JPH02185964A - Composite material and production thereof - Google Patents
Composite material and production thereofInfo
- Publication number
- JPH02185964A JPH02185964A JP470389A JP470389A JPH02185964A JP H02185964 A JPH02185964 A JP H02185964A JP 470389 A JP470389 A JP 470389A JP 470389 A JP470389 A JP 470389A JP H02185964 A JPH02185964 A JP H02185964A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- base material
- surface layer
- composite material
- intermetallic compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002131 composite material Substances 0.000 title claims abstract description 28
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000010410 layer Substances 0.000 claims abstract description 41
- 239000000463 material Substances 0.000 claims abstract description 28
- 239000002344 surface layer Substances 0.000 claims abstract description 28
- 229910001069 Ti alloy Inorganic materials 0.000 claims abstract description 15
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910004349 Ti-Al Inorganic materials 0.000 claims abstract 5
- 229910004692 Ti—Al Inorganic materials 0.000 claims abstract 5
- 229910000765 intermetallic Inorganic materials 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 12
- -1 nitrogen ions Chemical class 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 229910021362 Ti-Al intermetallic compound Inorganic materials 0.000 claims description 3
- 238000009684 ion beam mixing Methods 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims 1
- 239000011229 interlayer Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 150000002500 ions Chemical class 0.000 abstract description 19
- 230000003647 oxidation Effects 0.000 abstract description 18
- 238000007254 oxidation reaction Methods 0.000 abstract description 18
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052593 corundum Inorganic materials 0.000 abstract description 6
- 230000001590 oxidative effect Effects 0.000 abstract description 6
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract description 6
- 238000005260 corrosion Methods 0.000 abstract description 5
- 230000007797 corrosion Effects 0.000 abstract description 5
- 230000001681 protective effect Effects 0.000 abstract description 4
- 230000004888 barrier function Effects 0.000 abstract description 2
- 238000009792 diffusion process Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 14
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 230000001133 acceleration Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 238000001659 ion-beam spectroscopy Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910010038 TiAl Inorganic materials 0.000 description 1
- 229910011208 Ti—N Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 230000004584 weight gain Effects 0.000 description 1
- 235000019786 weight gain Nutrition 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、主として自動車、航空宇宙産業分野に利用さ
れる基材がＴｉもしくはＴｉ合金からなる複合材料及び
その製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a composite material whose base material is made of Ti or a Ti alloy, which is mainly used in the automobile and aerospace industries, and a method for manufacturing the same.
［従来の技術及び課題］
Ｔｉ もしくはＴｉ合金は、耐食性に優れた軽量構造材
料として主に自動車、航空宇宙産業の分野での利用、拡
大が考えられてきた。しかしながら、かかるＴｉ もし
くはＴｉ合金は５００℃以上の温度範囲の酸化性雰囲気
中で酸化が激しく進行するという問題があった。[Prior Art and Problems] Ti or Ti alloys have been considered for use and expansion mainly in the fields of automobiles and aerospace industries as lightweight structural materials with excellent corrosion resistance. However, such Ti or Ti alloys have a problem in that oxidation proceeds rapidly in an oxidizing atmosphere at a temperature range of 500° C. or higher.
このようなことから、最近、軽量で耐酸化性の優れた高
強度耐熱材料としてＴｉ−Ａｌ１金属間化合物が注目さ
れている。Ｔｉ −Ａｌ金属間化合物は、高温での酸化
性雰囲気下で表面に保護被膜であるＡｌ２Ｏ３膜を生成
が起り、優れた耐酸化性を有する。こうしたＴｉ −Ａ
ｌ金属間化合物の侵れた物性及びＴｉ等と熱膨張係数が
近似している性質を利用して、前記Ｔｉ もしくはＴｉ
合金からなる基材上にＴｉ−ＡＪ？金属間化合物層を被
覆することによりＴｉ等の欠点である耐酸化性を改善し
た複合材料が考えられている。For these reasons, Ti-Al1 intermetallic compounds have recently attracted attention as a lightweight, high-strength heat-resistant material with excellent oxidation resistance. The Ti-Al intermetallic compound forms an Al2O3 film as a protective film on its surface in an oxidizing atmosphere at high temperatures, and has excellent oxidation resistance. Such Ti-A
l Taking advantage of the corrosive physical properties of intermetallic compounds and the property that their coefficient of thermal expansion is similar to that of Ti, etc., the above-mentioned Ti or Ti
Ti-AJ on a base material made of alloy? Composite materials are being considered that have improved oxidation resistance, which is a drawback of Ti and the like, by coating with an intermetallic compound layer.
