JPH03177570A - Production of combined hard material - Google Patents
Production of combined hard materialInfo
- Publication number
- JPH03177570A JPH03177570A JP31423989A JP31423989A JPH03177570A JP H03177570 A JPH03177570 A JP H03177570A JP 31423989 A JP31423989 A JP 31423989A JP 31423989 A JP31423989 A JP 31423989A JP H03177570 A JPH03177570 A JP H03177570A
- Authority
- JP
- Japan
- Prior art keywords
- ions
- ion
- base material
- film
- drawn out
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 150000002500 ions Chemical class 0.000 claims abstract description 35
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 12
- -1 nitrogen ions Chemical class 0.000 claims abstract description 11
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 11
- 238000005468 ion implantation Methods 0.000 claims abstract description 10
- 229910004349 Ti-Al Inorganic materials 0.000 claims abstract 5
- 229910004692 Ti—Al Inorganic materials 0.000 claims abstract 5
- 239000002131 composite material Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 13
- 229910001069 Ti alloy Inorganic materials 0.000 claims description 11
- 239000002344 surface layer Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000009684 ion beam mixing Methods 0.000 claims description 4
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 1
- 229910001456 vanadium ion Inorganic materials 0.000 claims 1
- 239000000203 mixture Substances 0.000 abstract description 14
- 229910045601 alloy Inorganic materials 0.000 abstract description 4
- 239000000956 alloy Substances 0.000 abstract description 4
- 238000007740 vapor deposition Methods 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 238000004140 cleaning Methods 0.000 abstract description 2
- 238000004506 ultrasonic cleaning Methods 0.000 abstract description 2
- 238000004544 sputter deposition Methods 0.000 abstract 2
- 238000005498 polishing Methods 0.000 abstract 1
- 238000000926 separation method Methods 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 description 16
- 238000007254 oxidation reaction Methods 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 9
- 230000001133 acceleration Effects 0.000 description 5
- 229910000765 intermetallic Inorganic materials 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910021362 Ti-Al intermetallic compound Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000001659 ion-beam spectroscopy Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、特に耐摩耗性、耐酸化性に優れた複合硬質材
料を製造する方性に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention particularly relates to the method of producing a composite hard material having excellent wear resistance and oxidation resistance.
［従来の技術と課題］
通常、Ｔｉ合金は軽量の耐熱高強度材料として航空、宇
宙産業用を初めとして自動車工業、一般工業用として幅
広く実用されてきているが、産業界では総合的な性能向
上の要求がなされており、特にその耐酸化性、耐摩耗性
の改善向上に期待が寄せられている。[Conventional technologies and issues] Generally, Ti alloys have been widely used as lightweight, heat-resistant, high-strength materials in the aviation and space industries, as well as in the automobile industry and general industry. In particular, there are expectations for improved oxidation resistance and wear resistance.
一般的に、Ｔｉ合金は酸化雰囲気中で約５００℃以上で
は酸化が急激に進行し、通常長時間の使用に耐えられな
い。この為、色々な耐酸化被覆の利用が試みられ、Ａｌ
１．Ｓｉ、Ｎｉ、Ｃｒ、Ｐｔなどの被膜が耐酸化性を向
上せしめたが、十分とは言い難い現状である。In general, Ti alloys undergo rapid oxidation at temperatures above about 500° C. in an oxidizing atmosphere, and cannot usually withstand long-term use. For this reason, attempts have been made to use various oxidation-resistant coatings, including Al
1. Although coatings made of Si, Ni, Cr, Pt, etc. have improved oxidation resistance, the current situation is far from sufficient.
