JPH0281025A - Multicolor liquid crystal display device and its production - Google Patents
Multicolor liquid crystal display device and its productionInfo
- Publication number
- JPH0281025A JPH0281025A JP63234413A JP23441388A JPH0281025A JP H0281025 A JPH0281025 A JP H0281025A JP 63234413 A JP63234413 A JP 63234413A JP 23441388 A JP23441388 A JP 23441388A JP H0281025 A JPH0281025 A JP H0281025A
- Authority
- JP
- Japan
- Prior art keywords
- color filters
- light
- liquid crystal
- electrodeposition
- photosensitive resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 title description 12
- 238000004070 electrodeposition Methods 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims abstract description 24
- 239000011347 resin Substances 0.000 claims abstract description 17
- 229920005989 resin Polymers 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 229920000642 polymer Polymers 0.000 claims abstract description 6
- 239000010409 thin film Substances 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 41
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 238000004043 dyeing Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、液晶カラーテレビ、パーソナルコンピュータ
の表示装置、ビデオ表示装置、計４１１１機器の表示パ
ネル等あらゆる用途に応用可能な高画質多色液晶装置及
びその製造方法に関するものである。Detailed Description of the Invention [Field of Industrial Application] The present invention provides a high-definition multicolor liquid crystal display that can be applied to all kinds of uses, such as liquid crystal color televisions, display devices for personal computers, video display devices, and display panels for a total of 4111 devices. The present invention relates to a device and a method for manufacturing the same.
本発明は、多色液晶表示装置に用いられるカラーフィル
ター、特にＴ Ｆ Ｔ （Ｔｈｉｎ ＦｉｌＩＩＩＴｒ
ａｎｓｉｓＬｅｒ）基板等のアクティブ素子基板を用い
た表示パネル内に設けたカラーフィルターの間隙部に電
着法により遮光膜を形成することにより高画質の多色液
晶表示装置を提供する。The present invention relates to color filters used in multicolor liquid crystal display devices, particularly TFT (Thin FilIIITr).
A multicolor liquid crystal display device with high image quality is provided by forming a light-shielding film by electrodeposition in the gap between color filters provided in a display panel using an active element substrate such as an ansisLer) substrate.
液晶表示装置は従来は、時計や電卓等の表示装置として
広く用いられてきたが、近年では表示パネルに極めて微
細なカラーフィルターを用いることにより多色表示が行
えるようになってきた。この場合、液晶は光シヤツター
として用いられるが、シャッターを閉じた際の光の遮光
率、特にカラーフィルター間隙からの光の漏れが表示品
質、カラーコントラストを低下させる要因となる。この
欠点を除去するために、カラーフィルター間隙に遮光膜
を設けることが必要になってきている。Liquid crystal display devices have conventionally been widely used as display devices for watches, calculators, etc., but in recent years, it has become possible to display multiple colors by using extremely fine color filters in the display panel. In this case, the liquid crystal is used as a light shutter, but the light blocking rate when the shutter is closed, especially the leakage of light from the gaps between the color filters, becomes a factor that deteriorates display quality and color contrast. In order to eliminate this drawback, it has become necessary to provide a light shielding film between the color filters.
従来の遮光膜を設けたカラーフィルターの製造方法を第
３図を用いて説明する。A conventional method for manufacturing a color filter provided with a light-shielding film will be described with reference to FIG.
第３図囚は、遮光膜として金属薄膜を用いたものである
。まずはしめに、透明ガラス基板２上にスパッタリング
等の気相メツキ法でカラーフィルター間隙部にクロム等
の金属薄膜を形成する。この際に、カラーフィルター形
成予定部に金属が析出しないようにマスクないしマスキ
ング材による被覆が必要になる。次に、赤色のカラーフ
ィルター４Ｒを形成し、その上に防染膜７を設ける。同
様にカラーフィルター４Ｇ、４Ｂを設けてメタル遮光膜
付カラーフィルターが製造される。The photo in FIG. 3 uses a metal thin film as a light-shielding film. First, a thin film of metal such as chromium is formed on the transparent glass substrate 2 in the gaps between the color filters by a vapor phase plating method such as sputtering. At this time, it is necessary to cover the area where the color filter is to be formed with a mask or masking material so that metal does not precipitate. Next, a red color filter 4R is formed, and an anti-dyeing film 7 is provided thereon. Similarly, a color filter with a metal light-shielding film is manufactured by providing color filters 4G and 4B.
