JPH0311004B2 - - Google Patents

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Publication number
JPH0311004B2
JPH0311004B2 JP62249264A JP24926487A JPH0311004B2 JP H0311004 B2 JPH0311004 B2 JP H0311004B2 JP 62249264 A JP62249264 A JP 62249264A JP 24926487 A JP24926487 A JP 24926487A JP H0311004 B2 JPH0311004 B2 JP H0311004B2
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JP
Japan
Prior art keywords
film
magnetic
sio
lubricant
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP62249264A
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Japanese (ja)
Other versions
JPS63119019A (en
Inventor
Takeo Hinobayashi
Akira Isori
Hiroyasu Oda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
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Priority to JP24926487A priority Critical patent/JPS63119019A/en
Publication of JPS63119019A publication Critical patent/JPS63119019A/en
Publication of JPH0311004B2 publication Critical patent/JPH0311004B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は、超高密度記録に適し、耐久性、耐摩
耗性が高く高信頼性の磁気デイスク媒体に関する
ものである。 一般に情報処理装置の外部記憶装置として使用
される磁気デイスク装置用の磁気記録媒体は、情
報量の増加に伴つて増々記録密度の向上と高信頼
性が要求されている。 記録密度の向上に関しては、磁気デイスクの表
面に付着する磁性膜の高保磁力化、高磁束密度化
等の磁気特性の改善と、磁性膜自体の薄膜化、更
には電磁変換特性を向上させるための磁気ヘツド
と磁気記録媒体の磁性膜の間隔(以下スペーシン
グと称する。)を挾くし、スペーシング・ロスを
小さくする必要があるため、磁性膜面は表面あら
さ、突起等をなくした平滑性の良い事が要求され
ている。 このような高記録密度化を指向した磁気デイス
クとしては、従来より一般的に使用されている磁
性粉とバインダを含む、塗布型の磁性膜から、バ
インダを含まない連続的な磁性膜(連続磁性媒
体)が磁気蓄積エネルギーが高く有利である事か
ら鉄や鉄コバルト系合金を真空中、アルゴンガス
あるいはアルゴンガス中に酸素を混合した雰囲気
中で、スパツタ法や、蒸着法により非磁性基板上
に連続的に付着させたフエライト酸化物磁性膜
(以下フエライト酸化膜と称する。)、金属磁性膜
が種々の方法で提案されている。 また電着法による磁性膜の作成も従来より一般
に行なわれている。これらの方法で作成された磁
気記録媒体は高記録密度媒体とし優れた特性を有
するものが得られており、特にフエライト酸化物
膜は材質的にも硬く、また腐食性が良く磁気記録
媒体としては非常に良好なものとして評価されて
いる。 このように従来より磁性膜としての特性は非常
に良好となつており、このようにして出来た磁気
記録媒体は実際の使用条件に耐うるように磁気ヘ
ツドの摺動に対する充分な耐久性、耐摩耗性を向
上させるための磁性膜表面に処理を施す事が重要
な課題となつている。 すなわち、磁気デイスク装置においては通常動
作時においては磁気記録体の磁性膜面上を磁気ヘ
ツドが浮上し、磁気ヘツドは直接磁性膜と接触す
ることはないが記録密度の向上に伴つてスペーシ
ングを小さくするために低浮上量化が必要とな
り、また最近は磁気デイスク媒体の回転開始時
と、停止時に磁気ヘツドが磁気記録媒体と摺動接
触する形式、すなわちコンタクトスタートストツ
プ(以下CSS方法と称する。)方式が採用される
ようになつているため充分な耐久性と耐摩耗性が
要求されるようになつている。 このような磁気記録媒体の耐久性、耐摩耗性を
向上させる方法として従来より以下の方法が採用
されている。 1つの方法は、磁気記録媒体上に直接潤滑膜を
形成して磁気ヘツドと磁気記録媒体との摺動に対
する摩擦を小さくする方法が行なわれている。 例えば磁気デイスク表面に潤滑剤として
KryToxAD(デユポン社商標)の稀釈液を塗布す
る事により、記録媒体表面が滑性となり、磁気ヘ
ツドの摺動に対して、摩耗を小さくし、耐摩耗性
を向上させる事が行なわれている。 磁気記録媒体の表面、すなわち磁性膜面の平滑
性が非常に良好なため磁気ヘツドが記録媒体に吸
着する現象が発生してしまう。ここで吸着とは磁
気ヘツドがデイスク面に付着する現象を意味す
る。この吸着は潤滑剤を介在物とする一種の接着
でありCSS方式においては摺動接触時にステツク
スリツプ(Stick−Slip)を伴なうため、短時間
においてヘツドクラツシユを誘発させ、磁気ヘツ
ドの破損、磁性表面にキズを付ける等の原因とな
つている。 このように磁気記録媒体表面に潤滑剤を塗布す
る事は摩擦力を低下させるが、逆に吸着現象を生
じさせるために記録媒体表面の耐摩耗性を向上さ
せる事にはそれほど大きな効果を上げる事が出来
なかつた。 尚このヘツドステイツクは潤滑剤を薄く磁気記
録媒体上に塗布する事により軽減出来るが、逆に
摩擦力の低下という面から考えるとそれほどの効
果が期待出来ず、またこの潤滑剤の膜厚のコント
ロールは、膜厚の可変範囲が小さいために再現
性、製造性に欠け量産工程においては不可能に近
いものである。 また磁気記録媒体表面の耐摩耗性を向上させる
ための他の方法として、磁性膜上に保護膜を形成
する方法が従来より金属磁性膜で行なわれ多くの
保護膜材が提案されている。 しかし、一般に金属磁性膜の場合の保護膜は耐
摩耗性の他に耐食性を向上させる目的も兼ねてお
り、300Å以下の保護膜では、保護膜にピンホー
ルが生じるために耐食性に対する効果が期待出来
ないため通常は400Å〜800Åの膜厚の保護膜を使
用している。 またこの保護膜の上に潤滑剤を塗布する事も行
なわれている。確かに保護膜の耐摩耗性は実用レ
ベルにまで達するが上述したようにこのような膜
厚の大きい保護膜を使用すると、スペーシングロ
スが問題となり、本来の磁性膜の性能を発揮する
事が出来なかつた。 また仮に保護膜を耐食性を考えずに薄くしたと
しても保護膜が400Å以下においては著るしく耐
摩耗性が低下してしまう欠点があつた。 従つて本発明は上記欠点を解消した新規な磁気
デイスク媒体を提供する事を目的とするものでこ
の目的は、磁性膜の形成されたデイスク表面に、
30〜200Å厚の無機化合物薄膜をスパツタ等の真
空技術を用いて形成することにより該無機化合物
薄膜が前記磁性膜全体を覆うのでは無く点在させ
て形成し、さらにその表面に潤滑剤膜を形成して
構成したことを特徴とする磁気デイスク媒体によ
り達成する事が出来る。 以下実施例を基に本発明を説明する。 第1図は、本発明に係る磁気デイスク媒体の特
性を示すもので、横軸に無機化合物薄膜(SiO2
の膜厚、縦軸に摺動回数を示す。 摺動回数は磁気記録媒体(円板状)表面上にア
ルミナから成るヘツドスライダ(テーパフラツト