しかしながら、上記構成の複合材料にあっては高温雰囲
気下でＴｉ −ＡｆＩ金属間化合物中のＡｌ成分が基材
であるＴｌ中に拡散し、金属間化合物層中のＡｌが次第
に減少してＴｉリッチの層となるため、高温での酸化性
雰囲気下でＴｌＯ２の生成が進行する。その結果、緻密
な保護被膜であるＡｌ２Ｏ３膜の生成効果が得られず、
酸化が急激に進行するという問題があった。However, in the composite material with the above structure, the Al component in the Ti-AfI intermetallic compound diffuses into the base material Tl in a high-temperature atmosphere, and the Al in the intermetallic compound layer gradually decreases, making it rich in Ti. As a result, the production of TlO2 progresses under an oxidizing atmosphere at high temperatures. As a result, the effect of forming an Al2O3 film, which is a dense protective film, could not be obtained.
There was a problem that oxidation progressed rapidly.
本発明は、上記従来の課題を解決するためになされたも
ので、軽量性、耐食性と共に優れた耐酸化性を有する複
合材料、及びかかる複合材料を簡単に製造し得る方法を
提供しようとするものである。The present invention was made to solve the above-mentioned conventional problems, and aims to provide a composite material that is lightweight, has excellent corrosion resistance, and excellent oxidation resistance, and a method for easily manufacturing such a composite material. It is.
［課題を解決するための手段］
本発明の複合材料は、Ｔｉ もしくはＴｉ合金からなる
基材の表層内部にＴｉＮ系層を形成すると共に、該表層
上部もしくは表層上にＴｉ −Ａｉｌ系金属間化合物層
を形成したことを特徴とするものである。[Means for Solving the Problems] The composite material of the present invention has a TiN-based layer formed inside the surface layer of a base material made of Ti or a Ti alloy, and a Ti-Ail-based intermetallic compound on the top of the surface layer or on the surface layer. It is characterized by forming layers.
上記Ｔｉ合金としテハ、例えばＴｌ−８Ａｌｌ −４Ｖ
等を挙げることができる。The above Ti alloy is used, for example, Tl-8All-4V.
etc. can be mentioned.
上記ＴｉＮ系層としては、例えばＴｉ Ｎ層、ＴｉＮに
一部ＡΩ、■成分が結合した（ＴｉＡｌ、Ｖ）Ｎ層等を
挙げることができる。Examples of the TiN-based layer include a TiN layer and a (TiAl, V)N layer in which a portion of AΩ and (2) components are bonded to TiN.
上記Ｔ！−Ａｌ系金属間化合物としては、例えばＴｉ−
ＡＪ７金属間化合物、Ｎ成分が一部固溶したＴｉ−ＡＮ
金属間化合物、■成分が一部固溶したＴｉ−／ｌ金属間
化合物、Ｎ及びＶ成分が一部固溶したＴｉ −Ａｊ？金
属間化合物等を挙げることができる。Above T! -Al-based intermetallic compounds include, for example, Ti-
AJ7 intermetallic compound, Ti-AN in which N component is partially dissolved
Intermetallic compound, Ti-/l intermetallic compound in which component (■) is partially dissolved in solid solution, Ti-Aj? in which N and V components are partially dissolved in solid solution. Examples include intermetallic compounds.
また、本発明の複合材料は前記表層上部もしくは表層上
にＴｉ−ＡＮ金属間化合物層が形成された基材表面に、
Ａ ｌ ２０３膜を更に被覆したものである。Further, the composite material of the present invention has a base material surface on which a Ti-AN intermetallic compound layer is formed on the upper surface layer or on the surface layer.
