPH04181215A JP H04181215 A JPH04181215 A JP H04181215A JP 2310778 A JP2310778 A JP 2310778A JP 31077890 A JP31077890 A JP 31077890A JP H04181215 A JPH04181215 A JP H04181215A
Authority
JP
Japan
Prior art keywords
substrate
liquid crystal
crystal display
film
display element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2310778A
Other languages
Japanese (ja)
Inventor
Nobumasa Oshima
大島 信正
Kazuo Ogata
一雄 緒方
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2310778A priority Critical patent/JPH04181215A/en
Publication of JPH04181215A publication Critical patent/JPH04181215A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To eliminate the unequalness of a coated film and the failure of a substrate, etc., by having a smooth and flat layer formed by a pressurized sliding method using an org. high polymer having the molecular structure to allow easy free rotation. CONSTITUTION:Colored films 2 are formed in the form of stripes having 90mum width and about 2.0mum film thickness as color filters on the glass substrate. The surface undulations of the films 2 are kept at 1.0mum max. step. A xylene soln. of polymethyl methacrylate having 2,000 average mol. wt. and 1,500 to 2,500mol.wt. distribution is applied thereon under pressurized sliding with a roll coater 6 and thereafter, the substrate is rested at room temp. and is then heated to 200 deg.C to obtain 4mum film thickness after heating. The surface undulations of this time are 0.1mum max. step and decrease considerably from 2.0mum thickness and 1.0mum max. step of the initial film 2. The film is thus smoothed and flattened. The film deposition and photolithographic characteristic are improved in this way.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、デイスプレィ装買である液晶表示素子および
その製造方法ならびに液晶表示素子に用いる液晶表示素
子基板および製造方法に間するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a liquid crystal display element as a display device, a method of manufacturing the same, a liquid crystal display element substrate used in the liquid crystal display element, and a method of manufacturing the same.

従来の技術 液晶表示素子に使用する基板は、平滑性と平坦性を必要
とし、これらに欠けると液晶表示素子として2枚の基板
間のギャップが不均一になり表示品位が低下する。特に
STN型液晶において、その影響は顕著である。
2. Description of the Related Art Substrates used in liquid crystal display devices require smoothness and flatness, and if these characteristics are lacking, the gap between the two substrates in the liquid crystal display device becomes uneven and the display quality deteriorates. This effect is particularly noticeable in STN type liquid crystals.

ここで平滑性は細かな凹凸よりなる粗さに関する性能で
あり、スムースネスと一般的にいわれる。
Here, smoothness is a performance related to roughness consisting of fine irregularities, and is generally referred to as smoothness.

また平坦性とは基板のうねり状の起伏に関する性能であ
りフラツトネスと一般的にいわれる。
Furthermore, flatness refers to the performance related to the undulations of the substrate, and is generally referred to as flatness.

また基板表面に起伏があると、この上に薄膜の透明導電
膜を形成する場合に透明導電膜の断線やシッートが発生
しやすい、またカラーフィルタ基板では表面の起伏によ
る光拡散現象により光透過性が損なわれ、カラーフィル
タの機能が低下することもある。基板を平滑、平坦化す
るために、いくつかの試みがなされているが、カラーフ
ィルタ上に塗布膜層を設けたものを従来の方法の一例と
して説明する。
In addition, if the substrate surface has undulations, when a thin transparent conductive film is formed on top of the substrate, disconnections or sheets are likely to occur in the transparent conductive film, and in the case of color filter substrates, light diffusion due to surface undulations may cause light transmission. may be damaged and the function of the color filter may deteriorate. Although several attempts have been made to smooth and planarize the substrate, a method in which a coating film layer is provided on a color filter will be described as an example of a conventional method.

第4図はカラーフィルタ上に透明な塗布膜層を形成した
基板の断面図を示すものである。第4図でカラーフィル
タ着色膜2はガラス基板1上に数μmの膜厚で形成され
ており、この上に変性シリコーン、エポキシ、アクリル
樹脂などで構成されるワニスによる膜厚数μmの塗布膜
層4を形成したものである。
FIG. 4 shows a cross-sectional view of a substrate on which a transparent coating layer is formed on a color filter. In FIG. 4, a color filter colored film 2 is formed on a glass substrate 1 to a thickness of several micrometers, and on top of this a coating film of varnish made of modified silicone, epoxy, acrylic resin, etc. is applied to a thickness of several micrometers. Layer 4 was formed.

