JPH0254409A - Magnetic head - Google Patents
Magnetic headInfo
- Publication number
- JPH0254409A JPH0254409A JP20514888A JP20514888A JPH0254409A JP H0254409 A JPH0254409 A JP H0254409A JP 20514888 A JP20514888 A JP 20514888A JP 20514888 A JP20514888 A JP 20514888A JP H0254409 A JPH0254409 A JP H0254409A
- Authority
- JP
- Japan
- Prior art keywords
- iron
- magnetic head
- gap
- film
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 48
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 42
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 36
- 239000000956 alloy Substances 0.000 claims abstract description 36
- 229910000859 α-Fe Inorganic materials 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 229910052742 iron Inorganic materials 0.000 claims abstract description 19
- 229910001337 iron nitride Inorganic materials 0.000 claims description 18
- 229910001567 cementite Inorganic materials 0.000 claims description 6
- UCNNJGDEJXIUCC-UHFFFAOYSA-L hydroxy(oxo)iron;iron Chemical compound [Fe].O[Fe]=O.O[Fe]=O UCNNJGDEJXIUCC-UHFFFAOYSA-L 0.000 claims description 6
- ZDVYABSQRRRIOJ-UHFFFAOYSA-N boron;iron Chemical group [Fe]#B ZDVYABSQRRRIOJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910015372 FeAl Inorganic materials 0.000 claims 1
- 239000011521 glass Substances 0.000 abstract description 11
- 239000002131 composite material Substances 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 4
- 238000004804 winding Methods 0.000 abstract description 4
- 238000005498 polishing Methods 0.000 abstract description 3
- 229910052681 coesite Inorganic materials 0.000 abstract description 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 2
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 2
- 229910052682 stishovite Inorganic materials 0.000 abstract description 2
- 229910052905 tridymite Inorganic materials 0.000 abstract description 2
- 238000003486 chemical etching Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 29
- 239000010409 thin film Substances 0.000 description 14
- 230000004907 flux Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000011162 core material Substances 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 229910000702 sendust Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910000789 Aluminium-silicon alloy Inorganic materials 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明はＶＴＲ，ＤＡＴあるいはＦＤＤ等に用いられる
高保磁力の磁気記録媒体に高密度に情報を記録するのに
適した磁気ヘッドに関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a magnetic head suitable for recording information at high density on a high coercive force magnetic recording medium used in a VTR, DAT, FDD, or the like.
従来の技術
高密度磁気記録再生においては、記録媒体の保磁力を大
きくすれば有利であることが一般に知られているが、高
保磁力の記録媒体に情報を記録するためには強い磁場が
必要となる。ヘッドコア材として主流をなすフェライ上
材はその飽和磁束密度が４０００〜５０００ガウス程度
であるため、磁気記録媒体の保磁力が１０００エルステ
ッド以上の磁気記録媒体（例えばメタルテープ）になる
と記録が不十分になるという欠点がある。Conventional technology In high-density magnetic recording and reproduction, it is generally known that it is advantageous to increase the coercive force of the recording medium, but in order to record information on a recording medium with high coercive force, a strong magnetic field is required. Become. Ferrite material, which is the mainstream material for head cores, has a saturation magnetic flux density of about 4,000 to 5,000 Gauss, so if the magnetic recording medium has a coercive force of 1,000 Oe or more (for example, a metal tape), recording will be insufficient. It has the disadvantage of becoming.
そこでフェライトよりも飽和磁束密度の大きいＣｏＮｂ
Ｚｒ、ＣｏＮｂＴａ′Ｚ、ｒ等のＣｏ系の非品質合金が
利用されている。しかしながらこれら非晶質磁性合金に
於いても飽和磁束密度を大きくするためには合金中のＣ
ｏ量を多くすることが必要となる。一方Ｃｏ量を多くす
ると非晶質合金の結晶化温度が低くなり、熱処理工程の
多いヘッドの製造に支障をきたす、従って現状では９０
００ガウス程度以下の飽和磁束密度を示す非晶質合金を
利用してしか磁気ヘッドとして製造できていない。Therefore, CoNb, which has a higher saturation magnetic flux density than ferrite,
Co-based non-quality alloys such as Zr, CoNbTa'Z, and r are used. However, even in these amorphous magnetic alloys, in order to increase the saturation magnetic flux density, C in the alloy must be
It is necessary to increase the amount of o. On the other hand, increasing the amount of Co lowers the crystallization temperature of the amorphous alloy, which hinders the manufacture of heads that require many heat treatment steps.
