JPH03184755A - Seal edge grinder of hollow glass article for picture tube - Google Patents

Seal edge grinder of hollow glass article for picture tube

Info

Publication number
JPH03184755A
JPH03184755A JP32508389A JP32508389A JPH03184755A JP H03184755 A JPH03184755 A JP H03184755A JP 32508389 A JP32508389 A JP 32508389A JP 32508389 A JP32508389 A JP 32508389A JP H03184755 A JPH03184755 A JP H03184755A
Authority
JP
Japan
Prior art keywords
polishing
hollow glass
polishing table
glass article
seal edge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP32508389A
Other languages
Japanese (ja)
Other versions
JP2610603B2 (en
Inventor
Isao Kishimoto
岸本 勇夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Electric Glass Co Ltd
Original Assignee
Nippon Electric Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Glass Co Ltd filed Critical Nippon Electric Glass Co Ltd
Priority to JP1325083A priority Critical patent/JP2610603B2/en
Publication of JPH03184755A publication Critical patent/JPH03184755A/en
Application granted granted Critical
Publication of JP2610603B2 publication Critical patent/JP2610603B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Abstract

PURPOSE:To have the grinding surface of a grinding table worn out uniformly over the whole surface and maintain a smooth surface at all times by decentering this grinding table from an arm shaft. CONSTITUTION:An arm shaft 11 is decentered to a turning center axis in a grinding table 10. Accordingly, when the rotative grinding of a seal edge surface of a hollow glass article 15 for a picture tube is performed on this grinding table 10, rotative grinding work takes place as the hollow glass article 15 and the polishing table 10 both reciprocatively slide relatively as far as two times over an eccentric value in the radial direction of the table 10. In consequence, the seal edge surface of the hollow glass article 15 rubs a top surface of the table 10 over the whole surface so that it is ground.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ブラウン管用中空ガラス物品、例えば、ファ
ンネル及びパネルのシールエツジ面を研磨する装置の改
良に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an improvement in an apparatus for polishing seal edge surfaces of hollow glass articles for cathode ray tubes, such as funnels and panels.

〔従来の技術〕[Conventional technology]

テレビブラウン管は、高度の精密さが要求されるため、
前面となるパネルと、後面となるファンネルとを別個に
製造し、必要部品の組立後一体向に封着されている。こ
の封着のために、パネル及びファンネルのシールエツジ
面を、ガラス成形後、研磨している。
Television cathode ray tubes require a high degree of precision, so
The front panel and the rear funnel are manufactured separately, and after the necessary parts are assembled, they are sealed together. For this sealing, the seal edge surfaces of the panel and funnel are polished after glass molding.

例えば、上記ファンネルのシールエツジ面を研磨する従
来の装置は、第3図に示す様に、研磨テーブル(1)の
回転中心軸(2)と、その垂直上方のアーム軸(3)と
は同一軸線上に配置していた。
For example, in the conventional apparatus for polishing the seal edge surface of the funnel, as shown in FIG. It was placed on the line.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

従来の装置に於いては、1つの品種(寸法)のファンネ
ル(4)を研磨し続けた場合、第4図の如く、研磨テー
ブル(1)の一部(ファンネルと当接していた部分)が
摩耗して凹んだ状態になる。
With conventional equipment, when one type (size) of funnels (4) is continuously polished, a part of the polishing table (1) (the part that was in contact with the funnel) is damaged as shown in Figure 4. It becomes worn and dented.

従って、1品種(寸法)のファンネルの研磨作業をある
期間継続した後、異なった品種(寸法)のファンネルを
研磨する場合(特に、前の品種(寸法)より大きいファ
ンネルを研磨する場合)には、シールエツジに研磨テー
ブルと当接しない部分ができ、研磨作業ができないとい
う問題があった。パネルについても同様であった。
Therefore, when polishing funnels of a different type (dimension) after continuing polishing of one type (dimension) of funnels for a certain period of time (especially when polishing funnels larger than the previous type (dimension)), However, there was a problem in that the seal edge had a portion that did not come into contact with the polishing table, making polishing work impossible. The same was true for the panels.

