JP2001062686A - Index type edge polisher - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an index type edge polisher formed such that the edge parts of both surfaces of the outer periphery of a circular workare continuously polished by a single polishing drum without reversing the surface and the back of the work and suspending a polishing work. SOLUTION: This edge polisher is formed such that four work holding means 3 are disposed at intervals of 90 deg. on an index table 1 intermittently rotated in a 90 deg. arc at a time around a first axis L1 and a polishing drum 4 inclining based on the first axis L1 is disposed at the central part of the index table 1, and the index table 1 is intermittently rotated in a 90 deg. are at a time. This constitution polishes the edge of the outer periphery of the work W by moving each work holding means 3 from a handling position to feed and take out the work W, in order, to a first machining position H1 where an outer periphery edge E1 on the surface side is polished by the polishing drum 4, a second machining position where a peripheral side is polished, and a third machining position H3 where an outer pery edge on the back side is polished.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an index type edge polisher for polishing a chamfered outer peripheral portion of a substantially disk-shaped work such as a semiconductor wafer, a magnetic disk substrate or an optical disk substrate. Things.

[0002]

2. Description of the Related Art As this kind of edge polisher,
Conventionally, various structures have been proposed as described in, for example, Japanese Patent Publication No. Hei 7-16865 and Japanese Patent Application Laid-Open No. H11-33888.

[0003] The former is an intermittent rotation of a predetermined angle.
A plurality of work holding means for holding the work rotatably on one index table are arranged at equal angular intervals around the center of rotation of the table, and a polishing drum is arranged on the center of rotation of the table. The first index table is polished by pressing the outer peripheral edge of the work held by each work holding means against the outer peripheral surface of the rotating polishing drum while intermittently rotating the index table by a constant angle. After polishing the outer peripheral edge on the front side of the work, the work is turned upside down and moved to the second index table, where the outer peripheral edge on the back side is polished.

[0004] This edge polisher is very efficient because the outer peripheral edges of a plurality of works can be polished simultaneously and continuously, but is very efficient. Is added to the inversion time.

On the other hand, in the latter, a polishing drum is brought into contact with the outer periphery of a rotating wafer supported by a wafer support, and the front edge, the peripheral side surface and the rear surface edge are sequentially polished while changing the contact angle of the polishing drum. Things.

In this method, it is not necessary to turn the wafer upside down, but since the contact angle of the polishing drum must be changed according to the chamfer angle during polishing, the structure and control of the apparatus become complicated. In addition, each time the polishing of one wafer is completed, the process of interrupting the polishing, removing it from the wafer support, setting a new wafer and restarting the polishing is repeated. Is bad,
It is not suitable for continuously processing a large number of wafers.

[0007]

SUMMARY OF THE INVENTION The technical problem of the present invention is to use one polishing drum to change the outer peripheral edges of the front and back surfaces of a work without reversing the work and without interrupting the work. Can be continuously polished,
An object of the present invention is to provide an index type edge polisher having a simple structure and high working efficiency.

[0008]

According to the present invention, there is provided an index table rotatable about a first axis; a first index table provided on the index table.
A plurality of work holding means arranged at equal angular intervals surrounding the axis and rotatably holding a disk-shaped work having chamfered outer edges on the front and back sides around a second axis parallel to the first axis; A polishing drum disposed at the center of the arrangement of the plurality of workpiece holding means so as to be rotatable around a third axis inclined with respect to the first axis; and intermittently rotating the index table by a constant angle. Then, each work holding means is moved to a handling position for supplying and unloading the work, a first processing position for polishing the outer peripheral edge on one of the front and back sides by the polishing drum, and a second processing position for polishing the peripheral side surface. And an intermittent drive means for sequentially moving the other outer peripheral edge to a third processing position for polishing; the work is pressed against the polishing drum with a required force at the first to third processing positions. Biasing means; moving means for separating the workpiece from the polishing drum in the handling position; index expression edge polisher, characterized in that it comprises a are provided.

In the edge polisher having the above structure, the work holding means, to which the work has been supplied at the handling position, is rotated by the index table so that the first work is stopped.
While sequentially moving from the processing position to the second processing position and the third processing position, at each processing position, the outer peripheral portion of the work is pressed against the outer peripheral surface of the inclined polishing drum at a different contact angle, and one of the outer peripheral edges on the front and back sides And the peripheral side surface and the other outer peripheral edge are sequentially polished. Then, when the work holding means moves to the handling position, the work for which polishing has been completed is taken out, and a new unprocessed work is supplied.