発明が解決しようとする課題 しかしながら液晶表示素子基板においては、上記のよう
な一般的な樹脂を塗布して平滑、平坦化層を形成する方
法では、塗布膜層表面にきわめて細かいあばた状の起伏
が発生したり、カラーフィルタ表面やカラーフィルタ着
色膜自体の相互の起伏や段差が残るなどして、高い平滑
、平坦化性が得られず、特にSTN型液晶には使用でき
るものが、得られ難かった。
Problems to be Solved by the Invention However, in the case of liquid crystal display element substrates, the above-mentioned method of coating a general resin to form a smoothing and flattening layer produces extremely fine pock-like undulations on the surface of the coating layer. It is difficult to obtain a high level of smoothness and flatness, especially for STN type liquid crystals, as the surface of the color filter and the colored film of the color filter themselves remain uneven or uneven. Ta.

平滑、平坦化加工した押圧板を押しつけて、表面状態を
転写する押圧成型法によれば、平滑、平坦化性は得られ
るものの接触式であり、押圧板等の表面欠陥の転写、汚
れの付着、押圧および剥離時の基板の破損などが生じや
すかった。また押圧板等消耗品、特殊な押圧成型装置の
使用が必要であった。
The press molding method, which transfers the surface condition by pressing a press plate that has been smoothed and flattened, can achieve smoothness and flattening, but it is a contact method, and it is difficult to transfer surface defects such as the press plate and the adhesion of dirt. , the substrate was easily damaged during pressing and peeling. In addition, it was necessary to use consumables such as a press plate and a special press molding device.

本発明は上記問題点に鑑み、簡単な製造方法で平滑性、
平坦性が高く液晶表示素子に使用可能なレベルの基板を
、容易で安価に擾供することを目的としている。
In view of the above problems, the present invention provides smoothness and smoothness with a simple manufacturing method.
The purpose is to easily and inexpensively provide a substrate with high flatness that can be used for liquid crystal display devices.

課題を解決するための手段 自由回転が容易な分子構造よりなる有機高分子樹脂ヲ、
ロールコートカーテンコート等基板と一定間隔を保った
状態で、表面に沿って摺動するような構成の加圧摺動法
により基板上に塗布させた後、有機高分子の液状流動温
度以上の熱エネルギーを与えて分子の自由回転を促し、
うねりと表面粗さの小さい平滑性と平坦性の良好な基板
を得るものである。
Means to solve the problem Organic polymer resin with a molecular structure that can easily rotate freely.
Roll coat curtain coat, etc. After being coated onto the substrate using a pressure sliding method in which it slides along the surface while maintaining a constant distance from the substrate, it is heated to a temperature higher than the liquid flow temperature of the organic polymer. Providing energy to encourage free rotation of molecules,
A substrate with good smoothness and flatness with small waviness and surface roughness can be obtained.

作用 有機高分子樹脂に溶剤等を加えて粘度を低下させて塗布
したり加熱すると、流動により平滑化が進む。これはレ
ベリングとして産業上利用されている。しかし一般に使
用されている方法では、粘度低下を溶剤等に依ったり、
使用する有機高分子の分子量が飲方から数十万と大きい
上、その分布が大きいので流動性が不充分になる。この
結果平滑、平坦性の程度はSTNタイプ液晶などに要求
されるレベルの達成には不充分で、下地の段差が残った
り表面にきわめて細かい起伏が発生したりした。また塗
布膜の耐薬品性や耐溶剤性が不充分な場合があった。
Function: When a solvent or the like is added to the organic polymer resin to lower its viscosity and then applied or heated, smoothing progresses due to flow. This is used industrially as leveling. However, commonly used methods rely on solvents etc. to reduce the viscosity.
The molecular weight of the organic polymer used is large, hundreds of thousands of thousands, and its distribution is large, resulting in insufficient fluidity. As a result, the degree of smoothness and flatness was insufficient to achieve the level required for STN type liquid crystals, etc., and steps in the base remained and extremely fine undulations occurred on the surface. Further, the chemical resistance and solvent resistance of the coating film were sometimes insufficient.