この問題を解決するために各品種毎に研磨テーブルを用
意することが考えられるが、費用がかかると共に、ファ
ンネル又はパネルの品種を変更する度に研磨テーブルの
取り換え作業を必要とし、作業手間がかかり、生産効率
の低下をきたす問題が生じる。
In order to solve this problem, it may be possible to prepare a polishing table for each type of product, but this would be expensive and require the work of replacing the polishing table every time the type of funnel or panel is changed, which is labor-intensive. , a problem arises that reduces production efficiency.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は、従来の研磨装置の上記問題点に鑑みて提案さ
れたもので、上面に研磨面を備え回転する円盤状の研磨
テーブルと、研磨テーブルの上方で研磨テーブルの回転
中心軸に対して偏心するアーム軸と、アーム軸より放射
状に取付けられた複数本の支持腕と、支持腕に取り付け
られたチャック支持体と、ブラウン管用中空ガラス物品
をチャックし該中空ガラス物品が研磨テーブル上で回転
し得るようにチャック支持体に回転自在に取り付けられ
たチャック体とでブラウン管用中空ガラス物品のシール
エツジ研磨装置を構成したものである。
The present invention was proposed in view of the above-mentioned problems of conventional polishing devices, and includes a rotating disc-shaped polishing table with a polishing surface on the upper surface, and a rotation center axis of the polishing table that is positioned above the polishing table. An eccentric arm shaft, a plurality of support arms attached radially from the arm shaft, a chuck support body attached to the support arms, and a hollow glass article for a cathode ray tube is chucked and the hollow glass article is rotated on a polishing table. A seal edge polishing apparatus for a hollow glass article for a cathode ray tube is constituted by a chuck body rotatably attached to a chuck support body so that the chuck body can be rotatably attached to a chuck support body.

〔作用〕[Effect]

アーム軸が研磨テーブルの回転中心軸に対して偏心させ
であるので、研磨テーブル上でブラウン管用中空ガラス
物品のシールエツジ面の回転研磨を行った場合、研磨テ
ーブルの1回転中に、上記中空ガラス物品と研磨テーブ
ルとが研磨テーブルの径方向に偏心量の2倍だけ相対的
に往復摺動を伴いつつ回転研磨作業が行われ、研磨テー
ブルの上面を全幅に亘って中空ガラス物品のシールエツ
ジ面で摺擦させて研磨を行わせることが可能になる。
Since the arm axis is eccentric to the rotation center axis of the polishing table, when rotary polishing of the seal edge surface of a hollow glass article for cathode ray tube is performed on the polishing table, the hollow glass article is rotated during one rotation of the polishing table. Rotary polishing work is performed while the polishing table and the polishing table are relatively reciprocated in the radial direction of the polishing table by twice the amount of eccentricity, and the seal edge surface of the hollow glass article is rubbed over the entire width of the upper surface of the polishing table. It becomes possible to perform rubbing and polishing.

〔実施例〕〔Example〕

第1図はブラウン管用中空ガラス物品としてファンネル
のシールエツジの研磨に適用した本発明装置の要部概略
側面図、第2図は要部概略平面図であって、(10)は
研磨テーブル、(11)はアーム軸、(12)は支持腕
、(13)はチャック支持体、(14)はチャック体、
(15)はファンネルを示している。
FIG. 1 is a schematic side view of the main parts of the apparatus of the present invention applied to polishing the seal edge of a funnel as a hollow glass article for a cathode ray tube, and FIG. 2 is a schematic plan view of the main parts, in which (10) is a polishing table, (11) ) is the arm shaft, (12) is the support arm, (13) is the chuck support body, (14) is the chuck body,
(15) shows a funnel.

