JPH03103550U - - Google Patents
Info
- Publication number
- JPH03103550U JPH03103550U JP1137390U JP1137390U JPH03103550U JP H03103550 U JPH03103550 U JP H03103550U JP 1137390 U JP1137390 U JP 1137390U JP 1137390 U JP1137390 U JP 1137390U JP H03103550 U JPH03103550 U JP H03103550U
- Authority
- JP
- Japan
- Prior art keywords
- absorber electrode
- catch plate
- disk
- absorber
- ion beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000006096 absorbing agent Substances 0.000 claims description 11
- 238000010884 ion-beam technique Methods 0.000 claims description 4
- 239000012212 insulator Substances 0.000 claims description 2
- 238000010292 electrical insulation Methods 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
Description
第１図は、この考案の一実施例に係るイオン処
理装置を示す要部構成図である。第２図は、第１
図の装置におけるアブソーバ電極周りを示す図で
ある。第３図は、従来のイオン処理装置の一例を
示す要部構成図である。第４図は、第３図の装置
におけるアブソーバ電極周りを示す図である。
２……イオンビーム、６……フアラデーカツプ
、８……ウエーハ、１０……デイスク、１２……
キヤツチプレート、１６……フイラメント、２２
……二次電子、２４……第１のアブソーバ電極、
２６……第２のアブソーバ電極、３２……絶縁物
、３４……第１の直流電源、３６……第２の直流
電源。
FIG. 1 is a block diagram of essential parts of an ion processing apparatus according to an embodiment of this invention. Figure 2 shows the first
FIG. 3 is a diagram showing the area around the absorber electrode in the device shown in the figure. FIG. 3 is a block diagram of main parts showing an example of a conventional ion processing apparatus. FIG. 4 is a diagram showing the vicinity of the absorber electrode in the device of FIG. 3. 2...Ion beam, 6...Fuaraday cup, 8...Wafer, 10...Disk, 12...
Catch plate, 16...Filament, 22
...Secondary electron, 24...First absorber electrode,
26... Second absorber electrode, 32... Insulator, 34... First DC power supply, 36... Second DC power supply.
Claims (1)
クに装着されたウエーハにイオンビームを照射し
て当該ウエーハを処理する装置であつて、デイス
クの前面側に設けられたフアラデーカツプと、デ
イスクの後面側に設けられていてデイスクが並進
したときにそれの代わりにイオンビームを受ける
キヤツチプレートと、フアラデーカツプに一次電
子を当ててそこから二次電子を放出させるフイラ
メントとを備え、この二次電子をイオンビーム照
射領域におけるウエーハに供給するようにしたも
のにおいて、前記フアラデーカツプのデイスク側
端部をそれとの間で電気絶縁を保つた状態で取り
囲むように第１のアブソーバ電極を設け、前記キ
ヤツチプレートのデイスク側端部に、絶縁物を介
して、当該端部を取り囲みかつ第１のアブソーバ
電極と対向する第２のアブソーバ電極を取り付け
、第１のアブソーバ電極とキヤツチプレートとの
間に前者に負電圧を印加する第１の直流電源を接
続し、第２のアブソーバ電極とキヤツチプレート
との間に前者に正電圧を印加する第２の直流電源
を接続したことを特徴とするイオン処理装置。 It is a device that processes a wafer mounted on a disk that is rotated and translated in a vacuum chamber by irradiating the wafer with an ion beam. It is equipped with a catch plate that receives the ion beam instead of the ion beam when the disk is translated, and a filament that hits the far day cup with primary electrons and emits secondary electrons. A first absorber electrode is provided to surround the disk-side end of the Faraday cup while maintaining electrical insulation therebetween, and a first absorber electrode is provided to surround the disk-side end of the Faraday cup while maintaining electrical insulation therebetween; A second absorber electrode that surrounds the end and faces the first absorber electrode is attached via an insulator, and a negative voltage is applied to the first absorber electrode and the catch plate. An ion processing apparatus characterized in that a first DC power source is connected to the catch plate, and a second DC power source for applying a positive voltage to the second absorber electrode and the catch plate is connected between the second absorber electrode and the catch plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1137390U JPH03103550U (en) | 1990-02-07 | 1990-02-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1137390U JPH03103550U (en) | 1990-02-07 | 1990-02-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03103550U true JPH03103550U (en) | 1991-10-28 |
Family
ID=31514901
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1137390U Pending JPH03103550U (en) | 1990-02-07 | 1990-02-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03103550U (en) |
-
1990
- 1990-02-07 JP JP1137390U patent/JPH03103550U/ja active Pending
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