JPS62213954A - Method and device for grinding peripheral surface of hard and brittle material - Google Patents

Method and device for grinding peripheral surface of hard and brittle material

Info

Publication number
JPS62213954A
JPS62213954A JP5689286A JP5689286A JPS62213954A JP S62213954 A JPS62213954 A JP S62213954A JP 5689286 A JP5689286 A JP 5689286A JP 5689286 A JP5689286 A JP 5689286A JP S62213954 A JPS62213954 A JP S62213954A
Authority
JP
Japan
Prior art keywords
grinding
workpiece
work
coarse
finish
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5689286A
Other languages
Japanese (ja)
Other versions
JPH074747B2 (en
Inventor
Shuzo Takahashi
高橋 修三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NITOMATSUKU KK
Original Assignee
NITOMATSUKU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NITOMATSUKU KK filed Critical NITOMATSUKU KK
Priority to JP61056892A priority Critical patent/JPH074747B2/en
Publication of JPS62213954A publication Critical patent/JPS62213954A/en
Publication of JPH074747B2 publication Critical patent/JPH074747B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To shorten grinding time and lessen the finish coarseness greatly by allowing a work to be processed to rotate at a low speed, engaging a coarse grinding element in high speed rotation with the peripheral surface of the work as coarse grinding, and at the same time, engaging a finish grinding element in high speed rotation with the peripheral surface of the coarse ground work as finish grinding. CONSTITUTION:A coarse grinding element 201 advances in the A direction and is engaged with a work to be processed W as start of coarse grinding. At the same time, the work W begins rotating counterclockwise at a low speed, and thus the periphery of the work W is coarse ground, and when the coarse grinding wheel 201 starts coarse grinding of the periphery (3), a finish grinding wheel 301 advances in the B direction to engage with the work W, and thus finish grinding will start. That is, the periphery (1) already coarse ground undergoes finish grinding. While the work W then makes one turn, the finish grinding wheel 301 performs finish grinding of peripheries (1)-(4) one after another. The work W makes a rotation a little more than one turn after start of the finish grinding. Thus concurrent performance of coarse and finish grinding shortens the processing time as well as provides selectively for finish grinding element, which gives finer coarseness of the finished surface.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、例えばICチップに用いられるシリコンウェ
ハ等の硬脆材の外周面を研削する方法およびその装置に
関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method and an apparatus for grinding the outer peripheral surface of a hard brittle material such as a silicon wafer used for, for example, an IC chip.

〔従来の技術〕[Conventional technology]

Icチップ用ウェハは、外周縁部が欠けるのを防止する
ため、またその表面仕上げ時に、定盤とウェハ表面の間
に砥剤(ラップ剤)が浸入しやすくするため、外周縁部
に面取りが施される。ウェハ等の硬脆材の外周面を研削
して面取りする装置として、実開昭60−149749
号公報に記載されたものが知られている。
Ic chip wafers have chamfers on the outer periphery to prevent the outer periphery from chipping, and to make it easier for abrasive (lap agent) to enter between the surface plate and the wafer surface during surface finishing. administered. As a device for grinding and chamfering the outer peripheral surface of hard brittle materials such as wafers, Utility Model Application No. 60-149749
The one described in the No. Publication is known.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

従来の外周面研削装置は、1つの砥石によりウェハの外
周面を研削する構成になっており、一定時間内に研削工
程を終えるためには、ある程度粗度の粗い砥石により研
削しなければならず、このため、ウェハ外周面の仕上げ
粗度には一定の限界があるという問題が住じている。
Conventional outer peripheral surface grinding equipment uses one grindstone to grind the outer peripheral surface of the wafer, and in order to complete the grinding process within a certain amount of time, it is necessary to use a grindstone with a certain degree of roughness. Therefore, there is a problem that there is a certain limit to the finish roughness of the outer peripheral surface of the wafer.

本発明は研削時間を短縮するとともに加工面粗度を向上
させることを目的としてなされたものである。
The present invention was made for the purpose of shortening grinding time and improving machined surface roughness.