研磨テーブル(10)は、上面に研磨面(10a)を備
えた円盤状をなし、その下面中央部に回転中心軸(16
)を有し、この回転中心軸(16)は支持台(17)上
に設けられた軸承筒(18)に回転可能に軸承され、か
つ、支持台(17)上に設置された駆動モータ〔19)
から減速ギヤ機構(20)を介して減速して回転駆動さ
れる。
The polishing table (10) has a disc shape with a polishing surface (10a) on the upper surface, and a rotation center shaft (16) in the center of the lower surface.
), this rotational center shaft (16) is rotatably supported by a bearing cylinder (18) provided on a support base (17), and a drive motor [ 19)
The rotational speed is reduced through the reduction gear mechanism (20) and driven to rotate.

上記支持台(17)は、機台(21)にスライドガイド
(22)を介して摺動可能に載置され、支持台(17)
と機台(21)との間に設置した偏心量調整機構(23
)によって偏心it (e)の調整を可能としである。
The support stand (17) is slidably placed on the machine stand (21) via a slide guide (22).
The eccentricity adjustment mechanism (23) installed between the
) makes it possible to adjust the eccentricity it (e).

この偏心量調整機構(23)は、第1図に示した実施例
では、支持台(17)側にボルト(23a)を設け、こ
れと螺合するナツト(23b)をブラケッ)(23c)
を介して機台(21)上に設置したものであって、ボル
ト(23a)又はナツト(23b)のいずれか一方を回
転させることにより、支持台(17)を機台(21)上
で移動させ、機台(21)に設けた正逆偏心量表示目盛
(24)に対する支持台(17)の指標(25)によっ
て偏心1(e)を表示するように構成した場合を例示し
ているが、他の構成でもよい。
In the embodiment shown in FIG. 1, this eccentricity adjustment mechanism (23) includes a bolt (23a) provided on the support base (17) side, and a nut (23b) that is screwed with the bolt (23a) attached to a bracket (23c).
The support base (17) is moved on the machine base (21) by rotating either the bolt (23a) or the nut (23b). In this example, the eccentricity 1(e) is displayed by the indicator (25) on the support base (17) with respect to the forward/reverse eccentricity display scale (24) provided on the machine base (21). , other configurations are also possible.

アーム軸(11)は、研磨テーブル(10)の上方で機
台(21)と一体の上部支持フレーム(21aに、軸承
筒(26)を介して、研磨テーブル(10)の回転中心
軸(16)に対して偏心して回転可能に支持されている
。そして、アーム軸(11)は、上部支持フレーム(2
1a)上の駆動モータ(27)から減速ギヤ機構(28
)を介して、研磨テーブル(10)とは逆方向に間欠的
に回転駆動される。尚、アーム軸(11)には、その上
端から研磨スラリーが中心を貫通する導管(図示省) 略)を通して研磨テーブル(工0)上に供給される。こ
の研磨スラリーは、砂、アランダム、セリフ等の研磨剤
に水が混合されて一定の濃度に調整されており、流動性
がある。尚、研磨テーブル(10)の下部周囲には研磨
スラリーを受ける容器(図示省略)が設けられている。
The arm shaft (11) is connected to the rotation center axis (16) of the polishing table (10) through a bearing cylinder (26) to an upper support frame (21a) which is integrated with the machine base (21) above the polishing table (10). ).The arm shaft (11) is eccentrically supported rotatably with respect to the upper support frame (2).
1a) From the upper drive motor (27) to the reduction gear mechanism (28)
), the polishing table (10) is intermittently rotated in the opposite direction. Incidentally, the polishing slurry is supplied from the upper end of the arm shaft (11) onto the polishing table (process 0) through a conduit (not shown) passing through the center. This polishing slurry is made by mixing water with an abrasive such as sand, alundum, or serif, and is adjusted to a certain concentration, and has fluidity. A container (not shown) for receiving polishing slurry is provided around the lower part of the polishing table (10).

