JPH0273306A - Color filter and production thereof - Google Patents

Color filter and production thereof

Info

Publication number
JPH0273306A
JPH0273306A JP63226238A JP22623888A JPH0273306A JP H0273306 A JPH0273306 A JP H0273306A JP 63226238 A JP63226238 A JP 63226238A JP 22623888 A JP22623888 A JP 22623888A JP H0273306 A JPH0273306 A JP H0273306A
Authority
JP
Japan
Prior art keywords
transparent conductive
film
conductive film
layer
conductive films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63226238A
Other languages
Japanese (ja)
Inventor
Toyoaki Sawada
沢田 豊明
Makoto Sakakawa
誠 坂川
Hisao Hoshi
久夫 星
Takeo Sugiura
杉浦 猛雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP63226238A priority Critical patent/JPH0273306A/en
Publication of JPH0273306A publication Critical patent/JPH0273306A/en
Pending legal-status Critical Current

Links

Landscapes

  • Optical Filters (AREA)

Abstract

PURPOSE:To allow the selective formation of plural colored layers on patterned transparent conductive films by forming colored layers on the patterned 2nd transparent conductive films which are provided on the 1st transparent conductive film and have the resistance value of <=1/5 the resistance value of this film. CONSTITUTION:An SnO2 film 2 as the 1st transparent conductive film is formed by a vapor deposition method on a transparent substrate 1 and the patterned 2nd transparent conductive films 3 are formed by a mask vapor deposition method on the SnO2 film 2. Only the transparent conductive films 3 to be formed with red layers are used as one electrode and the prescribed transparent conductive films 3 are colored red by an electrodeposition painting method, by which the red layers 5 are formed. Black light shielding films 9 are formed on the SnO2 film 2 between the 2nd transparent conductive films 3. The plural colored layers are selectively formed on the patterned transparent conductive films in this way.

Description

【発明の詳細な説明】 [産業上の利用分野コ 本発明は、カラーフィルタ及びその製造方法の改良に関
する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to improvements in color filters and methods for manufacturing the same.

[従来の技術] 従来、透明基板上の透明導電膜パターン上に、電気泳動
を利用した電着塗装法により色分解用の着色層を形成す
ることが行われている(特開昭82−180421号公
報)。以下、この技術について説明する。
[Prior Art] Conventionally, a colored layer for color separation has been formed on a transparent conductive film pattern on a transparent substrate by an electrodeposition coating method using electrophoresis (Japanese Unexamined Patent Publication No. 82-180421). Publication No.). This technique will be explained below.

即ち、微細な導電性回路パターンの間に機能性塗膜を形
成させるに際し、まず電着コーティングで導電性回路パ
ターン上にのみ遮光性と薬剤可溶性をもつプレコート塗
膜を形成させる。次に、上記プレコート塗膜を含み、透
明基板全体に光硬化性を有する機能性塗膜を形成しうる
機能性材料を適当な方法でコーティングする。つづいて
、場合により適当な方法と条件でこの被膜をプリベーク
した後、透明基板の背面、すなわち基板の導電性回路パ
ターンを有しない側より、光を照射し上記の光硬化性材
料を硬化させる。この際、電着によりプレコート塗膜を
形成されている部分はその遮光性のために光が遮られて
その上にコートされている光硬化性材料は硬化しない。
That is, when forming a functional coating film between fine conductive circuit patterns, first, a precoat coating film having light-shielding properties and drug solubility is formed only on the conductive circuit patterns by electrodeposition coating. Next, the entire transparent substrate is coated with a functional material capable of forming a photocurable functional coating film, including the precoated coating film, by an appropriate method. Subsequently, after prebaking this film using an appropriate method and conditions as the case requires, light is irradiated from the back side of the transparent substrate, that is, the side of the substrate that does not have a conductive circuit pattern, to harden the photocurable material. At this time, the light-blocking properties of the areas on which the pre-coated film is formed by electrodeposition block light, and the photocurable material coated thereon does not harden.