〔問題点を解決するための手段〕[Means for solving problems]

第1の発明は硬脆材の外周面研削方法に係り、この方法
は硬脆材から成るワークを低速回転させておき、高速回
転する荒砥石をワーク外周面に係合させて荒研削し、こ
の荒研削と同時に、高速回転する仕上砥石を荒研削され
たワーク外周面に係合させて仕上研削することを特徴と
している。
The first invention relates to a method for grinding the outer peripheral surface of a hard and brittle material, and this method involves rotating a workpiece made of a hard and brittle material at a low speed, and engaging the outer peripheral surface of the workpiece with a high-speed rotating rough grindstone for rough grinding. At the same time as this rough grinding, a finishing grindstone that rotates at high speed is brought into engagement with the rough-ground outer peripheral surface of the workpiece to perform finish grinding.

第2の発明は上記外周面研削方法の実施に直接使用する
装置に係り、この装置は硬脆材から成るワークを回転自
在に支持する手段と、ワークに対して接離自在に設けら
れ、高速回転してワークの外周面を荒研削する荒砥石と
、ワークに対して接離自在に設けられ、高速回転してワ
ークの外周面を仕上研削する仕上砥石とを備え、ワーク
は回転変位しつつ外周面を研削され、上記仕上砥石は荒
砥石が研削したワーク外周面を仕上研削することを特徴
としている。
The second invention relates to an apparatus directly used for carrying out the above-mentioned outer circumferential surface grinding method, and this apparatus includes a means for rotatably supporting a workpiece made of hard and brittle material, and a means for freely moving toward and away from the workpiece, and a high-speed It is equipped with a rough grinding wheel that rotates to roughly grind the outer circumferential surface of the workpiece, and a finishing grindstone that is provided so as to be able to move toward and away from the workpiece and rotates at high speed to finish grind the outer circumferential surface of the workpiece. The outer circumferential surface of the workpiece is ground, and the finishing whetstone is characterized in that it performs finish grinding on the outer circumferential surface of the workpiece that has been ground by the rough grindstone.

〔実施例〕〔Example〕

以下図示実施例により本発明を説明する。 The present invention will be explained below with reference to illustrated embodiments.

第2図は本発明装置の一実施例を示す。例えば円板状を
有するシリコンウェハ等のワークWは、上チャック10
1 と下チャック102により挾まれ、同軸的に設けら
れたモデルMとともに軸心周りに低速で回転駆動される
。ワークWと同一高さ位置には荒砥石201と仕上砥石
301が配設され、またモデルMと同一高さ位置にはそ
れぞれスタイラスローラ202 、302が配設される
。これらのスタイラスローラ202 、302は、それ
ぞれ荒砥石201、仕上砥石301と同軸的に設けられ
る。荒砥石201は高速回転しつつワークWの外周面に
係合し、一方スタイラスローラ202は常時モデルMに
係合するようになっている。したがって荒砥石201は
モデルMの形状に沿ってワークWを荒研削する。仕上砥
石301は荒研削されたワークWの外周面をモデルMの
形状に沿って仕上研削する。
FIG. 2 shows an embodiment of the device of the present invention. For example, a workpiece W such as a silicon wafer having a disk shape is held at the upper chuck 10.
1 and the lower chuck 102, and are rotated at low speed around the axis together with the coaxially provided model M. A rough grindstone 201 and a finishing grindstone 301 are provided at the same height as the workpiece W, and stylus rollers 202 and 302 are provided at the same height as the model M, respectively. These stylus rollers 202 and 302 are provided coaxially with the rough whetstone 201 and the finishing whetstone 301, respectively. The rough grindstone 201 engages with the outer peripheral surface of the workpiece W while rotating at high speed, while the stylus roller 202 engages with the model M at all times. Therefore, the rough grindstone 201 roughly grinds the workpiece W along the shape of the model M. The finishing whetstone 301 performs finishing grinding on the rough-ground outer peripheral surface of the workpiece W along the shape of the model M.