第３図１３は、赤・緑・青３色のカラーフィルターを重
ね合わせて減法混色効果を用いて黒色の遮光膜を形成す
る方法である。遮光膜形成部に赤色フィルター、緑色フ
ィルター及び青色フィルターを順次重ねていくことによ
り、赤・緑・青３色のカラーフィルターと同時に遮光膜
を形成することができる。FIG. 3 shows a method of forming a black light-shielding film by superimposing three color filters of red, green, and blue and using a subtractive color mixture effect. By sequentially stacking a red filter, a green filter, and a blue filter on the light-shielding film forming portion, the light-shielding film can be formed simultaneously with the three color filters of red, green, and blue.
前述した従来方法による遮光膜を設けたカラーフィルタ
ーは、その製造方法の特質としてカラーフィルター表面
の凹凸は避けられない。第３図囚に示した金属薄膜を遮
光膜にした場合、金属薄膜の厚さはせいぜい、ｌ０００
人が量産を前提にする最大値である。しかし、カラーフ
ィルターは染色法の場合でも十分なカラー濃度を得るた
めには０．５ミクロン以下にはできないので、金属遮光
膜とカラーフィルターとの膜厚が生じる。もし仮に金属
遮光膜をカラーフィルターと同等の厚さにする場合には
、スパッタリング法等の気相メツキに相当の時間を費や
し製造コストが膨大なものになる。In the color filter provided with the light shielding film by the conventional method described above, unevenness on the surface of the color filter is unavoidable due to the characteristic of the manufacturing method. When the metal thin film shown in Figure 3 is used as a light-shielding film, the thickness of the metal thin film is at most 1000 mm.
This is the maximum value that humans assume for mass production. However, even in the dyeing method, the color filter cannot be made smaller than 0.5 microns in order to obtain sufficient color density, so the thickness of the metal light-shielding film and the color filter is increased. If the metal light-shielding film were to have the same thickness as the color filter, a considerable amount of time would be required for vapor phase plating such as sputtering, and the manufacturing cost would be enormous.
第３図（Ｕ３に示したＲ−Ｇ−Ｂ積層タイプの遮光膜を
有したカラーフィルターの場合は、表面の凹凸はさらに
大きくなる。遮光膜部５とカラーフィルター４Ｒ・４Ｇ
・４Ｂとの膜厚さは、赤色フィルターが４Ｇ＋４Ｂ、緑
色フィルターが４Ｒ＋４Ｂ、青色フィルターが４Ｒ＋４
Ｇとなりカラーフィルター２層分の厚さが凹凸になる。In the case of a color filter having an R-G-B laminated type light-shielding film shown in FIG. 3 (U3), the surface unevenness becomes even larger.
・The film thickness with 4B is 4G+4B for the red filter, 4R+4B for the green filter, and 4R+4 for the blue filter.
G, and the thickness of two color filter layers becomes uneven.
したがって、これらのカラーフィルターを用いて多色液
晶表示装置用のセルを作製する場合、カラーフィルター
及び遮光膜上に液晶配向膜を形成する必要があり、この
配向膜が前記表面の凹凸の影響を受けることになる０通
常前記配向膜の厚さは１０００人程度であるから、配向
膜の厚さは５ないし１０倍以上の凹凸があることになる
。当然のことながら、カラーフィルターと遮光膜材質と
の熱膨張率が異なる場合には、前記配向膜にその影響が
現れ、微少なりラックの発生により液晶の配向不良が生
しる。またカラーフィルターと遮光ＩＩ！材質が同一で
あっても表面に凹凸がある場合配向膜の厚さが不均一に
なり、内部応力残留による歪や配向膜自体の表面が凹凸
になり液晶配向不良の原因になる。Therefore, when manufacturing a cell for a multicolor liquid crystal display device using these color filters, it is necessary to form a liquid crystal alignment film on the color filter and the light-shielding film, and this alignment film reduces the influence of the surface irregularities. Normally, the thickness of the alignment film is about 1,000, so the alignment film has unevenness that is 5 to 10 times the thickness. Naturally, if the coefficients of thermal expansion of the color filter and the material of the light-shielding film are different, this will have an effect on the alignment film, and a slight rack will occur, resulting in poor alignment of the liquid crystal. Also, color filter and shading II! Even if the materials are the same, if the surface is uneven, the thickness of the alignment film will be non-uniform, causing distortion due to residual internal stress and unevenness of the surface of the alignment film itself, causing poor liquid crystal alignment.