It is further coated with Al 203 film.
本発明の複合材料の製造方法は、Ｔｉ もしくは７．１
合金からなる基材に窒素イオンを注入して該基材の表層
内部にＴｉＮ系層を形成した後、該基材の表層上部もし
くは表層上にＴｉ−Ａｐ系金金属間化合物層形成するこ
とを特徴とするものである。The method for producing a composite material of the present invention is based on Ti or 7.1
After implanting nitrogen ions into a base material made of an alloy to form a TiN-based layer inside the surface layer of the base material, a Ti-Ap-based gold intermetallic compound layer is formed on or on the surface layer of the base material. This is a characteristic feature.
上記Ｔｉ −Ａｌ７系金属間化合物層を形成手段として
は、ＣＶＤ法やＰＶＤ法などの各種の蒸着法を採用し得
るが、特にＡｌイオンの直接的な注入法又はイオンミキ
シング法によるＴｉ −ＡＮ系金属間化合物層の形成は
密着性、結晶性及び組成の調整等の総合的な観点から好
適である。なお、後者のイオンミキシング法は、Ｔｉ又
はＡ４７の蒸着と共にＡｌｌ又はＴｉイオンを注入する
方法であり、蒸着手段としては真空蒸着法、電子ビーム
加熱法、スパッタリング法を採用し得る。Ｔｌ−Ａｌ１
系金属間化合物層を数μｍ程度と厚く形成する場合には
、前記Ａｌイオンの単独注入では十分な厚さＴｉ −Ａ
Ｎ系金属間化合物層を形成することが難しい。このよう
な場合には、イオンビームミキシングを採用することが
望ましい。Various vapor deposition methods such as CVD and PVD can be used to form the Ti-Al7-based intermetallic compound layer, but in particular, Ti-AN based intermetallic compound layer formed by direct Al ion implantation or ion mixing method can be used. Formation of an intermetallic compound layer is suitable from the comprehensive viewpoint of adhesion, crystallinity, composition adjustment, etc. Note that the latter ion mixing method is a method in which All or Ti ions are implanted together with the deposition of Ti or A47, and a vacuum deposition method, an electron beam heating method, or a sputtering method may be employed as the deposition method. Tl-Al1
When forming the intermetallic compound layer as thick as several μm, the single implantation of Al ions does not have enough thickness Ti-A.
It is difficult to form an N-based intermetallic compound layer. In such cases, it is desirable to employ ion beam mixing.
また、本発明の複合材料の製造方法は基材の表層を部も
しくは表層上にＴｉ −ＡｊＪ系金属間化合物層を形成
した後、更にイオンビームミキシング法によりＡＩ？２
０３膜を形成するものである。この場合、Ａｌ２Ｏ３膜
の形成に先だって酸化処理を施して表面にＡｊ１２０３
薄膜を形成し、この後に被覆されるＡＮ ２０３膜の密
着性を高めるようにしてもよい。In addition, in the method for manufacturing a composite material of the present invention, after forming a Ti-AjJ-based intermetallic compound layer on the surface layer of a base material, AI? 2
03 film is formed. In this case, prior to forming the Al2O3 film, oxidation treatment is performed to form Aj1203 on the surface.
A thin film may be formed to enhance the adhesion of the subsequently coated AN 203 film.
［作用］
本発明によれば、ＴｉもしくはＴｉ合金からなる基材の
表層内部にＴｉ Ｎ系層を形成すると共に、該表層上部
もしくは表層上にＴｉと熱膨張係数が近似したＴｉ −
Ａｆｆ系金属間化合物層を形成することによって、該金
属間化合物層を密着性よく形成でき、しかも高温雰囲気
下において前記Ｔｉ−／ｌ系金属間化合物中のＡｌｌ成
分が基材であるＴｉ もしくはＴｉ合金中に拡散するの
を前記表層内部に形成したＴｉＮ系層のバリア作用によ
り防止できる。その結果、金属間化合物層中の１の減少
を防止でき、高温での酸化性雰囲気下で緻密な保護波膜
であるＡｉ）２０ｓ膜を生成できるため、耐酸化性の優
れた複合材料を得ることができる。また、基材がＴｉも
しくはＴｉ合金から形成されているため、複合材料の軽
量化、耐食性を達成できる。更に、Ａ４１２０３膜を別
途被覆することによって耐酸化性をより一層向上できる
。[Function] According to the present invention, a TiN-based layer is formed inside the surface layer of a base material made of Ti or a Ti alloy, and a Ti-N layer having a thermal expansion coefficient similar to that of Ti is formed on the upper part of the surface layer or on the surface layer.