ワーク支持機構100は、基台90上に設けられた下軸
部110と、図示しない連結部材を介して固定枠91上
に取付けられた上軸部120とから成る。
The workpiece support mechanism 100 includes a lower shaft portion 110 provided on a base 90 and an upper shaft portion 120 mounted on a fixed frame 91 via a connecting member (not shown).

下軸部110は基台90に固定されたシリンダ装置11
1を有し、このシリンダ装置111のピストンロッド1
12に連結された下軸113は、固定枠91に設けられ
た軸受部材92を貫通して固定枠91の上方へ突出する
。下軸113の上端部には、下チャック102が下軸1
13に対して軸心周りに相対回転可能に連結される。し
かして下チャック102は昇降自在であり、かつ軸心周
りに回転変位可能である。一方、上軸部120はハウジ
ング121内にモータ122を有する。このモータ12
2の駆動軸123は下方に延びてハウジング121から
突出し、その突出端にモデルMが固定され、モデルMの
下面に上チャック101が設けられる。しかしてモデル
Mと上チャック101は、モータ122により低速で回
転駆動される。
The lower shaft portion 110 is a cylinder device 11 fixed to the base 90.
1, and the piston rod 1 of this cylinder device 111
A lower shaft 113 connected to the fixed frame 91 passes through a bearing member 92 provided on the fixed frame 91 and projects above the fixed frame 91 . The lower chuck 102 is attached to the upper end of the lower shaft 113.
13 so as to be relatively rotatable around the axis. Thus, the lower chuck 102 can be moved up and down, and can be rotated about its axis. On the other hand, the upper shaft portion 120 has a motor 122 within a housing 121. This motor 12
The second drive shaft 123 extends downward and protrudes from the housing 121, the model M is fixed to the protruding end thereof, and the upper chuck 101 is provided on the lower surface of the model M. Thus, the model M and the upper chuck 101 are rotated at low speed by the motor 122.

ワークWが供給される前、下チャック102は下降位置
にあり、図示しない供給機構によりワークWが下チャッ
ク102上に供給されると、ワークWは下チャック10
2の上面に発生している負圧により吸着されて位置決め
される。そして下チャック102は上昇し、上チャック
101 とともにワークWを挟持する。その後モータ1
22が始動して、ワークWを回転させる。
Before the workpiece W is supplied, the lower chuck 102 is in the lowered position, and when the workpiece W is supplied onto the lower chuck 102 by a supply mechanism (not shown), the workpiece W is moved onto the lower chuck 10.
2 is adsorbed and positioned by the negative pressure generated on the upper surface. The lower chuck 102 then rises and clamps the workpiece W together with the upper chuck 101. Then motor 1
22 starts and rotates the workpiece W.

荒砥石201を有する倣い機構200と仕上砥石301
を有する倣い機構300とは同一の構成を有するので、
ここでは後者の倣い機構300について説明する。
A copying mechanism 200 having a rough whetstone 201 and a finishing whetstone 301
Since it has the same configuration as the copying mechanism 300 having
Here, the latter copying mechanism 300 will be explained.

砥石軸台310は、固定枠91に設けられた一対のブラ
ケット311上のレール312にi6[され、ワーク支
持機構100に対して進退動自在である。砥石軸台31
0は、固定枠91に固定された送りシリンダ装置320
により往復駆動される。送りシリンダ装置320のピス
トンロッド321の先端には筒状部材322が摺動自在
に嵌合され、この筒状部材322は砥石軸台310の下
面に固定された連結部材313に連結される。筒状部材
322は長穴323を形成され、この長穴323にはピ
ストンロッド321に立設されたピン324が係合する
The grindstone head 310 is mounted on rails 312 on a pair of brackets 311 provided on the fixed frame 91, and is movable forward and backward relative to the workpiece support mechanism 100. Grinding wheel head 31
0 is a feed cylinder device 320 fixed to the fixed frame 91
It is driven back and forth by. A cylindrical member 322 is slidably fitted to the tip of the piston rod 321 of the feed cylinder device 320, and this cylindrical member 322 is connected to a connecting member 313 fixed to the lower surface of the grindstone stock 310. The cylindrical member 322 has an elongated hole 323 formed therein, and a pin 324 erected on the piston rod 321 engages with the elongated hole 323 .