型)を配置し、媒体を低速で回転させ(周速40〜
80cm/S)る加速した摩耗試験で媒体表面にキズ
が生じる迄のヘツド通過回数を示す。ヘツドの荷
重は20g/mm2である。 したがつて摺動回数大なるほど耐摩耗性が良い
ことを示す。 第1図中実線で示したものはクライトツクス
(KryTox)143AD(デユポン社商標)の稀釈液を
磁性膜上に設けられたSiO2膜上に潤滑剤として
塗布したもので、破線は無潤滑時を示す。 また各線幅は測定値のバラツキを示す。 図から明らかなように潤滑時、無潤滑時にかか
わらず磁性膜上に設けられたSiO2膜が厚ければ
厚いほど耐摩耗性は良く、SiO2膜が薄くなるに
つれて耐摩耗性が低下する。また一般に潤滑時よ
りも無潤滑時の方が耐摩耗性は劣る。 ここで注目しなければならない事は、SiO2
の膜厚が300Å付近の耐摩耗性である。SiO2膜厚
が300Å付近の耐摩耗性は測定他に大きなバラツ
キが生じる。 また大きな特徴は潤滑時においてバラツキが大
きくなり、ある測定においては無潤滑時を下回る
測定値も出る事である。このような300Å付近に
おける大きなバラツキはSiO2の薄膜化に伴ない
SiO2の膜強度がいちじるしく低下するとともに
潤滑による吸着の影響が加わつたからと考えられ
る。 現在実用レベルの耐摩耗性としては、この加速
試験において摺動回数N=2000以上であることが
必要である。なお、この値はCSS2万回以上に耐
えることを確認している。この条件を安定に満足
する点は、潤滑時においてSiO2膜厚が400Å以上
である。 次にSiO2膜厚が300Å付近の詳細な測定を行な
つたところ第2図のような結果となつた。 ここで注目すべきことは、SiO2の膜厚が300Å
で第1図と同様に摺動回数Nが最低となり、300
Å以下においては逆にバラツキが小さくなり耐摩
耗性も向上し、また300Å以上においても、当然
ながら耐摩耗性が向上する点である。 これらの理由は以下によるものと考えられる。 SiO2の膜厚が300Å以上の場合にはSiO2の膜強
度が大きいため、例え吸着が発生してもキズつき
にくいと考えられる。 またSiO2の膜厚が300Å以下の場合、SiO2膜厚
が薄く、膜強度が小さいにもかかわらず耐摩耗性
が安定し、向上しているのは吸着の発生が抑えら
れるためと考えられる。 すなわち、吸着は潤滑剤を介在物とする、ヘツ
ドと媒体の接着現象であつて、潤滑剤の媒体への
塗布量を調整してやれば防止出来る。ここで問題
なのは潤滑剤の媒体への付着力である。 第1表に記載されているように一般の潤滑剤は
フエライトなどの磁性膜よりもSiO2などの無機
化合物に対する方が付着力が大きいことはぬれ性
が良いことからも明らかである。 従つて、磁性膜上に無機化合物を点在させたも
のに対して潤滑剤を塗布させた後十分に拭きとり
を行なえば無機化合物表面にのみ潤滑剤を残す事
が可能となる。 よつて磁性膜上に設けられる無機化合物の点在
量を増せば当然潤滑剤の塗布量が増し、また逆に
無機化合物の点在量を減らせば潤滑剤の塗布量を
減らす事が出来る。この無機化合物の点在量は
SiO2の膜厚のコントロールによつて行なう事が
出来る。 すなわち、SiO2の膜厚が300Å以下になるとす
でにSiO2膜は磁性膜上に連続して付着している
のではなく網状〜島状に付着しているものと考え
られる。 従つて、上述したように潤滑剤の塗布量のコン
トロールが可能となる。よつて第2図に示すよう
にSiO2の膜厚が300Å以下では潤滑剤の塗布量が
コントロールされて最適の塗布量となり吸着がな
くなり、かつ潤滑剤のすべりの効果より耐摩耗性
を向上させる事が出来る。 このように本発明者らは、このような発想より
保護膜と称されるような比較的厚いSiO2膜を設
けなくとも、潤滑剤を最適な塗布量にコントロー
ルし、十分耐摩耗性が得られるSiO2の膜厚を見
い出し、この膜厚は30〜200Åが最適値である事
発見したもので、スペーシングロスを大幅に改善
する事を可能としつつ実用上十分な耐摩耗性を得
る事に成功したものである。
The present invention relates to a magnetic disk medium that is suitable for ultra-high density recording, has high durability, wear resistance, and high reliability. Magnetic recording media for magnetic disk devices, which are generally used as external storage devices for information processing devices, are required to have higher recording density and higher reliability as the amount of information increases. In order to improve the recording density, we need to improve the magnetic properties of the magnetic film attached to the surface of the magnetic disk, such as increasing the coercive force and increasing the magnetic flux density, making the magnetic film itself thinner, and further improving the electromagnetic conversion characteristics. Since it is necessary to reduce the spacing loss by reducing the spacing between the magnetic film of the magnetic head and the magnetic recording medium (hereinafter referred to as spacing), the magnetic film surface must be smooth and free from surface roughness and protrusions. Good things are required. Magnetic disks designed for such high recording densities range from coating-type magnetic films that contain magnetic powder and binder, which have been commonly used, to continuous magnetic films that do not contain binders (continuous magnetic films) that do not contain binders. Because the medium (medium) has a high magnetic storage energy and is advantageous, iron or iron-cobalt alloys are deposited on non-magnetic substrates by sputtering or vapor deposition in vacuum, argon gas, or an atmosphere containing oxygen mixed with argon gas. Continuously deposited ferrite oxide magnetic films (hereinafter referred to as ferrite oxide films) and metal magnetic