JPH0245447U - - Google Patents

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Publication number
JPH0245447U
JPH0245447U JP12213188U JP12213188U JPH0245447U JP H0245447 U JPH0245447 U JP H0245447U JP 12213188 U JP12213188 U JP 12213188U JP 12213188 U JP12213188 U JP 12213188U JP H0245447 U JPH0245447 U JP H0245447U
Authority
JP
Japan
Prior art keywords
rays
base plate
fluorescent
incident
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12213188U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0725684Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988122131U priority Critical patent/JPH0725684Y2/ja
Publication of JPH0245447U publication Critical patent/JPH0245447U/ja
Application granted granted Critical
Publication of JPH0725684Y2 publication Critical patent/JPH0725684Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
JP1988122131U 1988-09-20 1988-09-20 全反射蛍光ｘ線分析装置 Expired - Lifetime JPH0725684Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988122131U JPH0725684Y2 (ja) 1988-09-20 1988-09-20 全反射蛍光ｘ線分析装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988122131U JPH0725684Y2 (ja) 1988-09-20 1988-09-20 全反射蛍光ｘ線分析装置

Publications (2)

Publication Number Publication Date
JPH0245447U true JPH0245447U (enrdf_load_stackoverflow) 1990-03-28
JPH0725684Y2 JPH0725684Y2 (ja) 1995-06-07

Family

ID=31369771

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988122131U Expired - Lifetime JPH0725684Y2 (ja) 1988-09-20 1988-09-20 全反射蛍光ｘ線分析装置

Country Status (1)

Country Link
JP (1) JPH0725684Y2 (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62222150A (ja) * 1985-11-28 1987-09-30 ゲ−・カ−・エス・エス・フオルシユングスツエントルム・ゲ−シユタハト・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング 試料の表面層を破壊することなしに該表面層の元素組成を分析する方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62222150A (ja) * 1985-11-28 1987-09-30 ゲ−・カ−・エス・エス・フオルシユングスツエントルム・ゲ−シユタハト・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング 試料の表面層を破壊することなしに該表面層の元素組成を分析する方法

Also Published As

Publication number Publication date
JPH0725684Y2 (ja) 1995-06-07

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