非作動時、ピストンロッド321は後退して砥石軸台3
10を後方に位置させている。ここで送りシリンダ装置
320のピストンの後側の室(図示せず)に、図示しな
い圧力源から高圧空気が導入され、ピストンロッド32
1は前進し始める。この前進開始時、砥石軸台310は
まだ停止しているが、ピン324が長穴323の前端に
係合すると、その後ピストンロッド321はピン324
を介して砥石軸台310を前進させる。仕上砥石301
がワークWに当接した後、ピストンロッド321は長穴
323の長さの約半分だけ前進し、ピン324が長穴3
23の略中央にきた点で停止する。この状態でワークW
の研削が行なわれる。研削が終了すると、送りシリンダ
装置320のピストンの前側の室(図示せず)に高圧空
気が導入され、ピストンロッド321は後退し始める9
まずピン324が長穴323の後端に係合し、その後ピ
ストンロッド321はピン324を介して砥石軸台31
0を後退させる。なお送りシリンダ装置320は、仕上
砥石301がワークWから一定値以上離れている時砥石
軸台310を早送りし、仕上砥石301がワークWに近
接している時砥石軸台310を遅送りするようになって
いる。
When not in operation, the piston rod 321 moves backward and the grindstone head 3
10 is located at the rear. Here, high pressure air is introduced from a pressure source (not shown) into a chamber (not shown) on the rear side of the piston of the feed cylinder device 320, and the piston rod 320
1 starts moving forward. At the start of this forward movement, the grindstone head 310 is still stopped, but when the pin 324 engages with the front end of the elongated hole 323, the piston rod 321 then moves to the pin 324.
The grindstone head 310 is advanced through the. Finishing whetstone 301
After contacting the workpiece W, the piston rod 321 moves forward by about half the length of the elongated hole 323, and the pin 324 moves into the elongated hole 3.
It stops when it reaches approximately the center of 23. In this state, work W
Grinding is performed. When the grinding is completed, high pressure air is introduced into the chamber (not shown) in front of the piston of the feed cylinder device 320, and the piston rod 321 begins to retreat.
First, the pin 324 engages with the rear end of the elongated hole 323, and then the piston rod 321 is connected to the grindstone head 31 via the pin 324.
Retract 0. The feed cylinder device 320 is configured to rapidly feed the grindstone head 310 when the finishing whetstone 301 is away from the workpiece W by a certain value or more, and to slowly feed the whetstone head 310 when the finishing whetstone 301 is close to the workpiece W. It has become.

押圧バランスシリンダ装置325は、ブラケット326
により固定枠91に取付けられ、そのピストンロッド3
27は常時一定圧で砥石軸台310の後面を押圧する。
The pressing balance cylinder device 325 includes a bracket 326
The piston rod 3 is attached to the fixed frame 91 by
27 always presses the rear surface of the grindstone head 310 with a constant pressure.

したがってワークWは仕上砥石301に一定の圧力で摺
接して研削される。
Therefore, the workpiece W is ground by slidingly contacting the finishing whetstone 301 with a constant pressure.

砥石支持枠330は砥石軸台310の前面に上下動自在
に取付けられる。砥石軸台310の上面にブラケット3
31を介して固定されたモータ332の駆動ねじ軸33
3は、砥石支持枠330内に設けられた図示しないねし
孔に螺合し、回転することにより砥石支持枠330を上
下動させることができる。砥石支持枠330は、上下方
向に延びる回転軸334を有する。回転軸334は砥石
支持枠330の下方に突出し、その突出端部には仕上砥
石301が固定され、この仕上砥石301の上方にはス
タイラスローラ302が同軸的に設けられる。また回転
軸334の砥石支持枠330から上方へ突出する部分に
は、プーリ335が固定される。このブーl7335は
、砥石軸台310に取付けられたモータ336の駆動軸
のプーリ337に、ベルト338を介して連結される。
The grindstone support frame 330 is attached to the front surface of the grindstone shaft stand 310 so as to be vertically movable. A bracket 3 is placed on the top surface of the grindstone head 310.
Drive screw shaft 33 of motor 332 fixed via 31
3 is screwed into a threaded hole (not shown) provided in the whetstone support frame 330, and by rotation, the whetstone support frame 330 can be moved up and down. The grindstone support frame 330 has a rotating shaft 334 that extends in the vertical direction. The rotating shaft 334 protrudes below the grindstone support frame 330, and a finishing grindstone 301 is fixed to the protruding end thereof, and a stylus roller 302 is coaxially provided above the finishing grindstone 301. Further, a pulley 335 is fixed to a portion of the rotating shaft 334 that projects upward from the grindstone support frame 330. This boob 17335 is connected via a belt 338 to a pulley 337 of a drive shaft of a motor 336 attached to the grindstone stock 310.

