JPH0247033U - - Google Patents

Info

Publication number
JPH0247033U
JPH0247033U JP1988126606U JP12660688U JPH0247033U JP H0247033 U JPH0247033 U JP H0247033U JP 1988126606 U JP1988126606 U JP 1988126606U JP 12660688 U JP12660688 U JP 12660688U JP H0247033 U JPH0247033 U JP H0247033U
Authority
JP
Japan
Prior art keywords
substrate
cradles
pair
rotary drying
receiving port
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1988126606U
Other languages
English (en)
Other versions
JPH069501Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988126606U priority Critical patent/JPH069501Y2/ja
Priority to KR1019890013807A priority patent/KR900005566A/ko
Priority to US07/413,331 priority patent/US4987687A/en
Publication of JPH0247033U publication Critical patent/JPH0247033U/ja
Application granted granted Critical
Publication of JPH069501Y2 publication Critical patent/JPH069501Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/08—Drying solid materials or objects by processes not involving the application of heat by centrifugal treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Molecular Biology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Description

【図面の簡単な説明】
第１図は本考案に係る回転乾燥装置の一実施例
を示す要部斜視図、第２図〜第４図はそれぞれク
レードルの支軸の係合構造を例示する斜視図、第
５図は従来例による回転乾燥装置の縦断面図であ
る。 １……ターンテーブル、５……クレードル、６
……受容口、８……基板収容カセツト、１０……
支軸。

Claims (1)

  1. 【実用新案登録請求の範囲】 ターンテーブル上に基板収容カセツトを受容す
    る少なくとも一対のクレードルを具備して成り、
    一対のクレードルは受容口が上向きになるカセツ
    ト交換姿勢と当該受容口が鉛直対面状になる液切
    り姿勢とに揺動回転可能に軸支して成る基板の回
    転乾燥装置において、 クレードルを支軸部分で脱着可能に係合したこ
    とを特徴とする基板の回転乾燥装置。
JP1988126606U 1988-09-27 1988-09-27 基板の回転乾燥装置 Expired - Lifetime JPH069501Y2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1988126606U JPH069501Y2 (ja) 1988-09-27 1988-09-27 基板の回転乾燥装置
KR1019890013807A KR900005566A (ko) 1988-09-27 1989-09-26 기판의 회전 건조장치
US07/413,331 US4987687A (en) 1988-09-27 1989-09-27 Rotary wafer drier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988126606U JPH069501Y2 (ja) 1988-09-27 1988-09-27 基板の回転乾燥装置

Publications (2)

Publication Number Publication Date
JPH0247033U true JPH0247033U (ja) 1990-03-30
JPH069501Y2 JPH069501Y2 (ja) 1994-03-09

Family

ID=14939359

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988126606U Expired - Lifetime JPH069501Y2 (ja) 1988-09-27 1988-09-27 基板の回転乾燥装置

Country Status (3)

Country Link
US (1) US4987687A (ja)
JP (1) JPH069501Y2 (ja)
KR (1) KR900005566A (ja)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3190929B2 (ja) * 1992-10-26 2001-07-23 保 目崎 半導体材料の水切乾燥装置
JP2709568B2 (ja) * 1994-06-30 1998-02-04 日本プレシジョン・サーキッツ株式会社 ダウンフロー型スピンドライヤ
US5634978A (en) * 1994-11-14 1997-06-03 Yieldup International Ultra-low particle semiconductor method
US5772784A (en) * 1994-11-14 1998-06-30 Yieldup International Ultra-low particle semiconductor cleaner
US5571337A (en) * 1994-11-14 1996-11-05 Yieldup International Method for cleaning and drying a semiconductor wafer
US5958146A (en) * 1994-11-14 1999-09-28 Yieldup International Ultra-low particle semiconductor cleaner using heated fluids
US5849104A (en) * 1996-09-19 1998-12-15 Yieldup International Method and apparatus for cleaning wafers using multiple tanks
JP2604561B2 (ja) * 1994-12-26 1997-04-30 山形日本電気株式会社 ウェーハ乾燥装置
US6047717A (en) * 1998-04-29 2000-04-11 Scd Mountain View, Inc. Mandrel device and method for hard disks
US7798764B2 (en) * 2005-12-22 2010-09-21 Applied Materials, Inc. Substrate processing sequence in a cartesian robot cluster tool
US7651306B2 (en) * 2004-12-22 2010-01-26 Applied Materials, Inc. Cartesian robot cluster tool architecture
US20060182535A1 (en) * 2004-12-22 2006-08-17 Mike Rice Cartesian robot design
US7371022B2 (en) * 2004-12-22 2008-05-13 Sokudo Co., Ltd. Developer endpoint detection in a track lithography system
US7819079B2 (en) * 2004-12-22 2010-10-26 Applied Materials, Inc. Cartesian cluster tool configuration for lithography type processes
US7699021B2 (en) * 2004-12-22 2010-04-20 Sokudo Co., Ltd. Cluster tool substrate throughput optimization
US20060241813A1 (en) * 2005-04-22 2006-10-26 Applied Materials, Inc. Optimized cluster tool transfer process and collision avoidance design
DK201370239A1 (en) 2013-04-30 2014-10-31 Semi Stål As Container drying device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS629635A (ja) * 1985-07-08 1987-01-17 Oki Electric Ind Co Ltd 半導体ウエハの回転乾燥装置
US4777732A (en) * 1986-06-12 1988-10-18 Oki Electric Industry Co., Ltd. Wafer centrifugal drying apparatus
JPH0745958Y2 (ja) * 1987-05-11 1995-10-18 黒谷 信子 半導体材料の水切乾燥装置

Also Published As

Publication number Publication date
KR900005566A (ko) 1990-04-14
US4987687A (en) 1991-01-29
JPH069501Y2 (ja) 1994-03-09

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