films have been proposed by various methods. In addition, magnetic films have also been commonly produced by electrodeposition. Magnetic recording media created by these methods are high recording density media with excellent properties. In particular, ferrite oxide films are hard materials and have good corrosive properties, making them difficult to use as magnetic recording media. It is rated as very good. As described above, the properties of magnetic films have been very good for a long time, and magnetic recording media made in this way have sufficient durability and resistance to the sliding of the magnetic head so that they can withstand actual usage conditions. Applying treatments to the surface of magnetic films to improve their abrasion resistance has become an important issue. In other words, in a magnetic disk device, during normal operation, the magnetic head flies above the magnetic film surface of the magnetic recording medium, and the magnetic head does not come into direct contact with the magnetic film, but as the recording density improves, the spacing increases. In order to reduce the size, it is necessary to lower the flying height, and recently a method has been developed in which the magnetic head slides into contact with the magnetic recording medium when the magnetic disk medium starts and stops rotating, that is, the contact start/stop method (hereinafter referred to as the CSS method). ) method is being adopted, so sufficient durability and wear resistance are required. Conventionally, the following methods have been employed to improve the durability and wear resistance of such magnetic recording media. One method is to form a lubricant film directly on the magnetic recording medium to reduce the friction caused by sliding between the magnetic head and the magnetic recording medium. For example, as a lubricant on the surface of a magnetic disk.
By applying a diluted solution of KryToxAD (trademark of DuPont), the surface of the recording medium becomes slippery, which reduces abrasion caused by sliding of the magnetic head and improves abrasion resistance. Since the surface of the magnetic recording medium, that is, the surface of the magnetic film, has very good smoothness, a phenomenon occurs in which the magnetic head is attracted to the recording medium. Here, adsorption refers to the phenomenon in which the magnetic head adheres to the disk surface. This adsorption is a type of adhesion that uses lubricant as an intermediary, and in the CSS method, it is accompanied by stick-slip during sliding contact, which can lead to head crushing in a short period of time, causing damage to the magnetic head and damage to the magnetic surface. This may cause scratches, etc. Applying a lubricant to the surface of a magnetic recording medium in this way reduces the frictional force, but conversely it causes an adsorption phenomenon, so it is not very effective in improving the wear resistance of the surface of the recording medium. I couldn't do it. This head-stag can be reduced by applying a thin layer of lubricant on the magnetic recording medium, but this is not so effective in terms of reducing the frictional force, and if the film thickness of this lubricant is Control is nearly impossible in a mass production process due to the small variable range of film thickness, which results in poor reproducibility and manufacturability. As another method for improving the wear resistance of the surface of a magnetic