JPH0282772U - - Google Patents
Info
- Publication number
- JPH0282772U JPH0282772U JP16013388U JP16013388U JPH0282772U JP H0282772 U JPH0282772 U JP H0282772U JP 16013388 U JP16013388 U JP 16013388U JP 16013388 U JP16013388 U JP 16013388U JP H0282772 U JPH0282772 U JP H0282772U
- Authority
- JP
- Japan
- Prior art keywords
- reaction chamber
- flange
- attached
- lid body
- rotary substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 10
- 238000003780 insertion Methods 0.000 claims description 3
- 230000037431 insertion Effects 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 239000002994 raw material Substances 0.000 claims 2
- 230000002093 peripheral effect Effects 0.000 claims 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案による回転型基板処理装置の構
造の一例を示す一部切開説明図、第２図は前記回
転型基板処理装置における回転型基板保持具の概
略の構造を示す斜視図、第３図ａ〜ｄは従来の基
板処理装置の反応室の構造の一例を示す概略断面
図である。
１……反応室、２……加熱装置、３……フラン
ジ、４……反応室本体、５……蓋体、６……軸受
け、７……原料ガス供給用管、８……排気ガス用
管、９……シヤフト、１０……回転型基板保持具
、１１……基板挿着溝、１２……上板用中実円板
、１３……下板用中空円板、１４……支柱、１５
……基板、１６……基板保持部、２１……ヒータ
ー、２２……反応室、２３……ガス流、２４……
基板、２５……基板ホルダ。
FIG. 1 is a partially cutaway explanatory view showing an example of the structure of a rotary substrate processing apparatus according to the present invention, FIG. 2 is a perspective view showing a schematic structure of a rotary substrate holder in the rotary substrate processing apparatus, and FIG. 3A to 3D are schematic cross-sectional views showing an example of the structure of a reaction chamber of a conventional substrate processing apparatus. 1...Reaction chamber, 2...Heating device, 3...Flange, 4...Reaction chamber main body, 5...Lid, 6...Bearing, 7...Material gas supply pipe, 8...For exhaust gas Pipe, 9... Shaft, 10... Rotating board holder, 11... Board insertion groove, 12... Solid disk for upper plate, 13... Hollow disk for lower plate, 14... Support column, 15
... Substrate, 16 ... Substrate holding part, 21 ... Heater, 22 ... Reaction chamber, 23 ... Gas flow, 24 ...
Board, 25... board holder.
Claims (1)
料ガスを供給する為の原料ガス供給用管及び反応
が終了したガスを排気する為の排気ガス用管が設
けられ、外周に加熱装置が装着されたフランジ付
きの反応室本体と、中央部に反応室の外側に突出
する様にして軸受けが取りつけられた、反応室本
体のフランジ部に着脱可能なフランジ付き蓋体と
、前記蓋体の前記軸受けによりシヤフトが軸支さ
れた、反応室内に装入保持される回転型基板保持
具とからなり、前記回転型基板保持具が、内面に
基板挿着溝を所望数設けた上板用中実円板と、該
上板用中実円板の基板挿着溝と対向する面に、前
記溝と対向する位置に基板挿着溝を設けた下板用
中空円板とが所定の間隔をもつて支柱により固定
されている基板保持部がシヤフトに装着されたも
のである事を特徴とする回転型基板処理装置。 A raw material gas supply pipe for supplying raw material gas into the reaction chamber and an exhaust gas pipe for exhausting gas after the reaction are provided in the center and peripheral parts of the bottom, respectively, and a heating device is attached to the outer periphery. a reaction chamber main body with a flange, a lid body with a flange attached to a center portion thereof so as to protrude outside the reaction chamber, a lid body with a flange detachable from the flange portion of the reaction chamber body, and the bearing of the lid body. A rotary substrate holder is inserted into and held in the reaction chamber, and the shaft is pivotally supported by a rotary substrate holder. The plate and a hollow disc for a lower plate, which has a board insertion groove at a position opposite to the groove on a surface facing the board insertion groove of the solid disc for the upper plate, are spaced at a predetermined interval. A rotary substrate processing apparatus characterized in that a substrate holding part fixed by a support is attached to a shaft.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16013388U JPH0282772U (en) | 1988-12-09 | 1988-12-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16013388U JPH0282772U (en) | 1988-12-09 | 1988-12-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0282772U true JPH0282772U (en) | 1990-06-26 |
Family
ID=31441934
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16013388U Pending JPH0282772U (en) | 1988-12-09 | 1988-12-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0282772U (en) |
-
1988
- 1988-12-09 JP JP16013388U patent/JPH0282772U/ja active Pending
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