ところで、Ｔ １−Ａｌ系の金属間化合物は耐酸化性に
優れ、通常のＴｉ合金に比べて酸化開始温度を約３００
℃程度向上させる。しかし、これらの材料は加工性が悪
いため現在その改善に努めているところである。しかる
に、この耐酸化性の高いＴｉ−Ａｌ系金属間化合物膜を
従来のＴｉ合金の表面に被覆することにより、耐酸化性
に優れた複合材料を作り出すことの可能性が考えられる
。By the way, T1-Al-based intermetallic compounds have excellent oxidation resistance, and have an oxidation initiation temperature of about 300°C compared to ordinary Ti alloys.
Increase by about ℃. However, since these materials have poor workability, efforts are currently being made to improve them. However, it is possible to create a composite material with excellent oxidation resistance by coating the surface of a conventional Ti alloy with this highly oxidation-resistant Ti-Al intermetallic compound film.
しかし、従来のＣＶＤ、ＰＶＤ手法による被覆膜では、
耐熱材として使用される繰り返し熱応力の発生する条件
下で、剥離等が生じ実用上問題であった。また、従来の
Ｔｉ合金は無潤滑の状態で摩擦係数が大きく、摺動部や
他の金属との接触部に使用する場合、焼付けの問題が生
じる各種潤滑剤を使用することにより摩擦係数を下げる
ことが可能であるが、長時間の使用に耐えることができ
ないため、表面処理が行われている。上記焼付を防止す
るにはＴｉ合金の表面を硬化することが必要で、浸入型
元素硬化法、めっき法、ろう付け。However, coating films made using conventional CVD and PVD methods,
Under conditions where repeated thermal stress is generated when used as a heat-resistant material, peeling and the like occur, which is a practical problem. In addition, conventional Ti alloys have a large coefficient of friction without lubrication, and when used in sliding parts or parts that come into contact with other metals, the friction coefficient can be lowered by using various lubricants that can cause seizure problems. However, since it cannot withstand long-term use, surface treatment is performed. In order to prevent the above-mentioned seizure, it is necessary to harden the surface of the Ti alloy, which can be done by immersion elemental hardening, plating, or brazing.
溶射、拡散接合肉盛溶接法等種々の方法が試みられてい
るが、表面硬化層の硬度はビッカーズ硬度（Ｈｖ ）
１０００以上程度で従来品より焼付けに対し有効である
が、耐摩耗性の面で十分とは言い難い。Various methods have been tried, such as thermal spraying and diffusion bonding welding, but the hardness of the surface hardening layer is only Vickers hardness (Hv).
A value of about 1000 or more is more effective against seizure than conventional products, but it cannot be said to be sufficient in terms of wear resistance.
本発明は上記事情に鑑みてなされたもので、基材表面へ
のイオン注入並びにイオンミッシング法による成膜によ
り基材内部からの組成ギャップの少ない複合硬質材料を
製造する方法を提供することを目的とする。The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a method for manufacturing a composite hard material with a small composition gap from inside the base material by ion implantation onto the surface of the base material and film formation by the ion missing method. shall be.
［課題を解決するための手段と作用］
本発明者らは、耐酸化性のみを付与するためには、Ｔｆ
またはＴｉ合金の被覆層としてＴｉ −Ａｌ系の金属間
化合物膜を形成すれば良いのであるが、併せて耐摩耗性
を向上せしめるために耐摩耗、耐酸化性に優れている（
Ｔｉ−Ａ、＆）Ｎ又は（Ｔ ｉ −Ａｌ−Ｖ） Ｎの硬
質膜を被覆した複合硬質材料を開発した。[Means and effects for solving the problem] The present inventors believe that in order to impart only oxidation resistance, Tf
Alternatively, a Ti-Al intermetallic compound film may be formed as a Ti alloy coating layer, but it also has excellent wear resistance and oxidation resistance to improve wear resistance (
We have developed a composite hard material coated with a hard film of Ti-A, &)N or (Ti-Al-V)N.
本願第１の発明は、Ｔｉ又はＴｉ合金からなる基材の表
層内にイオン注入法によりＡｌ！イオン。The first invention of the present application provides Al! ion.
