JPH03109453A - Slippery film and production thereof - Google Patents
Slippery film and production thereofInfo
- Publication number
- JPH03109453A JPH03109453A JP1245224A JP24522489A JPH03109453A JP H03109453 A JPH03109453 A JP H03109453A JP 1245224 A JP1245224 A JP 1245224A JP 24522489 A JP24522489 A JP 24522489A JP H03109453 A JPH03109453 A JP H03109453A
- Authority
- JP
- Japan
- Prior art keywords
- film
- residual
- ppm
- less
- content
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 229920000642 polymer Polymers 0.000 claims abstract description 72
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims abstract description 58
- 229920005989 resin Polymers 0.000 claims abstract description 32
- 239000011347 resin Substances 0.000 claims abstract description 32
- 239000010954 inorganic particle Substances 0.000 claims abstract description 22
- 239000002245 particle Substances 0.000 claims abstract description 17
- 230000003746 surface roughness Effects 0.000 claims abstract description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000010936 titanium Substances 0.000 claims abstract description 9
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 9
- 230000003068 static effect Effects 0.000 claims abstract description 8
- 239000000203 mixture Substances 0.000 claims description 21
- 239000000178 monomer Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 abstract description 26
- 238000010030 laminating Methods 0.000 abstract description 3
- 239000010419 fine particle Substances 0.000 abstract description 2
- 230000008569 process Effects 0.000 abstract description 2
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 238000007669 thermal treatment Methods 0.000 abstract 1
- -1 polyethylene terephthalate Polymers 0.000 description 53
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 26
- 150000001875 compounds Chemical class 0.000 description 12
- 230000008018 melting Effects 0.000 description 10
- 238000002844 melting Methods 0.000 description 10
- 239000000377 silicon dioxide Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 230000009477 glass transition Effects 0.000 description 8
- 238000001816 cooling Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 239000008188 pellet Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000012778 molding material Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 229910002012 Aerosil® Inorganic materials 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- QXYJCZRRLLQGCR-UHFFFAOYSA-N dioxomolybdenum Chemical compound O=[Mo]=O QXYJCZRRLLQGCR-UHFFFAOYSA-N 0.000 description 4
- 238000001125 extrusion Methods 0.000 description 4
- 238000009998 heat setting Methods 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 150000003440 styrenes Polymers 0.000 description 4
- PBKONEOXTCPAFI-UHFFFAOYSA-N 1,2,4-trichlorobenzene Chemical compound ClC1=CC=C(Cl)C(Cl)=C1 PBKONEOXTCPAFI-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007786 electrostatic charging Methods 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 235000010755 mineral Nutrition 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000003011 styrenyl group Polymers [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 1
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 1
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical group CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- KCFQLCPMVCXRHF-UHFFFAOYSA-N O.[Na+].[Na+].[Na+].[O-]B([O-])[O-] Chemical compound O.[Na+].[Na+].[Na+].[O-]B([O-])[O-] KCFQLCPMVCXRHF-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000000217 alkyl group Polymers 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- WAKZZMMCDILMEF-UHFFFAOYSA-H barium(2+);diphosphate Chemical compound [Ba+2].[Ba+2].[Ba+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O WAKZZMMCDILMEF-UHFFFAOYSA-H 0.000 description 1
- FAARTQSZKSBAOS-UHFFFAOYSA-N barium(2+);diphosphite Chemical compound [Ba+2].[Ba+2].[Ba+2].[O-]P([O-])[O-].[O-]P([O-])[O-] FAARTQSZKSBAOS-UHFFFAOYSA-N 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- VSGNNIFQASZAOI-UHFFFAOYSA-L calcium acetate Chemical compound [Ca+2].CC([O-])=O.CC([O-])=O VSGNNIFQASZAOI-UHFFFAOYSA-L 0.000 description 1
- 239000001639 calcium acetate Substances 0.000 description 1
- 235000011092 calcium acetate Nutrition 0.000 description 1
- 229960005147 calcium acetate Drugs 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- CJZGTCYPCWQAJB-UHFFFAOYSA-L calcium stearate Chemical compound [Ca+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CJZGTCYPCWQAJB-UHFFFAOYSA-L 0.000 description 1
- 235000013539 calcium stearate Nutrition 0.000 description 1
- 239000008116 calcium stearate Substances 0.000 description 1
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- AAEHPKIXIIACPQ-UHFFFAOYSA-L calcium;terephthalate Chemical compound [Ca+2].[O-]C(=O)C1=CC=C(C([O-])=O)C=C1 AAEHPKIXIIACPQ-UHFFFAOYSA-L 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229940011182 cobalt acetate Drugs 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- QAHREYKOYSIQPH-UHFFFAOYSA-L cobalt(II) acetate Chemical compound [Co+2].CC([O-])=O.CC([O-])=O QAHREYKOYSIQPH-UHFFFAOYSA-L 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical group O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- DGVMNQYBHPSIJS-UHFFFAOYSA-N dimagnesium;2,2,6,6-tetraoxido-1,3,5,7-tetraoxa-2,4,6-trisilaspiro[3.3]heptane;hydrate Chemical compound O.[Mg+2].[Mg+2].O1[Si]([O-])([O-])O[Si]21O[Si]([O-])([O-])O2 DGVMNQYBHPSIJS-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910052622 kaolinite Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- UEGPKNKPLBYCNK-UHFFFAOYSA-L magnesium acetate Chemical compound [Mg+2].CC([O-])=O.CC([O-])=O UEGPKNKPLBYCNK-UHFFFAOYSA-L 0.000 description 1
- 239000011654 magnesium acetate Substances 0.000 description 1
- 235000011285 magnesium acetate Nutrition 0.000 description 1
- 229940069446 magnesium acetate Drugs 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- GVALZJMUIHGIMD-UHFFFAOYSA-H magnesium phosphate Chemical compound [Mg+2].[Mg+2].[Mg+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GVALZJMUIHGIMD-UHFFFAOYSA-H 0.000 description 1
- 239000004137 magnesium phosphate Substances 0.000 description 1
- 229910000157 magnesium phosphate Inorganic materials 0.000 description 1
- 229960002261 magnesium phosphate Drugs 0.000 description 1
- 235000010994 magnesium phosphates Nutrition 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- 235000019792 magnesium silicate Nutrition 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- BMQVDVJKPMGHDO-UHFFFAOYSA-K magnesium;potassium;chloride;sulfate;trihydrate Chemical compound O.O.O.[Mg+2].[Cl-].[K+].[O-]S([O-])(=O)=O BMQVDVJKPMGHDO-UHFFFAOYSA-K 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 229940071125 manganese acetate Drugs 0.000 description 1
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- JDQLUYWHCUWSJE-UHFFFAOYSA-N methanolate;titanium(3+) Chemical compound [Ti+3].[O-]C.[O-]C.[O-]C JDQLUYWHCUWSJE-UHFFFAOYSA-N 0.000 description 1
- CPOFMOWDMVWCLF-UHFFFAOYSA-N methyl(oxo)alumane Chemical compound C[Al]=O CPOFMOWDMVWCLF-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000001225 nuclear magnetic resonance method Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920001596 poly (chlorostyrenes) Polymers 0.000 description 1
- 229920003197 poly( p-chlorostyrene) Polymers 0.000 description 1
- 229920001620 poly(3-methyl styrene) Polymers 0.000 description 1
- 229920001627 poly(4-methyl styrene) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920001608 poly(methyl styrenes) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920006295 polythiol Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- XWKBMOUUGHARTI-UHFFFAOYSA-N tricalcium;diphosphite Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])[O-].[O-]P([O-])[O-] XWKBMOUUGHARTI-UHFFFAOYSA-N 0.000 description 1
- MCULRUJILOGHCJ-UHFFFAOYSA-N triisobutylaluminium Chemical compound CC(C)C[Al](CC(C)C)CC(C)C MCULRUJILOGHCJ-UHFFFAOYSA-N 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Laminated Bodies (AREA)
- Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は易滑性フィルム及びその製造方法に関し、詳し
くはシンジオタクチック構造を有するスチレン系重合体
からなり、高度な平滑性及びすべり性を有するフィルム
、ならびにその効率のよい製造方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a slippery film and a method for producing the same, and more specifically, it is made of a styrene polymer having a syndiotactic structure and has a high degree of smoothness and slipperiness. The present invention relates to a film having the above-mentioned properties and an efficient manufacturing method thereof.
〔従来の技術及び発明が解決しようとする課題〕一般に
、プラスチックフィルムにおいては、その厚みが薄くな
るほど加工性やすべり性が要求される。特に磁気テープ
の如き産業用フィルムにおいては、すべり性と平滑性の
両方が要求される。[Prior Art and Problems to be Solved by the Invention] Generally, the thinner the plastic film is, the more processability and slipperiness are required. In particular, industrial films such as magnetic tapes require both slipperiness and smoothness.
