JPH0316612U - - Google Patents
Info
- Publication number
- JPH0316612U JPH0316612U JP7815989U JP7815989U JPH0316612U JP H0316612 U JPH0316612 U JP H0316612U JP 7815989 U JP7815989 U JP 7815989U JP 7815989 U JP7815989 U JP 7815989U JP H0316612 U JPH0316612 U JP H0316612U
- Authority
- JP
- Japan
- Prior art keywords
- film forming
- substrate
- thin film
- nozzle
- discharge port
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010408 film Substances 0.000 claims description 9
- 239000010409 thin film Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 4
- 239000002994 raw material Substances 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000003595 mist Substances 0.000 claims 1
- 238000002791 soaking Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Non-Insulated Conductors (AREA)
- Manufacturing Of Electric Cables (AREA)
Description
第1図は、本考案の実施例を示す霧化薄膜形成
装置の概略縦断側面図、第2図は、第1図のA−
A線断面図、第3図〜第5図は、他の実施例を示
す霧化薄膜形成装置の概略縦断側面図、第6図は
、従来例を示す霧化薄膜形成装置の概略縦断側面
図、第7図は、第6図で示した装置における基板
の成膜室での位置と成膜速度との関係の概略を示
すグラフである。 1…霧化器、3…成膜用ノズル、3a…成膜用
ノズルの吐出口、4…成膜室、7…均熱板、8…
ヒータ。
装置の概略縦断側面図、第2図は、第1図のA−
A線断面図、第3図〜第5図は、他の実施例を示
す霧化薄膜形成装置の概略縦断側面図、第6図は
、従来例を示す霧化薄膜形成装置の概略縦断側面
図、第7図は、第6図で示した装置における基板
の成膜室での位置と成膜速度との関係の概略を示
すグラフである。 1…霧化器、3…成膜用ノズル、3a…成膜用
ノズルの吐出口、4…成膜室、7…均熱板、8…
ヒータ。
Claims (1)
- 薄膜の原料溶液を霧化する霧化器1と、原料溶
液の霧の吐出口3aを上方に向けて開口させた成
膜用ノズル3と、同成膜用ノズル3の吐出口3a
の上を通過するよう一方向に搬送される基板6を
天面とする成膜室4と、成膜室4にある上記基板
6を加熱する手段とからなる霧化薄膜形成装置に
おいて、霧化器1に接続された成膜用ノズル3を
各々有する成膜室4が、上記基板6が搬送される
方向に複数連ねて配置されていることを特徴とす
る霧化薄膜形成装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989078159U JPH0745846Y2 (ja) | 1989-06-30 | 1989-06-30 | 霧化薄膜形成装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989078159U JPH0745846Y2 (ja) | 1989-06-30 | 1989-06-30 | 霧化薄膜形成装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0316612U true JPH0316612U (ja) | 1991-02-19 |
JPH0745846Y2 JPH0745846Y2 (ja) | 1995-10-18 |
Family
ID=31621182
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989078159U Expired - Lifetime JPH0745846Y2 (ja) | 1989-06-30 | 1989-06-30 | 霧化薄膜形成装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0745846Y2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7067337B2 (en) | 1996-05-15 | 2006-06-27 | Seiko Epson Corporation | Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6169961A (ja) * | 1984-09-13 | 1986-04-10 | Agency Of Ind Science & Technol | 霧化薄膜作製装置用ノズル |
-
1989
- 1989-06-30 JP JP1989078159U patent/JPH0745846Y2/ja not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6169961A (ja) * | 1984-09-13 | 1986-04-10 | Agency Of Ind Science & Technol | 霧化薄膜作製装置用ノズル |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7067337B2 (en) | 1996-05-15 | 2006-06-27 | Seiko Epson Corporation | Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device |
Also Published As
Publication number | Publication date |
---|---|
JPH0745846Y2 (ja) | 1995-10-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA2127867A1 (en) | Apparatus and method for depositing particulate material in a composite substrate | |
JPS63149288U (ja) | ||
EP0109224A3 (en) | Rotary liquid sprayer | |
EP0415253B1 (en) | Thin film forming apparatus | |
JPH0316612U (ja) | ||
JPH0316613U (ja) | ||
JPH0247540B2 (ja) | ||
JPH0390578A (ja) | 薄膜形成装置 | |
JPH0418434U (ja) | ||
JPS5735964A (ja) | Tofusochi | |
JPH01174920U (ja) | ||
JPS61115137U (ja) | ||
JPH03291382A (ja) | 霧化薄膜形成装置 | |
JPS62199942U (ja) | ||
JPH02133475U (ja) | ||
JPS6321359Y2 (ja) | ||
JPS5987077A (ja) | 超微粒子の膜形成法 | |
JPS62127336U (ja) | ||
GB1113627A (en) | Improvements relating to evaporators and methods of drying milk or the like | |
JPS63144878U (ja) | ||
JPS639252U (ja) | ||
JPH03102256U (ja) | ||
JPS63105143U (ja) | ||
JPH05214541A (ja) | 薄膜形成装置 | |
JPS62110267U (ja) |