Magnetic heads can only be manufactured using amorphous alloys that exhibit a saturation magnetic flux density of about 0.00 Gauss or less.
そこでヘッド材料として１００００ガウス以上の飽和磁
束密度を示すセンダスト（ＦｅＡＩｌＳｉ）合金が利用
されている（例えば、第９回日本応用磁気学会学術講演
概要集、２９ＰＡ−２）、そして磁気ヘッドの形として
は第２図（ａ）に示すように主コアがフェライトからな
り、ギャップ近傍のみが高飽和磁束密度のセンダスト薄
膜からなるＭＩＧタイプのヘッド、第２スル）に示すよ
うに補助コアにフェライトを用いて、トラックとなるセ
ンダスト薄膜をサンドインチしたタイプのヘッドなどが
ある０両者ともにセンダスト薄膜をフェライト基板上に
１０μｍ程度以上に堆積することが必要になる。Therefore, Sendust (FeAIlSi) alloy, which exhibits a saturation magnetic flux density of 10,000 Gauss or more, is used as a head material (for example, the 9th Japan Society of Applied Magnetics, Abstracts of Academic Conferences, 29PA-2), and the shape of the magnetic head is As shown in Figure 2 (a), the main core is made of ferrite, and only the vicinity of the gap is made of Sendust thin film with high saturation magnetic flux density. In both cases, it is necessary to deposit a sendust thin film to a thickness of about 10 μm or more on a ferrite substrate.
発明が解決しようとする課題
しかしながらＦｅＡｆｆｉＳｉ合金薄膜をフェライト基
板上に１０μｍ程度形成し、ＦｅＡ／！Ｓｉ合金の軟磁
気特性を良くするために６００℃程度で熱処理を行うと
、ＦｅＡｌ５１合金膜がフェライトから剥離する。この
程度の激しいものはＦｅＡｊ！Ｓ１合金膜がフェライト
を引き剥す形で剥離する。Problems to be Solved by the Invention However, a FeAffiSi alloy thin film of about 10 μm is formed on a ferrite substrate, and FeA/! When heat treatment is performed at about 600° C. to improve the soft magnetic properties of the Si alloy, the FeAl51 alloy film peels off from the ferrite. Something as intense as this is FeAj! The S1 alloy film peels off in the form of peeling off the ferrite.
これはＦｅＡｊ！ＳＬ合金中のＳｔ、Ａｆｆｉがフェラ
イトと反応して、ＦｅＡｊｉ！Ｓｉ合金膜とフェライト
の境界でこれらの反応層（ＳｉＯ□、。This is FeAj! St and Affi in the SL alloy react with ferrite to form FeAji! These reaction layers (SiO□,
Ａ２□Ｏ１１等）が形成されるためである。これらの反
応層の熱膨張計数はＦｅＡｌＳｉ合金に比べると小さい
ために境界において大きな歪が生じて剥離などの原因と
なる。また剥離にいたらなかった場合でもこれらの反応
層は第２図（ａ）では疑似ギャップ、第２図（６）では
初期形成膜の特性劣化による記録再生特性の劣化、等の
原因となり磁気ヘッドに悪影響を及ぼす。This is because A2□O11 etc.) are formed. Since the coefficient of thermal expansion of these reaction layers is smaller than that of the FeAlSi alloy, large strains occur at the boundaries, causing peeling and the like. Even if peeling does not occur, these reaction layers cause a pseudo gap in Figure 2 (a) and deterioration of the recording and reproducing characteristics due to the deterioration of the characteristics of the initially formed film in Figure 2 (6), causing damage to the magnetic head. Adversely affect.
また非磁性酸化物基板上にＦｅＡ４４３３合金膜を形成
する場合でも、両者の境界で大きな歪が生じるため、Ｆ
ｅＡｌ１Ｓｉ合金膜の初期形成膜の特性劣化、記録再生
特性の劣化、膜の剥離等の現象が現れ、磁気ヘッドに悪
影響を及ぼす。Furthermore, even when forming a FeA4433 alloy film on a non-magnetic oxide substrate, large strain occurs at the boundary between the two, so F
Phenomena such as deterioration of the characteristics of the initially formed eAl1Si alloy film, deterioration of recording/reproduction characteristics, and film peeling occur, which adversely affects the magnetic head.
