JPH03145782A - Semiconductor laser device - Google Patents
Semiconductor laser deviceInfo
- Publication number
- JPH03145782A JPH03145782A JP28447689A JP28447689A JPH03145782A JP H03145782 A JPH03145782 A JP H03145782A JP 28447689 A JP28447689 A JP 28447689A JP 28447689 A JP28447689 A JP 28447689A JP H03145782 A JPH03145782 A JP H03145782A
- Authority
- JP
- Japan
- Prior art keywords
- laser device
- semiconductor laser
- gaas substrate
- buried part
- thermal conductivity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 239000000126 substance Substances 0.000 claims 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract description 14
- 239000000463 material Substances 0.000 abstract description 4
- 238000002844 melting Methods 0.000 abstract description 2
- 230000008018 melting Effects 0.000 abstract description 2
- 238000000034 method Methods 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Landscapes
- Semiconductor Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は各種光源として用いられる半導体レーザ装置
の構造に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to the structure of a semiconductor laser device used as various light sources.
[従来の技術]
第2図は従来の半導体レーザ装置を示1−断面図で、図
において、(1)はブロック、(2)は電極A、(3)
はGaAs基板、(5)はエピタキシャル成長層、5a
はエピタキシャル成長層(5)のうちの活性層、(6)
は電極Bである。[Prior Art] Fig. 2 is a cross-sectional view of a conventional semiconductor laser device, in which (1) is a block, (2) is an electrode A, and (3) is a block.
is a GaAs substrate, (5) is an epitaxial growth layer, 5a
is the active layer of the epitaxial growth layer (5), (6)
is electrode B.
次に動作について説明する、1電棒A(2)及び電極B
(6)より注入された電子及び正孔は、活性層(5a)
の中で再結合し発光する。この発光と共に発生する熱を
GaAs基板(3)、ブロック(1)を伝わって外部へ
逃がすことにより、活性層(5a)の温度上昇を抑制し
て、半導体レーザ装置の信頼性を向上させる。Next, the operation will be explained, 1 electric rod A (2) and electrode B
(6) The electrons and holes injected from the active layer (5a)
They recombine inside and emit light. By dissipating the heat generated along with this light emission to the outside through the GaAs substrate (3) and the block (1), the temperature rise of the active layer (5a) is suppressed and the reliability of the semiconductor laser device is improved.
[発明が解決しようとする課題]
従来の半導体レーザ装置は以」二のように構成されてい
たので、熱の拡散はほとんど[i a A s基板の熱
伝導に支配されており、従って熱の拡散が不七分である
ため活性層が劣化するなどの問題点がありだ。[Problems to be Solved by the Invention] Since the conventional semiconductor laser device was configured as described below, the diffusion of heat is mostly dominated by the thermal conduction of the substrate, and therefore the thermal diffusion is Since the diffusion is uneven, there are problems such as deterioration of the active layer.
この発明はF記のような問題点を解消するためになされ
たもので、活性層で発生した熱を効率良く外部へ逃がし
信頼性の高い゛稔導体レーザ装置を得ることを目的とす
る。This invention was made in order to solve the problems mentioned in F, and aims to provide a highly reliable "fertile conductor laser device" by efficiently dissipating the heat generated in the active layer to the outside.
1課題を解決するだめのf段]
この発明に係る半導体レーザ装置は、L; a A S
基板に穴を形成し、その穴にGaAs基板より高熱伝導
性の物質を埋込んだものである。f-stage to solve the problem] The semiconductor laser device according to the present invention has L; a A S
A hole is formed in the substrate, and a material with higher thermal conductivity than the GaAs substrate is filled in the hole.
[作用]
(1)
(2)
この発明における半導体レーザ装置は、GaAs基板の
中にこの基板より高熱伝導性の部分を設けることにより
、活性層にて発生した熱はより早く外部へ拡散され、そ
の信頼性も向上する。[Function] (1) (2) In the semiconductor laser device of the present invention, heat generated in the active layer is diffused to the outside more quickly by providing a portion in the GaAs substrate that has higher thermal conductivity than the substrate. Its reliability also improves.
[実施例]
以下、この発明の一実施例を図について説明する。第1
図において、(1)はブロック、(2)は電極A、(3
)はGaAs基板、(4)は埋込部、(5)はエピタキ
シャル成長層、(5a)は活性層、(6)は電極Bであ
る。[Example] Hereinafter, an example of the present invention will be described with reference to the drawings. 1st
In the figure, (1) is the block, (2) is the electrode A, (3
) is a GaAs substrate, (4) is a buried portion, (5) is an epitaxial growth layer, (5a) is an active layer, and (6) is an electrode B.
