JPH03179768A - Lead frame member - Google Patents

Lead frame member

Info

Publication number
JPH03179768A
JPH03179768A JP31268389A JP31268389A JPH03179768A JP H03179768 A JPH03179768 A JP H03179768A JP 31268389 A JP31268389 A JP 31268389A JP 31268389 A JP31268389 A JP 31268389A JP H03179768 A JPH03179768 A JP H03179768A
Authority
JP
Japan
Prior art keywords
lead frame
alloy
etching
base alloy
frame member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP31268389A
Other languages
Japanese (ja)
Other versions
JPH07109869B2 (en
Inventor
Takahide Inoue
隆英 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd, Toppan Printing Co Ltd filed Critical Hitachi Metals Ltd
Priority to JP1312683A priority Critical patent/JPH07109869B2/en
Publication of JPH03179768A publication Critical patent/JPH03179768A/en
Publication of JPH07109869B2 publication Critical patent/JPH07109869B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a lead frame member which is excellent in thermal conformity to an Si chip, mechanical strength, electrical conductivity, thermal conductivity, and etching processability by a method wherein both the side layers of a lead frame member in a thicknesswise direction are formed of Ni-Fe base alloy and an intermediate layer sandwiched between the side layers is formed of Cu or Cu base alloy. CONSTITUTION:Both the side layers of a lead frame in a thicknesswise direction are formed of Ni-Fe base alloy, and an intermediate layer sandwiched between the side layers is formed of Cu or Cu base alloy. The Ni-Fe base alloy is one of those alloies usually used for a lead frame such as 42% Ni-Fe alloy, 50% Ni-Fe alloy, 29% Ni-17% Co-Fe alloy, and improved alloies of the above alloies. It is preferable that the side layers are equal to each other in thickness from the standpoint of an etching processability. Well known lead frame Cu base alloies can be widely applied to Cu base alloy the same as Ni-Fe base alloy.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ICパッケージ等の電子部品に使用されるリ
ードフレーム部材に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a lead frame member used for electronic components such as IC packages.

〔従来の技術〕[Conventional technology]

従来、集積回路(I C)のリードフレーム用材料とし
ては42%Ni−Fe合金(通称42Ni合金)、50
%Ni−Fe合金(通称5ONi合金)、29%N 1
−17 Go−F e合金(通称コバール合金)等のN
i−Fe系合金(以下、これらを総称して本発明ではN
i−Fe基合金という)あるいは種々のCu合金が用い
られていた。
Conventionally, materials for lead frames of integrated circuits (IC) include 42% Ni-Fe alloy (commonly known as 42Ni alloy) and 50% Ni-Fe alloy (commonly known as 42Ni alloy).
%Ni-Fe alloy (commonly known as 5ONi alloy), 29%N 1
-17 N such as Go-F e alloy (commonly known as Kovar alloy)
i-Fe alloy (hereinafter, these are collectively referred to as N in the present invention)
i-Fe-based alloys) or various Cu alloys were used.

リードフレーム材には、 (1)Siチップとの熱膨張整合性、 (2)良好な機械的強度、 (3)良好な電気伝導度、 (4)良好な熱伝導度、 が要求される。しかしながら、従来のNi−Fe基合金
は電気伝導度が小さく、またCu合金は、Siチップと
の熱膨張整合性、機械的性質に問題がある等、それぞれ
に一長一短を有しており、全ての要求特性を満足するリ
ードフレーム部材の開発が待たれていた。
The lead frame material is required to have (1) thermal expansion matching with the Si chip, (2) good mechanical strength, (3) good electrical conductivity, and (4) good thermal conductivity. However, conventional Ni-Fe-based alloys have low electrical conductivity, and Cu alloys have problems with thermal expansion matching with Si chips and mechanical properties. The development of a lead frame member that satisfies the required characteristics has been awaited.

さらに、近年はICの高集積化に伴いリードフレームも
多ビン化している。
Furthermore, in recent years, as ICs have become highly integrated, lead frames have also become multi-bin.

これに伴いインナーリードの間隔は非常に狭くなり、エ
ツチング加工性が極めて重要視されるようになってきた
。しかし、従来のNi−Fe基合金やCu基合金のエツ
チング加工性に関し、以下のような問題点が指摘された
As a result, the spacing between inner leads has become extremely narrow, and etching workability has become extremely important. However, the following problems have been pointed out regarding the etching processability of conventional Ni-Fe-based alloys and Cu-based alloys.