窒素イオ吃の少なくともいずれかを注入した後、その表
層上に（Ｔｉ−Ａｊｌｌ）Ｎ系の被膜を被覆することを
特徴とする複合硬質材料の製造方法である。This method of manufacturing a composite hard material is characterized in that after injecting at least one of nitrogen ions, a (Ti-Ajll)N-based film is coated on the surface layer of the material.
本願第２の発明は、Ｔｉ又はＴｉ合金からなる基材の表
層内にイオン注入法によりＡ、９イオン。A second invention of the present application is to inject A,9 ions into the surface layer of a base material made of Ti or a Ti alloy by an ion implantation method.
バナジウム（Ｖ）イオン、窒素イオンの少なくともいず
れかを注入した後、その表層上に（Ｔｉ−Ａρ）Ｎ系の
被膜を被覆することを特徴とする複合硬質材料の製造方
法である。This method of manufacturing a composite hard material is characterized in that after implanting at least one of vanadium (V) ions and nitrogen ions, the surface layer thereof is coated with a (Ti-Aρ)N-based film.
本発明において、Ｔｉ又はＴｉ合金の表層（イオン注入
層）にはＴ １−Ａｌ７系の金属間化合物が生成しても
良く、また窒化物層が生成されても良い。また、硬質窒
化膜被覆膜は、Ｔｉ、Ａｌまたは７ ｔ 、 Ａｆｔ
＋ ”を蒸着すると同時に、別のイオン諒より窒素イ
オンを照射するイオンビームミクシング法により成膜す
るもので、蒸着手段としてはターゲットを利用したイオ
ンビームスパッタ法（前者）と電子ビームによる真空蒸
着法（後者）を挙げることができる。ここで、前者の場
合、所定の化学組成を構成するＴｉ−Ａ１組成ターゲッ
トまたはＴｉ−Ａｌ７−Ｖ組成ターゲットを利用しても
よく、あるいはＴｉ、Ａｌ７及びＶ単体の金属ターゲッ
ト１こ順次スパッタイオンビームを照射して基材表面に
蒸着してもよい。一方、後者の場合、ダブルまたはトリ
プルハース方式によるＥＢ蒸着が通常利用される。In the present invention, a T1-Al7-based intermetallic compound or a nitride layer may be formed on the surface layer (ion-implanted layer) of Ti or Ti alloy. Further, the hard nitride film coating film is made of Ti, Al or 7t, Aft
The film is formed using an ion beam mixing method in which nitrogen ions are simultaneously deposited from a different ion source, and the deposition methods include ion beam sputtering using a target (the former) and vacuum evaporation using an electron beam. In the former case, a Ti-A1 composition target or a Ti-Al7-V composition target constituting a predetermined chemical composition may be used, or Ti, Al7 and V alone may be used. The metal target 1 may be sequentially irradiated with a sputter ion beam to deposit on the substrate surface.In the latter case, on the other hand, double or triple hearth EB deposition is usually used.
生成される硬質窒化物膜については単一の組成またはＶ
量を段階的もしくは連続的に増加させた組成構造を有す
ることも有効である。For the hard nitride film produced, a single composition or V
It is also effective to have a composition structure in which the amount is increased stepwise or continuously.
以下、本発明の実施例について比較例とともに説明する
。Examples of the present invention will be described below along with comparative examples.
［実施例１］
まず、基材として、寸法が３０Ｘ ３０Ｘ ２ ｍｍの
Ｔｉ又はＴ ｉ−６Ａ１−６Ａ合金板の片面を鏡面研磨
し、超音波洗浄を施した後、イオン照射と蒸着機能を備
えた真空チャンバ内のホルダに保持した。[Example 1] First, as a base material, one side of a Ti or Ti-6A1-6A alloy plate with dimensions of 30 x 30 x 2 mm was mirror-polished and subjected to ultrasonic cleaning, and then equipped with ion irradiation and vapor deposition functions. It was held in a holder in a vacuum chamber.