したがってモータ336を回転させると、プーリ337
、ベルト338、およびプーリ335を介して回転軸3
34が高速回転し、仕上砥石301が回転駆動される。
Therefore, when the motor 336 is rotated, the pulley 337
, belt 338, and pulley 335 to the rotating shaft 3.
34 rotates at high speed, and the finishing whetstone 301 is rotationally driven.

第3図は、荒砥石201および仕上砥石301の構成を
示す。この図に示された荒゛砥石201および仕上砥石
301の各外周面201 a 、301 aは、研削後
のワークWの外周面と同じ形状、すなわち底部が断面半
円状の環状溝を有する。したがって、このような砥石2
01 、301によりワークWを研削する場合、砥石支
持枠230 、330は昇降させない。
FIG. 3 shows the configuration of the rough whetstone 201 and the finishing whetstone 301. The outer circumferential surfaces 201 a and 301 a of the roughing whetstone 201 and the finishing whetstone 301 shown in this figure have the same shape as the outer circumferential surface of the workpiece W after grinding, that is, an annular groove with a semicircular bottom section. Therefore, such a grindstone 2
01 and 301, the grindstone support frames 230 and 330 are not raised or lowered.

第4図は、荒砥石201および仕上砥石301の他の構
成を示す。この例においては、ワークWは上方縁部W1
と下方縁部W2に面取りされるようになっている。荒砥
石201には、ワークWの円柱状外周面W3を研削する
ための円柱部201bと、上方縁部W1を研削するため
の上方円錐部201Cと、下方縁部W2を研削するため
の下方円錐部201 bとが形成され、円柱部201d
の幅はワークWの厚さよりも厚く成形されている。同様
に、仕上砥石301はワークWよりも厚い円柱部301
bと、上方円錐部301cと、下方円錐部301dとを
有する。
FIG. 4 shows another configuration of the rough whetstone 201 and the finishing whetstone 301. In this example, the workpiece W has an upper edge W1
The lower edge W2 is chamfered. The rough whetstone 201 includes a cylindrical part 201b for grinding the cylindrical outer peripheral surface W3 of the workpiece W, an upper conical part 201C for grinding the upper edge W1, and a lower conical part 201C for grinding the lower edge W2. A columnar portion 201b is formed, and a columnar portion 201d is formed.
The width of the workpiece W is formed to be thicker than the thickness of the workpiece W. Similarly, the finishing whetstone 301 has a cylindrical portion 301 thicker than the workpiece W.
b, an upper conical portion 301c, and a lower conical portion 301d.

しかしてワークWは、まず外周面W3を研削され、次い
で上方縁部W、および下方縁部W2を研削される。上方
縁部W、は外周面W3の研削時よりも砥石201 、3
01を下方へ移動させて研削され、下方縁部W2は外周
面W、lの研削時よりも砥石201゜301を上方へ移
動させて研削される。このように第4図の例では、砥石
支持枠230 、330は昇降する。
Thus, the workpiece W is first ground on its outer circumferential surface W3, and then on its upper edge W and lower edge W2. The upper edge W is lower than the grinding wheels 201 and 3 when grinding the outer peripheral surface W3.
The lower edge W2 is ground by moving the grindstone 201° 301 upwards compared to when grinding the outer circumferential surfaces W and l. In this way, in the example of FIG. 4, the grindstone support frames 230 and 330 move up and down.