ところで、磁気テープ分野においては、最近高密度化に
伴いさらに平滑性の良好なフィルムが求められている。Incidentally, in the field of magnetic tapes, films with even better smoothness have been required as the density has increased recently.
近年開発されたシンジオタクチック構造のスチレン系重
合体の延伸フィルムは、耐熱性2寸法安定性、電気絶縁
性等にすぐれ、種々の用途が期待され、特に産業用フィ
ルムが有望とされている。Stretched films of styrenic polymers with a syndiotactic structure, which have been developed in recent years, have excellent heat resistance, two-dimensional stability, electrical insulation properties, etc., and are expected to have a variety of uses, and are particularly promising as industrial films.
一方、ポリエチレンテレフタレート(PET)フィルム
においては、その製膜技術の進歩により、高度な平滑性
、すべり性を満足するものが開発されているが、磁性体
を蒸着する時の耐熱性、オリゴマー析出の問題、高湿度
化における加水分解。On the other hand, with the advancement of film-forming technology, polyethylene terephthalate (PET) films have been developed that satisfy high levels of smoothness and slipperiness. Problem: Hydrolysis under high humidity.
寸法変化の問題があり、さらにガラス転移温度を超える
と伸びが生じ、高温になる自動車内での使用上の問題等
がある。There is a problem of dimensional change, and furthermore, when the glass transition temperature is exceeded, elongation occurs, which causes problems when used in high-temperature automobiles.
シンジオタクチック構造のスチレン系重合体においては
、上記問題を解決できる特性を有しているが、高度な平
滑性およびすべり性を満足するフィルムは、未だ得られ
ていない。Styrenic polymers with a syndiotactic structure have properties that can solve the above problems, but a film that satisfies a high level of smoothness and slipperiness has not yet been obtained.
そこで本発明者らは、上述の問題点を解消し、上記延伸
フィルムの特性を維持しつつ、高度な平滑性およびすべ
り性を有するフィルムを開発すべく鋭意研究を重ねた。Therefore, the present inventors have conducted extensive research in order to solve the above-mentioned problems and develop a film that has high smoothness and slipperiness while maintaining the properties of the stretched film.
その結果、フィルム素材としてシンジオタクチック構造
のスチレン系重合体あるいはその組成物を用いるととも
に、フィルムの片面を粗面、他面を平滑面とし、さらに
表面粗さや静摩擦係数を一定範囲に調節したフィルムが
、上述の目的に適うものであることを見出した。本発明
はかかる知見に基いて完成したものである。As a result, we used a styrene polymer with a syndiotactic structure or its composition as a film material, and one side of the film was rough and the other side was smooth, and the surface roughness and coefficient of static friction were adjusted within a certain range. was found to be suitable for the above purpose. The present invention was completed based on this knowledge.
すなわち本発明は、シンジオタクチック構造を有するス
チレン系重合体又はその組成物の延伸フィルムあるいは
該延伸フィルムを含む積層フィルムであって、片面が粗
面で他面が平滑面であり、該平滑面の表面粗さRaがo
、ooi〜0.02μmであるとともに、前記フィルム
の静摩擦係数μsが0.3〜1.Oであることを特徴と
する易滑性フィルムを提供するものである。That is, the present invention provides a stretched film of a styrenic polymer having a syndiotactic structure or a composition thereof, or a laminated film containing the stretched film, wherein one side is a rough surface and the other side is a smooth surface, and the smooth surface The surface roughness Ra of
, ooi to 0.02 μm, and the static friction coefficient μs of the film is 0.3 to 1. The present invention provides an easily slippery film characterized by being O.
本発明で用いるシンジオタクチック構造を有するスチレ
ン系重合体とは、立体化学構造がシンジオタクチック構
造、即ち炭素−炭素結合から形成される主鎖に対して側
鎖であるフェニル基や置換フェニル基が交互に反対方向
に位置する立体構造を有するものであり、そのタフティ
シティ−は同位体炭素による核磁気共鳴法(”C−NM
R法)により定量される。重3C−NMR法により測定
されるタフティシティ−は、連続する複数個の構成単位
の存在割合、例えば2個の場合はダイアツド。The styrenic polymer having a syndiotactic structure used in the present invention means that the stereochemical structure is a syndiotactic structure, that is, a phenyl group or substituted phenyl group that is a side chain with respect to the main chain formed from carbon-carbon bonds. It has a three-dimensional structure in which C-NMs are alternately located in opposite directions, and its toughness can be determined by nuclear magnetic resonance method using carbon isotope ("C-NM").
R method). Toughness measured by the heavy 3C-NMR method is the proportion of a plurality of consecutive structural units, for example, in the case of two units, it is a diad.
3個の場合はトリアット、5個の場合はペンタッドによ
って示すことができるが、本発明に言う主としてシンジ
オタクチック構造を有するスチレン系重合体とは、通常
はラセミダイアツドで75%以上、好ましくは85%以
上、若しくはラセミペンタッドで30%以上、好ましく
は50%以上のシンジオタクテイシテイ−を有するポリ
スチレン。In the case of 3 atoms, it can be expressed as triat, and in the case of 5 atoms, it can be expressed as pentad, but the styrenic polymer mainly having a syndiotactic structure as referred to in the present invention is usually racemic diamond with a proportion of 75% or more, preferably 85%. Polystyrene having a syndiotacticity of 30% or more, preferably 50% or more in racemic pentads.
ポリ(アルキルスチレン)、ポリ(ハロゲン化スチレン
)、ポリ(アルコキシスチレン)、ポリ(ビニル安息香
酸エステル)、これらの水素化重合体およびこれらの混
合物、あるいはこれらの構造単位を含む共重合体を指称
する。なお、ここでポリ(アルキルスチレン)としては
、ポリ(メチルスチレン)。Refers to poly(alkyl styrene), poly(halogenated styrene), poly(alkoxystyrene), poly(vinyl benzoate), hydrogenated polymers thereof, mixtures thereof, or copolymers containing these structural units. do. In addition, poly(alkylstyrene) here is poly(methylstyrene).
ポリ(エチルスチレン)、ポリ(プロピルスチレン)。Poly(ethylstyrene), poly(propylstyrene).
ポリ(ブチルスチレン)、ポリ(フェニルスチレン)。Poly(butylstyrene), poly(phenylstyrene).
ポリ(ビニルナフタレン)、ポリ(ビニルスチレン)。Poly(vinylnaphthalene), poly(vinylstyrene).
ポリ(アセナフチレン)などがあり、ポリ(ハロゲン化
スチレン)としては、ポリ(クロロスチレン)。Poly(acenaphthylene), etc. Poly(halogenated styrene) includes poly(chlorostyrene).
ポリ(ブロモスチレン)、ポリ(フルオロスチレン)な
どがある。また、ポリ(アルコキシスチレン)としては
、ポリ(メトキシスチレン)、ポリ(エトキシスチレン
)などがある。これらのうち特に好ましいスチレン系重
合体としては、ポリスチレン。Examples include poly(bromostyrene) and poly(fluorostyrene). Furthermore, examples of poly(alkoxystyrene) include poly(methoxystyrene) and poly(ethoxystyrene). Among these, a particularly preferred styrenic polymer is polystyrene.
ポリ(p−メチルスチレン)、ポリ(m−メチルスチレ
ン)、ポリ(p−ターシャリ−ブチルスチレン)。Poly(p-methylstyrene), poly(m-methylstyrene), poly(p-tert-butylstyrene).
ポリ(p−クロロスチレン)、ポリ(m−クロロスチレ
ン)、ポリ(p−フルオロスチレン)、またスチレンと
P−メチルスチレンとの共重合体をあげることができる
(特開昭62−187708号公報)。Examples include poly(p-chlorostyrene), poly(m-chlorostyrene), poly(p-fluorostyrene), and copolymers of styrene and P-methylstyrene (JP-A-62-187708). ).
更に、スチレン系共重合体におけるコモノマーとしては
、上述の如きスチレン系重合体のモノマーのほか、エチ
レン、プロピレン、ブテン、ヘキセン、オクテン等のオ
レフィンモノマー、ブタジェン、イソプレン等のジエン
モノマー、環状ジエンモノマーやメタクリル酸メチル、
無水マレイン酸、アクリロニトリル等の極性ビニルモノ
マー等をあげることができる。Furthermore, as comonomers in the styrene copolymer, in addition to the above-mentioned styrene polymer monomers, olefin monomers such as ethylene, propylene, butene, hexene, and octene, diene monomers such as butadiene and isoprene, cyclic diene monomers, etc. methyl methacrylate,
Examples include polar vinyl monomers such as maleic anhydride and acrylonitrile.