つづいて、このチャンバ内を５ Ｘ ｔｏ−６Ｔｏｒｒ
に真空引きした後、イオン源から加速電圧５ＫＶのＡｒ
イオンを引出し、前記板に照射して表面洗浄のための前
処理を施した。Next, the inside of this chamber was heated to 5 X to -6 Torr.
After evacuation to
Ions were extracted and irradiated onto the plate to pre-treat the surface for cleaning.
次いで、質量分離型イオン源から１イオンを引出し、加
速電圧１８０ＫｅＶ、 ビーム電流１．０＋ｗＡドー
ズｆｆｉ Ｉ Ｘ １０’７ｊｏｎｓ／ ｃｍ２でＡＪ
フイオン注入を行い、引き続き加速電圧１６０ＫｅＶ、
ビーム電流１５ｍＡ、 ドーズｍ ５ Ｘ １０
１７Ｉｏｎｓ／ ｃｍ２で窒素（Ｎイオン注入を行った
。Next, one ion was extracted from the mass-separated ion source and AJ was applied at an acceleration voltage of 180 KeV and a beam current of 1.0 + wA dose ffi I x 10'7 jons/cm2.
After ion implantation, the acceleration voltage was 160KeV,
Beam current 15mA, dose m 5 x 10
Nitrogen (N ion implantation) was performed at 17 Ions/cm2.
ひきつづき、同一真空チャンバー内で５０ａｔ％Ｔ １
−５０ａｔ％Ａｌのモザイクターゲット（Ｔｉターゲッ
ト上にＡｌチップを所定の組成相当量のせたもの）を使
用して、スパッターイオン源より加速電圧２．５ＫＶ、
イオン電流１．５Ａで引き出したＡｒイオンを照射し、
前記基材上にスパッタ蒸着すると同時に他のイオン源か
ら窒素イオンを加速電圧ＩＫＶ、イオン電流密度３０μ
Ａ／ｃｓ”の条件で引き出し、該スパッタ蒸着膜に照射
して厚さ約２μｍの（５０ａｔ％Ｔ ｉ −５０ａＬ％
Ａｌ）Ｎ組成を有する複合窒化膜を形成して複合硬質材
料を製造した。Continuing, 50 at% T 1 in the same vacuum chamber
- Using a 50 at% Al mosaic target (Al chips placed on a Ti target in an amount equivalent to a predetermined composition), an acceleration voltage of 2.5 KV was applied from a sputter ion source.
Irradiate Ar ions extracted with an ion current of 1.5A,
Nitrogen ions are sputter-deposited onto the base material at the same time from another ion source at an acceleration voltage of IKV and an ion current density of 30μ.
A/cs'' condition and irradiated the sputter-deposited film to form a film with a thickness of about 2 μm (50at%T i -50aL%
A composite hard material was manufactured by forming a composite nitride film having an Al)N composition.
しかして、実施例１の複合硬質材料を空気中にて８５０
℃まで昇温し、その後常温まで下げる急熱急冷操作を１
０回繰返す高温酸化試験を行い、試験後の各複合材料の
酸化に伴うｆｆ１ｆｆｉ変化及び外観を調べた。その結
果を、後掲する第１表に示す。Therefore, the composite hard material of Example 1 was exposed to 850°C in air.
1 rapid heating and cooling operation to raise the temperature to ℃ and then lower it to room temperature.
A high-temperature oxidation test was repeated 0 times, and changes in ff1ffi due to oxidation and appearance of each composite material after the test were investigated. The results are shown in Table 1 below.
［実施例２ゴ
まず、基材として、寸法が３０Ｘ ３０Ｘ ２ ｔａｉ
）５０ａｔ％Ｔ ｉ −５０ａｔ％Ａ１組成の金属間化
合物板材を用意し、実施例１と同様な前処理を施した。[Example 2] First, as a base material, the dimensions are 30X 30X 2
) An intermetallic compound plate material having a composition of 50 at% Ti -50 at% A1 was prepared and subjected to the same pretreatment as in Example 1.
