JPH0261546B2 - - Google Patents
Info
- Publication number
- JPH0261546B2 JPH0261546B2 JP24365583A JP24365583A JPH0261546B2 JP H0261546 B2 JPH0261546 B2 JP H0261546B2 JP 24365583 A JP24365583 A JP 24365583A JP 24365583 A JP24365583 A JP 24365583A JP H0261546 B2 JPH0261546 B2 JP H0261546B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- arc
- cathode
- ring
- charged particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 14
- 239000002245 particle Substances 0.000 claims description 8
- 239000013077 target material Substances 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims description 4
- 229910000889 permalloy Inorganic materials 0.000 claims description 4
- 230000006641 stabilisation Effects 0.000 claims description 4
- 238000011105 stabilization Methods 0.000 claims description 4
- 229910000640 Fe alloy Inorganic materials 0.000 claims description 3
- 239000011810 insulating material Substances 0.000 claims description 3
- 230000000087 stabilizing effect Effects 0.000 claims description 2
- 230000008016 vaporization Effects 0.000 claims 1
- 230000004907 flux Effects 0.000 description 10
- 238000001704 evaporation Methods 0.000 description 9
- 230000003628 erosive effect Effects 0.000 description 8
- 230000008020 evaporation Effects 0.000 description 8
- 229910052742 iron Inorganic materials 0.000 description 8
- 238000013459 approach Methods 0.000 description 5
- 229910000859 α-Fe Inorganic materials 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 230000008713 feedback mechanism Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- -1 Copalt Substances 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24365583A JPS60135570A (ja) | 1983-12-23 | 1983-12-23 | ア−ク安定化方法および装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24365583A JPS60135570A (ja) | 1983-12-23 | 1983-12-23 | ア−ク安定化方法および装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60135570A JPS60135570A (ja) | 1985-07-18 |
JPH0261546B2 true JPH0261546B2 (enrdf_load_stackoverflow) | 1990-12-20 |
Family
ID=17107039
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24365583A Granted JPS60135570A (ja) | 1983-12-23 | 1983-12-23 | ア−ク安定化方法および装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60135570A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2878997B2 (ja) * | 1995-09-26 | 1999-04-05 | 株式会社神戸製鋼所 | 真空蒸着装置 |
-
1983
- 1983-12-23 JP JP24365583A patent/JPS60135570A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60135570A (ja) | 1985-07-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA1248493A (en) | Method and apparatus for evaporation arc stabilization including initial target cleaning | |
RU2168233C2 (ru) | Катод для распыления или электродугового испарения (варианты) и устройство для покрытия или ионной имплантации подложек | |
US4673477A (en) | Controlled vacuum arc material deposition, method and apparatus | |
JPH0261547B2 (enrdf_load_stackoverflow) | ||
US5126030A (en) | Apparatus and method of cathodic arc deposition | |
US5215640A (en) | Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices | |
KR20140143352A (ko) | 여과된 음극 아크 증착 장치 및 방법 | |
JPH10280135A (ja) | 陰極アーク放電を用いた薄膜蒸着装置 | |
EP0306491A4 (en) | Arc coating of refractory metal compounds. | |
JP2002008893A (ja) | プラズマ加工法 | |
US4600489A (en) | Method and apparatus for evaporation arc stabilization for non-permeable targets utilizing permeable stop ring | |
CA1247043A (en) | Controlled vacuum arc material deposition, method and apparatus | |
US4559125A (en) | Apparatus for evaporation arc stabilization during the initial clean-up of an arc target | |
JP4989026B2 (ja) | 磁界発生装置付き真空アークソース | |
US4559121A (en) | Method and apparatus for evaporation arc stabilization for permeable targets | |
Aksenov et al. | Transformation of axial vacuum-arc plasma flows into radial streams and their use in coating deposition | |
JP2851320B2 (ja) | 真空アーク蒸着装置及び方法 | |
US5418348A (en) | Electron beam source assembly | |
JPH0261546B2 (enrdf_load_stackoverflow) | ||
JP2571252B2 (ja) | アノード・カソード間アークの安定化装置 | |
Robinson et al. | Characteristics of a dual purpose cathodic arc/magnetron sputtering system | |
GB2150947A (en) | Evaporation arc stabilization for non-permeable targets utilizing permeable stop ring | |
CA1210824A (en) | Apparatus and method for evaporation arc stabilization | |
Sanders et al. | Magnetic enhancement of cathodic arc deposition | |
KR930001231B1 (ko) | 다중극 자장억류 원리를 이용한 대용량 이온플레이팅 방법 및 그장치 |