かくして、従来の製造方法によるカラーフィルターを用
いた多色液晶表示装置の表示品質の信頼性が低下すると
いう欠点を有していた。Thus, the reliability of the display quality of a multicolor liquid crystal display device using a color filter produced by the conventional manufacturing method has been disadvantageous.
本発明は、上記のような欠点を除去するためにカラーフ
ィルターを形成したその上に透明電極を設けて遮光膜を
高分子電着法で形成するところに特徴を有する。The present invention is characterized in that, in order to eliminate the above-mentioned drawbacks, a color filter is formed, a transparent electrode is provided thereon, and a light-shielding film is formed by polymer electrodeposition.
上記のような手段を講じることによって、カラーフィル
ターが形成された基板裏面は、凹凸がなくなり、配向膜
の厚さが均一となるとともに、フィルタ間隙の遮光も行
われることになる。By taking the above-mentioned measures, the back surface of the substrate on which the color filter is formed has no irregularities, the thickness of the alignment film becomes uniform, and the gap between the filters is also shielded from light.
以下図面を用いて本発明の実施例について説明する。第
１図は本発明の多色液晶表示装置の断面図であり、第２
図は、その製造方法を説明する図である。第２図におい
て、第２図ｉａｌは透明基板上にカラーフィルター４を
形成したものである。カラーフィルターの製法は染色法
、印刷法、電着法等いずれの方法でも良いが、本発明が
目的とするカラーフィルターの表面の均一性または平坦
化という点でみると、染色法ないし電着法かへターと言
える。また、製造コストを考ＩＬＬだ場合には、後で述
べる遮光膜形成が高分子電着法であるので、カラーフィ
ルターの製法は電着法が最も有利になる。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a cross-sectional view of the multicolor liquid crystal display device of the present invention, and FIG.
The figure is a diagram explaining the manufacturing method. In FIG. 2, the color filter 4 is formed on a transparent substrate. The color filter may be manufactured by any method such as dyeing method, printing method, electrodeposition method, etc. However, from the point of view of uniformity or flattening of the surface of the color filter, which is the objective of the present invention, dyeing method or electrodeposition method is suitable. You can say it's kaheta. Furthermore, if manufacturing cost is a consideration, since the formation of the light-shielding film described later is performed by polymer electrodeposition, the electrodeposition method is the most advantageous method for manufacturing the color filter.
次に、前記カラーフィルター４及びカラーフィルター４
の間隙部に透明電極３を形成する［ｂｌ。透明電極３は
蒸着法ないしスパッタリング法により形成させることが
できる。次いでポジ型の感光性樹脂を塗布し、カラーフ
ィルターの反対面から背面露光すると、カラーフィルタ
ー−ヒの感光性樹脂はカラーフィルターにより光が遮断
されて硬化し、カラーフィルター間隙部のポジ型感光性
樹脂だけが感光する。このようなポジ型の感光性樹脂は
、第４図に示したカラーフィルターの波長特性と考ＩＣ
シて選択することが必要である。ずなわら、Ｒ・Ｇ−８
３色のカラーフィルター共に透過しない波長領域（３３
０ｎｍ前後）で感光する感光性樹脂を選ぶことにより、
前記の背面露光が実現する。その後、現像してカラーフ
ィルター４の間隙部のみ透明電極３を露出させる。そし
てこの露出した透明電極３上に、赤色・緑色・青色の３
色の電着浴を混合した黒色電着浴により電着するｆｄ＋
。ここで用いる高分子電着法と電着浴については特開昭
５９１１４５７２号に詳しく開示されている。Next, the color filter 4 and the color filter 4
A transparent electrode 3 is formed in the gap [bl. The transparent electrode 3 can be formed by a vapor deposition method or a sputtering method. Next, a positive-type photosensitive resin is applied and exposed to light from the opposite side of the color filter.The photosensitive resin on the color filter A is blocked from light by the color filter and hardens, causing the positive-type photosensitive resin in the gap between the color filters to harden. Only the resin is exposed to light. This type of positive photosensitive resin is based on the wavelength characteristics of the color filter and the IC shown in Figure 4.
It is necessary to make a selection. Zunawara, R.G-8
Wavelength range that does not pass through all three color filters (33
By selecting a photosensitive resin that is sensitive to light (around 0 nm),
The above-mentioned back exposure is realized. Thereafter, development is performed to expose the transparent electrodes 3 only in the gaps between the color filters 4. Then, on this exposed transparent electrode 3, red, green, and blue 3
fd+ electrodeposited using a black electrodeposition bath mixed with a colored electrodeposition bath
. The polymer electrodeposition method and electrodeposition bath used here are disclosed in detail in JP-A-59114572.