次いで、質量分離型イオン源からＮイオンを引出し、加
速電圧！８０Ｋ ｅ Ｖ 、 ビーム電流１．５ｍＡ
。Next, N ions are extracted from the mass-separated ion source, and the accelerating voltage! 80K e V, beam current 1.5mA
.
ドーズ量５ ｘ ｔｏ”１ｏｎｓ／ ｃｍ’でＮイオン
注入を行った。N ion implantation was performed at a dose of 5 x to"1 ons/cm'.
ひきつづき、同一真空チャンバー内でトリプルハース方
式でＴｉ、Ａｌ１．ＶをＥＢ蒸着しながら同時に非分離
型のイオン源からＮイオンを引き出し、照射させながら
イオンミクシング成膜を行なった。この結果、膜厚は約
２μｍであった。なお、各金属の蒸着速度は、Ｔ ｉ
； ６．０入／ｓｅｅ 、 Ａ１１） ；１．７入
／ｓｅｅ 、 Ｖ ； ０．３入／ｓｅｅとし、窒素
イオンの照射は加速電圧１０ＫＶ、イオン電流密度０．
２ｍＡ／Ｃｌ１１２の条件で行なった。Subsequently, Ti, Al1. While V was being EB-evaporated, N ions were extracted from a non-separated ion source and ion mixing film formation was performed while irradiating the film. As a result, the film thickness was approximately 2 μm. Note that the vapor deposition rate of each metal is T i
; 6.0 in/see, A11) ; 1.7 in/see, V ; 0.3 in/see, and nitrogen ion irradiation was performed at an acceleration voltage of 10 KV and an ion current density of 0.
The test was carried out under the conditions of 2 mA/Cl112.
形成された窒化物膜の組成はｆｌ／２（７５ａｔ％Ｔｉ
−２１ａｔ％Ａｌ−４ａｔ％Ｖ）１５０％Ｎであること
が、ＥＰＭＡで成分量の確認、Ｘ線回折で単一層の確認
で明らかになっている。The composition of the formed nitride film is fl/2 (75 at% Ti
-21at%Al-4at%V)150%N was confirmed by confirming the component amount by EPMA and by confirming a single layer by X-ray diffraction.
しかして、実施例２の材料をｐｉｎ ｏｎ ｄｉｓｃ方
式の耐摩耗試験に供した。ここで、条件は、φ５ＩＩｆ
ｆｌルビーボール使用、加重２．５Ｎ、速度５．５ Ｘ
ｌ０−２ｍ５−’、回転数１０００で行った。その結果
を後掲する第２表に示す。また、連続酸化試験（空気中
。Therefore, the material of Example 2 was subjected to a pin-on-disc wear resistance test. Here, the condition is φ5IIf
fl Ruby ball used, weight 2.5N, speed 5.5X
The test was carried out at l0-2m5-' and 1000 rotations. The results are shown in Table 2 below. Also, continuous oxidation test (in air).
８００℃、 １０（ｌｈｒｓ）の結果も併せて第２表に
示す。The results at 800°C and 10 (lhrs) are also shown in Table 2.
［比較例１］
前記実施例１と同様に前処理されたＴｉ−６Ａｌ＋−４
ｖ合金板（寸法３０×３０×２１１１１）の表面に、直
接実施例１と同様な条件で、（５０ａＬ％Ｔ ｉ −５
０ａｔ％ＡＪ）Ｎ膜を約２μｍ成膜した材料を製造した
。[Comparative Example 1] Ti-6Al+-4 pretreated in the same manner as in Example 1
(50aL%T i -5
A material in which a 0at%AJ)N film was formed to a thickness of approximately 2 μm was manufactured.