recording medium, a method of forming a protective film on a magnetic film has been conventionally carried out using a metal magnetic film, and many protective film materials have been proposed. However, in general, the protective film for metal magnetic films has the purpose of improving corrosion resistance in addition to wear resistance, and with a protective film of 300 Å or less, pinholes occur in the protective film, so no effect on corrosion resistance can be expected. Therefore, a protective film with a thickness of 400 Å to 800 Å is normally used. It is also practiced to apply a lubricant on top of this protective film. It is true that the wear resistance of the protective film reaches a practical level, but as mentioned above, when using such a thick protective film, spacing loss becomes a problem and the original performance of the magnetic film cannot be demonstrated. I couldn't do it. Furthermore, even if the protective film were made thin without considering corrosion resistance, if the protective film was less than 400 Å, the wear resistance would be significantly reduced. Therefore, it is an object of the present invention to provide a new magnetic disk medium that eliminates the above-mentioned drawbacks.
By forming an inorganic compound thin film with a thickness of 30 to 200 Å using a vacuum technique such as sputtering, the inorganic compound thin film does not cover the entire magnetic film, but is scattered, and a lubricant film is further applied to the surface. This can be achieved by a magnetic disk medium characterized in that it is formed and configured. The present invention will be explained below based on Examples. FIG. 1 shows the characteristics of the magnetic disk medium according to the present invention, in which the horizontal axis shows the inorganic compound thin film (SiO 2 ).
The film thickness and the number of sliding movements are shown on the vertical axis. The number of sliding movements is determined by placing an alumina head slider (tapered flat type) on the surface of a magnetic recording medium (disc-shaped) and rotating the medium at a low speed (peripheral speed of 40~
The number of passes through the head until scratches appear on the media surface in an accelerated abrasion test (80 cm/s) is shown. The load on the head is 20 g/mm 2 . Therefore, the greater the number of times of sliding, the better the wear resistance. The solid line in Figure 1 shows a dilute solution of KryTox 143AD (DuPont trademark) applied as a lubricant to the SiO 2 film provided on the magnetic film, and the broken line shows the state without lubrication. show. Furthermore, each line width indicates the variation in measured values. As is clear from the figure, the thicker the SiO 2 film provided on the magnetic film, the better the wear resistance, regardless of whether it is lubricated or not, and the wear resistance decreases as the SiO 2 film becomes thinner. In addition, wear resistance is generally lower when not lubricated than when lubricated. What must be noted here is the wear resistance of the SiO 2 film when the thickness is around 300 Å. When the SiO 2 film thickness is around 300 Å, there are large variations in wear resistance due to measurement and other factors. Another major feature is that the variation increases when lubricated, and in some measurements, the measured values are lower than when not lubricated. This large variation around 300Å is due to the thinning of the SiO 2 film.
