JPH0319933U - - Google Patents
Info
- Publication number
- JPH0319933U JPH0319933U JP5671689U JP5671689U JPH0319933U JP H0319933 U JPH0319933 U JP H0319933U JP 5671689 U JP5671689 U JP 5671689U JP 5671689 U JP5671689 U JP 5671689U JP H0319933 U JPH0319933 U JP H0319933U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- fabry
- perot etalon
- photodetector
- separating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010521 absorption reaction Methods 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 9
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 claims description 7
- 238000010408 sweeping Methods 0.000 claims description 5
- 230000010355 oscillation Effects 0.000 claims 3
- 238000000926 separation method Methods 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 7
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
Description
第１図は本考案に係るレーザ周波数特性測定装
置の一実施例を示す構成ブロツク図、第２図は吸
収セルの吸収特性を示す特性曲線図、第３図およ
ひ第４図は第１図装置の動作説明図、第５図は第
１図装置によつて測定された被測定レーザの温度
−波長特性を示す図、第６図は第１図装置の一変
形例を示す構成ブロツク図、第７図は本考案に係
る可変周波数光源の一実施例を示す構成ブロツク
図、第８図は第７図装置の変形例を示す構成ブロ
ツク図、第９図、第１０図は従来のレーザ周波数
特性測定装置を示す構成原理図である。
１１……被測定半導体レーザ、１５……掃引手
段、１８……分離手段、１９……吸収セル、２０
……フアブリ・ペロー・エタロン、２１……第１
の光検出器、２２……第２の光検出器、２３……
演算回路、２６……周波数制御回路、２７……ス
イツチ、２９……電圧ホールド回路、３０……切
換スイツチ。
FIG. 1 is a block diagram showing an embodiment of a laser frequency characteristic measuring device according to the present invention, FIG. 2 is a characteristic curve diagram showing the absorption characteristics of an absorption cell, and FIGS. 5 is a diagram showing the temperature-wavelength characteristics of the laser to be measured measured by the device shown in FIG. 1, and FIG. 6 is a configuration block diagram showing a modification of the device shown in FIG. 1. , FIG. 7 is a block diagram showing an embodiment of the variable frequency light source according to the present invention, FIG. 8 is a block diagram showing a modification of the device shown in FIG. 7, and FIGS. FIG. 1 is a diagram illustrating the configuration principle of a frequency characteristic measuring device. 11... Semiconductor laser to be measured, 15... Sweeping means, 18... Separating means, 19... Absorption cell, 20
...Fabri Perrault Etalon, 21...1st
photodetector, 22... second photodetector, 23...
Arithmetic circuit, 26... Frequency control circuit, 27... Switch, 29... Voltage hold circuit, 30... Changeover switch.
Claims (1)
引する掃引手段と、前記半導体レーザの出力光を
２つに分離する分離手段と、この分離手段の一方
の出力光を入射し特定の周波数で吸引を起こす吸
収セルと、前記分離手段の他方の出力光を入射す
るフアブリ・ペロー・エタロンと、前記吸収セル
の透過光を検出する第１の光検出器と、前記フア
ブリ・ペロー・エタロンの透過光を検出する第２
の光検出器と、前記第１および第２の光検出器の
出力と前記掃引手段の掃引信号とから前記被測定
半導体レーザの各温度または電流における発振周
波数を演算する演算回路とを備えたことを特徴と
するレーザ周波数特性測定装置。 (2) 半導体レーザと、この半導体レーザの温度
を掃引する掃引手段と、前記半導体レーザの出力
光を２つに分離する分離手段と、この分離手段の
一方の出力光を入射し特定の周波数で吸収を起こ
す標準物質を封入した吸収セルと、前記分離手段
の他方の出力光を入射するフアブリ・ペロー・エ
タロンと、前記吸収セルの透過光を検出する第１
の光検出器と、前記フアブリ・ペロー・エタロン
の透過光を検出する第２の光検出器と、前記第１
および第２図の光検出器の出力と前記掃引手段の
掃引信号とから前記被測定半導体レーザの発振周
波数を演算する演算回路と、前記吸収セルの吸収
線または前記フアブリ・ペロー・エタロンの透過
線に前記半導体レーザの発振周波数を制御する制
御手段とを備えたことを特徴とする可変周波数光
源。[Claims for Utility Model Registration] (1) A sweeping means for sweeping the temperature or current of a semiconductor laser to be measured, a separating means for separating the output light of the semiconductor laser into two, and an output light of one of the separating means. a Fabry-Perot etalon that receives the other output light of the separation means; a first photodetector that detects the transmitted light of the absorption cell; The second one detects the transmitted light of the Fabry-Perot etalon.
