JPH02662B2 - - Google Patents
Info
- Publication number
- JPH02662B2 JPH02662B2 JP5866076A JP5866076A JPH02662B2 JP H02662 B2 JPH02662 B2 JP H02662B2 JP 5866076 A JP5866076 A JP 5866076A JP 5866076 A JP5866076 A JP 5866076A JP H02662 B2 JPH02662 B2 JP H02662B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- perovskite
- resistor
- conductivity
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 claims description 34
- 239000002131 composite material Substances 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 238000001179 sorption measurement Methods 0.000 description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011533 mixed conductor Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- -1 oxygen ions Chemical class 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 230000002468 redox effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5866076A JPS52141699A (en) | 1976-05-20 | 1976-05-20 | Densitometer of oxidizing and reducing gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5866076A JPS52141699A (en) | 1976-05-20 | 1976-05-20 | Densitometer of oxidizing and reducing gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52141699A JPS52141699A (en) | 1977-11-26 |
| JPH02662B2 true JPH02662B2 (de) | 1990-01-09 |
Family
ID=13090736
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5866076A Granted JPS52141699A (en) | 1976-05-20 | 1976-05-20 | Densitometer of oxidizing and reducing gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52141699A (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0897902A1 (de) * | 1997-08-11 | 1999-02-24 | Kao Corporation | Verfahren zur Herstellung von Alkylenoxidaddukten |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5633533A (en) * | 1979-08-27 | 1981-04-04 | Matsushita Electric Ind Co Ltd | Gas sensor |
| DE3265738D1 (en) * | 1981-04-07 | 1985-10-03 | Lucas Ind Plc | Oxygen sensors |
| JPS61137053A (ja) * | 1984-12-06 | 1986-06-24 | Fuigaro Giken Kk | λセンサ |
| JPS61147150A (ja) * | 1984-12-20 | 1986-07-04 | Fuigaro Giken Kk | 排ガスセンサ |
| US7900501B2 (en) | 2005-12-20 | 2011-03-08 | Atmospheric Sensors Ltd. | Air quality monitor |
-
1976
- 1976-05-20 JP JP5866076A patent/JPS52141699A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0897902A1 (de) * | 1997-08-11 | 1999-02-24 | Kao Corporation | Verfahren zur Herstellung von Alkylenoxidaddukten |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52141699A (en) | 1977-11-26 |
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