This is thought to be due to the fact that the strength of the SiO 2 film decreased significantly and the adsorption effect due to lubrication was added. In order to obtain abrasion resistance at a current practical level, it is necessary that the number of times of sliding is N=2000 or more in this accelerated test. It has been confirmed that this value can withstand more than 20,000 CSS cycles. This condition is stably satisfied when the SiO 2 film thickness is 400 Å or more during lubrication. Next, we performed detailed measurements of the SiO 2 film thickness around 300 Å, and the results shown in Figure 2 were obtained. What should be noted here is that the SiO 2 film thickness is 300 Å.
As in Figure 1, the number of sliding movements N is the lowest, 300.
On the contrary, when the thickness is less than 300 Å, the variation becomes smaller and the wear resistance is improved, and even when the thickness is 300 Å or more, the wear resistance is naturally improved. These reasons are considered to be as follows. When the SiO 2 film thickness is 300 Å or more, the strength of the SiO 2 film is high, so it is thought that even if adsorption occurs, it is unlikely to be scratched. Furthermore, when the SiO 2 film thickness is 300 Å or less, the wear resistance is stable and improved despite the thin SiO 2 film thickness and low film strength, which is thought to be due to the suppression of adsorption. . In other words, adsorption is a phenomenon of adhesion between the head and the medium using lubricant as an intervening substance, and can be prevented by adjusting the amount of lubricant applied to the medium. The problem here is the adhesion of the lubricant to the medium. As shown in Table 1, it is clear from the good wettability that general lubricants have greater adhesion to inorganic compounds such as SiO 2 than to magnetic films such as ferrite. Therefore, if a lubricant is applied to a magnetic film on which an inorganic compound is dotted and then thoroughly wiped off, the lubricant can be left only on the surface of the inorganic compound. Therefore, if the amount of inorganic compounds dotted on the magnetic film is increased, the amount of lubricant applied will naturally increase, and conversely, if the amount of inorganic compounds dotted is decreased, the amount of lubricant applied can be reduced. The amount of this inorganic compound is
This can be done by controlling the SiO 2 film thickness. That is, it is considered that when the SiO 2 film thickness becomes 300 Å or less, the SiO 2 film is not attached continuously on the magnetic film, but is already attached in the form of a network to islands. Therefore, as described above, it is possible to control the amount of lubricant applied. Therefore, as shown in Figure 2, when the SiO 2 film thickness is less than 300 Å, the amount of lubricant applied is controlled and becomes the optimum amount, eliminating adsorption, and improving wear resistance due to the sliding effect of the lubricant. I can do things. Based on this idea, the present inventors were able to control the amount of lubricant applied to the optimum amount and obtain sufficient wear resistance without the need to provide a relatively thick SiO 2 film called a protective film. We discovered that the optimum film thickness for this film is 30 to 200 Å, which makes it possible to significantly improve spacing loss while providing sufficient wear resistance for practical use. It was successful.