課題を解決するための手段
合金膜を作製する際にフェライト基板上、もしくは非磁
性酸化物基板上にまずＦｅ系膜を形成し、その後ＦｅＡ
ｊ！ＳＬ剛毅膜を所望の膜厚だけ形成する。Means for Solving the Problems When producing an alloy film, an Fe-based film is first formed on a ferrite substrate or a non-magnetic oxide substrate, and then FeA
j! SL rigid film is formed to a desired thickness.
作用 この技術的手段の作用は次のようになる。action The effect of this technical means is as follows.
フェライトもしくは非磁性酸化物基板とＦｅＡ４４３３
合金膜の境界にＦｅ系薄膜を形成し、両者の反応を防止
する。Ferrite or non-magnetic oxide substrate and FeA4433
An Fe-based thin film is formed at the boundary of the alloy film to prevent reaction between the two.
フェライトもしくは非磁性酸化物基板上にＦｅ系膜を形
成することでＦｅＡｆ！３１合金の初期形成膜の特性が
大幅に改善できる。またＦｅＡｆｆｉＳＩ合金薄膜とフ
ェライトの境界での反応層の形成を防止することで、フ
ェライト基板上にＦｅＡｌ５ｔ合金膜が１０μｍ以上形
成可能となる。この結果第２図のヘッドに現れていた疑
似ギャップ、記録再生特性の劣化、歪の増大などの現象
を減少させることが可能となる。By forming an Fe-based film on a ferrite or non-magnetic oxide substrate, FeAf! The characteristics of the initially formed film of the 31 alloy can be significantly improved. Furthermore, by preventing the formation of a reaction layer at the boundary between the FeAffiSI alloy thin film and ferrite, it becomes possible to form a FeAl5t alloy film with a thickness of 10 μm or more on the ferrite substrate. As a result, it is possible to reduce phenomena such as pseudo gaps, deterioration of recording/reproducing characteristics, and increase in distortion that appeared in the head of FIG. 2.
実施例
以下本発明の一実施例について、図面を参照しながら説
明する。EXAMPLE An example of the present invention will be described below with reference to the drawings.
（実施例１）
第１図（ａ）は本発明により形成した磁気ヘッドの一例
である。ギャップ近傍に高飽和磁束密度のＦｅＡｌＳｉ
を主成分とした合金薄膜１を用い、それ以外の磁路はフ
ェライト２を用いたいわゆるＭＩＧタイプのヘッドであ
る。この例では合金薄膜１の膜厚を１０μｍとしている
。(Example 1) FIG. 1(a) shows an example of a magnetic head formed according to the present invention. FeAlSi with high saturation magnetic flux density near the gap
This is a so-called MIG type head using a thin alloy film 1 mainly composed of ferrite 2 for the other magnetic paths. In this example, the thickness of the alloy thin film 1 is 10 μm.
なお３はガラスである。窒化鉄膜４がフェライト２と合
金薄膜１の間に０．１μｍ形成されている。Note that 3 is glass. An iron nitride film 4 is formed between the ferrite 2 and the alloy thin film 1 with a thickness of 0.1 μm.
従来例では、−１０ｄＢ（ＩＭＨｚ）あった疑似ギャッ
プ効果が窒化鉄膜４を用いることにより一２４ｄＢ （
ＩＭ七）に減少した。In the conventional example, the pseudo gap effect, which was -10 dB (IMHz), was reduced to -24 dB (IMHz) by using the iron nitride film 4.
IM7) decreased.
（実施例２）
第１図山）は本発明により形成した磁気ヘッドの一例で
ある。主コアとなるのがＦｅＡｌＳｉを主成分とした合
金膜５である。この厚さがトラック幅になっている。こ
こではトラック幅２０μｍとした。補助コアとなるのが
フェライト６、そのあいだにあるのが、厚さ０．１μｍ
の窒化鉄膜７である。(Example 2) Figure 1 (mountain) is an example of a magnetic head formed according to the present invention. The main core is an alloy film 5 mainly composed of FeAlSi. This thickness is the track width. Here, the track width was set to 20 μm. The auxiliary core is ferrite 6, and in between is 0.1 μm thick.
This is the iron nitride film 7.
従来フェライト上にＦｅＡｆｆｉＳｉ合金膜を２０μｍ
堆積することは非常に困難であったが、この手法を用い
ることにより可能となった。Conventional ferrite with FeAffiSi alloy film of 20μm
Deposition was extremely difficult, but it became possible using this method.