［比較例２］
前記実施例１と同様に前処理されたＡｌ及びＮのイオン
注入がされたＴ ｉ −６Ａ、Ｑ−４Ｖ合金板（寸法３
０Ｘ ３０Ｘ ２−■）の表面に、実施例１と同一のモ
ザイクターゲットを使用し、窒素イオンの同時照射によ
るイオンビームミクシング作用のないイオンビームスパ
ッター法により５０ａｔ％Ｔ ｉ −５０ａｔ％ＡｌＩ
組成の約２μｍの金属間化合物被膜材を製造した。[Comparative Example 2] Ti-6A, Q-4V alloy plate pretreated in the same manner as in Example 1 and implanted with Al and N ions (dimension 3
0X 30X 2-■) using the same mosaic target as in Example 1, 50 at% Ti -50 at% AlI was applied by ion beam sputtering without ion beam mixing effect due to simultaneous irradiation with nitrogen ions.
An intermetallic compound coating material having a composition of about 2 μm was produced.
上記比較例１，２の複合材料を空気中にて８５０℃まで
昇温し、その後常温まで下げる急熱急冷操作を１０回繰
返す高温酸化試験を行い、試験後の各複合材料の酸化に
伴う重量変化及び外観を調べた。A high-temperature oxidation test was conducted in which the composite materials of Comparative Examples 1 and 2 were heated to 850°C in air and then lowered to room temperature, repeated 10 times. Changes and appearance were investigated.
その結果を、後掲する第１表に示す。The results are shown in Table 1 below.
［比較例３，４］
上記実施例２と同一寸法の２種類の片面鏡面研磨板材を
比較例として用意した。つまり、比較例３は５０ａｔ％
Ｔ １−５０ａｔ％Ａｊ７組成の金属間化合物板材、比
較例４はＴ １−ＢＡρ−４Ｖ合金板材である。[Comparative Examples 3 and 4] Two types of single-sided mirror-polished plate materials having the same dimensions as those of Example 2 were prepared as comparative examples. In other words, Comparative Example 3 is 50 at%
Comparative Example 4, which is an intermetallic compound plate having a composition of T 1-50 at% Aj7, is a T 1-BAρ-4V alloy plate.
しかして、比較例３．４の材料についても、実施例２と
同様な条件でｐｉｎ Ｏｎ ｄｊｓｃ方式の耐摩耗試験
、連続酸化試験を行ったところ、第２表に示す結果が得
られた。When the material of Comparative Example 3.4 was also subjected to a pin-on-djsc wear test and a continuous oxidation test under the same conditions as Example 2, the results shown in Table 2 were obtained.
第 表 ［発明の効果］ 以上詳述した如く本発明によれば、 基材表面へ のイオン注入並びにイオンミ クシング広による戊No. table [Effect of the invention] According to the present invention as detailed above, To the base material surface ion implantation and ion mi 戊 by Kushing Hiroshi
Claims (4)
注入法によりＡｌイオン，窒素イオンの少なくともいず
れかを注入した後、その表層上に（Ｔｉ−Ａｌ）Ｎ系の
被膜を被覆することを特徴とする複合硬質材料の製造方
法。(1) After injecting at least one of Al ions and nitrogen ions into the surface layer of a base material made of Ti or Ti alloy by ion implantation method, the surface layer is coated with a (Ti-Al)N-based film. A method for manufacturing a composite hard material characterized by:
タン，アルミニウムを蒸着すると同時にＮイオン照射を
行うイオンビームミクシング法により成膜する請求項１
記載の複合硬質材料の製造方法。(2) When producing the (Ti-Al)N-based film, the film is formed by an ion beam mixing method in which N ions are irradiated at the same time as titanium and aluminum are vapor-deposited.
A method of manufacturing the composite hard material described.