By forming the Aff-based intermetallic compound layer, the intermetallic compound layer can be formed with good adhesion, and moreover, in a high temperature atmosphere, the All component in the Ti-/l-based intermetallic compound is a base material of Ti or Ti. Diffusion into the alloy can be prevented by the barrier effect of the TiN-based layer formed inside the surface layer. As a result, it is possible to prevent the reduction of 1 in the intermetallic compound layer, and to produce a dense protective wave film, Ai)20s film, in an oxidizing atmosphere at high temperatures, resulting in a composite material with excellent oxidation resistance. be able to. Furthermore, since the base material is made of Ti or a Ti alloy, the composite material can be made lighter and has better corrosion resistance. Furthermore, by separately coating the A41203 film, the oxidation resistance can be further improved.
この場合、Ａｌ２２０３膜が何等かの原因によりクラッ
クが発生し、下地が酸化性雰囲気に曝されても前述した
ように耐酸化性の優れたＴｌ−１系金属間化合物層が形
成されているため、酸化の進行を防止できる。In this case, even if the Al2203 film cracks for some reason and the underlying layer is exposed to an oxidizing atmosphere, a Tl-1 intermetallic compound layer with excellent oxidation resistance is formed as described above. , can prevent the progress of oxidation.
一方、本発明によればＴｉもしくはＴｉ合金からなる基
材に窒素イオンを注入して該基材の表層内部にＴｉＮ系
層を形成した後、該基材の表層上部もしくは表層上にＴ
・ｌ−Ａｌ１系金属間化合物層を形成することによって
、既述した軽量性、耐食性と共に、耐酸化性の優れた複
合材料を簡単に製造することができる。On the other hand, according to the present invention, nitrogen ions are implanted into a base material made of Ti or a Ti alloy to form a TiN-based layer inside the surface layer of the base material, and then T
- By forming the l-Al1-based intermetallic compound layer, it is possible to easily produce a composite material that has excellent oxidation resistance as well as light weight and corrosion resistance as described above.
［実施例］ 以下、本発明の実施例を詳細に説明する。[Example] Examples of the present invention will be described in detail below.
実施例１
まず、基材としての５０Ｘ ５０Ｘ ２ ｍｍの寸法の
Ｔｉ板を用意し、この片面を鏡面研磨し、超音波洗浄、
乾燥を施した後、イオン照射と蒸着機能を備えた真空チ
ャンバ内のホルダに設置した。つづいて、このチャンバ
内を所定の真空度に真空引きした後、イオン源からＮイ
オンを加速電圧５ｋＶの条件でＴｉ板の鏡面に５分間照
射して表面清浄化のための前処理を施した。ひきつづき
、Ｎイオンを加速電圧１８（ｌｋＶ、イオン電流値３．
０ｍＡでＴｉ板にイオン注入し、Ｔｉ板板層層内部Ｔｉ
Ｎ層を形成した。次いで、５０ａｔ％Ｔｔ−５０ａｔ％
Ａｌの組成の金属間化合物ターゲットを用いてＡｒイオ
ンを加速電圧５ｋＶ、ビーム電流２．５ｍＡ／ｃシの条
件でイオンビームスパッタ蒸着を行なって厚さ２．０μ
ｍの５０ａｔ％Ｔｌ −５０ａｔ％Ａ、９金属間化合物
層を形成し、複合材料を製造した。Example 1 First, a Ti plate with dimensions of 50 x 50 x 2 mm was prepared as a base material, one side of the plate was mirror polished, ultrasonically cleaned,
After drying, it was placed in a holder in a vacuum chamber equipped with ion irradiation and vapor deposition functions. Next, after evacuating the chamber to a predetermined degree of vacuum, the mirror surface of the Ti plate was irradiated with N ions from an ion source at an acceleration voltage of 5 kV for 5 minutes to perform pretreatment for surface cleaning. . Continuing, N ions were accelerated at a voltage of 18 (lkV, ion current value of 3.