−aにエツチングは、レジストを施した被エッチング材
の両側面から同時に行なわれる。その際のエツチング進
行過程を第2図に示す(断面図)。
-a Etching is performed simultaneously from both sides of the material to be etched, which is coated with resist. The etching progress process at that time is shown in FIG. 2 (cross-sectional view).

エツチング初期から第2図(a) −(b)→(C)の
ように主に板厚方向にエツチングが進行するが、エツチ
ング時間の差異により板厚中央部が凸となった断面形状
となる。この凸部は、リードの寸法不良や、リードの短
絡を起こす原因となり、排除する必要がある。この凸部
を排除するためにはエツチング時間を長くすれば良いが
、生産効率の点から望ましくなく、またレジストが施さ
れている表面部から内部にいくにしたがって、エツチン
グは板厚方向だけでなく、板幅方向にも進行(サイドエ
ッチ)するため第2図(d)に示すように板幅方向に過
剰にエツチングが進行してしまい望ましくない。
From the beginning of etching, etching progresses mainly in the thickness direction as shown in Figure 2 (a) - (b) → (C), but due to the difference in etching time, the cross-sectional shape becomes convex at the center of the thickness. . These protrusions cause dimensional defects in the leads and lead short circuits, and must be eliminated. In order to eliminate these protrusions, it is possible to lengthen the etching time, but this is undesirable from the point of view of production efficiency, and etching occurs not only in the thickness direction, but also as you go from the surface where the resist is applied to the inside. Since etching also progresses in the board width direction (side etching), etching progresses excessively in the board width direction, as shown in FIG. 2(d), which is undesirable.

〔発明が解決しようとする課題〕 本発明の目的は、以上に鑑み、従来のNi−Fe基合金
とSiチップとの熱的整合性、機械的強度とCu合金ま
たはCu基合金の良好な電気伝導性と熱伝導性を兼ね備
え、さらにエツチング加工性を改善した超多ビン化の要
求を満足させる新規なリードフレーム部材を提供するこ
とである。
[Problems to be Solved by the Invention] In view of the above, an object of the present invention is to improve the thermal compatibility and mechanical strength of the conventional Ni-Fe-based alloy and Si chip, and the good electrical properties of the Cu alloy or the Cu-based alloy. It is an object of the present invention to provide a new lead frame member that has both conductivity and thermal conductivity, and also has improved etching processability and satisfies the demands for ultra-high number of bins.

〔課題を解決するための手段〕[Means to solve the problem]

本発明者は、従来からリードフレームに使用されてきた
Ni−Fe基合金、およびCu、Cu基合金のエツチン
グ加工性の評価を行なったところ、前述のようにNi−
Fe基合金、およびCu、Cu基合金共に板厚中央部が
凸になったエツチング断面となるものの、Ni−Fe基
合金に比べCu、Cu基合金の方がエツチング速度が速
く、その結果板厚中央部に生ずる凸の度合いが少ないこ
とを知見した。
The present inventor evaluated the etching processability of Ni-Fe-based alloys, Cu, and Cu-based alloys that have been conventionally used for lead frames, and found that Ni-Fe-based alloys, as described above,
Although both Fe-based alloys and Cu and Cu-based alloys have an etched cross section with a convex central part of the plate thickness, the etching speed of Cu and Cu-based alloys is faster than that of Ni-Fe-based alloys, and as a result, the plate thickness increases. It was found that the degree of convexity occurring in the central part was small.

そこで本発明者は、エツチングにより凸が生ずる板厚中
央部にエツチング加工性に優れるCuまたはCu基合金
を用い、その両側にNi−Fe基合金を配した複合構造
の材料を用いてエツチング加工性の評価を行なったとこ
ろ、従来のNi−Fe基合金、またはCu等の単体から
なるリードフレーム部材に比べ極めて優れたエツチング
断面を得ることができることを確認した。
Therefore, the present inventor used a material with a composite structure in which Cu or Cu-based alloy, which has excellent etching workability, was used in the central part of the sheet thickness where a convexity occurs due to etching, and Ni-Fe-based alloy was arranged on both sides. As a result of evaluation, it was confirmed that an extremely superior etched cross section could be obtained compared to conventional lead frame members made of Ni--Fe based alloys or single elements such as Cu.

本発明は以上の知見に基づきなされたものであり、板厚
方向の両側層がNi−Fe基合金、両側層に挾まれる中
間層がCuまたはCu基合金であることを特徴とするリ
ードフレーム用部材である。
The present invention has been made based on the above findings, and provides a lead frame characterized in that the layers on both sides in the plate thickness direction are made of a Ni-Fe-based alloy, and the intermediate layer sandwiched between the layers on both sides is made of Cu or a Cu-based alloy. It is a member for use.