第1図(a)〜(e)は、第3図に示す砥石201 、
301を用いた本発明方法の一実施例によるワークWの
研削工程を示す。ワークWの回転角度位置を理解しやす
くするため、ワークWの外周部を円周方向に4等分し、
各点に■〜■の符号を時計周りに付している。
FIGS. 1(a) to (e) show the grindstone 201 shown in FIG.
3 shows a process of grinding a workpiece W according to an embodiment of the method of the present invention using a grinder 301. To make it easier to understand the rotational angular position of the workpiece W, the outer circumference of the workpiece W is divided into four equal parts in the circumferential direction.
Each point is marked with symbols ■ to ■ in a clockwise direction.

第1図(a)はワークWの研削前の状態を示し、砥石2
01 、301は高速回転を開始している。ここで荒砥
石201は第1図(b)に示すように矢印入方向に前進
し、ワークWに係合して荒研削を開始する。これと同時
にワークWは反時計周りに低速で回転し始める。しかし
てワークWの外周部■、■、■が荒研削される。荒砥石
201が外周部■の荒研削を開始する時、すなわちワー
クWが半回転して外周部■が仕上砥石301側に到達し
た時、第1図(C)に示すように仕上砥石301が矢印
B方向に前進してワークWに係合し、仕上研削を開始す
る。すなわち既に荒研削されている外周部■が仕上研削
される。この後ワークWが1回転する間、第1図(d)
に示すように、仕上砥石301は外周部■〜■を順次仕
上研削する。この時、荒砥石201は前進位置にあるが
、荒砥石201が近接するワークWの外周面は既に研削
されており、またスタイラスローラ202がモデルMに
係合するので、荒砥石201とワークWは接触しない。
FIG. 1(a) shows the state of the workpiece W before grinding, and the grinding wheel 2
01 and 301 have started high speed rotation. Here, the rough grindstone 201 moves forward in the direction of the arrow as shown in FIG. 1(b), engages with the workpiece W, and starts rough grinding. At the same time, the workpiece W begins to rotate counterclockwise at low speed. Thus, the outer peripheral portions (■, ■, ■) of the workpiece W are roughly ground. When the rough grinding wheel 201 starts rough grinding of the outer peripheral part (■), that is, when the work W rotates half a turn and the outer peripheral part (■) reaches the finishing whetstone 301 side, the finishing whetstone 301 starts grinding as shown in FIG. 1(C). It moves forward in the direction of arrow B, engages with the workpiece W, and starts finish grinding. That is, the outer circumferential portion (2), which has already been roughly ground, is subjected to finish grinding. After that, while the workpiece W rotates once, as shown in Fig. 1(d),
As shown in , the finishing whetstone 301 sequentially performs finishing grinding on the outer circumferential parts (1) to (2). At this time, the rough whetstone 201 is in the forward position, but the outer peripheral surface of the work W adjacent to the rough whetstone 201 has already been ground, and the stylus roller 202 engages with the model M, so the rough whetstone 201 and the work W do not touch.

ワークWは、仕上研削が開始されてからその外周部■が
再び仕上砥石301を少し過ぎるまで、すなわち、1回
転より若干多めに回転する。これはワークWの全周にわ
たり確実に仕上研削するためである。しかしてワークW
が約1.5回転して研削工程が終了すると、第1図(e
)に示すように、荒砥石201は矢印C方向に、また仕
上砥石301は矢印り方向にそれぞれ後退する。その後
、ワークWは約半回転して元の回転角度位置に戻る。
The workpiece W rotates a little more than one revolution after the start of finish grinding until the outer circumferential part (2) passes a little past the finishing grindstone 301 again. This is to ensure that finish grinding is performed over the entire circumference of the workpiece W. However, work W
When the grinding process is completed after approximately 1.5 rotations, the image shown in Figure 1 (e
), the rough whetstone 201 retreats in the direction of arrow C, and the finishing whetstone 301 retreats in the direction of arrow C. Thereafter, the workpiece W rotates about half a rotation and returns to the original rotation angle position.