Ions are implanted into the Ti plate at 0 mA, and the Ti inside the Ti plate layer is
An N layer was formed. Then 50at%Tt-50at%
Using an intermetallic compound target with a composition of Al, Ar ions were deposited by ion beam sputtering at an acceleration voltage of 5 kV and a beam current of 2.5 mA/c to a thickness of 2.0 μm.
A composite material was produced by forming 9 intermetallic compound layers of 50 at% Tl - 50 at% A.
比較例１
実施例１と同様にＴｉ板の片面を鏡面研磨し、超音波洗
浄、乾燥、イオンクリーニングを施した後、５０ａ［％
Ｔｌ−５０ａｔ％ＡΩの組成の金属間化合物ターゲット
を用いてＡ「イオンを加速電圧５ｋＶ、ビーム電流２．
５ｍＡ／ｃ−の条件で該Ｔｉ板に直接イオンビームスパ
ッタ蒸着を行なって厚さ２．０μｍの５０ａｔ％Ｔｌ−
５０８ｔ％Ａｆｉ金属間化合物層を形成し、複合材料を
製造した。Comparative Example 1 Similar to Example 1, one side of a Ti plate was mirror-polished, subjected to ultrasonic cleaning, drying, and ion cleaning.
Using an intermetallic compound target with a composition of Tl-50 at% AΩ, A' ions were accelerated at a voltage of 5 kV and a beam current of 2.
Direct ion beam sputter deposition was performed on the Ti plate under the condition of 5 mA/c- to deposit 50 at% Tl- to a thickness of 2.0 μm.
A 508t% Afi intermetallic compound layer was formed to produce a composite material.
本実施例１及び比較例１により得られた複合材料を空気
中にて８５０℃、５時間の酸化試験を行なったところ、
下記第１表に示す結果を得た。The composite materials obtained in Example 1 and Comparative Example 1 were subjected to an oxidation test at 850°C for 5 hours in air.
The results shown in Table 1 below were obtained.
第１表
上記第１表から明らかなように本実施例１の複合材料は
比較例１の複合材料に比べて耐酸化性が極めて優れてい
ることがわかる。Table 1 As is clear from Table 1 above, the composite material of Example 1 is found to have extremely superior oxidation resistance compared to the composite material of Comparative Example 1.
実施例２
基材としての３０Ｘ ５０Ｘ ２關の寸法のＴ Ｉ−８
Ａｆｉ−４Ｖ合金板を用意し、この片面を前記実施例１
と同様な方法により前処理、Ｎイオンの注入による表層
内部にＴｉＮ層を形成した。つづいて、Ｔｉ及びＡｆｉ
をダブルハース方式の電子ビーム蒸着を行ない、前記Ｔ
ｉ合金板表面に厚さ２．５μｍの５０ａｔ％Ｔｉ−５０
ａｔ％／ｌの組成の金属間化合物層を形成した。次いで
、Ａｐの真空蒸着と同時にイオン源より酸素イオンを加
速電圧１０ｋＶ、イオン電流密度０．５ｍＡ／ｃシでイ
オン注入して厚さ３．０μｍのＡｌ２Ｏ３膜を形成し、
複合材料を製造した。Example 2 T I-8 with dimensions of 30X 50X 2 as base material
An Afi-4V alloy plate was prepared, and one side of the plate was prepared in accordance with Example 1.
A TiN layer was formed inside the surface layer by pretreatment and N ion implantation using the same method as described above. Next, Ti and Afi
The above-mentioned T
i 50 at% Ti-50 with a thickness of 2.5 μm on the surface of the alloy plate
An intermetallic compound layer having a composition of at%/l was formed. Next, simultaneously with the vacuum evaporation of Ap, oxygen ions were implanted from an ion source at an acceleration voltage of 10 kV and an ion current density of 0.5 mA/c to form an Al2O3 film with a thickness of 3.0 μm.