（実施例３）
第１図（Ｃ）は本発明により形成した磁気ヘッドの一例
である。主コアとなるのがＦｅＡｌＳｉを主成分とした
合金膜５、それを挟持しているのが非磁性セラミック基
板９である。５と９のあいだにあるのが、厚さ０．１μ
ｍの窒化鉄膜７である。この例では、ＦｅＡｆＳｉ合金
薄膜の厚みがトラックになっている。(Example 3) FIG. 1(C) is an example of a magnetic head formed according to the present invention. The main core is an alloy film 5 mainly composed of FeAlSi, and the nonmagnetic ceramic substrates 9 sandwich it. The thickness between 5 and 9 is 0.1μ.
The iron nitride film 7 has a thickness of m. In this example, the thickness of the FeAfSi alloy thin film is a track.
初期成形膜の特性向上に記録再生特性が１ｄＢ（０，１
ＭＨｚ〜５Ｍ七）アップした。The recording and reproducing characteristics improved by 1 dB (0,1
MHz~5M7) Up.
（実施例４） 実施例１で窒化鉄の代わりに炭化鉄を用いたもの。(Example 4) Example 1 except that iron carbide was used instead of iron nitride.
（実施例５） 実施例２で窒化鉄の代わりに炭化鉄を用いたもの。(Example 5) Example 2 except that iron carbide was used instead of iron nitride.
（実施例６） 実施例３で窒化鉄の代わりに炭化鉄を用いたもの。(Example 6) Example 3 except that iron carbide was used instead of iron nitride.
（実施例７） 実施例１で窒化鉄の代わりに鉄−ボロンを用いたもの。(Example 7) Example 1 except that iron-boron was used instead of iron nitride.
（実施例８） 実施例２で窒化鉄の代わりに鉄−ボロンを用いたもの。(Example 8) Example 2 except that iron-boron was used instead of iron nitride.
（実施例９） 実施例３で窒化鉄の代わりに鉄−ボロンを用いたもの。(Example 9) Example 3 except that iron-boron was used instead of iron nitride.
（実施例１０） 実施例１で窒化鉄の代わりに鉄を用いたもの。(Example 10) Example 1 except that iron was used instead of iron nitride.
（実施例１１） 実施例２で窒化鉄の代わりに鉄を用いたもの。(Example 11) Example 2 except that iron was used instead of iron nitride.
（実施例１２） 実施例３で窒化鉄の代わりに鉄を用いたもの。(Example 12) Example 3 except that iron was used instead of iron nitride.
第３図は本発明により製造される磁気へっドの製造方法
の一例である。FIG. 3 is an example of a method for manufacturing a magnetic head manufactured according to the present invention.
第３図（ａ）ではまず研摩、ケミカルエツチングを施し
た磁気劣化層のなフェライト基板１１上に鉄糸薄１１！
１２を０．１μｍ、ＦｅＡｌＳｉ合金薄膜１３を１０μ
ｍ順にスパッタ法で形成する。このサンプルを複合バー
１４とする。１２．１３の膜は真空を破らずに形成する
のが望ましい。In FIG. 3(a), first, a thin iron thread 11 is placed on a ferrite substrate 11 with no magnetic deterioration layer which has been polished and chemically etched.
12 is 0.1 μm, and FeAlSi alloy thin film 13 is 10 μm.
They are formed by sputtering in order of m. This sample will be referred to as a composite bar 14. It is desirable to form the film 12.13 without breaking the vacuum.
なお鉄系薄膜の形成方法は後で述べる。The method for forming the iron-based thin film will be described later.
第３図（ｂ）では第３図（ａ）で形成した複合バー１４
にトラック加工を施す、１７はトラックである。その後
ギャップ面１９にギャップ材料としてＳ ｉＯ２、ガラ
ス（図では省略）を所望量形成する。In FIG. 3(b), the composite bar 14 formed in FIG. 3(a) is shown.
17 is a track. Thereafter, desired amounts of SiO2 and glass (not shown in the figure) are formed as gap materials on the gap surface 19.