即ち、電着によりプレコート被膜が形成されていない導
電性回路パターンの間隙のみの光硬化性材料の光硬化が
進行する。この後、適当な薬剤を用いて上記非硬化性材
料の非硬化および電着によりコートした遮光性プレコー
ト塗膜を溶出せしめると、導電性回路パターン間の間隙
にのみ光硬化性を育する機能性材料(遮光膜)が残存す
る。
That is, photocuring of the photocurable material progresses only in the gaps between the conductive circuit patterns where no precoat film is formed by electrodeposition. Thereafter, by using an appropriate agent to elute the light-shielding precoat film coated by non-curing and electrodeposition of the above-mentioned non-curing material, a functional property that develops photo-curing properties only in the gaps between the conductive circuit patterns is created. The material (light shielding film) remains.

[発明が解決しようとする課題] しかしながら、従来技術によれば、次に述べる問題点を
有する。
[Problems to be Solved by the Invention] However, the prior art has the following problems.

即ち、遮光膜(黒)は金属クロムやカーボンを用いるた
め導電率が高く、パターニングされた透明導電膜の間隙
に遮光膜を介在させ、た場合、透明導電膜間に短絡が起
き、電着塗装法によっては各々の透明導電膜上に所定の
青色層を形成することができない。
In other words, the light-shielding film (black) uses metal chromium or carbon, so it has high conductivity, and if the light-shielding film is interposed between the patterned transparent conductive films, a short circuit will occur between the transparent conductive films, and the electrodeposition coating will fail. Depending on the method, it is not possible to form a predetermined blue layer on each transparent conductive film.

本発明は上記事情に鑑みてなされたもので、複数の着色
層をパターニングされた透明導電膜上に選択的に形成し
得るカラーフィルタ及びその製造方法を提供することを
目的とする。
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a color filter in which a plurality of colored layers can be selectively formed on a patterned transparent conductive film, and a method for manufacturing the same.

[課題を解決するための手段] 本願第1の発明は、透明基板と、この透明基板上に設け
られた第1の透明導電膜と、この第1の透明導電膜上に
設けられ該透明導電膜と比べ抵抗値が175以下のパタ
ーニングされた第2の透明導電膜と、この第2の透明導
電膜上に設けられた青色層と、前記第2の透明導電膜間
の前記第1の透明導電膜上に設けられた遮光膜とを具備
することを特徴とするカラーフィルタである。
[Means for Solving the Problems] The first invention of the present application includes a transparent substrate, a first transparent conductive film provided on the transparent substrate, and a transparent conductive film provided on the first transparent conductive film. A patterned second transparent conductive film having a resistance value of 175 or less compared to the film, a blue layer provided on the second transparent conductive film, and the first transparent conductive film between the second transparent conductive film. The color filter is characterized by comprising a light shielding film provided on a conductive film.

本願第2の発明は、絶縁性基板上に第1の透明’H1:
 ::”Nを介して該透明導電膜と比べ抵抗値が〕15
以下の第2透明導電膜を形成した後これをパターニング
する工程と、このパターニングされた第2の透明導電膜
上に着色層を形成する工程と、前記第2の透明導電膜間
の前記第1の透明導電膜上に遮光膜を形成する]1程と
を具備することを特徴とするカラーフィルタの製造方法
である。
The second invention of the present application provides a first transparent 'H1:
::”The resistance value is 15 compared to the transparent conductive film through N.
The following steps include forming a second transparent conductive film and patterning it; forming a colored layer on the patterned second transparent conductive film; and forming the first transparent conductive film between the second transparent conductive films. forming a light shielding film on the transparent conductive film of the present invention.

本発明に係る第1の透明導電膜としては、第2の透明導
電膜よりもシート抵抗値が5倍以上大きいものを用い、
具体的にはSn 02膜等が挙げられる。このSn 0
2膜のシート抵抗値は150〜500Ωである。
As the first transparent conductive film according to the present invention, a film whose sheet resistance value is 5 times or more larger than that of the second transparent conductive film is used,
Specifically, a Sn 02 film etc. can be mentioned. This Sn 0
The sheet resistance value of the two films is 150 to 500Ω.