以上のように本実施例によれば、荒研削と同時に仕上研
削を行なうことができるので加工時間を短縮させること
ができる。又本実施例はワークWを約2回転させるだけ
で研削を行なうことができ、上縁部と下縁部を別々に面
取りしていた従来例と比較し、加工時間を大巾に短縮さ
せることができる。さに本実施例は、荒砥石と仕上砥石
に別けて研削するように構成したものであるから。仕上
砥石として粒度11000以上の砥石を用いることが可
能となり、ワークWの仕上面粗度を格段と向上させるこ
とができる。このように砥石を2種類用いる場合、摩耗
状態に応じて砥石を交換すればよく、その管理が容易で
ある。また、第3図の砥石201゜301のように、ワ
ークWの外周面の最終形状に対応した断面形状を有する
砥石を用いると、ワークWの外周面形状を高情度に定め
ることができる。
As described above, according to this embodiment, finish grinding can be performed simultaneously with rough grinding, so that machining time can be shortened. Furthermore, in this embodiment, grinding can be performed by rotating the workpiece W approximately twice, and compared to the conventional example in which the upper and lower edges are chamfered separately, the machining time is greatly shortened. I can do it. This is because the present embodiment is configured to perform grinding using a rough whetstone and a finishing whetstone separately. It becomes possible to use a grindstone with a grain size of 11,000 or more as a finishing grindstone, and the finished surface roughness of the workpiece W can be significantly improved. When two types of grindstones are used in this way, it is only necessary to replace the grindstones depending on the state of wear, and the management thereof is easy. Further, by using a grindstone having a cross-sectional shape corresponding to the final shape of the outer peripheral surface of the workpiece W, such as the grindstone 201° 301 in FIG. 3, the outer peripheral surface shape of the workpiece W can be determined with high precision.

なお、第4図に示す砥石により研削する場合、第1図(
a)〜(e)に示す工程に従ってまず外周面W3を研削
し、次いで同様に上方縁部W1を研削し、最後に下方縁
部W8を研削する。
In addition, when grinding with the whetstone shown in Fig. 4, the grinding wheel shown in Fig. 1 (
According to the steps shown in a) to (e), first the outer circumferential surface W3 is ground, then the upper edge W1 is similarly ground, and finally the lower edge W8 is ground.

〔発明の効果〕〔Effect of the invention〕

以上のように本発明によれば、硬脆材から成るワークの
外周面の研削において、仕上げ粗度を大巾に細かくする
とともに研削時間を短縮することが可能となるという効
果が得られる。
As described above, according to the present invention, in grinding the outer circumferential surface of a workpiece made of a hard and brittle material, it is possible to significantly improve the finish roughness and shorten the grinding time.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)〜(e)は本発明方法の一実施例に係るワ
ーク研削工程を示す平面図であり、第1図(a)は研削
開始前の工程、第1図(b)は荒研削のみを行う工程、
第1図(C)は荒研削と仕上研削を同時に行う工程、第
1図(d)は仕上研削のみを行う工程、第1図(e)は
研削終了工程をそれぞれ示し、 第2図は本発明装置の一実施例を示す側面図、第3図は
荒砥石と仕上砥石の一実施例を示す側面図、 第4図は荒砥削と仕上砥石の他の実施例を示す側面図で
ある。 201・・・荒砥削、    301・・・仕上砥石、
W・・・ワーク。
FIGS. 1(a) to (e) are plan views showing the workpiece grinding process according to an embodiment of the method of the present invention, FIG. 1(a) is the process before the start of grinding, and FIG. 1(b) is the A process where only rough grinding is performed,
Figure 1 (C) shows the process of performing rough grinding and finish grinding at the same time, Figure 1 (d) shows the process of performing only finish grinding, Figure 1 (e) shows the process of finishing the grinding, and Figure 2 shows the process of finishing grinding. FIG. 3 is a side view showing one embodiment of the inventive device, FIG. 3 is a side view showing one embodiment of a rough grinding wheel and a finishing grindstone, and FIG. 4 is a side view showing another embodiment of the rough grinding wheel and finishing grindstone. 201... Rough grinding, 301... Finishing whetstone,
W...Work.