支持腕(12)は、アーム軸(11)の周囲に複数本(
図示例では6本)が等間隔で放射状に取付けられており
、この支持腕(12)にチャック支持体(13)が昇降
シリンダ(29)を介して昇降可能に取付けられている
。この場合、チャック支持体(13)は、昇降シリンダ
(29)のピストンロンド(29a)に直結しないで、
上下方向に相対的に移動可能に嵌挿してあり、チャック
支持体(13)を昇降シリンダ(29)で上昇させると
きには、ピストンロンド(29a)の下端のストッパ(
29b)に掛止して上昇させるように構成しである。
The support arm (12) includes a plurality of support arms (12) around the arm shaft (11).
In the illustrated example, six pieces are attached radially at equal intervals, and a chuck support (13) is attached to this support arm (12) so as to be movable up and down via a lift cylinder (29). In this case, the chuck support (13) is not directly connected to the piston rod (29a) of the lifting cylinder (29).
It is fitted so that it can move relatively in the vertical direction, and when the chuck support (13) is raised by the lifting cylinder (29), the stopper (
29b) so that it can be raised.

上記チャック支持体(13)には、チャック体(14)
がスライド軸受(30)を介して回転自在で、かつ、軸
方向に摺動可能に支持されている。このチャック体(1
4)は、回転軸(14a)部と、この回転軸(14a)
部の下端にスラスト軸受(14b)介して回転可能に装
着したバキュームヘッド(14c)と、このバキューム
ヘッド(14c)に取付けたバキュームパッド(14d
)とからなっており、バキュームヘッド(14c)は、
図面では省略したが、ホース及び制御バルブを介して吸
気発生源に接続してあり、吸気作用時、バキュームパッ
ド(14d)により、ファンネル(工5)を吸着保持す
る構成である。
The chuck supporter (13) includes a chuck body (14).
is rotatably supported via a slide bearing (30) and slidably in the axial direction. This chuck body (1
4) is a rotating shaft (14a) portion, and this rotating shaft (14a)
A vacuum head (14c) rotatably mounted on the lower end of the unit via a thrust bearing (14b), and a vacuum pad (14d) attached to this vacuum head (14c).
), and the vacuum head (14c) is
Although not shown in the drawings, it is connected to an intake air source via a hose and a control valve, and is configured to suction and hold the funnel (5) by a vacuum pad (14d) during intake operation.

上記チャック体(14)の回転軸(14a)は、チャッ
ク支持体(13)のスライド軸受(30)部を貫通して
上方に突出させてあり、この上方の突出端にストッパ(
14e)が取付けである。このストッパ(14e )に
対応して、チャック支持体(13)に重錘(31)の昇
降シリンダ(32)が取付けである0重錘(31)は、
昇降シリンダ(32)のピストンロンド(32a)に直
結しないで、上下方向に相対的に移動可能に嵌挿してあ
り、重錘(31)を昇降シリンダ(32)で上昇させる
ときには、ピストンロンド(32a)の下端のストッパ
(32b)に掛止して上昇させるように構成しである。
The rotating shaft (14a) of the chuck body (14) passes through the slide bearing (30) of the chuck support (13) and projects upward, and a stopper (
14e) is the installation. Corresponding to this stopper (14e), the zero weight (31) has a lift cylinder (32) for the weight (31) attached to the chuck support (13).
It is not directly connected to the piston rond (32a) of the lifting cylinder (32), but is fitted so that it can move relatively in the vertical direction, and when the weight (31) is raised by the lifting cylinder (32), the piston rond (32a) ) is configured to be raised by being hooked to a stopper (32b) at the lower end of the handle.

本発明装置の実施例は、以上の構成からなり、次に動作
を説明する。
The embodiment of the device of the present invention has the above configuration, and its operation will be explained next.

研磨テーブル(10)及びアーム軸(11)は、偏心量
調整機構(23)で予め調整された偏心量(e)をもっ
て対向せしめられており、夫々の駆動モータ(19) 
 (27)によって、相互に逆方向に低速度で回転駆動
される。
The polishing table (10) and the arm shaft (11) are opposed to each other with an eccentricity (e) adjusted in advance by an eccentricity adjustment mechanism (23), and each drive motor (19)
(27), they are driven to rotate at low speeds in mutually opposite directions.