Thus, according to the present invention, the outer peripheral edge of the front and back surfaces of the work is prevented from being turned upside down by one inclined polishing drum, and the polishing operation is not interrupted for supply and removal of the work. , Can be continuously polished. Therefore, the outer peripheral portion of the work can be efficiently polished by the edge polisher having a simple configuration that does not require the reversing mechanism.

According to a preferred specific embodiment of the present invention, four work holding means are arranged on the index table at 90-degree intervals, and the polishing drum is inclined at 45 degrees with respect to the first axis. In addition, the first processing position and the third processing position are mutually connected via a polishing drum in a plane including the first axis and the third axis.
The second processing position and the handling position are provided at positions different from the first processing position and the third processing position by 90 degrees, respectively.

[0012]

1 to 3 show a preferred embodiment of an edge polisher according to the present invention.
As shown in FIG. 5, this edge polisher has an outer peripheral portion of a disc-shaped work W having outer peripheral edges E ₁ and E ₂ chamfered at a bevel angle θ on both front and rear sides, that is, the outer peripheral edge E
The index table 1 is suitable for polishing the _first and _second surfaces E ₁ and the peripheral side surface E ₃ therebetween, and is rotatable around a vertical first axis L ₁ passing through the center. And an intermittent drive means 2 connected to the shaft 1a and intermittently rotating the index table 1 by 90 degrees.

On the index table 1, a workpiece W is held and a second axis L ₂ parallel to the first axis L ₁ is held.
Four work holding means 3 for rotating around, along with being disposed 90 degrees apart surrounds the first axis L _1, the central portion of the index table 1, with respect to the first axis L ₁ third axis one polishing drum 4 around the rotatable of L ₃ are arranged to be inclined. When the index table 1 rotates intermittently by 90 degrees, the four work holding means 3 move the handling position H ₀ for supplying and unloading the work W and the outer periphery of the work surface of the work W by the polishing drum 4. a first machining position H ₁ for polishing the edge E _1, and the second machining position H ₂ for polishing the peripheral side surface E _3, between the third machining position H ₃ for polishing the outer peripheral edge E ₂ of the back side sequentially It is designed to move.

The first processing position H ₁ and the third processing position H ₃
And is in the vertical plane including the first axis L ₁ and the third axis L _3, through the polishing drum 4 provided 180 degrees different positions, the second machining position H _2, and the handling position H ₀
It is provided in each 90-degree position different from the first machining position H ₁ and the third working position H ₃ thereof.

Each of the work holding means 3 has the same configuration as each other, and the specific configuration is as follows. That is, the work holding means 3 includes a chuck head 10 for vacuum chucking the work W and a chuck body 1 for rotatably supporting the chuck head 10.
1 and the chuck body 11 to the index table 1
And a moving mechanism 12 for moving in a radial direction of the polishing drum 4, that is, a direction in which the polishing drum 4 comes into contact with or separates from the polishing drum 4.

The chuck head 10 has a plurality of suction holes on its surface, and these suction holes are connected to a vacuum source via a port, a piping tube, and the like provided on the chuck body 11. However, their illustration is omitted. Further, the chuck head 10 is connected to a motor which is provided in the chuck body 11, at a slow speed of about one revolution to the work outer periphery E _1, E _2, polishing time, for example 40 to 60 seconds E ₃ Driven.

On the other hand, the moving mechanism 12 includes an annular base plate 13 fixed to the lower surface of the index table 1 by a support rod 14, and a rail mounted on the base plate 13 and extending in the radial direction of the index table 1. 15, and a slide base 16 movable along the rail 15. The chuck body 11 is mounted on the slide base 16 by a leg rod 17.

A pulley 18 is rotatably mounted on the base plate 13, and a wire 19 is wound around the pulley 18. One end of the wire 19 is fixed to an arm 16 a extending downward from the slide base 16, and a weight 20 is suspended from the tip of the wire 19. Are constantly urged on the rail 15 toward the polishing drum 4 side. The weight 20 includes a driving source for moving the work holding means 3 toward the polishing drum 4 and work outer peripheral portions E ₁ , E ₂ , E
_It constitutes a pressing means for pressing the work W against the polishing drum 4 at a constant contact pressure during the polishing of ₃ .