前記高分子電着法で形成される遮光膜の遮光性は、Ｒ・
に−８３色の電着浴の顔料の種Ｉｎ、混合３り合、膜厚
及び電着条件等で決定される。実際には、Ｒ・Ｇ−８３
色の電着浴を適正に混合して小包の電着浴すれば、あと
は電着条件で自由にＩ漠１■がコントロールでき遮光率
もそれに合わせて変動させうる。The light-shielding property of the light-shielding film formed by the polymer electrodeposition method is R.
It is determined by the type of pigment (In) in the electrodeposition bath for each color, the mixing ratio, the film thickness, the electrodeposition conditions, etc. Actually, R.G-83
By properly mixing the colored electrodeposition baths and electrodepositing the parcels, you can freely control the electrodeposition conditions and change the shading rate accordingly.
このようにして遮光膜を形成した後、不要となった感光
性樹脂を剥離すれば、本発明による電着黒色遮光膜が設
けられたカラーフィルターが出来上がる。After forming the light-shielding film in this way, the unnecessary photosensitive resin is peeled off, and a color filter provided with the electrodeposited black light-shielding film according to the present invention is completed.
以下具体例を説明する。A specific example will be explained below.
（１）染色法で形成したＲ 、 Ｇ −８３色のカラー
フィルターのそれぞれに膜厚を１．０ミクロンに揃えた
。この基板トにスパッタリングで透明電極を形成した後
、感光性樹脂（東京応化製ＯＦ Ｐ Ｒ−８００）をス
ピンナーで塗布した。次に、カラーフィルターと反対面
から背面露光をした。光量は５〜２０−ｊ／−の範囲で
ラビング現像するとシャープな形状が得られた。その後
、Ｒ−Ｇ−Ｂ電着浴を等量混合させた黒色電着浴中に浸
漬し、３５Ｖの定電圧法で１分間型着した。感光性樹脂
を剥離すると、カラーフィルター間隙部に電着された遮
光膜は１．０ミクロンの膜厚でカラーフィルター表面と
遮光膜表面とは平滑な表面になった。(1) The film thickness of each of the R and G-83 color filters formed by the dyeing method was adjusted to 1.0 microns. After forming a transparent electrode on this substrate by sputtering, a photosensitive resin (OF PR-800 manufactured by Tokyo Ohka Co., Ltd.) was applied using a spinner. Next, I performed back exposure from the side opposite to the color filter. A sharp shape was obtained by rubbing development with a light amount in the range of 5 to 20 −j/−. Thereafter, it was immersed in a black electrodeposition bath in which equal amounts of R-G-B electrodeposition baths were mixed, and molding was carried out for 1 minute using a constant voltage method at 35V. When the photosensitive resin was peeled off, the light shielding film electrodeposited in the gap between the color filters had a thickness of 1.0 microns, and the color filter surface and the light shielding film surface became smooth surfaces.
このようにして得られた黒色電着遮光膜付きカラーフィ
ルターを用いて第１図に示すようなセルを作った。この
セルを使用した多色液晶表示装置の画質は良好であり、
配向膜の信転性も良く、カラーフィルター表面の凹凸に
起因する配向膜の異常による不良は全く発生しなかった
。A cell as shown in FIG. 1 was made using the thus obtained color filter with a black electrodeposited light-shielding film. The image quality of multicolor liquid crystal display devices using this cell is good.
The reliability of the alignment film was also good, and no defects occurred due to abnormalities in the alignment film caused by unevenness on the surface of the color filter.
（２） パターニングした透明電極上にＲ−Ｇ−８３
色の電着カラーフィルターのそれぞれ１．５ミクロンの
膜厚に設けた。その表面に電着法で透明電極を形成した
。次にポジ型感光樹脂（東京応化製０ＤｕＲ）を塗布し
、光量３０〜ｌｏｏｍｊ ／ ｃ＋＋Ｉで背面露光後、
バブリング現像した結果、シャープなパターンを得た。(2) R-G-83 on the patterned transparent electrode
Each color electrodeposited color filter was provided with a film thickness of 1.5 microns. A transparent electrode was formed on the surface by electrodeposition. Next, apply a positive photosensitive resin (0DuR manufactured by Tokyo Ohka), and after back exposure at a light intensity of 30 to loomj/c++I,
As a result of bubbling development, a sharp pattern was obtained.