またこのスチレン系重合体は、分子量について特に制限
はないが、重量平均分子量が10,000以上3,00
0,000以下のものが好ましく、とりわけso、oo
o以上1,500.000以下のものが最適である。In addition, this styrene polymer has a weight average molecular weight of 10,000 or more and 3,000 or more, although there is no particular restriction on the molecular weight.
0,000 or less is preferred, especially so, oo
The optimum value is 0 or more and 1,500,000 or less.
ここで重量平均分子量が10,000未満であると、延
伸が充分にできない。さらに、分子量分布についてもそ
の広狭は制約がな(、様々なものを充当することが可能
であるが、重量平均分子量(Mw)/数平均分子ffi
(Mn)が1.5以上8以下が好ましい。なお、このシ
ンジオタクチック構造を有するスチレン系重合体は、従
来のアククチツク構造のスチレン系重合体に比べて耐熱
性が格段に優れている。If the weight average molecular weight is less than 10,000, sufficient stretching cannot be achieved. Furthermore, there are no restrictions on the width or narrowness of the molecular weight distribution (it is possible to apply various values, but the weight average molecular weight (Mw)/number average molecular weight ffi
(Mn) is preferably 1.5 or more and 8 or less. Note that this styrenic polymer having a syndiotactic structure has much better heat resistance than conventional styrenic polymers having an active structure.
さらに、これらのスチレン系重合体のうち、300℃、
剪断速度200/秒での溶融粘度が1×102〜lXl
0’ボイズのものが特に好適である。Furthermore, among these styrenic polymers, 300℃,
Melt viscosity at shear rate 200/sec is 1 x 102 to lXl
Those with 0' voids are particularly preferred.
このようなシンジオタクチック構造を有するスチレン系
重合体は、例えば不活性炭化水素溶媒中または溶媒の不
存在下に、(A)チタン化合物及び(B)水と有機アル
ミニウム化合物、特にトリアルキルアルミニウムとの縮
合生成物を触媒として、スチレン系単量体(上記スチレ
ン系重合体に対応する単量体)を重合することにより製
造することができる(特開昭62−187708号公報
)。A styrenic polymer having such a syndiotactic structure can be prepared by combining (A) a titanium compound and (B) water with an organoaluminum compound, especially a trialkylaluminum, in an inert hydrocarbon solvent or in the absence of a solvent. It can be produced by polymerizing a styrene monomer (monomer corresponding to the above styrene polymer) using the condensation product of as a catalyst (Japanese Unexamined Patent Publication No. 187708/1983).
また、ポリ(ハロゲン化アルキルスチレン)については
、特開平1−146912号公報に開示され、またこれ
らの水素化重合体は特願昭62−335893号明細書
に開示されている。Furthermore, poly(halogenated alkyl styrene) is disclosed in JP-A-1-146912, and hydrogenated polymers thereof are disclosed in Japanese Patent Application No. 62-335893.
本発明では易滑性フィルムの素材として、上述した延伸
フィルムからなる単層フィルムあるいは該延伸フィルム
を含む積層フィルムが用いられる。In the present invention, a monolayer film made of the above-mentioned stretched film or a laminated film containing the stretched film is used as the material of the easily slippery film.
また、この易滑性フィルムは、片面が粗面で他面が平滑
面でなければならず、そのうち平滑面については、表面
粗さRaが0.001〜0.02μm。In addition, this slippery film must have one side rough and the other side smooth, and the smooth side should have a surface roughness Ra of 0.001 to 0.02 μm.
好ましくは0.003〜0.018μmである。−方、
粗面の表面粗さRaについては、特に制限はないが、通
常は0.005〜0.05μmの範囲にすると同時に、
粗面と平滑面の表面粗さの比(即ち、粗面の表面粗さ/
平滑面の表面粗さ)が、1.5〜10、好ましくは1.
8〜8であるように調節することが望ましい。Preferably it is 0.003 to 0.018 μm. - way,
There is no particular limit to the surface roughness Ra of the rough surface, but it is usually in the range of 0.005 to 0.05 μm, and
The ratio of the surface roughness of the rough surface to the smooth surface (i.e., the surface roughness of the rough surface/
The surface roughness of the smooth surface is 1.5 to 10, preferably 1.
It is desirable to adjust it so that it is 8-8.
また、このフィルムの静摩擦係数μsは0.3〜1.0
、好ましくは0.3〜0.8である。なおここで静摩擦
係数とは、粗面と平滑面の間の摩擦係数を示す。In addition, the static friction coefficient μs of this film is 0.3 to 1.0
, preferably 0.3 to 0.8. Note that the static friction coefficient here refers to the friction coefficient between a rough surface and a smooth surface.
この平滑面を構成するフィルム素材としては、シンジオ
タクチック構造を有するスチレン系重合体又はその組成
物を用いればよいが、特に残留アルミニウム分が300
0ppm以下、残留チタン分が10ppm以下及び残留
スチレン系単量体が7000ppm以下、とりわけ残留
アルミニウム分が11000pp以下、残留チタン分が
7 ppm以下及び残留スチレン系単量体が5000p
pm以下である高純度のシンジオタクチック構造を有す
るスチレン系重合体、あるいはこのスチレン系重合体を
主成分とし、これに他の樹脂や各種添加剤を配合した組
成物が好適に用いられる。As the film material constituting this smooth surface, a styrene polymer having a syndiotactic structure or its composition may be used, but in particular, the residual aluminum content is 300%.
0 ppm or less, the residual titanium content is 10 ppm or less, and the residual styrene monomer is 7000 ppm or less, especially the residual aluminum content is 11000 pp or less, the residual titanium content is 7 ppm or less, and the residual styrene monomer is 5000 ppm or less.
A styrenic polymer having a syndiotactic structure with a high purity of pm or less, or a composition containing this styrenic polymer as a main component and blended with other resins and various additives is preferably used.
このような高純度のスチレン系重合体を製造するには、
様々な手法があるが、例えば次の如くである。まず、残
留アルミニウム分及び残留チタン分を上記の範囲内に抑
えるためには、■高活性触媒を用いてスチレン系重合体
を製造する方法(特願昭63−7466号明細書参照)
あるいは■脱灰、洗浄による方法、即ち、特開昭62−
187708号公報等に記載の通常のIVA族の有機金
属化合物とメチルアルミノキサン等のアルキルアルミノ
キサンを触媒成分として、スチレン系単量体を重合させ
た後、得られたシンジオタクチック構造のスチレン系重
合体を、酸、アルカリを適当な溶媒に溶解させた溶液に
より脱灰し、適当な溶媒で洗浄する方法である。To produce such high-purity styrenic polymers,
There are various methods, such as the following. First, in order to suppress the residual aluminum content and the residual titanium content within the above range, there is a method for producing a styrenic polymer using a highly active catalyst (see the specification of Japanese Patent Application No. 7466/1986).
Or ■ method by deashing and washing, that is, JP-A-62-
A styrenic polymer with a syndiotactic structure obtained by polymerizing a styrenic monomer using an ordinary IVA group organometallic compound described in Publication No. 187708 and an alkylaluminoxane such as methylaluminoxane as a catalyst component. This is a method of deashing with a solution of acid or alkali dissolved in an appropriate solvent, and washing with an appropriate solvent.
このようにして■あるいは■の方法により、残留アルミ
ニウム分及び残留チタン分の少ないシンジオタクチック
構造のスチレン系重合体が得られるが、さらに、これを
下記■あるいは■の方法で処理すれば、残留スチレン系
単量体が7000ppm以下のものとなる。In this way, a styrenic polymer with a syndiotactic structure with a low residual aluminum content and a low residual titanium content can be obtained by the method (1) or (2). The styrene monomer content is 7000 ppm or less.
■上記スチレン系重合体を減圧乾燥する方法ここで減圧
乾燥するにあたっては、乾燥温度を該重合体のガラス転
移温度以上とすると効率がよい。(2) Method of drying the styrenic polymer under reduced pressure When drying under reduced pressure, it is efficient to set the drying temperature to the glass transition temperature or higher of the polymer.
■上記スチレン系重合体を押出機により脱気する方法
上記スチレン系重合体あるいは■の方法で減圧乾燥した
スチレン系重合体を、押出機により脱気し、同時に成形
用材料(ベレット)とする。ここで押出機はベント付き
が好ましく、−軸、二輪いずれの押出機を用いてもよい
。(2) Method of degassing the above styrenic polymer using an extruder The above styrenic polymer or the styrenic polymer dried under reduced pressure by the method (2) is degassed using an extruder, and at the same time is used as a molding material (pellet). Here, the extruder is preferably equipped with a vent, and either a -shaft or two-wheel extruder may be used.
このような処理を経て残留アルミニウム分、残留チタン
分及び残留スチレン系単量体の少ない高純度のシンジオ
タクチック構造のスチレン系重合体が得られる。Through such treatment, a highly purified styrenic polymer having a syndiotactic structure with a small residual aluminum content, residual titanium content, and residual styrene monomer can be obtained.