また、本発明に係る第2の透明導電膜としては例えば9
5%In 03−5%Sn 02  (I To)等が
挙げられ、このITOのシート抵抗値は10〜30Ωで
ある。この透明導電膜のシート抵抗値は前記遮光膜のそ
れと比べて115以下とし、115を越えると各着色層
をパターニングされた透明導電膜上に選択的に形成にし
くくなる。
Further, as the second transparent conductive film according to the present invention, for example, 9
Examples include 5% In 03 - 5% Sn 02 (I To), and the sheet resistance value of this ITO is 10 to 30 Ω. The sheet resistance value of this transparent conductive film is set to be 115 or less compared to that of the light shielding film, and if it exceeds 115, it becomes difficult to selectively form each colored layer on the patterned transparent conductive film.

[作用] 本発明においては、第2の透明導電膜と比べて抵抗値が
5倍以上の抵抗値を有する第1の透明導電膜をパターン
化された第2の透明導電膜の下層として用いることによ
り、従来のようにパターン化された透明導電膜間で短絡
が生じることなく、所定の色の着色層を電着塗装法によ
り第2の透明導電膜上に容易に選択的に形成することが
できる。
[Function] In the present invention, a first transparent conductive film having a resistance value five times or more higher than that of the second transparent conductive film is used as a lower layer of a patterned second transparent conductive film. As a result, a colored layer of a predetermined color can be easily and selectively formed on the second transparent conductive film by an electrodeposition coating method without causing a short circuit between patterned transparent conductive films as in the conventional method. can.

[実施例] 以下、本発明の一実施例に係るカラーフィルタの製造方
法を工程順に第1図(A)〜(E)及び第2図を参照し
て説明する。
[Example] Hereinafter, a method for manufacturing a color filter according to an example of the present invention will be described in order of steps with reference to FIGS. 1(A) to (E) and FIG. 2.

(1)、まず、透明基!!i21上に反応性スパッタ法
により第1の透明導電膜としての5n02膜2を蒸着法
により形成した。ここで、Sn 02膜2の厚みは例え
ば0.1pであり、シート抵抗値は500Ωであった。
(1) First, a transparent group! ! A 5n02 film 2 as a first transparent conductive film was formed on the i21 by vapor deposition using a reactive sputtering method. Here, the thickness of the Sn 02 film 2 was, for example, 0.1p, and the sheet resistance value was 500Ω.

次に、前記5n02層2の上にマスク蒸着法によりパタ
ーニングされた第2の透明導電膜3を形成した(第1図
(A)図示)。ここで、前記透明導電膜3の幅は100
IDn、間隔は10pであり、シート抵抗値は15Ωで
あった。つづいて、第2図に示す如く赤色層を形成すべ
き前記第2の透明導電膜3に例えば導電性ペーストによ
る接続層(−点鎖線)4を設け、赤色層を形成すべき透
明導電膜3のみを一方の電極として電着塗装法により所
定の透明I4t、膜3上に赤色を着色し、170℃、1
時間加熱硬化処理を施して赤色層5を形成した(第1図
(B)図示)。なお、この時の本行塗装の印加電圧は8
.0Vとした。また、加熱硬化処理した赤色層5を上置
した第2の透明溝を膜3の表面は絶縁状態となる。
Next, a patterned second transparent conductive film 3 was formed on the 5n02 layer 2 by a mask evaporation method (as shown in FIG. 1(A)). Here, the width of the transparent conductive film 3 is 100
IDn, the spacing was 10p, and the sheet resistance value was 15Ω. Subsequently, as shown in FIG. 2, a connection layer (-dotted chain line) 4 made of, for example, a conductive paste is provided on the second transparent conductive film 3 on which the red layer is to be formed, and the transparent conductive film 3 on which the red layer is to be formed. A predetermined transparent I4t film 3 was colored red by electrodeposition coating method using only one electrode as one electrode, and was heated at 170°C for 1
A red layer 5 was formed by performing a heat curing treatment for a period of time (as shown in FIG. 1(B)). In addition, the applied voltage for main painting at this time was 8
.. It was set to 0V. Further, the surface of the film 3 is in an insulating state through the second transparent groove on which the heat-cured red layer 5 is placed.