The air cylinder 2 is provided on the lower surface of the base plate 13.
2 is attached, and the rod 22 of the air cylinder 22 is attached.
The tip of a extends so as to face the side surface of the arm 16a. When the outer peripheral portions E ₁ , E ₂ , and E ₃ are polished, the rod 22a is shortened as shown in FIG.
The work W is pressed against the polishing drum 4 by the weight 20 when its tip is slightly separated from the arm 16a, and when not polished, the rod 22a extends as shown in the work holding means 3 on the right side of FIG. By pressing the arm 16a, the work holding means 3 is retracted to the outer peripheral side of the index table 1, and the work W is separated from the polishing drum 4.

The polishing drum 4 has a polishing pad provided on the outer peripheral surface of a cylindrical base cylinder made of a hard material and having such a degree of flexibility that it can be recessed by a required amount according to the outer peripheral shape of the work W during polishing. by sticking, that where the outer peripheral surface and the working surface of the abrasive, by being supported by a drum support mechanism 25, a tilt angle α with respect to the first axis L ₁ substantially 4
It is arranged so that it is kept at 5 degrees.

[0021] Thus, by tilting the angle of its axis L ₃ 45 degrees causes flexibility in working surface of the polishing drum 4, as shown in FIG. 4, the workpiece holding means 3 of the first when that has been circulating the processing position H _1, the held workpiece W periphery edge E ₁ is polished drum 4 on the surface side of the
Contact the, so that the outer peripheral edge E ₂ of the back side is polished in contact with the polishing drum 4 when passing around the third working position H _3. Although not shown in FIG. 4, when the work goes around to the second processing position H ₂ , the peripheral side surface E ₃ comes into contact with the polishing drum 4.

However, the inclination angle of the polishing drum 4 is 45.
The angle may be other than the degree. For example, the work W may be inclined so as to be parallel or nearly parallel to the outer peripheral edges E ₁ and E ₂ of the work W at the first processing position H ₁ and the third processing position H _3. Can also. In this case, when polishing a workpiece having a different bevel angle θ, the inclination angle of the polishing drum 4 is adjusted in accordance with the bevel angle θ.

The drum support mechanism 25 has a base member 26 fixed to the body of the edge polisher, and a support frame 27 mounted on the base member 26 in an inclined state and having an adjustable inclination angle. I have. On this support frame 27, a rail 28 is provided.
7, a slide base 29 is slidably mounted on the rail 28, and a motor 30 is mounted on the slide base 29, and a drive shaft 30a extending from the motor 30 is provided. The polishing drum 4 is connected to a tip of the workpiece W. The motor 30 rotates the polishing drum 4 at a higher speed than the work W. A motor 32, a screw rod 33 driven and rotated by the motor 32, and a screw rod 33
A moving mechanism 31 having a nut member 34 that is screwed into the nut is attached, and the nut member 34 is fixed to the slide base 29. By rotating the screw rod 33 forward and reverse by the motor 32, the nut member 34 is rotated.
Reciprocates along the screw rod 33, and the polishing drum 4
And it is configured to reciprocate at a slow speed along the axis L _3.

At the handling position H ₀ , handling means 37 for supplying and removing the workpiece W is provided. This handling means 37
Is a telescopic chuck arm 3 provided with a chuck head 38 for vacuum chucking the workpiece W at its tip.
9 to supply an unprocessed work from a loader unit (not shown) to the work holding unit 3 and to take out a processed work from the work holding unit 3 to the unloader unit.

In the edge polisher having the above configuration, the work holding means 3 to which the unprocessed work W has been supplied at the handling position H ₀ has the index table 1 of nine.
By 0 degrees to the first machining position H ₁ by an intermittently rotating sequentially sent to the second processing position H ₂ and third processing position H _3,
At each machining position, the outer peripheral edge E of the rotating workpiece W
_1, and E ₂ and the peripheral side surface E ₃ are sequentially polished is pressed against the working surface of the outer periphery of the polishing drum 4 rotating in an inclined state. That is, in the first machining position H _1, as shown on the right side of the workpiece holding means 3 in FIG. 2, the outer peripheral edge E ₁ of the surface of the workpiece W is polished in contact with the polishing drum 4, the second machining position in H _2, as shown on the left side of the workpiece holding means 3 in FIG. 3, it is polished in contact peripheral surface E ₃ of the workpiece W to the polishing drum 4, in the third working position H _3, the work of the left side of FIG. 2 as shown in the holding means 3, the outer peripheral edge E ₂ of the back side of the workpiece W is polished in contact with the polishing drum 4.