即ち、アーム軸(11)は、支持腕(工2)の設置本数
分で等分割された角度を1ピツチとして間欠的に回転駆
動され、そのうちの1つの停止位置でファンネル(15
)がシールエツジ面(15aを下向きにして供給され、
チャック体(14)がこれをチャックし、重錘(31)
で研磨圧を付与する。
That is, the arm shaft (11) is intermittently rotated with one pitch being an angle equally divided by the number of support arms (work 2) installed, and the funnel (15) is rotated at one of the stop positions.
) is supplied with the seal edge surface (15a facing downward,
The chuck body (14) chucks this, and the weight (31)
Apply polishing pressure with .

研磨テーブル(10)とアーム軸(11)との偏心1 
(e )・の設定は、ファンネル(15)のシー) ルエッジ面(15a)が、第1図の右側に示しているよ
うに、最大偏心位置において、研磨テーブル(10)か
ら若干外方に喰み出しているように設定するのが望まし
い。
Eccentricity 1 between polishing table (10) and arm shaft (11)
The setting (e) is such that the seal edge surface (15a) of the funnel (15) is biting slightly outward from the polishing table (10) at the maximum eccentric position, as shown on the right side of Fig. 1. It is desirable to set it so that it protrudes.

各チャック体(14)にチャックされたファンネル(1
5)は、研磨テーブル(10)の回転と、アーム軸(1
1)の回転とにより、研磨テーブル(10)の回転中心
に近い部分の周速と遠い部分の周速との差によって、一
定方向に回転偶力が作用し、チャック支持体(13)に
対してスラスト軸受(14b)部で自転しケら研磨テー
ブル(10)の周囲を公転する。このl公転運動中、フ
ァンネル(15)は、研磨テーブル(10)の径方向に
、偏心量(e)の2倍だけ往復移動し、その結果、研磨
テーブル(10)の研磨面(10a)を径方向の全幅に
亘ってシールエツジ面(15a)が摺擦移動し、研磨面
(10a)を全面均一に摩耗させ、平滑な研磨面(10
a)を保持させることが可能となる。
Funnel (1) chucked to each chuck body (14)
5) is the rotation of the polishing table (10) and the rotation of the arm axis (1).
1), a rotating couple acts in a fixed direction due to the difference between the circumferential speed of the part near the rotation center of the polishing table (10) and the circumferential speed of the part far from the rotation center, and the rotation couple acts on the chuck support (13). It rotates around the thrust bearing (14b) and revolves around the polishing table (10). During this l-revolution, the funnel (15) reciprocates in the radial direction of the polishing table (10) by twice the amount of eccentricity (e), and as a result, the polishing surface (10a) of the polishing table (10) The seal edge surface (15a) slides over the entire width in the radial direction, wears the polished surface (10a) uniformly over the entire surface, and creates a smooth polished surface (10a).
It becomes possible to maintain a).

上記研磨テーブル(10)の回転速度は、アーム軸(1
1)の回転速度より高速とし、連続回転させるものであ
る。
The rotation speed of the polishing table (10) is determined by the arm axis (1
The rotation speed is higher than that in 1), and the rotation speed is continuous.

ファンネル(15)のシールエ・ンジ面(15a)の研
磨は、アーム軸(11)の1回転により終了するように
なされており、ファンネル(15)の供給ステーション
と取り出しステーションとは隣接している。
The polishing of the sealing edge surface (15a) of the funnel (15) is completed by one revolution of the arm shaft (11), and the supply station and take-out station of the funnel (15) are adjacent to each other.

ファンネル(15)の供給及び取り出しは、ローディン
グ及びアンローディングフォーク等により自動的に行わ
れる。
The feeding and unloading of the funnel (15) is performed automatically by loading and unloading forks and the like.

