JPH0244513Y2 - - Google Patents
Info
- Publication number
- JPH0244513Y2 JPH0244513Y2 JP1986179730U JP17973086U JPH0244513Y2 JP H0244513 Y2 JPH0244513 Y2 JP H0244513Y2 JP 1986179730 U JP1986179730 U JP 1986179730U JP 17973086 U JP17973086 U JP 17973086U JP H0244513 Y2 JPH0244513 Y2 JP H0244513Y2
- Authority
- JP
- Japan
- Prior art keywords
- lamp
- resist
- metal plate
- light
- longitudinal direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986179730U JPH0244513Y2 (enExample) | 1986-11-25 | 1986-11-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986179730U JPH0244513Y2 (enExample) | 1986-11-25 | 1986-11-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6384935U JPS6384935U (enExample) | 1988-06-03 |
| JPH0244513Y2 true JPH0244513Y2 (enExample) | 1990-11-27 |
Family
ID=31123048
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986179730U Expired JPH0244513Y2 (enExample) | 1986-11-25 | 1986-11-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0244513Y2 (enExample) |
-
1986
- 1986-11-25 JP JP1986179730U patent/JPH0244513Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6384935U (enExample) | 1988-06-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW315496B (enExample) | ||
| KR100508284B1 (ko) | 주변노광장치 | |
| TW202303288A (zh) | 基板處理裝置及基板處理方法 | |
| US5204224A (en) | Method of exposing a peripheral part of a wafer | |
| JP4518369B2 (ja) | 半導体結晶層の製造方法、レーザ照射方法、マルチパターンマスクおよびレーザ照射システム | |
| JPH0246046Y2 (enExample) | ||
| JPH0246045Y2 (enExample) | ||
| JP3194441B2 (ja) | レジストの硬化方法及びレジスト処理装置 | |
| JP2018147918A5 (enExample) | ||
| JP6450333B2 (ja) | 基板処理方法、基板処理装置及び基板処理システム | |
| JPH02254456A (ja) | フォトレジスト露光方法およびその装置 | |
| EP0448735B1 (en) | Method of exposing a peripheral part of wafer | |
| JP6145065B2 (ja) | 基板処理方法、基板処理装置及び記録媒体 | |
| JP2732450B2 (ja) | 光照射器 | |
| JP6921150B2 (ja) | 追加露光装置およびパターン形成方法 | |
| JPS63234527A (ja) | レジスト処理方法 | |
| JPH0545887A (ja) | 画像形成用露光装置 | |
| JPS63234526A (ja) | レジスト処理方法 | |
| JPS62193248A (ja) | レジスト塗布・ベ−ク装置 | |
| JPH02177420A (ja) | ウエハ周辺露光装置 | |
| US5693455A (en) | Method for creating a pattern having step features in a photopolymer using a thermal mask | |
| JPS62101027A (ja) | レジスト処理方法 | |
| JP2617923B2 (ja) | パターン形成方法 | |
| JP4884149B2 (ja) | 露光装置、露光方法、及び表示用パネル基板の製造方法 | |
| CN121679987A (zh) | 光刻结构的制备方法及装置 |