a photodetector, and an arithmetic circuit that calculates the oscillation frequency of the semiconductor laser to be measured at each temperature or current from the outputs of the first and second photodetectors and the sweep signal of the sweep means. A laser frequency characteristic measurement device featuring: (2) a semiconductor laser; a sweeping means for sweeping the temperature of the semiconductor laser; a separating means for separating the output light of the semiconductor laser into two; an absorption cell enclosing a standard substance that causes absorption; a Fabry-Perot etalon into which the other output light of the separation means is incident; and a first Fabry-Perot etalon for detecting the transmitted light of the absorption cell.
a second photodetector for detecting transmitted light of the Fabry-Perot etalon;
and an arithmetic circuit that calculates the oscillation frequency of the semiconductor laser to be measured from the output of the photodetector and the sweep signal of the sweep means shown in FIG. 2, and an absorption line of the absorption cell or a transmission line of the Fabry-Perot etalon. and a control means for controlling the oscillation frequency of the semiconductor laser.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989056716U JPH0740181Y2 (en) | 1989-03-30 | 1989-05-17 | Variable frequency light source using laser frequency characteristic measuring device and nuclear device |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1-37147 | 1989-03-30 | ||
| JP3714789 | 1989-03-30 | ||
| JP1989056716U JPH0740181Y2 (en) | 1989-03-30 | 1989-05-17 | Variable frequency light source using laser frequency characteristic measuring device and nuclear device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0319933U true JPH0319933U (en) | 1991-02-27 |
| JPH0740181Y2 JPH0740181Y2 (en) | 1995-09-13 |
Family
ID=31717793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989056716U Expired - Lifetime JPH0740181Y2 (en) | 1989-03-30 | 1989-05-17 | Variable frequency light source using laser frequency characteristic measuring device and nuclear device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0740181Y2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004004080A (en) * | 2002-05-24 | 2004-01-08 | Tektronix Inc | Sweep wavemeter and wavelength calibration method |
| JP4722110B2 (en) * | 2001-01-30 | 2011-07-13 | ソルラブス、 インコーポレイテッド | Wavelength calibration apparatus and method for swept laser |
| JP2017049253A (en) * | 2015-09-02 | 2017-03-09 | サーモ フィッシャー サイエンティフィック （ブレーメン） ゲーエムベーハー | Optimization of laser operating point in laser absorption spectrometer |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS48100138A (en) * | 1972-03-31 | 1973-12-18 | ||
| JPS5812385A (en) * | 1981-06-26 | 1983-01-24 | Fujitsu Ltd | Emitting light wave length sweep system of wave length variable laser |
| JPS60140141A (en) * | 1983-12-27 | 1985-07-25 | Fujitsu Ltd | Optical gas sensor |
| JPS62198723A (en) * | 1986-02-26 | 1987-09-02 | Yokogawa Electric Corp | Variable wavelength light source |
-
1989
- 1989-05-17 JP JP1989056716U patent/JPH0740181Y2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS48100138A (en) * | 1972-03-31 | 1973-12-18 | ||
| JPS5812385A (en) * | 1981-06-26 | 1983-01-24 | Fujitsu Ltd | Emitting light wave length sweep system of wave length variable laser |
| JPS60140141A (en) * | 1983-12-27 | 1985-07-25 | Fujitsu Ltd | Optical gas sensor |
| JPS62198723A (en) * | 1986-02-26 | 1987-09-02 | Yokogawa Electric Corp | Variable wavelength light source |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4722110B2 (en) * | 2001-01-30 | 2011-07-13 | ソルラブス、 インコーポレイテッド | Wavelength calibration apparatus and method for swept laser |
| JP2004004080A (en) * | 2002-05-24 | 2004-01-08 | Tektronix Inc | Sweep wavemeter and wavelength calibration method |
| JP4667728B2 (en) * | 2002-05-24 | 2011-04-13 | ソルラブス、 インコーポレイテッド | Sweep wavelength meter and wavelength calibration method |
| JP2017049253A (en) * | 2015-09-02 | 2017-03-09 | サーモ フィッシャー サイエンティフィック （ブレーメン） ゲーエムベーハー | Optimization of laser operating point in laser absorption spectrometer |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0740181Y2 (en) | 1995-09-13 |
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