また、上記高純度のスチレン系重合体に配合して組成物
を形成できる他の樹脂としては、各種のものがあるが、
例えば、アタクチック構造のスチレン系重合体、アイソ
タクチック構造のスチレン系重合体、スチレン−無水マ
レイン酸共重合体。In addition, there are various other resins that can be blended with the above-mentioned high-purity styrenic polymer to form a composition.
For example, styrene polymers with atactic structure, styrene polymers with isotactic structure, styrene-maleic anhydride copolymers.
ポリフェニレンエーテル等は、前述のシンジオタクチッ
ク構造のスチレン系重合体と相溶しやすく、延伸用予備
成形体を作成するときの結晶化の制御に有効で、その後
の延伸性が向上し、延伸条件の制御が容易で、且つ力学
物性に優れたフィルムを得ることができる。このうち、
アタクチック構造および/またはアイソタクチック構造
のスチレン系重合体を含有させる場合、シンジオタクチ
ック構造のスチレン系重合体と同様のモノマーからなる
ものが好ましい。また、これら相溶性樹脂成分の含有割
合は70〜1重量%、特に好ましくは50〜2重量%と
すればよい。ここで相溶性樹脂成分の含有割合が70重
量%を超えると、シンジオタクチック構造のスチレン系
重合体の長所である耐熱性等が損なわれるため好ましく
ない。また、非相溶性樹脂としては、例えば、ポリエチ
レン。Polyphenylene ether etc. are easily compatible with the above-mentioned styrenic polymer having a syndiotactic structure, and are effective in controlling crystallization when creating a preform for stretching, improving subsequent stretching properties and improving stretching conditions. It is possible to obtain a film that is easy to control and has excellent mechanical properties. this house,
When a styrene polymer having an atactic structure and/or an isotactic structure is contained, it is preferably made of the same monomer as the styrene polymer having a syndiotactic structure. Further, the content ratio of these compatible resin components may be 70 to 1% by weight, particularly preferably 50 to 2% by weight. If the content of the compatible resin component exceeds 70% by weight, it is not preferable because the advantages of the syndiotactic styrene polymer, such as heat resistance, will be impaired. Further, examples of the incompatible resin include polyethylene.
ポリプロピレン、ポリブテン、ポリペンテン等のポリオ
レフィン、ポリエチレンテレフタレート。Polyolefins such as polypropylene, polybutene, polypentene, and polyethylene terephthalate.
ポリブチレンテレフタレート、ポリエチレンナフタレー
ト等のポリエステル、ナイロン−6やナイロン6.6等
のポリアミド、ポリフェニレンスルフィド等のポリチオ
エーテル、ポリカーボネート。Polyesters such as polybutylene terephthalate and polyethylene naphthalate, polyamides such as nylon-6 and nylon 6.6, polythioethers such as polyphenylene sulfide, and polycarbonates.
ボリアリレート、ポリスルホン、ポリエーテルエーテル
ケトン、ポリエーテルスルホン、ポリイミド、テフロン
等のハロゲン化ビニル系重合体、ポリメタクリル酸メチ
ル等のアクリル系重合体、ポリビニルアルコール等、上
記相溶性の樹脂以外はすべて相当し、さらに、上記相溶
性の樹脂を含む架橋樹脂が挙げられる。これらの樹脂は
、本発明のシンジオタクチック構造のスチレン系重合体
と非相溶であるため、少量含有する場合、シンジオタク
チック構造のスチレン系重合体中に島のように分散させ
ることができ、延伸後に程良い光沢を与えたり、表面の
すべり性を改良するのに有効である。これら非相溶性樹
脂成分の含有割合は、光沢を目的とする場合は50〜2
重量%、表面性の制御を目的とする場合、0.001〜
5重量%が好ましい。また、製品として使用する温度が
高い場合は、比較的耐熱性のある非相溶性樹脂を用いる
ことが好ましい。Polyarylate, polysulfone, polyether ether ketone, polyether sulfone, polyimide, halogenated vinyl polymers such as Teflon, acrylic polymers such as polymethyl methacrylate, polyvinyl alcohol, etc., all other than the compatible resins listed above are equivalent. Furthermore, crosslinked resins containing the above-mentioned compatible resins can be mentioned. These resins are incompatible with the styrenic polymer having a syndiotactic structure of the present invention, so if they are contained in small amounts, they cannot be dispersed like islands in the styrenic polymer having a syndiotactic structure. It is effective in imparting a suitable gloss after stretching and improving surface slipperiness. The content ratio of these incompatible resin components is 50 to 2 when the purpose is gloss.
Weight%, if the purpose is to control surface properties, 0.001~
5% by weight is preferred. Furthermore, when the temperature at which the product is used is high, it is preferable to use an incompatible resin that is relatively heat resistant.
さらに、上述の高純度のスチレン系重合体に配合できる
添加剤としては、様々なものがあり、具体的には酸化防
止剤、帯電防止剤9着色剤、耐候剤等をあげることがで
き、これらを本発明の目的を阻害しない範囲で、適宜配
合することができる。Furthermore, there are various additives that can be added to the above-mentioned high-purity styrenic polymer, including antioxidants, antistatic agents, coloring agents, and weathering agents. may be appropriately blended within a range that does not impede the purpose of the present invention.
本発明の易滑性フィルムを製造する一つの方法としては
、上記高純度のスチレン系重合体やその組成物を、加熱
溶融しながらフィルムあるいはシ−ト状に押出し、冷却
固化し、さらに延伸を行い、その後熱処理して平滑面を
有するフィルムを形成する過程(特に延伸の前後、又は
熱処理後)において、このフィルムに適当な樹脂及び/
又は無機粒子を含有する樹脂からなる層を積層する方法
があげられる。この樹脂層の積層は、様々な手法にて行
えるが、通常は上記樹脂や無機粒子を含有する樹脂を溶
解又は溶融しておき、これを前述の平滑面を有するフィ
ルムの片面に塗布する方法、あるいは上記の高純度のス
チレン系重合体と無機粒子を含有する樹脂又は適当な樹
脂を共押出、共延伸する方法によって行えばよい。ここ
で積層に用いる樹脂は、本発明のスチレン系重合体や前
記のブレンド樹脂(他の樹脂)を用いることもできるが
、融点、あるいは軟化点が高い樹脂が好ましい。One method for producing the slippery film of the present invention is to extrude the above-mentioned high-purity styrenic polymer or its composition into a film or sheet while heating and melting it, solidify it by cooling, and then stretch it. In the process of forming a film with a smooth surface by heat treatment (particularly before and after stretching or after heat treatment), a suitable resin and/or
Another method is to laminate layers made of resin containing inorganic particles. Lamination of this resin layer can be done by various methods, but usually a method in which the above-mentioned resin or a resin containing inorganic particles is melted or melted and applied to one side of the above-mentioned smooth film; Alternatively, the above-mentioned high-purity styrene polymer and a resin containing inorganic particles or a suitable resin may be coextruded and co-stretched. The resin used for lamination here may be the styrene polymer of the present invention or the blended resin (other resin) described above, but a resin with a high melting point or softening point is preferable.
それらの層間に接着性樹脂を用いることもできる。An adhesive resin can also be used between those layers.
また、この樹脂中に含有させる無機粒子の種類。Also, the type of inorganic particles contained in this resin.
量3粒径は、後述の無機粒子と同様のものでよい。The particle size may be the same as that of the inorganic particles described below.
本発明の易滑性フィルムを製造する好適な方法の一つと
して、上記の高純度のスチレン系重合体と、無機微粒子
を含有するスチレン系重合体を積層する方法があり、例
えばその方法としては、上記高純度のスチレン系重合体
を(a)成分とし、またシンジオタクチック構造を有す
るスチレン系重合体に平均粒径0.01〜38m、好ま
しくはo、。One suitable method for producing the slippery film of the present invention is a method of laminating the above-mentioned high-purity styrenic polymer and a styrenic polymer containing inorganic fine particles. , the above-mentioned high-purity styrenic polymer is used as component (a), and the styrenic polymer having a syndiotactic structure has an average particle size of 0.01 to 38 m, preferably o.
〜lumの無機粒子を配合してなる組成物を(b)成分
とし、この(a)成分と(I))成分を加熱溶融しなが
ら共押出し、次いで延伸することによって製造する方法
があげられる。この共押出しを行った後は、通常は冷却
固化を行い、その後に延伸処理することが好ましい。ま
たこの延伸後は必要に応じて熱処理(熱固定)すること
が好ましい。An example of a manufacturing method is to use a composition comprising inorganic particles of ~lum as component (b), coextrude component (a) and component (I) while heating and melting, and then stretch. After performing this coextrusion, it is usually preferable to perform cooling and solidification, and then to perform a stretching treatment. Further, after this stretching, it is preferable to perform heat treatment (heat setting) as necessary.