次に動作について説明する。Next, the operation will be explained.
電極A(2)及び電8jB (6)より注入された電子
及び正孔は活性層(5a)の中で再結合し、発光する。Electrons and holes injected from the electrode A (2) and the electrode 8jB (6) recombine in the active layer (5a) and emit light.
この発光と共に発生する熱は、GaAs基板(3)及び
埋込部(4)、さらにブロック(1)を伝わって外部へ
逃げる。このとき、埋込部(4)に高熱伝導性の物質を
用いれば、放熱はより早くなり、半導体レーザ装置の信
頼性向上に繋がる。なお、このときGaAs基板(3)
と埋込部(4)とは、密着性が良い程、放熱は良いので
、GaAs基板(3)に(3)
形成した穴に、融液を流し込み、固化させて用いる。埋
込部(4)の材料としては、その融点、熱伝導度から考
えて、In、Na、Liなどか適している。The heat generated with this light emission travels through the GaAs substrate (3), the embedded portion (4), and further through the block (1) and escapes to the outside. At this time, if a highly thermally conductive material is used for the buried portion (4), heat radiation will be faster, leading to improved reliability of the semiconductor laser device. In addition, at this time, the GaAs substrate (3)
The better the adhesion between the and the embedded part (4), the better the heat dissipation, so the melt is poured into the hole formed in the GaAs substrate (3) and solidified before use. Suitable materials for the embedded portion (4) include In, Na, and Li in view of their melting point and thermal conductivity.
なお、ト記実施例ではGaAs基板(3)を使用した場
合を示したが、他の半導体基板であっても良いことは言
うまでもない。Incidentally, in the embodiment described above, a case is shown in which a GaAs substrate (3) is used, but it goes without saying that other semiconductor substrates may be used.
[発明の効果]
以上のようにこの発明によれば、半導体基板の中に、高
熱伝導の埋込部を設けたので、放熱が良くなり、信頼性
の高い半導体レーザ装置が14gられる効果がある。[Effects of the Invention] As described above, according to the present invention, since the embedded portion with high thermal conductivity is provided in the semiconductor substrate, heat dissipation is improved, and a highly reliable semiconductor laser device has the effect of weighing 14g. .
第1図はこの発明の一実施例による半導体レーザ装置を
示す断面図、第2図は従来の半導体レーザ装置を示す断
面図である。図において、(1)はブロック、(2)は
電極A、(3)はGaAs基板、(4)は埋込部、(5
)はエピタキシャル成長層、(6)は電極Bである。
なお、図中、同一符号は同一、又は相当部分を不ず。FIG. 1 is a sectional view showing a semiconductor laser device according to an embodiment of the present invention, and FIG. 2 is a sectional view showing a conventional semiconductor laser device. In the figure, (1) is the block, (2) is the electrode A, (3) is the GaAs substrate, (4) is the embedded part, and (5)
) is an epitaxial growth layer, and (6) is an electrode B. In addition, the same reference numerals do not refer to the same or corresponding parts in the figures.
Claims (1)
置において、前記半導体基板の中にこの半導体基板より
熱伝導性の良い物質を埋込んだことを特徴とする半導体
レーザ装置。1. A semiconductor laser device in which necessary layers are formed on a semiconductor substrate, characterized in that a substance having better thermal conductivity than that of the semiconductor substrate is embedded in the semiconductor substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28447689A JPH03145782A (en) | 1989-10-31 | 1989-10-31 | Semiconductor laser device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28447689A JPH03145782A (en) | 1989-10-31 | 1989-10-31 | Semiconductor laser device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03145782A true JPH03145782A (en) | 1991-06-20 |
Family
ID=17679017
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28447689A Pending JPH03145782A (en) | 1989-10-31 | 1989-10-31 | Semiconductor laser device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03145782A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013243169A (en) * | 2012-05-17 | 2013-12-05 | Japan Oclaro Inc | Semiconductor photonic device and optical module |
-
1989
- 1989-10-31 JP JP28447689A patent/JPH03145782A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013243169A (en) * | 2012-05-17 | 2013-12-05 | Japan Oclaro Inc | Semiconductor photonic device and optical module |
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