【表】 第3図は磁性膜上に設けられたSiO2の膜厚と
フエライトヘツドとの摩擦係数(μk)の関係を
示す図である。 図中○印は、SiO2の膜上が無潤滑で・印は潤
滑時を示す。なおこの潤滑は前述した
KryTox143ADを使用した場合である。 この図から明らかなように潤滑時はSiO2の膜
厚30Å以上で摩擦係数(μk)=0.15〜0.19と小さ
い値が得られた。SiO2の膜厚が30Å〜100Åの範
囲ではSiO2膜のみの滑性だけでは摩擦係数(μk)
は0.2以下にはならないが潤滑剤を併用する事に
よりμk=0.15〜0.19と少なくする事が出来る。 別表は磁気記録媒体上のSiO2の膜厚と潤滑剤
の塗布の有無による磁気ヘツドと磁気記録媒体と
の摩擦係数、耐CSS性、特性変化率及びSiO2成膜
のスパツタ条件を示したものである。 本発明に該当する試料番号は3〜9であり30〜
200ÅのSiO2の膜厚について別表の如き測定結果
を得た。 表より明らかなように本発明のSiO2の膜厚で
潤滑剤を塗布した場合、耐CSS性がほぼ20000回
以上でありまたスペーシングロス(特性変化率)
もほぼ0%であり非常に良好な結果を得た。 以上のように本発明では磁性膜上に30〜200Å
のSiO2を形成し、その上に潤滑剤を塗布する事
によりスペーシングロスがなく、また耐摩耗性が
良好な磁気記録媒体を提供出来る。 尚本発明では、フエライト酸化物磁性膜をスパ
ツタで形成したものについて説明したがこれに限
らず電着法や、スパツタ又は蒸着法で形成される
金属磁性膜でも耐食性が要求されないデイスク、
又腐食のないデイスク更には防食処理が施された
デイスクに対しては二酸化けい素等の表面に滑性
を付与する膜とデイスク表面との密着性(結合
力)が良ければ適用する事が可能である。 また、表面に滑性を付与する膜としては、滑性
を有し、デイスク表面との密着性が良く、しかも
表面潤滑剤を強固に付着させ得る無機化合物であ
れば二酸化けい素膜(SiO2)に限らず、表1に
示したアルミナ(Al2O3)膜、チツ化けい素
(Si3N4)膜も効果がある。 更に二酸化けい素−アルミナ−酸化ベリリウム
(SiO2−Al2O3−BeO)膜を同時に使用出来る。
また潤滑剤も種々使用可能である。 〈実施例〉 〔〕 フエライト酸化磁性膜の形成:アルミナ
基板表面を硫酸溶を用いて陽極処理し、アルマ
イト層を1〜2μmの厚さに形成した後この基
板を洗浄し、コバルトを含む鉄を主成分とする
ターゲツトを用いて80%アルゴン(Ar),20%
酸素(O2)雰囲気中でスパツターし、基板表
面に0.2μmのヘマタイト(α−Fe2O3)を形成
した。 これを還元雰囲気中で熱処理し、マグネタイ
ト(Fe3O4)に変換し、更に大気中熱処理して
ヘマタイト(γ−Fe2O3)のフエライト酸化磁
性膜を形成した。 〔〕 二酸化けい素膜の形成:フエライト酸化
膜上に二酸化けい素をターゲツトとして100%
アルゴン(Ar)又は80%アルゴン(Ar)−20
%酸素(O2)雰囲気でスパツタリングにより
形成した。条件は別表に示す。 〔〕 潤滑剤膜の形成:スピンコーテイングに
より回転しているデイスクに潤滑剤Aとして
KeyTox143AD(デユポン社商標)、潤滑剤Bと
してK1000(キヤニオンプロダクト社商標)を
塗布し、次に油脂分を含まない紙をとりつけた
回転パットで表面を拭き取り潤滑剤膜を形成し
た。 潤滑剤の塗布は二酸化けい素膜の形成後デシ
ケータ内に20時間放置後行なつた。 〈実験方法〉 (1) 耐CSS性の試験は第4図に示すサイクルの繰
り返しによるCSS試験でデイスク面に傷が生じ
る迄のCSS回数で示した。傷の確認は目視によ
る。 試験は1試料につき内周、外周2回行なつた。 また、使用したヘツドは、3.2±0.2gの荷重の
ウインチエスタータイプ、テーパフエライト型
Mn−Zuフエライトのヘツドで試験毎に新しいヘ
ツドを用いた。 電磁変換性の変化率(特性変化率)は別表の試
料〓.2の二酸化けい素膜がない時の弧立波出力
を1とした時の出力差を%で示した。 尚、特性の測定に使用したヘツドは浮上量0.2μ
m(周速40m/s)のテーパーフラツト型Mn−
Znフエライトで常に同一のヘツドを使用し、同
一の条件で測定した。 また摩擦係数はフエライトヘツドと磁気記録媒
体の摺動直後の摩擦係数(μk)を示す。別表に
おける摩擦係数の値は5回の平均値である。尚
SiO2の膜厚は、スパツタレートより換算したも
のであり、また厚さ200Å以下では完全な連続膜
ではないと考えられるがここでは被着量を総面積
で除した平均形状膜厚を指すものである。
[Table] FIG. 3 is a diagram showing the relationship between the thickness of the SiO 2 film provided on the magnetic film and the coefficient of friction (μk) between it and the ferrite head. In the figure, the ○ mark indicates that the SiO 2 film is not lubricated, and the * mark indicates that it is lubricated. Note that this lubrication is as described above.
This is the case when KryTox143AD is used. As is clear from this figure, during lubrication, a small value of friction coefficient (μk) of 0.15 to 0.19 was obtained when the SiO 2 film thickness was 30 Å or more. When the SiO 2 film thickness is in the range of 30 Å to 100 Å, the friction coefficient (μk) is limited by the lubricity of the SiO 2 film alone.
Although it cannot be less than 0.2, it can be reduced to μk = 0.15 to 0.19 by using a lubricant. The attached table shows the SiO 2 film thickness on the magnetic recording medium, the coefficient of friction between the magnetic head and the magnetic recording medium with or without lubricant, CSS resistance, property change rate, and sputtering conditions for SiO 2 film formation. It is. The sample numbers applicable to the present invention are 3 to 9 and 30 to 9.
The measurement results shown in the attached table were obtained for a SiO 2 film thickness of 200 Å. As is clear from the table, when the lubricant is applied with the film thickness of SiO 2 of the present invention, the CSS resistance is approximately 20,000 times or more, and the spacing loss (rate of change in characteristics)
was almost 0%, giving very good results. As described above, in the present invention, a film with a thickness of 30 to 200 Å is formed on the magnetic film.
By forming SiO 2 and applying a lubricant thereon, a magnetic recording medium with no spacing loss and good wear resistance can be provided. In the present invention, a ferrite oxide magnetic film formed by sputtering has been described, but the present invention is not limited to this, and metal magnetic films formed by electrodeposition, sputtering, or vapor deposition may also be used for disks that do not require corrosion resistance.