なお、(ロ)成分である組成物における無機粒子の含有
量は、特に制限はないが、通常は0.001〜1重景%
、好ましくは0.001〜0.8重量%の範囲である。The content of inorganic particles in the composition as component (B) is not particularly limited, but is usually 0.001 to 1%.
, preferably in the range of 0.001 to 0.8% by weight.
ここで上記無機粒子の平均粒径が0.01μmより小さ
いと粒子同士の二次凝集のため分散が困難であり、また
平均粒径が3μmより大きいと平滑性が無くなる。また
、組成物中の無機粒子の含量が0.001重量%より少
ないとすべり性の改良の効果がなく、含量が1重量%よ
り多いと薄物での延伸が困難となる。If the average particle size of the inorganic particles is smaller than 0.01 μm, dispersion will be difficult due to secondary aggregation of the particles, and if the average particle size is larger than 3 μm, smoothness will be lost. Further, if the content of inorganic particles in the composition is less than 0.001% by weight, there is no effect of improving slipperiness, and if the content is more than 1% by weight, it becomes difficult to stretch a thin product.
上記無機粒子は各種のものがあるが、例えば、IA族、
IIA族、IVA族、VIA族、■A族、■族。There are various kinds of the above-mentioned inorganic particles, for example, IA group,
Group IIA, Group IVA, Group VIA, Group ■A, Group ■.
IB族、ffB族、 IIIB族、IVB族元素の酸化
物。Oxides of group IB, ffB, IIIB, and IVB elements.
水酸化物、硫化物、窒素化物、ハロゲン化物、炭酸塩、
酢酸塩、燐酸塩、亜燐酸塩、有機カルボン酸塩、珪酸塩
、チタン酸塩、硼酸塩及びそれらの含水化合物、それら
を中心とする複合化合物、天然鉱物粒子を示す。具体的
には、弗化リチウム。hydroxides, sulfides, nitrides, halides, carbonates,
Shows acetates, phosphates, phosphites, organic carboxylates, silicates, titanates, borates and their hydrated compounds, complex compounds centered on them, and natural mineral particles. Specifically, lithium fluoride.
硼砂(硼酸ナトリウム含水塩)等のIA族元素化合物、
炭酸マグネシウム、燐酸マグネシウム、酸化マグネシウ
ム(マグネシア)、塩化マグネシウム、酢酸マグネシウ
ム、弗化マグネシウム、チタン酸マクネシウム、珪酸マ
グネシウム、珪酸マグネシウム含水塩(タルク)、炭酸
カルシウム、燐酸カルシウム、亜燐酸カルシウム、硫酸
カルシウム(石膏)、酢酸カルシウム、テレフタル酸カ
ルシウム、水酸化カルシウム、珪酸カルシウム、弗化カ
ルシウム、チタン酸カルシウム、チタン酸ストロンチウ
ム、炭酸バリウム、燐酸バリウム、硫酸バリウム、亜燐
酸バリウム等のIIAIA族元素化合物酸化チタン(チ
タニア)、−酸化チタン。Group IA element compounds such as borax (sodium borate hydrate),
Magnesium carbonate, magnesium phosphate, magnesium oxide (magnesia), magnesium chloride, magnesium acetate, magnesium fluoride, magnesium titanate, magnesium silicate, magnesium silicate hydrate (talc), calcium carbonate, calcium phosphate, calcium phosphite, calcium sulfate ( Group IIAIA element compounds such as gypsum), calcium acetate, calcium terephthalate, calcium hydroxide, calcium silicate, calcium fluoride, calcium titanate, strontium titanate, barium carbonate, barium phosphate, barium sulfate, barium phosphite, titanium oxide ( titania), - titanium oxide.
窒化チタン、二酸化ジルコニウム(ジルコニア)。Titanium nitride, zirconium dioxide (zirconia).
−酸化ジルコニウム等のIVA族元素化合物、二酸化モ
リブデン、二酸化モリブデン、硫化モリブデン等のVI
AIA族元素化合物化マンガン、酢酸マンガン等の■A
族元素化合物、塩化コバルト、酢酸コバルト等の■族元
素化合物、沃化第一銅等のIB族元素化合物、酸化亜鉛
、酢酸亜鉛等のIIB族元素化合物、酸化アルミニウム
(アルミナ)。- Group IVA element compounds such as zirconium oxide, VI such as molybdenum dioxide, molybdenum dioxide, molybdenum sulfide, etc.
■A of AIA group element compound manganese, manganese acetate, etc.
Group element compounds, Group I element compounds such as cobalt chloride and cobalt acetate, Group IB element compounds such as cuprous iodide, Group IIB element compounds such as zinc oxide and zinc acetate, and aluminum oxide (alumina).
水酸化アルミニウム、弗化アルミニウム、アルミノシリ
ケート(珪酸アルミナ、カオリン、カオリナイト)等の
IIIB族元素化合物、酸化珪素(シリカ、シリカゲル
)1石墨、カーボン、グラファイト、ガラス等のIVB
族元素化合物、カーナル石。Group IIIB element compounds such as aluminum hydroxide, aluminum fluoride, aluminosilicate (alumina silicate, kaolin, kaolinite), silicon oxide (silica, silica gel), IVB such as graphite, carbon, graphite, glass, etc.
Carnalite, a group element compound.
カイナイト、雲母(マイカ、キンウンモ)、バイロース
鉱等の天然鉱物の粒子が挙げられる。Examples include particles of natural minerals such as kainite, mica, and villoseite.
また、前述の(b)成分である組成物には、本発明の目
的を阻害しない限り、上記無機粒子とともに、他の種類
あるいは他の粒径の粒子、無機充填材等を含むものであ
ってもよい。In addition, the composition which is the component (b) mentioned above may not contain particles of other types or particle sizes, inorganic fillers, etc. in addition to the above-mentioned inorganic particles, as long as they do not impede the purpose of the present invention. Good too.
上記で用いる無機粒子は、最終的な成形品(フィルム)
に含有されるが、含有させる方法に限定はない。例えば
、スチレン系単量体の重合中の任意の過程で添加あるい
は析出させる方法、溶融押出する任意の過程で添加する
方法が挙げられる。The inorganic particles used above are the final molded product (film)
However, there are no limitations on the method of containing it. Examples include a method of adding or precipitating the styrenic monomer at any step during polymerization, and a method of adding at any step of melt extrusion.
この中では特に、重合過程の任意の段階で上記無機粒子
をスラリー状として添加する方法が、粒子の二次凝集を
防げるうえで好ましい。Among these, a method in which the inorganic particles are added in the form of a slurry at any stage of the polymerization process is particularly preferred since secondary aggregation of the particles can be prevented.
またこれらの無機粒子を効果的に分散させるため、分散
剤、界面活性剤等を用いてもよい。Further, in order to effectively disperse these inorganic particles, a dispersant, a surfactant, etc. may be used.
前記(b)成分の組成物は、基本的には上記スチレン系
重合体に無機粒子を所定割合で配合してなるものである
が、さらに成形性、力学物性1表面性等を考慮して他の
樹脂成分を含有させてもよい。The composition of component (b) is basically a mixture of inorganic particles in a predetermined ratio with the styrene polymer, but other ingredients may be added in consideration of moldability, mechanical properties, surface properties, etc. The resin component may also be included.
本発明の易滑性フィルムを製造する方法の一態様として
、前述したように上記(a)成分と(b)成分を加熱溶
融しながら共押出し、冷却固化後、延伸処理し、さらに
必要に応じて熱固定(熱処理)する方法があげられるが
、加熱熔融から熱固定までの操作を具体的に説明すれば
、次の通りである。As one embodiment of the method for producing the slippery film of the present invention, as described above, the above (a) component and (b) component are coextruded while being heated and melted, and after cooling and solidifying, stretching treatment is performed, and if necessary, A method of heat setting (heat treatment) can be mentioned, and the operations from heating and melting to heat setting are specifically explained as follows.
まず、上述の如き(a)、 (b)成分を成形素材とし
て、これを通常は共押出成形して、延伸用予備成形体(
原反シート)とする。この成形にあっては、上記成形素
材の加熱溶融したものを押出成形機にて所定形状に成形
するのが一般的であるが、成形素材を加熱溶融させずに
、軟化した状態で成形してもよい。ここで用いる押出成
形機は、−軸押出成形機、二軸押出成形機のいずれでも
よく、またベント付き、ベント無しのいずれでもよいが
、−軸のタンデム型が好ましい。なお、押出機には適当
なメツシュを使用しても良い。First, components (a) and (b) as described above are used as a molding material, which is usually coextruded to form a preform for stretching (
original fabric sheet). In this molding, it is common to heat and melt the above-mentioned molding material and mold it into a predetermined shape using an extrusion molding machine, but the molding material is molded in a softened state without being heated and melted. Good too. The extrusion molding machine used here may be either a -shaft extruder or a twin-screw extruder, and may be either with a vent or without a vent, but a -shaft tandem type is preferred. Note that an appropriate mesh may be used for the extruder.