(2)次に、緑色層を形成すべき前記第2の透明導電膜
3に赤色層5の場合と同様に導電性ペーストによる接続
層(二点鎖線)6を設け、緑色層を形成すべき第2の透
明導電膜3のみを一方の電極として本心塗装法により所
定の透明%を膜3上に緑色を着色し、17[1℃、]時
間加熱硬化処理を施して緑色層7を形成した(第1図(
C)図示)。
(2) Next, a connection layer (two-dot chain line) 6 made of conductive paste is provided on the second transparent conductive film 3 in which a green layer is to be formed, as in the case of the red layer 5, and a green layer is to be formed. Using only the second transparent conductive film 3 as one electrode, a predetermined transparency percentage is colored green on the film 3 using the Honshin coating method, and a green layer 7 is formed by heat curing treatment for 17 [1° C.] hours. (Figure 1 (
C) As shown).

なお、この時の電圧は6.5Vとした。つづいて、青色
層を形成すべき前記第2の透明導電膜3に赤色層5の場
合と同様に導電性ペーストによる接続層(図示せず)を
設け、青色層を形成すべき第21709C,1時間加熱
硬化処理を施して上記と同様こして所定の第2の透明導
電膜3上に青色層8を形成した(第1図(D)図示)。
Note that the voltage at this time was 6.5V. Subsequently, a connection layer (not shown) made of conductive paste is provided on the second transparent conductive film 3 on which the blue layer is to be formed, as in the case of the red layer 5, and the second transparent conductive film 3 on which the blue layer is to be formed is provided with a connecting layer (not shown). The blue layer 8 was formed on a predetermined second transparent conductive film 3 by subjecting it to a heat curing treatment for a period of time in the same manner as above (as shown in FIG. 1(D)).

なお、この時の電着塗装の印加電圧は9.0■とした。Note that the applied voltage for electrodeposition coating at this time was 9.0 .

ついで、前記5n02膜2に゛fヒ極をつけて例えば3
5Vで電着を行なった後、170℃、 30分間加熱処
理して第2の透明導電膜3間の前記5n02膜2上に黒
色の遮光膜9を形成し、カラーフィルタを製造した(第
1図(E)図示)。ここで、前記遮光膜9を分光法にて
測定したところ、吸光度1.92であった。なお、各着
色層は、前記赤色層5、緑色層7、青色層8の順に長さ
が短くなっており、前記接続層4.6は着色層を電着塗
装法により形成した後、夫々例えばメチルエチルケトン
により除去してもよい。
Next, the 5n02 film 2 is attached with an ゛f polarity, for example, 3
After electrodeposition at 5V, heat treatment was performed at 170° C. for 30 minutes to form a black light-shielding film 9 on the 5n02 film 2 between the second transparent conductive films 3 to produce a color filter (first Figure (E) (Illustrated). Here, when the light shielding film 9 was measured by spectroscopy, the absorbance was 1.92. The length of each colored layer becomes shorter in the order of the red layer 5, the green layer 7, and the blue layer 8, and the connecting layer 4.6 is formed by forming the colored layer by an electrodeposition coating method, and then, for example, It may be removed with methyl ethyl ketone.