In addition, it can be applied to non-corrosion-free disks, and even disks that have been subjected to anti-corrosion treatment, as long as the adhesion (bonding strength) between the film that imparts lubricity to the surface, such as silicon dioxide, and the disk surface is good. It is. In addition, as a film that imparts lubricity to the surface, silicon dioxide film (SiO 2 ), but also the alumina (Al 2 O 3 ) film and silicon titanide (Si 3 N 4 ) film shown in Table 1 are effective. Furthermore, a silicon dioxide-alumina-beryllium oxide (SiO 2 -Al 2 O 3 -BeO) film can be used simultaneously.
Various lubricants can also be used. <Example> [] Formation of ferrite oxide magnetic film: The surface of an alumina substrate is anodized using a sulfuric acid solution to form an alumite layer with a thickness of 1 to 2 μm. This substrate is then washed and coated with iron containing cobalt. Using target as main component 80% argon (Ar), 20%
Sputtering was performed in an oxygen (O 2 ) atmosphere to form hematite (α-Fe 2 O 3 ) with a thickness of 0.2 μm on the substrate surface. This was heat-treated in a reducing atmosphere to convert it into magnetite (Fe 3 O 4 ), and further heat-treated in the air to form a ferrite oxide magnetic film of hematite (γ-Fe 2 O 3 ). [] Formation of silicon dioxide film: 100% silicon dioxide as a target on the ferrite oxide film
Argon (Ar) or 80% Argon (Ar) −20
% oxygen (O 2 ) atmosphere by sputtering. The conditions are shown in the attached table. [] Formation of lubricant film: Apply lubricant A to the rotating disk by spin coating.
KeyTox 143AD (Trademark of DuPont) and K1000 (Trademark of Canion Products) as lubricant B were applied, and then the surface was wiped off with a rotating pad equipped with oil-free paper to form a lubricant film. The lubricant was applied after the silicon dioxide film was formed and left in a desiccator for 20 hours. <Experimental Method> (1) CSS resistance was tested by repeating the cycle shown in Figure 4 and measuring the number of CSS cycles until scratches appeared on the disk surface. Check for scratches by visual inspection. The test was conducted twice for each sample, once on the inner circumference and once on the outer circumference. In addition, the heads used were a winch ester type with a load of 3.2±0.2g, and a taper ferrite type.
A new head was used for each test with Mn-Zu ferrite heads. The rate of change in electromagnetic transmissibility (rate of change in characteristics) is for the samples in the attached table. The output difference is shown in % when the rising wave output in No. 2 without the silicon dioxide film is taken as 1. The head used to measure the characteristics has a flying height of 0.2μ.
Tapered flat type Mn- (peripheral speed 40m/s)
Measurements were made using Zn ferrite using the same head and under the same conditions. Further, the friction coefficient indicates the friction coefficient (μk) immediately after the ferrite head and the magnetic recording medium slide. The friction coefficient values in the attached table are the average values of 5 times. still
The film thickness of SiO 2 is calculated from the sputter rate, and although it is considered that it is not a completely continuous film if the thickness is less than 200 Å, here it refers to the average shape film thickness calculated by dividing the deposited amount by the total area. be.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、SiO2の膜厚と摺動回数関係を示す
図、第2図は、本発明に係るSiO2の膜厚におけ
る摺動回数関係を示す図、第4図は磁気記録媒体
の回転の開始と停止を繰り返す際の条件を示す
図、第3図はSiO2の膜厚と摩擦係数の関係を示
す図である。
FIG. 1 is a diagram showing the relationship between the SiO 2 film thickness and the number of sliding operations, FIG. 2 is a diagram showing the relationship between the SiO 2 film thickness and the number of sliding operations according to the present invention, and FIG. 4 is a diagram showing the relationship between the SiO 2 film thickness and the number of sliding operations. A diagram showing the conditions for repeating the start and stop of rotation, and FIG. 3 is a diagram showing the relationship between the SiO 2 film thickness and the coefficient of friction.