例えば、ファンネル(15)の供給位置では、チャンク
支持体(13)及び重錘(31)は、夫々昇降シリンダ
(29)  (32)によって、上昇端位置に保持され
ており、チャ・ツク体(14)の直下位置にローディン
グフォークでファンネル(15)が位置決め供給され、
先ず、チャ・ツク支持体(13)が昇降シリンダ(29
)により下降せしめられ、チャック体(14)とファン
ネル(15)とが整合し、チャック体(14)のバキュ
ームへ・ンド(14c )にバキュームが作用せしめら
れ、ノ\キュームパッド(14d)でファンネル(15
)をチャックし、ローディングフォークが後退し、この
とき、昇降シリンダ(29)のピストンロッド(29a
)は更に下降してファンネル(15)を研磨テーブル(
10)に当接させ、かつ、チャ・ツク支持体(13)に
対し、ストッパ(29b)が下方に離れた位置に待機せ
しめられ、次に、昇降シリンダ(32)によって重錘(
31)がチャ・ツク体(14)の上面に下降当接せしめ
られ、この当接後も、ピストンロッド(32a)のみは
更に下降して重錘(31)に対してストッパ(32b)
が下方に離れた無関係な位置に待機せしめられる。これ
によって、チャック体(14)を通してファンネル(1
5)のシールエツジ面(15a)に与えられる研磨圧は
、昇降シリンダ(29)  (32)等によるものでは
なく、重錘(31)の自重によって与えられ、従って、
研磨圧の変更は重錘(31)の変更によって簡便に、し
かも、正確に行われる。尚、研磨圧の付与は、エア圧力
やスプリング圧力で付与するものであっても、本発明を
適用し得る。また、研磨後のファンネル(15)の取り
出し位置では、昇降シリンダ(32)によって、先ず、
重錘(31)が持ち上げられ、続いて、昇降シリンダ(
29)によってチャック支持体(13) 、チャック体
(14)及びファンネル(15)を一体に持ち上げ、そ
の下にアンローディングフォークが挿入され、この時点
でバキュームヘッド(14,c)には、吸気の代わりに
圧縮エアが供給されてバキュームバンド(14d)によ
るファンネル(15)のチャックを解除し、研磨後のフ
ァンネル(15)をアンローディングフォーク上に移載
した後、昇降シリンダ(29)によって、チャック支持
体(13)の持ち上げが行われ、この状態でアンローデ
ィングフォークにより、研磨後のファンネル(15)の
取り出しが行われる。
For example, in the feeding position of the funnel (15), the chunk support (13) and the weight (31) are held at the upper end positions by the lifting cylinders (29) and (32), respectively, and the chuck body ( The funnel (15) is positioned and supplied directly below the funnel (14) with a loading fork,
First, the chuck support (13) is moved to the lifting cylinder (29).
), the chuck body (14) and the funnel (15) are aligned, a vacuum is applied to the vacuum pad (14c) of the chuck body (14), and the funnel is lowered by the vacuum pad (14d). (15
), the loading fork retreats, and at this time, the piston rod (29a) of the lifting cylinder (29)
) further descends and the funnel (15) is placed on the polishing table (
The stopper (29b) is brought into contact with the chuck support (13) at a position that is spaced downward from the chuck support (13).
31) is brought into contact with the upper surface of the chuck body (14), and even after this contact, only the piston rod (32a) is further lowered and is brought into contact with the stopper (32b) against the weight (31).
is made to wait in an unrelated position far below. This allows the funnel (1) to pass through the chuck body (14).
The polishing pressure applied to the seal edge surface (15a) in 5) is not due to the lifting cylinders (29) (32), etc., but is applied by the weight of the weight (31), and therefore,
The polishing pressure can be easily and accurately changed by changing the weight (31). Note that the present invention can be applied even if the polishing pressure is applied by air pressure or spring pressure. In addition, at the removal position of the funnel (15) after polishing, the elevating cylinder (32) first
The weight (31) is lifted, and then the lifting cylinder (
29), the chuck support (13), chuck body (14), and funnel (15) are lifted together, and the unloading fork is inserted under them. At this point, the vacuum head (14, c) is filled with suction air. Instead, compressed air is supplied to release the chuck of the funnel (15) by the vacuum band (14d), and after the funnel (15) after polishing is transferred onto the unloading fork, it is chucked by the lifting cylinder (29). The support body (13) is lifted, and in this state, the funnel (15) after polishing is taken out by the unloading fork.