実施例１と同一の黒色電着浴で、４５Ｖ定電圧１分間電
着で膜厚１．５ミクロンを有する黒色の遮光膜が得られ
、実施例１と同様な効果があった。A black light-shielding film having a thickness of 1.5 microns was obtained by electrodeposition at a constant voltage of 45 V for 1 minute using the same black electrodeposition bath as in Example 1, and the same effect as in Example 1 was obtained.
遣方法模式図、第３図Ｗ、（［３は従来のカラーフィル
ターの製造方法模式図、第４図は電着カラーフィルター
の波長特性の一例を示す特性図である。
ｌ・・・偏光板
２・ ・ ・ガラス基（反
・透明電極
カ
ラーフィルター
・遮光膜
・液晶
・防染膜
・感光性樹脂
本発明の′＋已′＆晶筏示装置の積尺を面図第１図(3 is a schematic diagram of a conventional color filter manufacturing method, and Figure 4 is a characteristic diagram showing an example of the wavelength characteristics of an electrodeposited color filter. l... Polarizing plate 2. Glass base (anti-transparent electrode color filter, light-shielding film, liquid crystal, anti-staining film, photosensitive resin) Figure 1 is a plan view of the scale of the present invention's '+' and crystal raft display devices.
Claims (2)
方に、複数のカラーフィルターとその上に透明電極を設
け、該カラーフィルター間隙部に遮光性薄膜を有した多
色液晶表示装置において、該遮光性薄膜が高分子電着法
により形成されたことを特徴とする多色液晶表示装置。(1) A multicolor liquid crystal display device in which a plurality of color filters and a transparent electrode are provided on at least one of two transparent substrates sandwiching a liquid crystal, and a light-shielding thin film is provided in the gap between the color filters, A multicolor liquid crystal display device, characterized in that the light-shielding thin film is formed by a polymer electrodeposition method.
該カラーフィルター間隙部に遮光性薄膜を形成する工程
が、 ［１］カラーフィルターを形成させる工程 ［２］透明電極を形成させる工程 ［３］感光性樹脂を塗布する工程 ［４］露光工程 ［５］現像工程 ［６］遮光性物質の電着工程(2) Forming multiple color filters on a transparent substrate,
The process of forming a light-shielding thin film in the gap between the color filters is as follows: [1] Forming a color filter [2] Forming a transparent electrode [3] Coating a photosensitive resin [4] Exposure process [5] ] Development process [6] Electrodeposition process of light-shielding substance
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63234413A JPH0281025A (en) | 1988-09-19 | 1988-09-19 | Multicolor liquid crystal display device and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63234413A JPH0281025A (en) | 1988-09-19 | 1988-09-19 | Multicolor liquid crystal display device and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0281025A true JPH0281025A (en) | 1990-03-22 |
Family
ID=16970625
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63234413A Pending JPH0281025A (en) | 1988-09-19 | 1988-09-19 | Multicolor liquid crystal display device and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0281025A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6173373A (en) * | 1984-09-19 | 1986-04-15 | Asahi Glass Co Ltd | Thin-film transistor |
| JPS61270701A (en) * | 1985-05-27 | 1986-12-01 | Toppan Printing Co Ltd | Production of color filter |
| JPS62160421A (en) * | 1986-01-08 | 1987-07-16 | Shinto Paint Co Ltd | Method for forming functional coated film between fine conductive circuits |
| JPS6360422A (en) * | 1986-08-30 | 1988-03-16 | Canon Inc | Ferroelectric liquid crystal element |
| JPH0273306A (en) * | 1988-09-09 | 1990-03-13 | Toppan Printing Co Ltd | Color filter and production thereof |
-
1988
- 1988-09-19 JP JP63234413A patent/JPH0281025A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6173373A (en) * | 1984-09-19 | 1986-04-15 | Asahi Glass Co Ltd | Thin-film transistor |
| JPS61270701A (en) * | 1985-05-27 | 1986-12-01 | Toppan Printing Co Ltd | Production of color filter |
| JPS62160421A (en) * | 1986-01-08 | 1987-07-16 | Shinto Paint Co Ltd | Method for forming functional coated film between fine conductive circuits |
| JPS6360422A (en) * | 1986-08-30 | 1988-03-16 | Canon Inc | Ferroelectric liquid crystal element |
| JPH0273306A (en) * | 1988-09-09 | 1990-03-13 | Toppan Printing Co Ltd | Color filter and production thereof |
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