JPH0318734B2 - - Google Patents
Info
- Publication number
- JPH0318734B2 JPH0318734B2 JP60063556A JP6355685A JPH0318734B2 JP H0318734 B2 JPH0318734 B2 JP H0318734B2 JP 60063556 A JP60063556 A JP 60063556A JP 6355685 A JP6355685 A JP 6355685A JP H0318734 B2 JPH0318734 B2 JP H0318734B2
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- heater
- heater support
- heat shield
- molecular beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6355685A JPS61224311A (ja) | 1985-03-29 | 1985-03-29 | 分子線源 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6355685A JPS61224311A (ja) | 1985-03-29 | 1985-03-29 | 分子線源 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61224311A JPS61224311A (ja) | 1986-10-06 |
| JPH0318734B2 true JPH0318734B2 (enrdf_load_stackoverflow) | 1991-03-13 |
Family
ID=13232607
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6355685A Granted JPS61224311A (ja) | 1985-03-29 | 1985-03-29 | 分子線源 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61224311A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7433587B2 (ja) * | 2019-06-20 | 2024-02-20 | Ｏｒｂｒａｙ株式会社 | ヒーターサポート及びヒーター装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59121831U (ja) * | 1983-02-04 | 1984-08-16 | 日本真空技術株式会社 | 分子線エピタキシ−用蒸発源熱シ−ルド |
-
1985
- 1985-03-29 JP JP6355685A patent/JPS61224311A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61224311A (ja) | 1986-10-06 |