有機高分子樹脂は分子構造中に自由回転の可能な分子が
あれば与えられたエネルギーにより流動が活発になる(
文献:高分子材料便覧、昭和48年発行、高分子学会編
、コロナ社刊、P1076)から、分子量を小さくし、
また分子量分布を小さくして最小活動セグメントである
分子鎖の自由回転が活発になるような材料で構成し、こ
の樹脂の液状流動温度以上の熱エネルギーを与えること
により、分子の自由回転が生じ流動状態になって、樹脂
自体の粘度が極度に低下する。この結果、表面粗さが除
去されて高い平滑性が得られ、なおかつ広い面積で均一
に発現する。また、加圧摺動により、基板に起因する起
伏は埋没、圧縮され、さらにうねりが除去されるなど平
坦性が向上する。
If an organic polymer resin has molecules that can freely rotate in its molecular structure, it will actively flow due to the energy given to it (
Literature: Polymer Materials Handbook, published in 1970, edited by the Society of Polymer Science, published by Corona Publishing, p. 1076), by reducing the molecular weight,
In addition, it is made of a material that has a small molecular weight distribution and activates the free rotation of the molecular chain, which is the minimum active segment, and by applying thermal energy higher than the liquid flow temperature of this resin, free rotation of molecules occurs and flow. As a result, the viscosity of the resin itself is extremely reduced. As a result, surface roughness is removed, high smoothness is obtained, and the surface is uniformly expressed over a wide area. In addition, due to the pressurized sliding, the undulations caused by the substrate are buried and compressed, and the flatness is improved by removing the undulations.

このように有機高分子樹脂層を加圧摺動法により基板上
に形成させた後、熟エネルギーを与える一連の工程によ
って、平滑性、平坦性がともに良好な基板を得ることが
できる。
After forming the organic polymer resin layer on the substrate by the pressure sliding method in this manner, a substrate having good smoothness and flatness can be obtained by a series of steps of applying ripening energy.

実施例 以下本発明の一実施例を図面により説明する。Example An embodiment of the present invention will be described below with reference to the drawings.

先ず、第2図(a)に示すカラーフィルタ基板は、ガラ
ス基板1上に凹版オフセット印刷方式により赤色(R)
、緑色(G)、青色(B)の各インクを印刷してカラー
フィルタとしての着色膜2(2R。
First, the color filter substrate shown in FIG. 2(a) is printed with red (R) on a glass substrate 1 by an intaglio offset printing method.
, green (G), and blue (B) inks to form a colored film 2 (2R) as a color filter.

2G、2B)を幅90μm、膜厚約2.0.crmのス
トライプ状に形成している0着色膜2の表面起伏(R,
G、B、の高さの差)は最大段差で1.0μmであった
。ここに平均分子量約2000、分子量分布が1500
〜2500のポリメチルメタクリレートのキシレン溶液
(45%濃度)を第3図に示すような、直径約100園
のロールを有するロールコータ6で加圧摺動塗布し室温
放置した後、200 ”Cに加熱して、加熱後4μmの
膜厚を得た(第1図)。このときの表面起伏は最大段差
で0,1μmになり、当初の着色膜2の厚み、2.0μ
mおよびR,G、 B、の高さの差である最大段差1.
0μmから大幅に減少して平滑、平坦化の目的を達して
いる。100■離れた別の測定点においても最大段差は
0.1Bmであり広い部分にわたって均一に発現してい
る。
2G, 2B) with a width of 90 μm and a film thickness of approximately 2.0 μm. The surface undulations (R,
The height difference between G and B was 1.0 μm at the maximum step. Here, the average molecular weight is about 2000, and the molecular weight distribution is 1500.
~2500 xylene solution (45% concentration) of polymethyl methacrylate was coated under pressure with a roll coater 6 having a roll diameter of about 100 mm as shown in Fig. 3, left at room temperature, and then heated to 200 ''C. After heating, a film thickness of 4 μm was obtained (Fig. 1).The surface unevenness at this time was 0.1 μm at the maximum step, which was 2.0 μm compared to the original thickness of the colored film 2.
m and the maximum step difference, which is the difference in height between R, G, and B, 1.
The thickness is significantly reduced from 0 μm, achieving the goal of smoothing and flattening. Even at another measurement point 100 cm away, the maximum step difference was 0.1 Bm, which was uniform over a wide area.