しかして、本発明方法によれば、透明基板1上に抵抗値
の大きいSn○2膜2を形成した後、該Sn 02膜2
と比べ抵抗値の小さい第2の該透明導電膜3を形成し、
更にこの透明導電膜3上に赤色層5.青色層7及び緑色
層8などの着色層を形成するため、上前塗装の際上記赤
色層5.青色層7及び緑色層8を夫々第2の透明導電膜
3間に選択的に形成することができる。なお、5n02
膜2の上にも多少前記赤色層5、緑色層7、青色層8が
付着することもありうるが、Sn○2膜4上膜島上ので
全体として黒色に近い色相を呈し、問題にする程ではな
い。また、各赤色層5、緑色層7、青色層8を製造が容
易な電行塗装法により作ることができ、コスト低減を図
ることかできる。
According to the method of the present invention, after forming the Sn02 film 2 having a large resistance value on the transparent substrate 1, the Sn02 film 2 is
forming the second transparent conductive film 3 having a smaller resistance value than that of the second transparent conductive film 3;
Furthermore, a red layer 5 is formed on this transparent conductive film 3. In order to form colored layers such as the blue layer 7 and the green layer 8, the red layer 5. The blue layer 7 and the green layer 8 can be selectively formed between the second transparent conductive films 3, respectively. In addition, 5n02
Although it is possible that the red layer 5, green layer 7, and blue layer 8 may adhere to some extent on the film 2, the overall hue on the film island on the Sn○2 film 4 is close to black, and it is not enough to cause a problem. isn't it. Further, each of the red layer 5, green layer 7, and blue layer 8 can be made by the electric coating method, which is easy to manufacture, and costs can be reduced.

本発明に係るカラーフィルタは、第1図(E)に示す如
く、透明基板1上にシート抵抗値が5 X 102と大
きい5n02膜(遮光膜)2を設け、このSnO□膜2
上に、該S n O2膜2と比べてシート抵抗値の小さ
い(15Ω)第2の透明導電膜3を設け、更にこの第2
の透明導電膜3上に赤色層5、緑色層7、青色層8等の
各着色層を選択的に設けた構造となっている。従って、
前述した如く電着塗装の際上記赤色層5.青色層7及び
緑色層8を夫々第2の透明導電膜3上に確実に形成する
ことができるという効果を有する。
The color filter according to the present invention, as shown in FIG.
A second transparent conductive film 3 having a smaller sheet resistance value (15Ω) than that of the S n O2 film 2 is provided on top, and this second
It has a structure in which colored layers such as a red layer 5, a green layer 7, a blue layer 8, etc. are selectively provided on a transparent conductive film 3. Therefore,
As mentioned above, during electrodeposition coating, the red layer 5. This has the effect that the blue layer 7 and the green layer 8 can be reliably formed on the second transparent conductive film 3, respectively.

なお、上記実施例では、赤色層、緑色層、青色層の各着
色層のみを透明導電膜上に形成した場合について述べた
か、これに限らず、他の色の着色層を形成してもよい。
In addition, in the above-mentioned example, the case where only the colored layers of the red layer, the green layer, and the blue layer are formed on the transparent conductive film is described, but the present invention is not limited to this, and colored layers of other colors may be formed. .

[発明の効果コ 以上詳述した如く本発明によれば、複数の着色層をパタ
ニングされた透明導電膜上に選択的に形成し得るととも
に、コスト低減をなしえる液晶表示装置に有用なカラー
フィルタ及びその製造方法を提供できる。
[Effects of the Invention] As described in detail above, the present invention provides a color filter useful for liquid crystal display devices that can selectively form a plurality of colored layers on a patterned transparent conductive film and can reduce costs. and a manufacturing method thereof.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(A)〜(E)は本発明の一実施例に係るカラー
フィルタの製造方法を工程順に示す断面図、第2図は着
色層の形成方法を説明するための平面図である。 1・・・透明基板、2・・・5n02膜(第1の透明導
電膜)、3・・・第2の透明導電膜、5・・・・・赤色
層、7・・・緑色層、8・・・青色層、9・・・遮光膜
。 出願人代理人 弁理士 鈴江武彦
FIGS. 1A to 1E are cross-sectional views showing a method for manufacturing a color filter according to an embodiment of the present invention in order of steps, and FIG. 2 is a plan view for explaining a method for forming a colored layer. DESCRIPTION OF SYMBOLS 1... Transparent substrate, 2... 5n02 film (first transparent conductive film), 3... Second transparent conductive film, 5... Red layer, 7... Green layer, 8 ... Blue layer, 9... Light-shielding film. Applicant's agent Patent attorney Takehiko Suzue

Claims (2)