またここで押出条件は、特に制限はなく、様々な状況に
応じて適宜選定すればよいが、好ましくは温度を成形素
材の融点〜分解温度より50°C高い温度の範囲で選定
し、剪断応力を5X10’dyne/cm以下とする。In addition, the extrusion conditions are not particularly limited and may be appropriately selected depending on various situations, but preferably the temperature is selected within the range of 50°C higher than the melting point of the molding material to the decomposition temperature, and the shear stress is 5×10'dyne/cm or less.
用いるダイはT−ダイ、円環ダイ等をあげることができ
る。The die used may be a T-die, an annular die, or the like.
上記共押出成形後、得られた原反シートを冷却固化する
。この際の冷媒は、気体、液体、金属ロール等各種のも
のを使用することができる。金属ロール等を用いる場合
、エアナイフ、エアチャンバー、タッチロール、静電印
荷等の方法によると厚みムラや波うち防止に効果的であ
る。After the above-mentioned coextrusion molding, the obtained raw sheet is cooled and solidified. As the refrigerant at this time, various types such as gas, liquid, and metal rolls can be used. When using a metal roll or the like, methods such as an air knife, air chamber, touch roll, and electrostatic charging are effective in preventing thickness unevenness and waviness.
冷却固化の温度は、通常はO℃〜原反シートのガラス転
移温度より30℃高い温度の範囲、好ましくはガラス転
移温度より20℃低い温度〜ガラス転移温度の範囲であ
る。また冷却速度は200〜3°C/秒の範囲で適宜選
択する。The temperature for cooling and solidification is usually in the range of 0° C. to 30° C. higher than the glass transition temperature of the original sheet, preferably in the range of 20° C. lower than the glass transition temperature to the glass transition temperature. Further, the cooling rate is appropriately selected within the range of 200 to 3°C/sec.
本発明では、冷却、固化した予備成形体(原反シート)
を−軸あるいは二輪に延伸する。二軸延伸の場合は縦方
向及び横方向に同時に延伸してもよいが、任意の順序で
逐次延伸してもよい。また延伸は一段で行ってもよく、
多段で行ってもよい。In the present invention, a cooled and solidified preform (original sheet)
Stretch to the -axis or two wheels. In the case of biaxial stretching, it may be stretched simultaneously in the longitudinal and transverse directions, or it may be stretched sequentially in any order. Also, stretching may be performed in one step,
It may be done in multiple stages.
ここで延伸方法としては、テンターによる方法。The stretching method used here is a method using a tenter.
ロール間で延伸する方法、気体圧力を利用してバブリン
グによる方法、圧延による方法など様々であり、これら
を適当に選定あるいは組み合わせて適用すればよい。延
伸温度は、一般には原反シートのガラス転移温度と融点
の間で設定すればよい。There are various methods such as stretching between rolls, bubbling using gas pressure, and rolling, and these may be appropriately selected or combined. The stretching temperature may generally be set between the glass transition temperature and melting point of the original sheet.
また延伸速度は、通常はl×10〜lXl0’%/分、
好ましくはlXl0”〜1×IO’%/分である。In addition, the stretching speed is usually 1×10 to 1×10’%/min,
Preferably it is 1X10'' to 1×IO'%/min.
上述の如き条件で延伸して得られた延伸フィルムに、さ
らに高温時の寸法安定性、耐熱性、フィルム面内の強度
バランスが要求される場合などには、さらに熱固定を行
うことが好ましい。熱固定は、通常行われている方法で
行うことができるが、この延伸フィルムを緊張状態、弛
緩状態あるいは制限収縮状態の下で、該フィルムのガラ
ス転移温度〜融点、好ましくは融点より100℃低い温
度〜融点直前の温度範囲にて、0.5〜120秒間保持
することによって行えばよい。なお、この熱固定は、上
記範囲内で条件を変えて二回以上行うことも可能である
。また、この熱固定はアルゴンガス、窒素ガスなどの不
活性ガス雰囲気下で行ってもよい、この熱固定を行わな
いと、特にガラス転移温度近傍で変形が生じやすく、加
工時や使用時に制約がある。In cases where the stretched film obtained by stretching under the above-mentioned conditions is required to have further dimensional stability at high temperatures, heat resistance, and in-plane strength balance of the film, it is preferable to further heat set the film. Heat setting can be carried out by a commonly used method, and the stretched film is placed under tension, relaxation or limited shrinkage, and the temperature is set between the glass transition temperature and the melting point of the film, preferably 100°C lower than the melting point. This may be carried out by holding the temperature for 0.5 to 120 seconds in the temperature range from the temperature to just below the melting point. Note that this heat fixing can be performed two or more times under different conditions within the above range. In addition, this heat fixation may be performed in an inert gas atmosphere such as argon gas or nitrogen gas. If this heat fixation is not performed, deformation is likely to occur, especially near the glass transition temperature, and there will be restrictions during processing and use. be.
このようにして得られる本発明の易滑性フィルムは、厚
さ2〜500μmであり、また片面が粗面で他面が平滑
面であり、該平滑面の表面粗さやフィルムの静摩擦係数
は前述の範囲のものとなる。The easily slippery film of the present invention obtained in this way has a thickness of 2 to 500 μm, and has a rough surface on one side and a smooth surface on the other side, and the surface roughness of the smooth surface and the coefficient of static friction of the film are as described above. It will be within the range of .
ここで、特に厚さが2〜20μmのフィルムは、磁気テ
ープ、コンデンサ用に、また厚さが20〜150μmの
フィルムは、磁気カード、プリント基板基材、写真フィ
ルム用に好適である。In particular, films with a thickness of 2 to 20 μm are suitable for magnetic tapes and capacitors, and films with a thickness of 20 to 150 μm are suitable for magnetic cards, printed circuit board substrates, and photographic films.
次に本発明を実施例及び比較例によりさらに詳しく説明
する。Next, the present invention will be explained in more detail with reference to Examples and Comparative Examples.
参考例1
(1)トリメチルアルミニウムと水との接触生成物の調
製
アルゴン置換した内容積500 milのガラス製容器
に、硫酸銅5水塩(CuS Oa ・5 HzO) 1
7.8g(71ミリモル)、トルエン200d及びトリ
メチルアルミニウム24dC250ミリモル)を入れ、
40°Cで8時間反応させた。その後、固体部分を除去
して得られた溶液から、更に、トルエンを室温下で減圧
留去して接触生成物6.7gを得た。Reference Example 1 (1) Preparation of contact product between trimethylaluminum and water In a glass container with an internal volume of 500 mil and replaced with argon, copper sulfate pentahydrate (CuS Oa .5 HzO) 1 was placed.
7.8 g (71 mmol), 200 d of toluene and 24 d of trimethylaluminum (250 mmol of C) were added,
The reaction was carried out at 40°C for 8 hours. Thereafter, from the solution obtained by removing the solid portion, toluene was further distilled off under reduced pressure at room temperature to obtain 6.7 g of a contact product.
このものの凝固点降下法によって測定した分子量は61
0であった。また、’H−NMR測定による前述の高磁
場成分(即ち、−〇、1〜−0.5 ppm)は43%
であった。The molecular weight of this substance measured by freezing point depression method is 61
It was 0. In addition, the aforementioned high magnetic field component (i.e., -0, 1 to -0.5 ppm) by 'H-NMR measurement was 43%.
Met.
(2)無機粒子を含むスチレン系重合体組成物の製造
精製スチレン単量体99.5重量部に乾式法シリカ(日
本アエロジル製、アエロジルTT−972(−次粒子の
直径0.3μのもの))を0.5重量部添加し、T、
K、ホモミキサーL型(特殊機化工業製)を用いて、円
筒容器の中で混合攪拌してスチレン混合物を調製した。(2) Production of styrenic polymer composition containing inorganic particles 99.5 parts by weight of purified styrene monomer was added to dry process silica (Nippon Aerosil, Aerosil TT-972 (-size particle diameter 0.3μ)) ), 0.5 parts by weight of T,
A styrene mixture was prepared by mixing and stirring in a cylindrical container using Homomixer L type (manufactured by Tokushu Kika Kogyo).
なお、この際ステアリン酸カルシウムを0.2重量部添
加した。At this time, 0.2 parts by weight of calcium stearate was added.
