JPH0279026U - - Google Patents
Info
- Publication number
- JPH0279026U JPH0279026U JP15897788U JP15897788U JPH0279026U JP H0279026 U JPH0279026 U JP H0279026U JP 15897788 U JP15897788 U JP 15897788U JP 15897788 U JP15897788 U JP 15897788U JP H0279026 U JPH0279026 U JP H0279026U
- Authority
- JP
- Japan
- Prior art keywords
- equipment
- supply means
- resist
- transporting
- clean room
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 2
- 238000001020 plasma etching Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15897788U JPH0279026U (enExample) | 1988-12-08 | 1988-12-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15897788U JPH0279026U (enExample) | 1988-12-08 | 1988-12-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0279026U true JPH0279026U (enExample) | 1990-06-18 |
Family
ID=31439782
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15897788U Pending JPH0279026U (enExample) | 1988-12-08 | 1988-12-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0279026U (enExample) |
-
1988
- 1988-12-08 JP JP15897788U patent/JPH0279026U/ja active Pending
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