【特許請求の範囲】[Claims] (1)透明基板と、この透明基板上に設けられた第1の
透明導電膜と、この第1の透明導電膜上に設けられ該透
明導電膜と比べ抵抗値が1/5以下のパターニングされ
た第2の透明導電膜と、この第2の透明導電膜上に設け
られた着色層と、前記第2の透明導電膜間の前記第1の
透明導電膜上に設けられた遮光膜とを具備することを特
徴とするカラーフィルタ。
(1) A transparent substrate, a first transparent conductive film provided on the transparent substrate, and a patterned film provided on the first transparent conductive film having a resistance value of 1/5 or less compared to the transparent conductive film. a second transparent conductive film, a colored layer provided on the second transparent conductive film, and a light shielding film provided on the first transparent conductive film between the second transparent conductive films. A color filter comprising:
(2)絶縁性基板上に第1の透明導電膜を介して該透明
導電膜と比べ抵抗値が1/5以下の第2透明導電膜を形
成した後これをパターニングする工程と、このパターニ
ングされた第2の透明導電膜上に着色層を形成する工程
と、前記第2の透明導電膜間の前記第1の透明導電膜上
に遮光膜を形成する工程とを具備することを特徴とする
カラーフィルタの製造方法。
(2) A step of forming a second transparent conductive film having a resistance value of 1/5 or less compared to that of the transparent conductive film on the insulating substrate via the first transparent conductive film, and then patterning the second transparent conductive film; forming a colored layer on the second transparent conductive film; and forming a light shielding film on the first transparent conductive film between the second transparent conductive films. Color filter manufacturing method.
JP63226238A 1988-09-09 1988-09-09 Color filter and production thereof Pending JPH0273306A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63226238A JPH0273306A (en) 1988-09-09 1988-09-09 Color filter and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63226238A JPH0273306A (en) 1988-09-09 1988-09-09 Color filter and production thereof

Publications (1)

Publication Number Publication Date
JPH0273306A true JPH0273306A (en) 1990-03-13

Family

ID=16842057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63226238A Pending JPH0273306A (en) 1988-09-09 1988-09-09 Color filter and production thereof

Country Status (1)

Country Link
JP (1) JPH0273306A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0281025A (en) * 1988-09-19 1990-03-22 Seiko Instr Inc Multicolor liquid crystal display device and its production
WO2002067054A3 (en) * 2001-02-21 2003-04-17 Ibm High-resolution photoresist structuring of multi-layer structures deposited onto substrates

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0281025A (en) * 1988-09-19 1990-03-22 Seiko Instr Inc Multicolor liquid crystal display device and its production
WO2002067054A3 (en) * 2001-02-21 2003-04-17 Ibm High-resolution photoresist structuring of multi-layer structures deposited onto substrates

Similar Documents

Publication Publication Date Title
JPH0273306A (en) Color filter and production thereof
JP2606162B2 (en) Liquid crystal display device and method of manufacturing the same
JPH0273304A (en) Color filter and its production
JPH02153304A (en) Production of color resolving filter
JPS62153826A (en) Color liquid crystal display device
JPS63249106A (en) Production of color filter
JPS6326628A (en) Liquid crystal color display device and its manufacture
JP2815246B2 (en) Manufacturing method of liquid crystal display element
JPH0273303A (en) Color filter and its production
JPS62240930A (en) Manufacture of liquid crystal display panel
JPH06208018A (en) Production of color filter
JPH0273302A (en) Production of color filter
JPH0497202A (en) Formation of color filter
JP2745544B2 (en) Manufacturing method of TFT type liquid crystal display device
JPH01158401A (en) Formation of color filter
JPH04269713A (en) Production of multicolor pattern
JPS63314521A (en) Liquid crystal color display device
KR960009378Y1 (en) Color filter base plate for liquid crystal display
JPS63249107A (en) Production of color filter
JPH06235811A (en) Production of color filter
JPS6358320A (en) Production of liquid crystal display element
JPH01277202A (en) Production of color filter with transparent electrode
JPH10221683A (en) Liquid crystal display device and production therefor
JPH0713013A (en) Formation of color filter and black mask
JPH04352104A (en) Production of color filter