次に、内容積22の反応容器に、上記(1)で得られた
接触生成物をアルミニウム原子として5ミリモル、トリ
イソブチルアルミニウムを5ミリモル、ペンタメチルシ
クロペンタジェニルチタントリメトキシド0.025ミ
リモル及び上記のスチレン混合物12を加え、90°C
で5時間重合反応を行った。その後、水酸化ナトリウム
のメタノール溶液を注入して触媒成分を分解して重合を
停止し、さらにメタノールで繰返し洗浄後、乾燥して重
合体300gを得た。Next, in a reaction vessel with an internal volume of 22, 5 mmol of the contact product obtained in (1) above as aluminum atoms, 5 mmol of triisobutylaluminum, and 0.025 mmol of pentamethylcyclopentagenyl titanium trimethoxide. and the above styrene mixture 12, and heated to 90°C.
The polymerization reaction was carried out for 5 hours. Thereafter, a methanol solution of sodium hydroxide was injected to decompose the catalyst component to stop polymerization, and after repeated washing with methanol, the mixture was dried to obtain 300 g of a polymer.
この重合体の重量平均分子量を、1.2.4−トリクロ
ロベンゼンを溶媒として、135°Cでゲルパーミェー
ションクロマトグラフィーにて測定したところ389
、000であり、また重量平均分子量/数平均分子量は
2.64であった。また、融点及び”C−NMR測定に
より、この重合体はシンジオタクチック構造のポリスチ
レンであることを確認した。このスチレン系重合体の3
00”C。The weight average molecular weight of this polymer was measured by gel permeation chromatography at 135°C using 1.2.4-trichlorobenzene as a solvent and was 389.
, 000, and the weight average molecular weight/number average molecular weight was 2.64. Furthermore, by melting point and C-NMR measurements, it was confirmed that this polymer was polystyrene with a syndiotactic structure.
00”C.
200/秒の剪断速度での溶融粘度はlXl0’ボイズ
であった。The melt viscosity at a shear rate of 200/sec was 1X10'voids.
この重合体を130°Cで1.2.4−トリクロロベン
ゼンに溶解し、濾別し、重合体中のシリカ含量を調べた
ところ0.5wt%であった。また、この溶液をスライ
ドガラス上に滴下し、顕微鏡で観察し、シリカの平均粒
径を調べたところ0.08μmであった。This polymer was dissolved in 1,2,4-trichlorobenzene at 130°C, filtered, and the silica content in the polymer was determined to be 0.5 wt%. Further, this solution was dropped onto a glass slide and observed under a microscope to find out the average particle size of the silica, which was 0.08 μm.
さらに、このスチレン系重合体を150°Cで2時間、
減圧乾燥した。得られたパウダーを、ベント付き二軸押
出機の先端にキャピラリーを持つ装置で300°Cにて
押出し、冷却後、カットしベレットとした。このベレッ
トを熱風により攪拌しながら結晶化させた。このベレッ
トは、結晶化度35%でスチレンモノマーを700pp
m含んでいた。Furthermore, this styrene polymer was heated at 150°C for 2 hours.
Dry under reduced pressure. The obtained powder was extruded at 300°C using a vented twin-screw extruder with a capillary at the tip, cooled, and then cut into pellets. This pellet was crystallized while stirring with hot air. This pellet has 700 pp of styrene monomer with 35% crystallinity.
It contained m.
参考例2
(無機微粒子を含まないスチレン系重合体の製造)乾式
シリカを含まないスチレンモノマーを用いて、上記参考
例1(2)と同様にしてスチレン系重合体を製造した。Reference Example 2 (Production of styrenic polymer containing no inorganic particles) A styrenic polymer was produced in the same manner as in Reference Example 1 (2) above using a styrene monomer containing no dry silica.
得られた重合体は、重量平均分子量が417,000重
量平均分子量/数平均分子量が2.54.Affi含量
が75 ppm+ T 1含量が2 ppr@であった
。この重合体の300°C,200/秒の剪断速度での
溶融粘度は1.2X10’ボイズであった・
このスチレン系重合体を上記参考例1(2)と同様にベ
レットとした。このベレットの結晶化度は30%であり
、スチレンモノマー含量は800pp■であった。The obtained polymer had a weight average molecular weight of 417,000 and a weight average molecular weight/number average molecular weight of 2.54. Affi content was 75 ppm+ T1 content was 2 ppr@. The melt viscosity of this polymer at 300° C. and a shear rate of 200/sec was 1.2×10′ voids. This styrenic polymer was made into pellets in the same manner as in Reference Example 1(2) above. The crystallinity of this pellet was 30%, and the styrene monomer content was 800 pp.
実施例1
参考例1,2で得られた材料を加熱結晶化後、二台の押
出機の先端に共押出用T−ダイを取りつけた装置を用い
て溶融加熱共押出を行った。このとき、参考例1の材料
は内径25mmの押出機で、参考例2の材料は内径40
mmの押出機でそれぞれ320°Cにて押出した。Example 1 The materials obtained in Reference Examples 1 and 2 were heated and crystallized, and then melted and heated to be coextruded using a device in which a T-die for coextrusion was attached to the tip of two extruders. At this time, the material of Reference Example 1 was used in an extruder with an inner diameter of 25 mm, and the material of Reference Example 2 was used in an extruder with an inner diameter of 40 mm.
Each sample was extruded at 320° C. using a 1.0 mm extruder.
この溶融押出したシートを静電印荷により63℃の冷却
ロールに密着させ、冷却固化させた。この時の冷却速度
は平均55°C/秒で130μmの延伸用シートを得た
。このシートをロール間で、それぞれのロールの周速度
を変化させ縦方向に、110°C2延伸速度6000%
/分で3倍に延伸した。続いて、横方向にテンターを用
いて120℃、延伸速度6000%/分で3倍に延伸し
た。This melt-extruded sheet was brought into close contact with a cooling roll at 63° C. by electrostatic charging, and cooled and solidified. The cooling rate at this time was an average of 55°C/sec to obtain a stretched sheet of 130 μm. This sheet was stretched between rolls at 110°C2 at a stretching speed of 6,000% in the longitudinal direction by changing the circumferential speed of each roll.
The film was stretched 3 times at a speed of 1/min. Subsequently, the film was stretched 3 times in the transverse direction using a tenter at 120° C. and at a stretching rate of 6000%/min.
更に横方向にテンターで固定したまま、縦方向に、13
0°C,2000%/分で1.5倍に再延伸した。この
フィルムを、テンターに固定し若干弛緩させ、255°
Cで10秒熱処理した。Furthermore, while fixing it horizontally with a tenter, vertically, 13
It was re-stretched to 1.5 times at 0°C and 2000%/min. This film was fixed on a tenter and slightly loosened, 255°
C. for 10 seconds.
得られたフィルムは厚さ12μmであった。このフィル
ムの表面粗さをJIS B−0601に準拠し、カッ
トオフ値0.08mmにて測定した。The resulting film had a thickness of 12 μm. The surface roughness of this film was measured according to JIS B-0601 at a cutoff value of 0.08 mm.
また、静摩擦係数をASTM D−1894に従って測
定した。得られたフィルムの性質を表に示す。In addition, the static friction coefficient was measured according to ASTM D-1894. The properties of the obtained film are shown in the table.
実施例2
参考例1において、シリカとして平均粒径0.9μmの
シリカ(水澤化学工業製、ジルトンAMT−08)を用
いたこと以外は、参考例1と同様にしてスチレン系重合
体組成物を調製した。Example 2 A styrenic polymer composition was prepared in the same manner as in Reference Example 1, except that silica with an average particle size of 0.9 μm (Jilton AMT-08, manufactured by Mizusawa Chemical Industry) was used as the silica. Prepared.
次に、実施例1において、参考例1の材料の代わりに、
このスチレン系重合体組成物を用いたこと以外は、実施
例1と同様の操作を行った。結果を表に示す。Next, in Example 1, instead of the material of Reference Example 1,
The same operation as in Example 1 was performed except that this styrenic polymer composition was used. The results are shown in the table.
実施例3
参考例2のスチレン系重合体ペレットを用いて、押出機
中に50/150/400/150150メツシユを入
れたことの他は、実施例1と同様に延伸フィルムを作成
した。このフィルムをコロナ処理した。次に、特開平1
−95113号公報の実施例1で得られたシンジオタク
チック構造のスチレン−ジビニルベンゼン共重合体(シ
ヒニルベンゼン単位9.4モル%、エチルベンゼン単位
5.0モル%9重量平均分子量360.000 )の0
.5wt%クロロホルム溶液を作り、この溶液にスチレ
ン−ジビニルベンゼン共重合体に対して0.5wt%の
乾式法シリカ(日本アエロジル製アエロジルTT−97
2ニー次粒子の粒径0.3μのもの)を添加し、ホモミ
キサーL型(特殊機化工業製)を用いて円筒容器で均一
に混合し、スラリー溶液とした。このスラリー溶液を上
記フィルムにバーコーターにて塗布し、250℃で10
秒乾燥した。Example 3 Using the styrene polymer pellets of Reference Example 2, a stretched film was produced in the same manner as in Example 1, except that a 50/150/400/150150 mesh was placed in the extruder. This film was corona treated. Next, JP-A-1
0 of the syndiotactic structure styrene-divinylbenzene copolymer obtained in Example 1 of Publication No.-95113 (9.4 mol% of syndiotactic units, 5.0 mol% of ethylbenzene units, 9 weight average molecular weight: 360.000)
.. A 5 wt% chloroform solution was prepared, and 0.5 wt% of dry process silica (Aerosil TT-97 manufactured by Nippon Aerosil) was added to the styrene-divinylbenzene copolymer.
