JPH0284323U - - Google Patents

Info

Publication number
JPH0284323U
JPH0284323U JP16487388U JP16487388U JPH0284323U JP H0284323 U JPH0284323 U JP H0284323U JP 16487388 U JP16487388 U JP 16487388U JP 16487388 U JP16487388 U JP 16487388U JP H0284323 U JPH0284323 U JP H0284323U
Authority
JP
Japan
Prior art keywords
semiconductor wafer
spacer
metal mask
wafer holder
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16487388U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16487388U priority Critical patent/JPH0284323U/ja
Publication of JPH0284323U publication Critical patent/JPH0284323U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の一実施例を示す縦断面図、第
2図は第1図のA部の拡大図、第3図は従来の蒸
着用半導体ウエハホルダを示す縦断面図、第4図
は第3図のB部の拡大図である。 4…スペーサ、4a…スペーサの波状溝、5…
半導体ウエハ、6…メタルマスク。
FIG. 1 is a vertical cross-sectional view showing an embodiment of the present invention, FIG. 2 is an enlarged view of part A in FIG. 1, FIG. 3 is a vertical cross-sectional view showing a conventional semiconductor wafer holder for deposition, and FIG. 4 is an enlarged view of section B in FIG. 3. FIG. 4... Spacer, 4a... Wavy groove of spacer, 5...
Semiconductor wafer, 6...metal mask.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体ウエハ上にメタルマスクを用いて選択的
に蒸着するウエハホルダにおいて、半導体ウエハ
をメタルマスク上に固定するスペーサを半円球状
の形状に構成し、かつその内側に波状の溝をラン
ダムに有することを特徴とする蒸着用半導体ウエ
ハホルダ。
In a wafer holder that selectively deposits vapor on a semiconductor wafer using a metal mask, the spacer for fixing the semiconductor wafer on the metal mask is configured in a semicircular shape, and has wavy grooves randomly inside the spacer. Features: Semiconductor wafer holder for vapor deposition.
JP16487388U 1988-12-20 1988-12-20 Pending JPH0284323U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16487388U JPH0284323U (en) 1988-12-20 1988-12-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16487388U JPH0284323U (en) 1988-12-20 1988-12-20

Publications (1)

Publication Number Publication Date
JPH0284323U true JPH0284323U (en) 1990-06-29

Family

ID=31450851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16487388U Pending JPH0284323U (en) 1988-12-20 1988-12-20

Country Status (1)

Country Link
JP (1) JPH0284323U (en)

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