Claims (1)

【特許請求の範囲】 1、硬脆材から成るワークを低速回転させておき、高速
回転する荒砥石をワーク外周面に係合させて荒研削し、
この荒研削と同時に、高速回転する仕上砥石を荒研削さ
れたワーク外周面に係合させて仕上研削すること特徴と
する硬脆材の外周面研削方法。 2、硬脆材から成るワークを回転自在に支持する手段と
、ワークに対して接離自在に設けられ、高速回転してワ
ークの外周面を荒研削する荒砥石と、ワークに対して接
離自在に設けられ、高速回転してワークの外周面を仕上
研削する仕上砥石とを備え、ワークは回転変位しつつ外
周面を研削され、上記仕上砥石は荒砥石が研削したワー
ク外周面を仕上研削することを特徴とする硬脆材の外周
面研削装置。
[Claims] 1. A workpiece made of a hard and brittle material is rotated at a low speed, and a rough grindstone rotating at a high speed is engaged with the outer peripheral surface of the workpiece for rough grinding,
A method for grinding the outer circumferential surface of a hard brittle material, which is characterized in that, at the same time as this rough grinding, a finishing grindstone rotating at high speed is engaged with the outer circumferential surface of the rough-ground workpiece to perform finish grinding. 2. A means for rotatably supporting a workpiece made of hard and brittle material, a rough grindstone that is provided so as to be able to move toward and away from the workpiece and rotate at high speed to roughly grind the outer circumferential surface of the workpiece, and a means that can move toward and away from the workpiece. It is equipped with a finishing whetstone that is freely provided and rotates at high speed to finish grind the outer circumferential surface of the workpiece, and the outer circumferential surface of the workpiece is ground while being rotated and displaced. A device for grinding the outer peripheral surface of hard and brittle materials.
JP61056892A 1986-03-17 1986-03-17 Method and apparatus for grinding outer peripheral surface of hard and brittle material Expired - Fee Related JPH074747B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61056892A JPH074747B2 (en) 1986-03-17 1986-03-17 Method and apparatus for grinding outer peripheral surface of hard and brittle material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61056892A JPH074747B2 (en) 1986-03-17 1986-03-17 Method and apparatus for grinding outer peripheral surface of hard and brittle material

Publications (2)

Publication Number Publication Date
JPS62213954A true JPS62213954A (en) 1987-09-19
JPH074747B2 JPH074747B2 (en) 1995-01-25

Family

ID=13040085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61056892A Expired - Fee Related JPH074747B2 (en) 1986-03-17 1986-03-17 Method and apparatus for grinding outer peripheral surface of hard and brittle material

Country Status (1)

Country Link
JP (1) JPH074747B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0332041A (en) * 1989-06-29 1991-02-12 Shinkawa Ltd Bonding-tool cleaning mechanism
DE19535616B4 (en) * 1994-09-29 2006-01-26 Tokyo Seimitsu Co. Ltd., Mitaka Wafer edge grinding device
JP2014226767A (en) * 2013-05-27 2014-12-08 株式会社東京精密 Wafer chamfer device and wafer chamfer method
JP2017094487A (en) * 2013-01-30 2017-06-01 株式会社荏原製作所 Polishing device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4910398A (en) * 1972-05-31 1974-01-29

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4910398A (en) * 1972-05-31 1974-01-29

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0332041A (en) * 1989-06-29 1991-02-12 Shinkawa Ltd Bonding-tool cleaning mechanism
DE19535616B4 (en) * 1994-09-29 2006-01-26 Tokyo Seimitsu Co. Ltd., Mitaka Wafer edge grinding device
JP2017094487A (en) * 2013-01-30 2017-06-01 株式会社荏原製作所 Polishing device
JP2014226767A (en) * 2013-05-27 2014-12-08 株式会社東京精密 Wafer chamfer device and wafer chamfer method

Also Published As

Publication number Publication date
JPH074747B2 (en) 1995-01-25

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