JPH03115658U - - Google Patents

Info

Publication number
JPH03115658U
JPH03115658U JP1990024083U JP2408390U JPH03115658U JP H03115658 U JPH03115658 U JP H03115658U JP 1990024083 U JP1990024083 U JP 1990024083U JP 2408390 U JP2408390 U JP 2408390U JP H03115658 U JPH03115658 U JP H03115658U
Authority
JP
Japan
Prior art keywords
electron beam
crucible
electromagnet
accelerated
beam source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1990024083U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0726359Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2408390U priority Critical patent/JPH0726359Y2/ja
Priority to US07/557,095 priority patent/US5034590A/en
Priority to EP19900114411 priority patent/EP0411482A3/en
Priority to KR1019900011706A priority patent/KR960005808B1/ko
Publication of JPH03115658U publication Critical patent/JPH03115658U/ja
Application granted granted Critical
Publication of JPH0726359Y2 publication Critical patent/JPH0726359Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP2408390U 1989-08-02 1990-03-09 電子ビーム蒸着用電子銃 Expired - Lifetime JPH0726359Y2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2408390U JPH0726359Y2 (ja) 1990-03-09 1990-03-09 電子ビーム蒸着用電子銃
US07/557,095 US5034590A (en) 1989-08-02 1990-07-25 Electron gun arrangement for use in the electron beam evaporation process
EP19900114411 EP0411482A3 (en) 1989-08-02 1990-07-27 Electron gun arrangement for use in the electron beam evaporation process
KR1019900011706A KR960005808B1 (ko) 1989-08-02 1990-07-31 전자비임 증착용 전자총

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2408390U JPH0726359Y2 (ja) 1990-03-09 1990-03-09 電子ビーム蒸着用電子銃

Publications (2)

Publication Number Publication Date
JPH03115658U true JPH03115658U (enrdf_load_stackoverflow) 1991-11-29
JPH0726359Y2 JPH0726359Y2 (ja) 1995-06-14

Family

ID=31527057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2408390U Expired - Lifetime JPH0726359Y2 (ja) 1989-08-02 1990-03-09 電子ビーム蒸着用電子銃

Country Status (1)

Country Link
JP (1) JPH0726359Y2 (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0726359Y2 (ja) 1995-06-14

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