A composite material was produced.
比較例２
実施例２と同様なＴｉ合金板の片面を前記実施例１と同
様な方法により前処理した後、Ａｌの真空蒸着と同時に
イオン源より酸素イオンを加速電圧１０ｋＶ、イオン電
流密度０．５ｍＡ／ｃ−でイオン注入するイオンビーム
ミキシング法によりＴｉ合金板表面に厚さ３．０μｍの
Ａ、Ｑ２０３膜を直接形成し、複合材料を製造した。Comparative Example 2 One side of the same Ti alloy plate as in Example 2 was pretreated in the same manner as in Example 1, and at the same time as vacuum evaporation of Al, oxygen ions were applied from an ion source at an acceleration voltage of 10 kV and an ion current density of 0. A 3.0 μm thick A, Q203 film was directly formed on the surface of a Ti alloy plate by an ion beam mixing method in which ions were implanted at 5 mA/c- to produce a composite material.
′本実施例２及び比較例２により得られた複合材料を空
気中にて８００℃、２時間の酸化試験を１０回繰返し行
なった。この試験後での各複合材料の酸化増量及び外観
を下記第２表に示す。'The composite materials obtained in Example 2 and Comparative Example 2 were subjected to an oxidation test at 800° C. for 2 hours in air 10 times. The oxidation weight gain and appearance of each composite material after this test are shown in Table 2 below.
第２表 手続補正 平成Table 2 procedural amendment Heisei
Claims (4)
にＴｉＮ系層を形成すると共に、該表層上部もしくは表
層上にＴｉ−Ａｌ系金属間化合物層を形成したことを特
徴とする複合材料。(1) A composite material characterized in that a TiN-based layer is formed inside the surface layer of a base material made of Ti or a Ti alloy, and a Ti-Al-based intermetallic compound layer is formed on or above the surface layer.
化合物層が形成された基材表面に、Ａｌ＿２Ｏ＿３膜を
更に被覆したことを特徴とする請求項１記載の複合材料
。(2) The composite material according to claim 1, wherein the surface of the base material on which the Ti-Al intermetallic compound layer is formed on or above the surface layer is further coated with an Al_2O_3 film.
ンを注入して該基材の表層内部にＴｉＮ系層を形成した
後、該基材の表層上部もしくは表層上にＴｉ−Ａｌ系金
属間化合物層を形成することを特徴とする複合材料の製
造方法。(3) After implanting nitrogen ions into a base material made of Ti or a Ti alloy to form a TiN-based layer inside the surface layer of the base material, a Ti-Al-based metal interlayer is formed on the upper surface layer or on the surface layer of the base material. A method for producing a composite material, comprising forming a compound layer.
金属間化合物層を形成した後、更にイオンビームミキシ
ング法によりＡｌ＿２Ｏ＿３膜を形成することを特徴と
する請求項３記載の複合材料の製造方法。(4) The composite material according to claim 3, characterized in that after forming the Ti-Al intermetallic compound layer on the upper surface layer or on the surface layer of the base material, an Al_2O_3 film is further formed by an ion beam mixing method. Production method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP470389A JPH068505B2 (en) | 1989-01-13 | 1989-01-13 | Composite material and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP470389A JPH068505B2 (en) | 1989-01-13 | 1989-01-13 | Composite material and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02185964A true JPH02185964A (en) | 1990-07-20 |
| JPH068505B2 JPH068505B2 (en) | 1994-02-02 |
Family
ID=11591241
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP470389A Expired - Lifetime JPH068505B2 (en) | 1989-01-13 | 1989-01-13 | Composite material and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH068505B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100321613B1 (en) * | 1999-09-15 | 2002-01-31 | 권문구 | Multilayer ion-coating method being fluorine compound on metal surface |
-
1989
- 1989-01-13 JP JP470389A patent/JPH068505B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100321613B1 (en) * | 1999-09-15 | 2002-01-31 | 권문구 | Multilayer ion-coating method being fluorine compound on metal surface |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH068505B2 (en) | 1994-02-02 |
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