JPH0310530U - - Google Patents
Info
- Publication number
- JPH0310530U JPH0310530U JP7112189U JP7112189U JPH0310530U JP H0310530 U JPH0310530 U JP H0310530U JP 7112189 U JP7112189 U JP 7112189U JP 7112189 U JP7112189 U JP 7112189U JP H0310530 U JPH0310530 U JP H0310530U
- Authority
- JP
- Japan
- Prior art keywords
- film
- semiconductor device
- silicon nitride
- protective film
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims 2
- 230000001681 protective effect Effects 0.000 claims 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000002161 passivation Methods 0.000 claims 1
- 238000001020 plasma etching Methods 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
Landscapes
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7112189U JPH0310530U (enExample) | 1989-06-16 | 1989-06-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7112189U JPH0310530U (enExample) | 1989-06-16 | 1989-06-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0310530U true JPH0310530U (enExample) | 1991-01-31 |
Family
ID=31607872
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7112189U Pending JPH0310530U (enExample) | 1989-06-16 | 1989-06-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0310530U (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011193977A (ja) * | 2010-03-18 | 2011-10-06 | Fumi Sueyoshi | ネイルアートスティック |
-
1989
- 1989-06-16 JP JP7112189U patent/JPH0310530U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011193977A (ja) * | 2010-03-18 | 2011-10-06 | Fumi Sueyoshi | ネイルアートスティック |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA2021671A1 (en) | High voltage semiconductor device and fabrication process | |
| JPH0310530U (enExample) | ||
| JPS6410222A (en) | Substrate for thin film passive element | |
| JPS6327066U (enExample) | ||
| JPS5666065A (en) | Semiconductor memory unit | |
| JPS6484724A (en) | Semiconductor device | |
| GB1353185A (en) | Method of making a semiconductor device | |
| JPS56148863A (en) | Manufacture of semiconductor device | |
| EP0067738A3 (en) | Method of reducing encroachment in a semiconductor device | |
| JPH0369232U (enExample) | ||
| JPH028032U (enExample) | ||
| JPS61171245U (enExample) | ||
| JP2606414B2 (ja) | 半導体装置の製造方法 | |
| JPS62168235U (enExample) | ||
| JPH0376139U (enExample) | ||
| JPH0487650U (enExample) | ||
| JPS5655061A (en) | Integrated semiconductor device | |
| JPS6451636A (en) | Manufacture of semiconductor integrated circuit | |
| JPS62197036U (enExample) | ||
| JPS6439656U (enExample) | ||
| JPS62166638U (enExample) | ||
| JPH0365258U (enExample) | ||
| JPS6338324U (enExample) | ||
| JPH01116442U (enExample) | ||
| JPH01169041U (enExample) |