〔作用〕[Effect]

第1図は、本発明リード部材をエツチングした場合のエ
ツチング進行過程を示す断面図である。
FIG. 1 is a sectional view showing the progress of etching when the lead member of the present invention is etched.

第1図(a)、 (b)までは第2図に示した従来材と
同様にエツチングが進行するが、その後はCu等からな
る中間層においては容易に板厚方向へエツチングが進行
する一方、この間両側相のサイドエッチは中間層の板厚
方向へのエツチング量に比べ少ないため、第1図(c)
に示すようなエツチング断面形状とすることができる。
Up to Fig. 1(a) and (b), etching progresses in the same way as the conventional material shown in Fig. 2, but after that, etching progresses easily in the thickness direction in the intermediate layer made of Cu etc. During this time, the amount of side etching on both phases is small compared to the amount of etching in the thickness direction of the intermediate layer, so as shown in Fig. 1(c).
It is possible to have an etched cross-sectional shape as shown in FIG.

すなわち、単体材料の場合、その材料がいかにエツチン
グ性が優れていても第2図(C)(あるいは(d))の
ようなエツチング断面となるが、本発明のようにエツチ
ング性の良好な材料を中間層とした複合構造とすること
により第1図(e)に示すような理想に近いエツチング
断面を達成することができる。
In other words, in the case of a single material, no matter how good the etching property of the material is, the etched cross section will be as shown in FIG. 2 (C) (or (d)). By forming a composite structure in which the intermediate layer is formed, an etched cross section close to the ideal as shown in FIG. 1(e) can be achieved.

本発明において、両側層にNi−Fe基合金を配するの
は、リードフレームに要求される機械的強度およびSi
チップとの整合性を具備させるためである。
In the present invention, the reason why Ni-Fe-based alloy is disposed on both sides is to meet the mechanical strength required for the lead frame and the Si-Fe base alloy.
This is to ensure consistency with the chip.

なお、本発明を実施し得るNi−Fe基合金とは、従来
からリードフレームとして用いられている42%Ni−
Fe合金、50%Ni−Fe合金、29%Ni−17%
Co−Fe合金あるいはこれら合金の改良合金を広く含
む概念であり、リードフレームの具体的用途、要求に応
じて適宜選択されることは当然であるが、本発明の目的
達成の観点からはとくに限定されるものでない。
Note that the Ni-Fe-based alloy with which the present invention can be implemented is 42% Ni-Fe, which has been conventionally used for lead frames.
Fe alloy, 50%Ni-Fe alloy, 29%Ni-17%
The concept broadly includes Co-Fe alloys and improved alloys of these alloys, and it goes without saying that they can be selected as appropriate depending on the specific use and requirements of the lead frame, but from the perspective of achieving the purpose of the present invention, there are no particular limitations. It is not something that can be done.

また、両側層の板厚は、エツチング加工性の観点から均
等であることが望ましい。
In addition, it is desirable that the thicknesses of both layers be equal from the viewpoint of etching processability.

本発明において、CuまたはCu基合金からなる中間層
の存在は、エツチング加工性の改善の他、リードフレー
ムとして要求される電気伝導性および熱伝導性を満足さ
せる働きをも有する。
In the present invention, the presence of the intermediate layer made of Cu or a Cu-based alloy not only improves etching processability but also serves to satisfy the electrical conductivity and thermal conductivity required for a lead frame.

なお、Cu基合金もN i−F e基合金同様、本発明
の目的が達成される限り限定されるものでなく、周知の
リードフレーム用Cu基合金を広く適用できる。
Note that, like the Ni-Fe-based alloy, the Cu-based alloy is not limited as long as the object of the present invention is achieved, and well-known Cu-based alloys for lead frames can be widely applied.

両側層(Ni−Fe基合金)および中間層(Cu等)の
板厚比は、リードフレームの具体的用途、要求に応じて
適宜選択できるが、中間層が薄すぎるとNi−Fe基合
金単体と差異がなくなりエツチング加工性の改善効果が
期待できなくなり、また十分な電気伝導性を確保するこ
とができなくなるので、中間層の板厚比は20%以上と
することが望ましい。
The plate thickness ratio of both side layers (Ni-Fe-based alloy) and intermediate layer (Cu, etc.) can be selected as appropriate depending on the specific use and requirements of the lead frame, but if the intermediate layer is too thin, the Ni-Fe-based alloy alone It is desirable that the plate thickness ratio of the intermediate layer is 20% or more, since there is no difference between the two and the effect of improving etching processability cannot be expected, and sufficient electrical conductivity cannot be ensured.