各支持腕(12)に支持されたチャック支持体(13)
及びチャック体(14)により、ファンネル(15)の
シールエツジ面(15a)の研磨が順次連続的に行われ
るものである。
Chuck support (13) supported by each support arm (12)
The seal edge surface (15a) of the funnel (15) is sequentially and continuously polished by the chuck body (14) and the chuck body (14).

上記実施例では、研磨テーブル(10)側に偏心量調整
機構(23)を設けているが、アーム軸(11)側に設
けてもよいことは勿論である。また、小型のファンネル
(15)の場合、研磨テーブル(10)の内外周速度差
で自転作用が得られないこともあるが、この場合には、
自転駆動手段が用いられる。
In the above embodiment, the eccentricity adjustment mechanism (23) is provided on the polishing table (10) side, but it is of course possible to provide it on the arm shaft (11) side. In addition, in the case of a small funnel (15), the rotation effect may not be obtained due to the speed difference between the inner and outer circumferential surfaces of the polishing table (10), but in this case,
A rotational drive means is used.

さらに、上記実施例では、アーム軸(11)をも研磨テ
ーブル(10)と逆方向に回転させるようになした場合
を示しているが、アーム軸(11)を回転させず、研磨
テーブル(10)のみを回転させて実施しても内外周速
差でファンネル(15)に自転作用を付与することがで
き、かつ、研磨テーブル(10)とアーム軸(1工)と
を偏心させであるため、研磨テーブル(10)の研磨面
を均一に摩耗させることができる。また、本発明装置は
ファンネル(15)に限らず、パネルのシールエ・ノジ
研磨にも適用することができる。
Further, in the above embodiment, the arm shaft (11) is also rotated in the opposite direction to the polishing table (10), but the arm shaft (11) is not rotated and the polishing table (10) is rotated in the opposite direction. ), it is possible to apply an autorotation effect to the funnel (15) due to the difference in inner and outer circumferential speeds, and the polishing table (10) and arm shaft (1 machining) are made eccentric. , the polishing surface of the polishing table (10) can be worn uniformly. Furthermore, the apparatus of the present invention can be applied not only to funnels (15) but also to seal etching and nozzle polishing of panels.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、アーム軸と研磨テーブルとを偏心させ
ておくだけで、研磨テーブルの研磨面を全面に亘って均
一に摩耗させ、常に平滑面を維持させることができ、異
品種のブラウン管用中空ガラス物品を同一の研磨テーブ
ル上で能率よく研磨することができる。
According to the present invention, by simply setting the arm shaft and the polishing table eccentrically, the polishing surface of the polishing table can be uniformly worn over the entire surface, and a smooth surface can always be maintained. Hollow glass articles can be efficiently polished on the same polishing table.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明装置の1実施例を示す要部概略側面図、
第2図は要部概略平面図、第3図及び第4図は従来装置
の研磨作業前と研磨作業後の側面図である。 (10)−研磨テーブル、(11)・・−アーム軸、(
12)−・−支持腕、 (13)−チャック支持体、 (14)・・−チャック体、  (15)−ファンネル
。 特 許 出 願 人  日本電気硝子株式会社代   
 理    人   江  原   省   吾第1図
FIG. 1 is a schematic side view of the main parts showing one embodiment of the device of the present invention;
FIG. 2 is a schematic plan view of the main part, and FIGS. 3 and 4 are side views of the conventional apparatus before and after the polishing operation. (10)-polishing table, (11)...-arm axis, (
12) - Support arm, (13) - Chuck support, (14) - Chuck body, (15) - Funnel. Patent applicant Nippon Electric Glass Co., Ltd.
Rijin Gangwon Province Figure 1

Claims (1)