第３図（Ｃ）では第３図（ｂ）で形成したバー２本を１
組としてギャップ形成を行う。巻線窓の部分にガラス１
５をいれ、このガラスをトラック溝部に流し込む、でき
あがったバーをギャップバー１６とする。ギャップ形成
条件は最高温度６００℃、保持時間１時間、Ｎ２雰囲気
中で行った第３図（ｄ）ではギャップパー１６にチップ
スライスを施す。In Fig. 3(C), the two bars formed in Fig. 3(b) are
Gap formation is performed as a group. Glass 1 in the winding window part
5 and pour this glass into the track groove.The resulting bar is used as a gap bar 16. The gap formation conditions were a maximum temperature of 600° C., a holding time of 1 hour, and a N2 atmosphere. In FIG. 3(d), chip slicing is performed on the gapper 16.
所望の形状の磁気ヘッドができあがる。１７ａ〜ｂは切
断線である。A magnetic head with the desired shape is completed. 17a-b are cutting lines.
第４図は本発明により製造される磁気ヘッドの製造方法
の一例である。FIG. 4 shows an example of a method for manufacturing a magnetic head manufactured according to the present invention.
第４図（ａ）ではＭｎＺｎ−フェライト基板２１に所定
幅の溝を所定間隔に形成し、その溝部にガラス２２が形
成しである複合基板の２枚を１組とする。In FIG. 4(a), grooves of a predetermined width are formed at predetermined intervals in a MnZn-ferrite substrate 21, and two composite substrates each having glass 22 formed in the groove portions form a set.
１枚の複合基板上にまず鉄系薄膜２４を０．１μｍ、Ｆ
ｅＡ４２３１合金膜２５を２０μｍ形成する（トラック
幅２０μｍの磁気ヘッドを作る場合）、この際高周波領
域での磁気特性を向上させるために絶縁物（例えばＳｔ
Ｏ，（図では省略））とＦｅＡｌＳｉ合金との積層構造
にするのが望ましい、２４．２５の膜は真空を破らずに
形成するのが望ましい。First, an iron-based thin film 24 of 0.1 μm and F was deposited on one composite substrate.
The eA4231 alloy film 25 is formed to a thickness of 20 μm (when making a magnetic head with a track width of 20 μm). At this time, an insulating material (for example, St
It is desirable to have a laminated structure of O, (omitted from the figure)) and FeAlSi alloy, and it is desirable to form the film 24.25 without breaking the vacuum.
もう１枚の基板上にはガラス層２６を２μｍ形成する。A glass layer 26 having a thickness of 2 μm is formed on the other substrate.
第４図（１））では第４図（ａ）で作った２枚の基板を
電気炉の中で約６００℃で加熱加圧接着し、複合ブロッ
ク２７を製造する。この際、窒素雰囲気中で行うのが望
ましい。In FIG. 4(1)), the two substrates made in FIG. 4(a) are bonded under heat and pressure at about 600° C. in an electric furnace to produce a composite block 27. At this time, it is desirable to carry out in a nitrogen atmosphere.
第４図（Ｃ）ではこの複合ブロックを短冊切断し、２本
のバー２８．２９を１Ａｌｌとして、１本のバーには巻
線溝加工などを行う。３０ａ−ｅは切断線である。In FIG. 4(C), this composite block is cut into strips, two bars 28 and 29 are set as 1All, and one bar is processed with a winding groove. 30a-e are cutting lines.
第４図（ｄ）では２本のバー２８．２９の突合せ面（ギ
ャップ面）を研磨した後、この面にＳｌＯ□、ガラス（
共に図では省略）を順にスパッタ法で形成し、電気炉内
で加圧加熱接着し、ヘッドバー３２とする。このときの
温度は工程（ｂ）で行った接着がゆるまないようにこの
温度より少し低い５６０°Ｃくらいが望ましい。In FIG. 4(d), after polishing the abutting surfaces (gap surfaces) of the two bars 28 and 29, this surface is coated with SlO□ and glass (
(both are omitted from the figure) are sequentially formed by sputtering and bonded under pressure and heat in an electric furnace to form the head bar 32. The temperature at this time is preferably about 560° C., which is slightly lower than this temperature, so that the bonding performed in step (b) does not loosen.
その後ヘツドバー３２を適当に切断して磁気ヘッドがで
きあがる＊３３ａ−ｃは切断線である。Thereafter, the head bar 32 is cut appropriately to complete the magnetic head.*33a-c are cutting lines.
第５図は本発明により製造される磁気ヘッドの製造方法
の一例である。FIG. 5 shows an example of a method for manufacturing a magnetic head manufactured according to the present invention.