During the polishing, the polishing drum 4 holds the third axis L ₃
Reciprocating slowly along the line, and the contact position with the work W can be changed.

While the index table 1 is rotating, the work W is separated from the polishing drum 4 by the rod 22a of the air cylinder 22 being extended to retract each work holding means 3 to the outer peripheral side of the index table 1. ing. Then, when the index table 1 is rotated by 90 degrees and the respective work holding means 3 are stopped at the respective processing positions, the rod W is shortened to a position slightly separated from the arm 16a. Polishing is performed by pressing against the polishing drum 4 with a constant contact pressure.

For the workpiece W for which all the outer peripheral polishing has been completed at the third processing position H ₃ , the index table 1 has an additional 90 points.
The wafer is sent to the handling position H ₀ by the intermittent rotation, and is taken out of the work holding means 3 by the handling means 37 at this position. After that, the unprocessed work is supplied, and the above-described polishing step is repeated.

Thus, the edge polisher uses one polishing drum 4 inclined at a fixed angle, and the work holding means 3 intermittently circulates around the polishing drum 4 so that the outer peripheral edges E ₁ , E _{1 on} the front and back surfaces of the work W can be used. ₂ and peripheral side E ₃
Without turning the work W upside down, changing the contact angle of the polishing drum 4 during processing, and without temporarily suspending the polishing operation for supply and removal of the work. Can be polished. Therefore,
The outer peripheral portion of the work W can be efficiently polished by an edge polisher having a simple configuration that does not require a reversing mechanism.

In the above embodiment, the index table 1
Is rotated intermittently by 90 degrees in one direction only in a rotary manner. As shown in FIGS. 6A to 6E, after intermittently rotating by 90 degrees in one direction three times (270 degrees), reverse rotation is performed. The process of rotating the object 270 degrees in the direction and returning to the original position may be repeated.

In this reversing type polishing method, as shown in FIG. 6A, the first work holding means 3 is set at the handling position H ₀ .
a is supplied with the work W, the index table 1
There is rotated 90 degrees in the positive direction, the first workpiece holding means 3a as shown in FIG. 6B is moved to the first processing position H _1, the outer peripheral edge E ₁ of the surface of the workpiece is polished in this position. At this time, the second workpiece holding means 3b in the handling position H _0, a new unmachined workpiece is supplied machined workpiece is taken out.

After a certain polishing time has elapsed, the index table 1 is further rotated by 90 degrees in the forward direction, and as shown in FIG.
The second workpiece holding means 3b with moving ₂ is moved to the first processing position H _1, the peripheral side surface E ₃ and the surface-side outer peripheral edge E ₁ of the workpiece W is polished in the respective working position. At this time, in the handling position H ₀ in the third workpiece holding means 3c, machined workpiece is taken out unmachined workpiece W
Is supplied.

[0033] Further predetermined polishing time, together with the index table 1 is rotated further 90 degrees in the positive direction, as shown in FIG. 6D, the first workpiece holding means 3a is moved to the third machining position H ₃ the second workpiece holding means 3b is moved to the second processing position H _2, and a third workpiece holding means 3c is moved to the first processing position H _1, the rear surface outer peripheral edge of the workpiece W in each processing position E ₂ If the peripheral side surface E ₃ and the surface-side outer peripheral edge E ₁ is polished. At this time, the fourth work holding means 3d at the handling position H ₀ includes:
The processed work is taken out and the unprocessed work W is supplied.

The steps up to FIG. 6D are exactly the same as those of the rotary polishing method. However, in the reversing polishing method, when the above steps are completed, as shown in FIG. 6E, the index table 1 moves in the reverse direction. continuously rotated 270 degrees, the first workpiece holding means 3a is returned to the handling position H _0. At this time, the second workpiece holding means 3b moves to the third working position H _3, third workpiece holding means 3c is moved to the second processing position H _2, the fourth work holding unit 3d is first machining position H ₁ Have moved to. This state is the same as the state shown in FIG. 6A.
FIG workpiece holding means 3a is in the third working position H ₃ 6
This is the same as the case where the index table 1 is further rotated 90 degrees in the forward direction from the state of D.

6A to 6E, the outer peripheral edge of the work W can be polished. In the reversing type polishing method for reversing the index table 1 as described above, each of the work holding units 3a to 3d is used.
When connecting an air pipe from a vacuum pump to the 3d chuck head, the rotary type polishing method does not require a necessary rotary joint, so that the configuration of the apparatus is simplified.