また平均分子量5000 (分布約3000〜1000
0)、および3万のポリメチルメタクリレートを用いて
同様の確認を行ったが最大段差が、0.6μm、0.7
μmとなり平滑、平坦化は得られなかった。このように
分子量が小さく、与えられるエネルギーにより流動性が
高まるもの、すなわち分子の自由回転が容易な分子構造
により構成された有機高分子の効果を確認した。
In addition, the average molecular weight is 5000 (distribution approximately 3000 to 1000)
0) and 30,000 polymethyl methacrylate, the maximum step difference was 0.6 μm, 0.7 μm.
μm, and smoothing and flattening could not be obtained. In this way, we confirmed the effectiveness of organic polymers that have a small molecular weight and whose fluidity increases with the application of energy, that is, organic polymers that have a molecular structure that allows molecules to easily rotate freely.

また塗布、付着形成を回転法(スピナー法)。In addition, the coating and adhesion formation are performed using a rotating method (spinner method).

引き上げ法(デイツプ法)、ロールコート法で試みた。We tried the pulling method (dip method) and roll coating method.

ロールコート法はローラーによる加圧があり、他の二法
では加圧はされない、平均分子量約2000の有機高分
子を用いて、最大段差はそれぞれ0.6.0.5.0.
1 μmが得られ、加圧摺動塗布による効果が確認でき
た。
In the roll coating method, pressure is applied by a roller, while in the other two methods, pressure is not applied. An organic polymer with an average molecular weight of about 2000 is used, and the maximum step difference is 0.6, 0, 5, 0, respectively.
A thickness of 1 μm was obtained, confirming the effect of pressure-sliding coating.

なお、溶剤に対する樹脂比率が高いので塗布膜層は高密
度であり、また耐薬品性、耐溶則性は実用レベルにあっ
た。
In addition, since the resin to solvent ratio was high, the coating layer had a high density, and the chemical resistance and melting resistance were at a practical level.

なお、本実施例ではポリメチルメタクリレートで説明し
たがポリメチルメタクリレート、ポリスチレンなど他の
有機高分子樹脂でも同様の効果が確認された。また活発
な自由回転を得るために分子量を小さくするほか、−C
−C−のような自由回転の容易な結合を多く持った構造
の樹脂も選択することができる。また、ロールコートの
ほかカーテンコートなど他の加圧摺動可能な塗布法でも
実施が可能である。
In this example, polymethyl methacrylate was used, but similar effects were confirmed with other organic polymer resins such as polymethyl methacrylate and polystyrene. In addition to reducing the molecular weight to obtain active free rotation, -C
It is also possible to select a resin having a structure such as -C- that has many bonds that can easily rotate freely. Further, in addition to roll coating, other pressure-sliding coating methods such as curtain coating can also be used.

発明の効果 自由回転が容易な分子構造よりなる有機高分子樹脂を基
板上に加圧摺動作用を具備する方法で塗着形成すること
により、もとからある基板の起伏を平滑、平坦化するこ
とができる。
Effects of the Invention By applying and forming an organic polymer resin with a molecular structure that allows easy free rotation onto a substrate using a method that provides pressure sliding action, the original undulations of the substrate can be smoothed and flattened. be able to.