第５図（ａ）は非磁性酸化物基板４１の２枚を１組とし
、１枚の基板４１上にまず窒化鉄膜４２を０．１μｍ、
ＦｅＡｊ！３１合金膜４３を２０．ｙｍ形成する（トラ
ック幅２０μｍの磁気ヘッドを作る場合）。In FIG. 5(a), two non-magnetic oxide substrates 41 are used as a set, and an iron nitride film 42 of 0.1 μm thickness is first formed on one substrate 41.
FeAj! 31 alloy film 43 to 20. ym (when making a magnetic head with a track width of 20 μm).
この際高周波領域での磁気特性を向上させるために絶縁
物（例えば３１０□ （図では省略））とＦｅＡ、ｊ！
Ｓｔ合金との積層構造にするのが望ましい。At this time, in order to improve the magnetic properties in the high frequency range, an insulator (for example, 310□ (not shown)) and FeA, j!
It is desirable to have a laminated structure with an St alloy.
４２．４３の膜は真空を破らずに形成するのが望ましい
。It is desirable to form the film 42.43 without breaking the vacuum.
もう１枚の基板上にはガラス層４４を２μｍ形成する。A glass layer 44 having a thickness of 2 μm is formed on the other substrate.
第５図（ｂ）では第５図（ａ）で作った２枚の基板を電
気炉の中で約６００℃で加熱加圧接着し、複合ブロック
４５を製造する。この際、窒素雰囲気中で行うのが望ま
しい。In FIG. 5(b), the two substrates made in FIG. 5(a) are bonded under heat and pressure at about 600° C. in an electric furnace to produce a composite block 45. At this time, it is desirable to carry out in a nitrogen atmosphere.
第５図（Ｃ）ではこの複合ブロックを短冊切断し、２本
のバー４６．４７を１組として、１本のバーには巻線溝
加工などを行う、４８ａ−ｅは切断線である。In FIG. 5(C), this composite block is cut into strips, two bars 46 and 47 are used as a set, and each bar is processed with winding grooves, etc., and 48a-e are cutting lines.
第５図（ロ）では２本のバー４６．４７の突合せ面（ギ
ャップ面）を研磨した後、この面に５ｉ０２、ガラス（
共に図では省略）を順にスパッタ法で形成し、電気炉内
で加圧加熱接着し、ヘッドパー５０とする。このときの
温度は工程（ｂ）で行った接着がゆるまないようにこの
温度より少し低い５６０°Ｃくらいが望ましい。In Figure 5 (b), after polishing the abutting surfaces (gap surfaces) of the two bars 46 and 47, 5i02 and glass (
(both are omitted from the figure) are sequentially formed by sputtering and bonded under pressure and heat in an electric furnace to form the head par 50. The temperature at this time is preferably about 560° C., which is slightly lower than this temperature, so that the bonding performed in step (b) does not loosen.
その後ヘツドパー５０を適当に切断して磁気ヘッドがで
きあがる。５１ａ、ｂは切断線である。Thereafter, the head par 50 is appropriately cut to complete a magnetic head. 51a and 51b are cutting lines.
鉄系薄膜の形成方法の一例を示す。An example of a method for forming an iron-based thin film will be shown.
窒化鉄の時
ターゲットに鉄、スパッタガスとしてアルゴンと窒素の
混合ガスを用いて反応性スパッタを行う。When using iron nitride, reactive sputtering is performed using iron as the target and a mixed gas of argon and nitrogen as the sputtering gas.
窒素ガスの分圧を調節することで、窒化鉄の組成をコン
トロールする。The composition of iron nitride is controlled by adjusting the partial pressure of nitrogen gas.
炭化鉄の時 ターゲットに炭化鉄を用いる。iron carbide time Iron carbide is used as a target.
鉄の時 ターゲットに鉄を用いる。iron time Uses iron as a target.
実施例では鉄系膜の膜厚に０．１／７ｍを用いたが、Ｆ
−ｅ Ａ Ｉ Ｓ ｌとフェライトの反応を防止するた
めには０．０３μｍもあれば十分である。In the example, 0.1/7 m was used as the thickness of the iron-based film, but F
-e AI S A thickness of 0.03 μm is sufficient to prevent the reaction between ferrite and ferrite.
