JPS61224311A - 分子線源 - Google Patents

分子線源

Info

Publication number
JPS61224311A
JPS61224311A JP6355685A JP6355685A JPS61224311A JP S61224311 A JPS61224311 A JP S61224311A JP 6355685 A JP6355685 A JP 6355685A JP 6355685 A JP6355685 A JP 6355685A JP S61224311 A JPS61224311 A JP S61224311A
Authority
JP
Japan
Prior art keywords
heater
support
supported
crucible
molecular beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6355685A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0318734B2 (enrdf_load_stackoverflow
Inventor
Norio Kanai
金井　謙雄
Naoyuki Tamura
直行 田村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6355685A priority Critical patent/JPS61224311A/ja
Publication of JPS61224311A publication Critical patent/JPS61224311A/ja
Publication of JPH0318734B2 publication Critical patent/JPH0318734B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP6355685A 1985-03-29 1985-03-29 分子線源 Granted JPS61224311A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6355685A JPS61224311A (ja) 1985-03-29 1985-03-29 分子線源

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6355685A JPS61224311A (ja) 1985-03-29 1985-03-29 分子線源

Publications (2)

Publication Number Publication Date
JPS61224311A true JPS61224311A (ja) 1986-10-06
JPH0318734B2 JPH0318734B2 (enrdf_load_stackoverflow) 1991-03-13

Family

ID=13232607

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6355685A Granted JPS61224311A (ja) 1985-03-29 1985-03-29 分子線源

Country Status (1)

Country Link
JP (1) JPS61224311A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112111784A (zh) * 2019-06-20 2020-12-22 安达满纳米奇精密宝石有限公司 加热器支架以及加热器装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59121831U (ja) * 1983-02-04 1984-08-16 日本真空技術株式会社 分子線エピタキシ−用蒸発源熱シ−ルド

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59121831U (ja) * 1983-02-04 1984-08-16 日本真空技術株式会社 分子線エピタキシ−用蒸発源熱シ−ルド

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112111784A (zh) * 2019-06-20 2020-12-22 安达满纳米奇精密宝石有限公司 加热器支架以及加热器装置

Also Published As

Publication number Publication date
JPH0318734B2 (enrdf_load_stackoverflow) 1991-03-13

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