JPH0250195B2 - - Google Patents

Info

Publication number
JPH0250195B2
JPH0250195B2 JP56202813A JP20281381A JPH0250195B2 JP H0250195 B2 JPH0250195 B2 JP H0250195B2 JP 56202813 A JP56202813 A JP 56202813A JP 20281381 A JP20281381 A JP 20281381A JP H0250195 B2 JPH0250195 B2 JP H0250195B2
Authority
JP
Japan
Prior art keywords
current
electrode
electrodes
separated
separation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56202813A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58104016A (ja
Inventor
Katsumi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP20281381A priority Critical patent/JPS58104016A/ja
Publication of JPS58104016A publication Critical patent/JPS58104016A/ja
Publication of JPH0250195B2 publication Critical patent/JPH0250195B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5093—Coaxial electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
JP20281381A 1981-12-16 1981-12-16 成膜方法および成膜装置 Granted JPS58104016A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20281381A JPS58104016A (ja) 1981-12-16 1981-12-16 成膜方法および成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20281381A JPS58104016A (ja) 1981-12-16 1981-12-16 成膜方法および成膜装置

Publications (2)

Publication Number Publication Date
JPS58104016A JPS58104016A (ja) 1983-06-21
JPH0250195B2 true JPH0250195B2 (enrdf_load_stackoverflow) 1990-11-01

Family

ID=16463621

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20281381A Granted JPS58104016A (ja) 1981-12-16 1981-12-16 成膜方法および成膜装置

Country Status (1)

Country Link
JP (1) JPS58104016A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004083486A1 (ja) * 1993-03-23 2004-09-30 Atsushi Yamagami 超短波を用いたプラズマcvd法及び該プラズマcvd装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5933250B2 (ja) * 1977-05-20 1984-08-14 株式会社日立製作所 コンデンサ型ガスプラズマ処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004083486A1 (ja) * 1993-03-23 2004-09-30 Atsushi Yamagami 超短波を用いたプラズマcvd法及び該プラズマcvd装置

Also Published As

Publication number Publication date
JPS58104016A (ja) 1983-06-21

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