発明の効果
本発明による磁気ヘッドにより、例えばＶＴＲＤＡＴ、
ＦＤＤ用ヘッドのコア材料として高飽和磁束密度のＦｅ
ＡｌＳｉ合金薄膜が利用でき、記録効率の優れた磁気ヘ
ッドを今までに比べて歩留り良く製造できる。Effects of the Invention The magnetic head according to the present invention enables, for example, VTRDAT,
Fe with high saturation magnetic flux density as core material for FDD heads
AlSi alloy thin films can be used, and magnetic heads with excellent recording efficiency can be manufactured with higher yield than ever before.
第１図Ｗは本発明の磁気ヘッドの斜視図、第２図は従来
の磁気ヘッドの実施例を示す斜視図、第３図、第４図、
第５図は本発明の磁気ヘッドの製造方法の工程図である
。
１・・・・・・合金薄膜、２・・・・・・フェライト、
３・・・・・・ガラス、４・・・・・・窒化鉄膜。
代理人の氏名 弁理士 粟野重孝 はか１名第
図
２−ｍ−フエライト
第
第
図
図
３ムあり３３ｃFIG. 1 W is a perspective view of the magnetic head of the present invention, FIG. 2 is a perspective view showing an embodiment of a conventional magnetic head, FIGS. 3 and 4,
FIG. 5 is a process diagram of a method for manufacturing a magnetic head according to the present invention. 1... Alloy thin film, 2... Ferrite,
3...Glass, 4...Iron nitride film. Name of agent: Patent attorney Shigetaka Awano (1 person)
Claims (5)
Ｓｉを主成分とする合金膜からなる磁気ヘッドで、フェ
ライト基板上に鉄系膜が０．０２μｍから１．０μｍ形
成され、その上にＦｅＡｌＳｉを主成分とする合金膜が
所望の厚さ形成されていることを特徴とする磁気ヘッド
。(1) The main core is ferrite, and the area near the gap is FeAl
In a magnetic head made of an alloy film mainly composed of Si, an iron-based film is formed on a ferrite substrate to a thickness of 0.02 μm to 1.0 μm, and an alloy film mainly composed of FeAlSi is formed on it to a desired thickness. A magnetic head characterized by:
鉄系膜が０．０２μｍから１．０μｍ形成され、その上
にＦｅＡｌＳｉを主成分とする合金膜が所望の厚さ形成
されていることを特徴とする磁気ヘッド。(2) An iron-based film with a thickness of 0.02 to 1.0 μm is formed on a non-magnetic oxide substrate or a ferrite substrate, and an alloy film containing FeAlSi as a main component is formed on top of it to a desired thickness. Features a magnetic head.
徴とする請求項（１），（２）のいずれかに記載の磁気
ヘッド。(3) The magnetic head according to any one of claims (1) and (2), wherein the iron-based film is iron nitride or iron carbide.
項（１），（２）のいずれかに記載の磁気ヘッド。(4) The magnetic head according to any one of claims (1) and (2), wherein the iron-based film is iron-boron.
されることを特徴とする請求項（１），（２）のいずれ
かに記載の磁気ヘッド。(5) The iron-based film contains 99wt. 2. The magnetic head according to claim 1, wherein the magnetic head is formed of an iron film containing % or more of iron.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20514888A JPH0254409A (en) | 1988-08-18 | 1988-08-18 | Magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20514888A JPH0254409A (en) | 1988-08-18 | 1988-08-18 | Magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0254409A true JPH0254409A (en) | 1990-02-23 |
Family
ID=16502216
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20514888A Pending JPH0254409A (en) | 1988-08-18 | 1988-08-18 | Magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0254409A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60132305A (en) * | 1983-12-21 | 1985-07-15 | Hitachi Ltd | Iron-nitrogen laminated magnetic film and magnetic head using the same |
| JPS6381609A (en) * | 1986-09-26 | 1988-04-12 | Tdk Corp | Magnetic head |
| JPS63279404A (en) * | 1987-05-12 | 1988-11-16 | Sumitomo Special Metals Co Ltd | Composite type magnetic head |
-
1988
- 1988-08-18 JP JP20514888A patent/JPH0254409A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60132305A (en) * | 1983-12-21 | 1985-07-15 | Hitachi Ltd | Iron-nitrogen laminated magnetic film and magnetic head using the same |
| JPS6381609A (en) * | 1986-09-26 | 1988-04-12 | Tdk Corp | Magnetic head |
| JPS63279404A (en) * | 1987-05-12 | 1988-11-16 | Sumitomo Special Metals Co Ltd | Composite type magnetic head |
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