Secondary particles having a particle size of 0.3 μm) were added thereto and mixed uniformly in a cylindrical container using a homomixer L type (manufactured by Tokushu Kika Kogyo Co., Ltd.) to form a slurry solution. This slurry solution was applied to the above film using a bar coater, and heated at 250°C for 10 minutes.
Dry for seconds.
得られたフィルムの性質を表に示す。The properties of the obtained film are shown in the table.
実施例4
実施例3において、シリカとして平均粒径0.9μmの
シリカ(水澤化学工業製、ジルトンAMT−08)を用
いたこと以外は、実施例3と同様の操作を行った。結果
を表に示す。Example 4 In Example 3, the same operation as in Example 3 was performed except that silica (manufactured by Mizusawa Chemical Industries, Ltd., Jiruton AMT-08) having an average particle size of 0.9 μm was used as the silica. The results are shown in the table.
比較例1 実施例3の塗布前のフィルムの性質を調べた。Comparative example 1 The properties of the film of Example 3 before coating were investigated.
結果を表に示す。The results are shown in the table.
比較例2
参考例1の材料を用いて、単層でフィルムを作成したこ
と以外は、実施例1と同様の操作を行った。結果を表に
示す。Comparative Example 2 The same operation as in Example 1 was performed except that a single layer film was created using the material of Reference Example 1. The results are shown in the table.
(以下余白)
〔発明の効果〕
畝上の如く、本発明のフィルムは、耐熱性にすぐれ、し
かも高度な平滑面を有するとともに、良好なすべり性を
併せ有するものである。(The following is a blank space) [Effects of the Invention] As shown in the ridges, the film of the present invention has excellent heat resistance, has a highly smooth surface, and also has good slip properties.
したがって、本発明のフィルムは、磁気テープ。Therefore, the film of the present invention can be used as a magnetic tape.
磁気ディスク、FPC,写真フィルム等のフィルム基材
をはじめ、コンデンサ等の各種産業用フィルムとして有
効な利用が期待される。It is expected to be effectively used as a film base material for magnetic disks, FPCs, photographic films, etc., as well as various industrial films such as capacitors.
Claims (5)
体又はその組成物の延伸フィルムあるいは該延伸フィル
ムを含む積層フィルムであって、片面が粗面で他面が平
滑面であり、該平滑面の表面粗さRaが0.001〜0
.02μmであるとともに、前記フィルムの静摩擦係数
μsが0.3〜1.0であることを特徴とする易滑性フ
ィルム。(1) A stretched film of a styrenic polymer having a syndiotactic structure or a composition thereof, or a laminated film containing the stretched film, wherein one side is a rough surface and the other side is a smooth surface, and the surface of the smooth surface Roughness Ra is 0.001~0
.. 02 μm, and the film has a static friction coefficient μs of 0.3 to 1.0.
ある請求項1記載の易滑性フィルム。(2) The slippery film according to claim 1, wherein the ratio of surface roughness between the rough surface and the smooth surface is 1.5 to 10.
チタン分が10ppm以下及び残留スチレン系単量体が
7000ppm以下であるシンジオタクチック構造を有
するスチレン系重合体を主成分とする層の片面に、樹脂
層及び/又は無機粒子を含有する樹脂層を積層してなる
請求項1記載の易滑性フィルム。(3) A resin layer on one side of a layer mainly composed of a styrenic polymer having a syndiotactic structure with a residual aluminum content of 3000 ppm or less, a residual titanium content of 10 ppm or less, and a residual styrene monomer content of 7000 ppm or less. The slippery film according to claim 1, comprising a laminated resin layer containing and/or inorganic particles.
、残留チタン分が10ppm以下及び残留スチレン系単
量体が7000ppm以下であるシンジオタクチック構
造を有するスチレン系重合体と(b)シンジオタクチッ
ク構造を有するスチレン系重合体に平均粒径0.01〜
3μmの無機粒子を配合してなる組成物を、加熱溶融し
ながら共押出し、次いで延伸することを特徴とする請求
項3記載の易滑性フィルムの製造方法。(4) (a) A styrenic polymer having a syndiotactic structure with a residual aluminum content of 3000 ppm or less, a residual titanium content of 10 ppm or less, and a residual styrenic monomer content of 7000 ppm or less, and (b) a syndiotactic structure. The styrenic polymer has an average particle size of 0.01~
4. The method for producing an easily slippery film according to claim 3, wherein a composition comprising inorganic particles of 3 μm is coextruded while being heated and melted, and then stretched.
チタン分が10ppm以下及び残留スチレン系単量体が
7000ppm以下であるシンジオタクチック構造を有
するスチレン系重合体を主成分とする延伸フィルムの片
面に、溶解した樹脂及び/又は無機粒子を含有する樹脂
を塗布することを特徴とする請求項3記載の易滑性フィ
ルムの製造方法。(5) Dissolved on one side of a stretched film mainly composed of a styrenic polymer having a syndiotactic structure with a residual aluminum content of 3000 ppm or less, a residual titanium content of 10 ppm or less, and a residual styrene monomer content of 7000 ppm or less. 4. The method for producing an easily slippery film according to claim 3, further comprising applying a resin containing a resin and/or an inorganic particle.
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1245224A JPH03109453A (en) | 1989-09-22 | 1989-09-22 | Slippery film and production thereof |
KR1019910700495A KR960003276B1 (en) | 1989-09-14 | 1990-05-13 | Slippery film and the production thereof |
CA002039695A CA2039695A1 (en) | 1989-09-14 | 1990-09-13 | Readily slidable film and process for production thereof |
AT90913546T ATE153043T1 (en) | 1989-09-14 | 1990-09-13 | SLIDING FILM AND METHOD FOR PRODUCING IT |
EP90913546A EP0444206B1 (en) | 1989-09-14 | 1990-09-13 | Slippery film and production thereof |
PCT/JP1990/001174 WO1991004287A1 (en) | 1989-09-14 | 1990-09-13 | Slippery film and production thereof |
DE69030721T DE69030721T2 (en) | 1989-09-14 | 1990-09-13 | SLIDING FILM AND METHOD FOR PRODUCING THE SAME |
US08/168,273 US5476899A (en) | 1989-09-14 | 1993-12-15 | Process for produce a readily slidable film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1245224A JPH03109453A (en) | 1989-09-22 | 1989-09-22 | Slippery film and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03109453A true JPH03109453A (en) | 1991-05-09 |
Family
ID=17130493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1245224A Pending JPH03109453A (en) | 1989-09-14 | 1989-09-22 | Slippery film and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03109453A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996017889A1 (en) * | 1994-12-07 | 1996-06-13 | Idemitsu Petrochemical Co., Ltd. | Polystyrene resin composition and oriented polystyrene film |
US5707719A (en) * | 1995-05-29 | 1998-01-13 | Toyo Boseki Kabushiki Kaisha | Oriented film including polystyrene polymer having syndiotactic configuration |
WO2019107525A1 (en) | 2017-12-01 | 2019-06-06 | 出光興産株式会社 | Method for producing styrene resin and styrene resin molded article |
-
1989
- 1989-09-22 JP JP1245224A patent/JPH03109453A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996017889A1 (en) * | 1994-12-07 | 1996-06-13 | Idemitsu Petrochemical Co., Ltd. | Polystyrene resin composition and oriented polystyrene film |
US5707719A (en) * | 1995-05-29 | 1998-01-13 | Toyo Boseki Kabushiki Kaisha | Oriented film including polystyrene polymer having syndiotactic configuration |
WO2019107525A1 (en) | 2017-12-01 | 2019-06-06 | 出光興産株式会社 | Method for producing styrene resin and styrene resin molded article |
KR20200086295A (en) | 2017-12-01 | 2020-07-16 | 이데미쓰 고산 가부시키가이샤 | Method for producing styrene resin and molded styrene resin |
US11180584B2 (en) | 2017-12-01 | 2021-11-23 | Idemitsu Kosan Co., Ltd. | Method for producing styrene resin and styrene resin molded article |
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