【特許請求の範囲】[Claims] (1)上面に研磨面を備え回転する円盤状の研磨テーブ
ルと、 研磨テーブルの上方で研磨テーブルの回転中心軸に対し
て偏心するアーム軸と、 アーム軸より放射状に取付けられた複数本の支持腕と、 支持腕に取り付けられたチャック支持体と、ブラウン管
用中空ガラス物品をチャックし該中空ガラス物品が研磨
テーブル上で回転し得るようにチャック支持体に回転自
在に取り付けられたチャック体とで構成したことを特徴
とするブラウン管用中空ガラス物品のシールエッジ研磨
装置。
(1) A rotating disk-shaped polishing table with a polishing surface on the top surface, an arm shaft eccentric to the rotation center axis of the polishing table above the polishing table, and multiple supports attached radially from the arm shaft. an arm, a chuck support attached to the support arm, and a chuck body rotatably attached to the chuck support for chucking a hollow glass article for a cathode ray tube and allowing the hollow glass article to rotate on a polishing table. A seal edge polishing device for hollow glass articles for cathode ray tubes, characterized in that:
JP1325083A 1989-12-14 1989-12-14 Seal edge polishing equipment for hollow glass articles for cathode ray tubes Expired - Fee Related JP2610603B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1325083A JP2610603B2 (en) 1989-12-14 1989-12-14 Seal edge polishing equipment for hollow glass articles for cathode ray tubes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1325083A JP2610603B2 (en) 1989-12-14 1989-12-14 Seal edge polishing equipment for hollow glass articles for cathode ray tubes

Publications (2)

Publication Number Publication Date
JPH03184755A true JPH03184755A (en) 1991-08-12
JP2610603B2 JP2610603B2 (en) 1997-05-14

Family

ID=18172957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1325083A Expired - Fee Related JP2610603B2 (en) 1989-12-14 1989-12-14 Seal edge polishing equipment for hollow glass articles for cathode ray tubes

Country Status (1)

Country Link
JP (1) JP2610603B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0623660A (en) * 1992-03-23 1994-02-01 Ngk Insulators Ltd End face polishing device
JPH077845U (en) * 1993-06-30 1995-02-03 日本電気硝子株式会社 Glass article polishing equipment
US6183344B1 (en) * 1998-12-07 2001-02-06 Asahi Glass Company Ltd. Method for grinding glass funnel seal edge and apparatus therefor
KR20020030997A (en) * 2000-10-20 2002-04-26 박경 wave beveling machine having a table capable of moving a center thereof
CN104308688A (en) * 2014-10-23 2015-01-28 重庆市晶之舞水晶饰品有限公司 Grinding device for edge surfaces of outer walls of crystal ashtrays

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS513948U (en) * 1974-06-26 1976-01-13
JPS513984U (en) * 1974-06-27 1976-01-13
JPS5436692A (en) * 1977-07-27 1979-03-17 Nippon Electric Glass Co Method of producing glass products

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS513948U (en) * 1974-06-26 1976-01-13
JPS513984U (en) * 1974-06-27 1976-01-13
JPS5436692A (en) * 1977-07-27 1979-03-17 Nippon Electric Glass Co Method of producing glass products

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0623660A (en) * 1992-03-23 1994-02-01 Ngk Insulators Ltd End face polishing device
JPH077845U (en) * 1993-06-30 1995-02-03 日本電気硝子株式会社 Glass article polishing equipment
US6183344B1 (en) * 1998-12-07 2001-02-06 Asahi Glass Company Ltd. Method for grinding glass funnel seal edge and apparatus therefor
KR20020030997A (en) * 2000-10-20 2002-04-26 박경 wave beveling machine having a table capable of moving a center thereof
CN104308688A (en) * 2014-10-23 2015-01-28 重庆市晶之舞水晶饰品有限公司 Grinding device for edge surfaces of outer walls of crystal ashtrays
CN104308688B (en) * 2014-10-23 2017-02-08 重庆联荣智能模具股份有限公司 Grinding device for edge surfaces of outer walls of crystal ashtrays

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