Claims (1)

【特許請求の範囲】 1 回転する磁気デイスク媒体上に浮上ヘツドを
配置して情報の記録再生を行う磁気デイスク装置
に使用される磁気デイスク媒体であつて、 基板上に磁性膜が形成され、その磁性膜上に30
〜200Å厚の無機化合物薄膜をスパツタ等の真空
技術を用いて形成することにより該無機化合物薄
膜が前記磁性膜全体を覆うのでは無く点在させて
形成し、 さらにその表面に潤滑剤膜を形成して構成した
ことを特徴とする磁気デイスク媒体。
[Scope of Claims] 1. A magnetic disk medium used in a magnetic disk device that records and reproduces information by placing a flying head on a rotating magnetic disk medium, which comprises a magnetic film formed on a substrate, and a magnetic film formed on the substrate. 30 on magnetic film
By forming an inorganic compound thin film with a thickness of ~200 Å using a vacuum technique such as sputtering, the inorganic compound thin film does not cover the entire magnetic film, but is scattered, and a lubricant film is further formed on the surface. A magnetic disk medium characterized in that it is configured as follows.
JP24926487A 1987-10-02 1987-10-02 Magnetic disk medium Granted JPS63119019A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24926487A JPS63119019A (en) 1987-10-02 1987-10-02 Magnetic disk medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24926487A JPS63119019A (en) 1987-10-02 1987-10-02 Magnetic disk medium

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56050122A Division JPS57167131A (en) 1981-04-03 1981-04-03 Magnetic recording medium

Publications (2)

Publication Number Publication Date
JPS63119019A JPS63119019A (en) 1988-05-23
JPH0311004B2 true JPH0311004B2 (en) 1991-02-15

Family

ID=17190376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24926487A Granted JPS63119019A (en) 1987-10-02 1987-10-02 Magnetic disk medium

Country Status (1)

Country Link
JP (1) JPS63119019A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5321248A (en) * 1976-08-11 1978-02-27 Furukawa Electric Co Ltd:The Preparation of antitracking polyolefin composition molding
JPS54162508A (en) * 1978-06-13 1979-12-24 Nec Corp Magnetic memory medium

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5321248A (en) * 1976-08-11 1978-02-27 Furukawa Electric Co Ltd:The Preparation of antitracking polyolefin composition molding
JPS54162508A (en) * 1978-06-13 1979-12-24 Nec Corp Magnetic memory medium

Also Published As

Publication number Publication date
JPS63119019A (en) 1988-05-23

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