さらに、基板表面は平滑、平坦化時に非接触であるので
、接触法で形成する場合に生ずる押圧板等の表面欠陥の
転写、汚れの付着、押圧および剥離時に生しやすい塗膜
のむらや基板の破損などを解消することができる。また
、特殊な加工装置を使用せず、押圧板等の消耗品などの
使用も必要ないので、安価で容易に平滑、平坦な基板が
得られる。また基板上に薄膜の透明導電膜を形成する場
合、基板表面の平滑性、平坦性が高いので着膜5フオト
リソグラフイ性が良好になり透明導電膜の断線、ショー
トの発生も減少する。またカラーフィルタ表面は平滑性
が高くなり光拡散現象がなく、カラーフィルタの機能を
高く発揮することができる。
Furthermore, since the surface of the substrate is smooth and non-contact during flattening, it is possible to transfer surface defects such as pressure plates that occur when forming with the contact method, adhesion of dirt, unevenness of the coating film that is likely to occur during pressing and peeling, and It is possible to eliminate damage etc. Further, since no special processing equipment is required and no consumables such as a pressing plate are required, smooth and flat substrates can be easily obtained at low cost. Furthermore, when a thin transparent conductive film is formed on a substrate, since the surface of the substrate is highly smooth and flat, the deposited film 5 has good photolithography properties and the occurrence of disconnections and short circuits in the transparent conductive film is reduced. In addition, the color filter surface has high smoothness and there is no light diffusion phenomenon, so that the color filter function can be highly exhibited.

また液晶表示素子として組み立てたときに、基板間のギ
ャップが均一になり、表示品位の高いものが得られる。
Furthermore, when assembled as a liquid crystal display element, the gap between the substrates becomes uniform, resulting in a high display quality.

本発明の方法によればこのようにカラーフィルタ表面の
平滑化に、特に優れた効果を有するものであるが、この
他に一般ガラス表面を同様処理することによって、研磨
ガラスの代わりに安価なガラス基板が提供できるなど、
平滑、平坦が必要な基板に広範囲に適用できるものであ
る。
Although the method of the present invention has a particularly excellent effect on smoothing the color filter surface, it is also possible to use inexpensive glass instead of polished glass by similarly treating the surface of ordinary glass. We can provide substrates, etc.
It can be applied to a wide range of substrates that require smoothness and flatness.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例における平滑、平坦化層を形
成したカラーフィルタ基板の断面図、第2図(a)は第
1図の本発明の一実施例に用いた平滑。 平坦化層を形成する前のカラーフィルタ基板の断面図、
第2図(b)は本発明の一実施例における有機高分子を
加圧摺動により付着形成した後で有機高分子を構成する
分子の自由回転性を付与する前のカラーフィルタ基板の
断面図、第3図は本発明の一実施例におけるローラーコ
ータによる有機高分子樹脂の付着形成の様子を示す概念
図、第4図は従来例で、塗布膜層を形成したカラーフィ
ルタ基板の断面図である。 1・・・・・・ガラス基板、2・・・・・・着色膜(2
R:赤色、2G:緑色、2B:置き)、3・・・・・・
平滑、平坦化層、4・・・・・・塗布膜層、5・・・・
・・カラーフィルタ基板、1・・・・・・ローラーコー
タおよびその構成部分、7・・・・・・有機高分子樹脂
。 代理人の氏名 弁理士小鍜治明 ほか2急用 3 図 G−一一ローラー〕−q−工よ乙ゾのすL入受以″17
− 簀猪番:+)It ”、6 6                  」コロ   
 ″″′
FIG. 1 is a cross-sectional view of a color filter substrate on which a smoothing and flattening layer is formed according to an embodiment of the present invention, and FIG. A cross-sectional view of a color filter substrate before forming a flattening layer,
FIG. 2(b) is a cross-sectional view of a color filter substrate according to an embodiment of the present invention, after an organic polymer is adhered and formed by sliding under pressure, but before the molecules constituting the organic polymer are given free rotation properties. , FIG. 3 is a conceptual diagram showing how organic polymer resin is deposited using a roller coater in an embodiment of the present invention, and FIG. 4 is a conventional example, which is a cross-sectional view of a color filter substrate on which a coating film layer is formed. be. 1...Glass substrate, 2...Colored film (2
R: Red, 2G: Green, 2B: Place), 3...
Smoothing, flattening layer, 4... Coating film layer, 5...
. . . Color filter substrate, 1 . . . Roller coater and its constituent parts, 7 . . . Organic polymer resin. Name of agent: Patent attorney Haruaki Ogata and 2 others 3 Figure G-11 Roller〕-q-Eng.
- Kano Boar Number: +) It ”, 6 6” Koro
″″′