一方、中間層が厚くなりすぎると、CuまたはCu基合
金単体と差異がなくなり、エツチング加工性の改善効果
が期待できず、また十分な機械的強度を確保することが
できなくなるので、中間層の板厚比の上限を70%とす
ることが望ましい。なお、板厚比とは以下により定義さ
れることとする。
On the other hand, if the intermediate layer becomes too thick, there will be no difference from Cu or Cu-based alloy alone, and no improvement in etching processability can be expected, and sufficient mechanical strength cannot be ensured. It is desirable that the upper limit of the plate thickness ratio be 70%. Note that the plate thickness ratio is defined as follows.

TR,= (T、 /(T、 十T、、 十T。)) 
X 100(%)TR,= (T、 /(T、 十T、
、 十T、、)) X100(%)TR,:中間層の板
厚比 TR,:両側層の板厚比(片側のみ) T1:中間層の板厚 T□、T、、:両側層の板厚 次に本発明リードフレーム部材は、周知の冷間クラッド
圧延により製造することができる。
TR, = (T, /(T, 10T,, 10T.))
X 100(%)TR, = (T, /(T, 10T,
, 10T,,)) Plate Thickness Next, the lead frame member of the present invention can be manufactured by the well-known cold clad rolling method.

〔実施例〕〔Example〕

以下、本発明を実施例に基づき説明する。 Hereinafter, the present invention will be explained based on examples.

両側層のNi−Fe合金として、42%Ni−Fe、 
50%Ni−Fe、29%N 1−17%Go−Fe(
=rバール)、中間層として無酸素銅、Cu−23%F
e−0,03%Pを準備し、それぞれ第1表の試料内容
の組み合わせ、板厚比となるように、これらの材料を冷
間圧延により圧着して、板厚0.15mm、板幅45帥
のクラツド材を得た。
As the Ni-Fe alloy on both sides, 42% Ni-Fe,
50%Ni-Fe, 29%N 1-17%Go-Fe(
= r bar), oxygen-free copper as the intermediate layer, Cu-23%F
e-0.03% P was prepared, and these materials were crimped by cold rolling so that the combination of sample contents and plate thickness ratio were as shown in Table 1, and the plate thickness was 0.15 mm and the plate width was 45 mm. Obtained the Marshal's Clad Lumber.

以上の試料ならびに42%Ni−Fe合金、無酸素銅に
ついてエツチング加工性、機械的強度、電気伝導率の評
価を行なった。結果を第1表に示す。
Etching workability, mechanical strength, and electrical conductivity were evaluated for the above samples, 42% Ni--Fe alloy, and oxygen-free copper. The results are shown in Table 1.

なお、エツチング加工性は、第3図に示すように幅0.
5mmの矩形孔を塩化第二鉄溶液(FeC1,+68、
O)を用いて5分間エツチングを実施した後の開孔率で
評価した。なお、開孔率とは、エツチング後のエツチン
グ断面の最大幅をW3、最小幅をW2としたときの、W
、/W、X100(%)を意味する。
Note that the etching processability is as shown in Fig. 3 when the width is 0.
A 5 mm rectangular hole was filled with ferric chloride solution (FeC1, +68,
Evaluation was made based on the porosity after etching for 5 minutes using O). Note that the porosity is W when the maximum width of the etched cross section after etching is W3 and the minimum width is W2.
, /W, means X100 (%).

第1表より、本発明リードフレーム部材は、エツチング
加工性に優れ、かつリードフレームとして要求される機
械的強度、電気伝導性を具備することがわかる。
From Table 1, it can be seen that the lead frame member of the present invention has excellent etching processability and has the mechanical strength and electrical conductivity required for a lead frame.