In each of the above embodiments, the case where a workpiece whose outer peripheral edge is chamfered in a planar shape is polished has been described. can do. That is, as shown in FIG. 7, a flexible polishing pad which can be depressed according to the outer peripheral shape of the work W is adhered to the outer periphery of the polishing drum 4 and pressed by the inclination angle of the polishing drum 4 or weight. forces etc., the edge portion W ₁ of the first processing position H ₁ in the surface side of the workpiece outer circumference is in contact with the polishing pad, the contact edge portion W ₂ of the third working position H ₃ in the back surface side opposite to the polishing pad However, at the intermediate second processing position H ₂ (not shown), the peripheral side surface W ₃ may be set to be in contact with the polishing pad.

Further, in each of the above embodiments, the index table 1 is intermittently rotated in the counterclockwise direction, but the rotation direction may be clockwise. In this case, the first
Processing position H ₁ and the third working position H ₃ is reversed arrangement in the case of the above-described embodiments. That is, the outer peripheral edge E _2, W ₂ of the back side of the workpiece is polished by the first processing position H _1, the outer peripheral edge E _1, W ₁ on the surface side is to be polished at the third working position H _3.

[0038]

As described above, according to the present invention, a single polishing drum inclined at a constant angle is used, and the circumference thereof is intermittently circulated by the work holding means, so that the outer peripheral edge of the front and back surfaces of the work is brought into contact with the peripheral edge. The side is continuously polished without turning the work upside down, changing the contact angle of the polishing drum during processing, and without interrupting the polishing operation for feeding and unloading the work. can do. Therefore, the outer peripheral portion of the work can be efficiently polished by the edge polisher having a simple configuration that does not require the reversing mechanism.

[Brief description of the drawings]

FIG. 1 is a plan view showing main components of an edge polisher according to the present invention.

FIG. 2 is a sectional view taken along the line II-II in FIG.

FIG. 3 is a sectional view taken along line III-III in FIG. 1;

FIG. 4 is an enlarged view of a main part showing a contact state between a polishing drum and a work.

FIG. 5 is a sectional view of a main part of a work.

FIG. 6 (A), (B), (C), (D), (E)
It is a top view which shows a different polishing method in process order.

FIG. 7 is a side view of a main part showing another embodiment of the present invention.

[Explanation of symbols]

W Work E ₁ Edge E ₂ Edge E ₃ Peripheral Side W ₁ Edge W ₂ Edge W ₃ Peripheral Side L ₁ First Axis L ₂ Second Axis L ₃ Third Axis H ₀ Handling Position H ₁ First Processing Position H ₂ 2 Processing position H ₃ Third processing position θ Bevel angle 1 Index table 2 Intermittent drive means 3, 3a, 3b, 3c, 3d Work holding means 4 Polishing drum 12 Supporting mechanism 20 Weight as pressing means

 ──────────────────────────────────────────────────の Continuing on the front page (72) Inventor Noriaki Mizuno 2647 Hayakawa, Ayase-shi, Kanagawa Prefecture F-term (reference) 3F0Term AA03 AA11 AA16 AB06 AB08 CB03

Claims (2)

[Claims] 1. An index table rotatable about a first axis; a disc-shaped work which is disposed on the index table at equal angular intervals around the first axis and has chamfered outer edges on its front and back surfaces. A plurality of work holding means for rotatably holding a plurality of work holding means around a second axis parallel to the first axis;
A polishing drum disposed so as to be rotatable around a third axis inclined with respect to the first axis; each of the work holding means is rotated intermittently by a fixed angle so that each of the work holding means can supply and receive the work; A handling position for taking out, a first processing position for polishing one of the outer peripheral edges by the polishing drum, a second processing position for polishing the peripheral side surface, and a third processing position for polishing the other outer peripheral edge. Intermittent driving means for sequentially moving the workpiece to the polishing drum at the first to third processing positions with a required force; and moving means for separating the workpiece from the polishing drum at the handling position. Index type edge polisher characterized by the following. 2. The edge polisher according to claim 1, wherein four work holding means are arranged on the index table at 90-degree intervals, and the polishing drum is inclined at 45 degrees with respect to the first axis. The first processing position and the third processing position are provided at positions 180 degrees different from each other via a polishing drum in a plane including the first axis and the third axis. The second processing position and the handling position are provided at positions different from the first processing position and the third processing position by 90 degrees, respectively.