Claims (4)

【特許請求の範囲】[Claims] (1)自由回転が容易な分子構造をもつ有機高分子を用
いて加圧摺動法により形成した平滑,平坦層を有する液
晶表示素子基板の製造方法。
(1) A method for manufacturing a liquid crystal display element substrate having a smooth and flat layer formed by a pressure sliding method using an organic polymer having a molecular structure that allows easy free rotation.
(2)請求項(1)記載の製造方法により得られた液晶
表示素子基板。
(2) A liquid crystal display element substrate obtained by the manufacturing method according to claim (1).
(3)液晶表示素子用カラーフィルタが備わった請求項
(1)記載の液晶表示素子基板の製造方法を構成要素と
する液晶表示素子の製造方法。
(3) A method for manufacturing a liquid crystal display element, comprising the method for manufacturing a liquid crystal display element substrate according to claim (1), which comprises a color filter for a liquid crystal display element.
(4)液晶表示素子用カラーフィルタが備わった請求項
(2)記載の液晶表示素子基板を構成要素とする液晶表
示素子。
(4) A liquid crystal display element comprising the liquid crystal display element substrate according to claim (2), which is provided with a color filter for liquid crystal display elements.
JP2310778A 1990-11-15 1990-11-15 Production of liquid crystal display element substrate Pending JPH04181215A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2310778A JPH04181215A (en) 1990-11-15 1990-11-15 Production of liquid crystal display element substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2310778A JPH04181215A (en) 1990-11-15 1990-11-15 Production of liquid crystal display element substrate

Publications (1)

Publication Number Publication Date
JPH04181215A true JPH04181215A (en) 1992-06-29

Family

ID=18009361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2310778A Pending JPH04181215A (en) 1990-11-15 1990-11-15 Production of liquid crystal display element substrate

Country Status (1)

Country Link
JP (1) JPH04181215A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009276555A (en) * 2008-05-14 2009-11-26 Dainippon Printing Co Ltd Method for manufacturing color filter for semi-transmissive liquid crystal display and its manufacturing apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009276555A (en) * 2008-05-14 2009-11-26 Dainippon Printing Co Ltd Method for manufacturing color filter for semi-transmissive liquid crystal display and its manufacturing apparatus

Similar Documents

Publication Publication Date Title
EP0951057B1 (en) Substrate flattening method
WO1994007158A1 (en) Color filter for liquid crystal display and tension expansion film formation apparatus
KR100647938B1 (en) Process for production of polymer sheet and optical polymer sheet
JP2000140739A (en) Sheet coating apparatus, coating by using the same and production of color filter
JP2991270B2 (en) Manufacturing method of color filter
JPH04181215A (en) Production of liquid crystal display element substrate
JP3791018B2 (en) Slit die coater die and coating film manufacturing method using the same
JPH04181216A (en) Production of liquid crystal display element substrate
JPH04181217A (en) Production of liquid crystal display element substrate
JPS62280805A (en) Manufacture of color filter
JPH10328612A (en) Production of liquid crystal optical element
JPH01270003A (en) Production of color filter
US5378494A (en) Method of applying a thin coating on the lower surface of a bilevel substrate
JPH01279205A (en) Production of color filter
JP3201195B2 (en) Film formation
JPH01262502A (en) Formation of protective layer on color filter
JPH01265204A (en) Production of color filter
JPS6311939B2 (en)
JP3551643B2 (en) Manufacturing method of liquid crystal display device
JPS62231786A (en) Colored film forming method
JP2000167476A (en) Formation of colored coating film
JPH01270002A (en) Production of color filter
JP4151138B2 (en) Method for forming colored coating
JPS63287802A (en) Production of color filter
JPH03241858A (en) Manufacture of semiconductor substrate