〔発明の効果〕〔Effect of the invention〕

以上説明のように、本発明によればエツチング加工性を
向上するとともに、良好な機械的強度、電気伝導性を有
しており、超多ビン用のリードフレーム部材として有効
である。
As described above, the present invention improves etching processability, has good mechanical strength and electrical conductivity, and is effective as a lead frame member for a very large number of bins.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明リードフレーム用部材のエツチング進行
過程を示す図、第2図は従来のリードフレーム用部材の
進行過程を示す図、第3図はエツチング試験を説明する
図である。 第 】 図 (a) (b) (c) r 1C7l)?ノ1cti*ご=Z≧デづと〉□第 図 手 続 補 正 書(自 発) 平成 年2.11に1 日 工、事 件 の 表示 平成1年 特許願 第312683号 2゜ 発 明 の 名 称 リードフレーム用部材 3、補正 を す る 者 発明の詳細な説明の欄 別紙 1. 明細書の発明の詳細な説明の欄を次のように訂正
する。 (1)  明細書第9頁の第1表を添付の第1表と差し
換える。 (2)同書第10頁第5行のro、5mmJをrO,8
m+1」に訂正する。 (3)同書第10頁第9行のrW、/W、Jを「W2/
W1」に訂正する。 以上
FIG. 1 is a diagram showing the progress of etching of a lead frame member of the present invention, FIG. 2 is a diagram showing the progress of a conventional lead frame member, and FIG. 3 is a diagram illustrating an etching test. ] Figure (a) (b) (c) r 1C7l)?ノ1cti*Go=Z≧Dzuto>□Diagram procedural amendment (voluntary) 1st February 1998 Nikko, Incident indication 1999 patent application No. 312683 2゜Name of invention Lead frame member 3. Detailed explanation of the invention of the person making the amendment Attachment 1. The Detailed Description of the Invention column in the specification is corrected as follows. (1) Replace Table 1 on page 9 of the specification with the attached Table 1. (2) ro, 5mmJ in the same book, page 10, line 5 is rO, 8
m+1". (3) Change rW, /W, and J on page 10, line 9 of the same book to “W2/
Corrected to "W1". that's all

Claims (1)

【特許請求の範囲】 1 板厚方向の両側層がNi−Fe基合金、両側層に挾
まれる中間層がCuまたはCu基合金であることを特徴
とするリードフレーム用部材。 2 中間層のCu板またはCu基合金の板厚比が20〜
70%であることを特徴とするリードフレーム用部材。
[Scope of Claims] 1. A member for a lead frame, characterized in that both layers in the plate thickness direction are made of a Ni-Fe-based alloy, and an intermediate layer sandwiched between the both-side layers is made of Cu or a Cu-based alloy. 2 The plate thickness ratio of the intermediate layer Cu plate or Cu-based alloy is 20~
70%.
JP1312683A 1989-12-01 1989-12-01 Lead frame material Expired - Fee Related JPH07109869B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1312683A JPH07109869B2 (en) 1989-12-01 1989-12-01 Lead frame material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1312683A JPH07109869B2 (en) 1989-12-01 1989-12-01 Lead frame material

Publications (2)

Publication Number Publication Date
JPH03179768A true JPH03179768A (en) 1991-08-05
JPH07109869B2 JPH07109869B2 (en) 1995-11-22

Family

ID=18032169

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1312683A Expired - Fee Related JPH07109869B2 (en) 1989-12-01 1989-12-01 Lead frame material

Country Status (1)

Country Link
JP (1) JPH07109869B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0533137A2 (en) * 1991-09-18 1993-03-24 Fujitsu Limited Leadframe and resin-sealed semiconductor device
CN104527157A (en) * 2014-12-31 2015-04-22 北京北冶功能材料有限公司 Composite material used for integrated circuit lead frame and manufacturing method thereof
GB2538144A (en) * 2016-03-11 2016-11-09 Castip Ind Co Ltd Tool bag having means to prevent tools from falling out of the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60242653A (en) * 1984-05-16 1985-12-02 Daido Steel Co Ltd Composite material for lead frame
JPH02231751A (en) * 1989-03-03 1990-09-13 Sumitomo Special Metals Co Ltd Material for lead frame

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60242653A (en) * 1984-05-16 1985-12-02 Daido Steel Co Ltd Composite material for lead frame
JPH02231751A (en) * 1989-03-03 1990-09-13 Sumitomo Special Metals Co Ltd Material for lead frame

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0533137A2 (en) * 1991-09-18 1993-03-24 Fujitsu Limited Leadframe and resin-sealed semiconductor device
US5367191A (en) * 1991-09-18 1994-11-22 Fujitsu Limited Leadframe and resin-sealed semiconductor device
US5753535A (en) * 1991-09-18 1998-05-19 Fujitsu Limited Leadframe and resin-sealed semiconductor device
CN104527157A (en) * 2014-12-31 2015-04-22 北京北冶功能材料有限公司 Composite material used for integrated circuit lead frame and manufacturing method thereof
GB2538144A (en) * 2016-03-11 2016-11-09 Castip Ind Co Ltd Tool bag having means to prevent tools from falling out of the same

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