注入法によりＡｌイオン，バナジウムイオン，窒素イオ
ンの少なくともいずれかを注入した後、その表層上に（
Ｔｉ−Ａｌ）Ｎ系の被膜を被覆することを特徴とする複
合硬質材料の製造方法。(3) After implanting at least one of Al ions, vanadium ions, and nitrogen ions into the surface layer of the base material made of Ti or Ti alloy by ion implantation method, (
1. A method for producing a composite hard material, comprising coating with a Ti-Al)N-based film.
タン，アルミニウム，バナジウムを蒸着すると同時にＮ
イオン照射を行うイオンビームミクシング法により成膜
する請求項３記載の複合硬質材料の製造方法。(4) When producing the (Ti-Al)N-based film, titanium, aluminum, and vanadium are vapor-deposited and N
4. The method for manufacturing a composite hard material according to claim 3, wherein the film is formed by an ion beam mixing method that performs ion irradiation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31423989A JPH03177570A (en) | 1989-12-05 | 1989-12-05 | Production of combined hard material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31423989A JPH03177570A (en) | 1989-12-05 | 1989-12-05 | Production of combined hard material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03177570A true JPH03177570A (en) | 1991-08-01 |
Family
ID=18050963
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31423989A Pending JPH03177570A (en) | 1989-12-05 | 1989-12-05 | Production of combined hard material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03177570A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0584483A1 (en) * | 1992-08-11 | 1994-03-02 | Applied Materials, Inc. | Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
| US5695827A (en) * | 1991-07-01 | 1997-12-09 | Boeing North American, Inc. | Surface protection of gamma and alpha-2 titanium aluminides by ion implantation |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62199763A (en) * | 1986-02-25 | 1987-09-03 | Matsushita Electric Works Ltd | Formation of tin film |
| JPS63250454A (en) * | 1987-04-06 | 1988-10-18 | Hitachi Ltd | Corrosion-and wear resistant member and its production |
| JPS6465251A (en) * | 1987-09-07 | 1989-03-10 | Nippon Light Metal Co | Surface treatment of aluminum member |
| JPS6473069A (en) * | 1987-09-10 | 1989-03-17 | Nissin Electric Co Ltd | Production of aluminum nitride film |
| JPH01168857A (en) * | 1987-12-23 | 1989-07-04 | Agency Of Ind Science & Technol | Formation of titanium nitride film |
| JPH01212751A (en) * | 1988-02-19 | 1989-08-25 | Hitachi Ltd | Manufacture of transparent aluminum nitride film |
| JPH01215965A (en) * | 1988-02-23 | 1989-08-29 | Nissin Electric Co Ltd | Manufacture of tin film |
-
1989
- 1989-12-05 JP JP31423989A patent/JPH03177570A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62199763A (en) * | 1986-02-25 | 1987-09-03 | Matsushita Electric Works Ltd | Formation of tin film |
| JPS63250454A (en) * | 1987-04-06 | 1988-10-18 | Hitachi Ltd | Corrosion-and wear resistant member and its production |
| JPS6465251A (en) * | 1987-09-07 | 1989-03-10 | Nippon Light Metal Co | Surface treatment of aluminum member |
| JPS6473069A (en) * | 1987-09-10 | 1989-03-17 | Nissin Electric Co Ltd | Production of aluminum nitride film |
| JPH01168857A (en) * | 1987-12-23 | 1989-07-04 | Agency Of Ind Science & Technol | Formation of titanium nitride film |
| JPH01212751A (en) * | 1988-02-19 | 1989-08-25 | Hitachi Ltd | Manufacture of transparent aluminum nitride film |
| JPH01215965A (en) * | 1988-02-23 | 1989-08-29 | Nissin Electric Co Ltd | Manufacture of tin film |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5695827A (en) * | 1991-07-01 | 1997-12-09 | Boeing North American, Inc. | Surface protection of gamma and alpha-2 titanium aluminides by ion implantation |
| EP0584483A1 (en) * | 1992-08-11 | 1994-03-02 | Applied Materials, Inc. | Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
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