JPH0242900B2 - - Google Patents

Info

Publication number
JPH0242900B2
JPH0242900B2 JP20462182A JP20462182A JPH0242900B2 JP H0242900 B2 JPH0242900 B2 JP H0242900B2 JP 20462182 A JP20462182 A JP 20462182A JP 20462182 A JP20462182 A JP 20462182A JP H0242900 B2 JPH0242900 B2 JP H0242900B2
Authority
JP
Japan
Prior art keywords
vacuum chamber
substrate
chamber
pressure adjustment
cylindrical anti
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP20462182A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5996271A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP20462182A priority Critical patent/JPS5996271A/ja
Publication of JPS5996271A publication Critical patent/JPS5996271A/ja
Publication of JPH0242900B2 publication Critical patent/JPH0242900B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP20462182A 1982-11-24 1982-11-24 連続式スパツタ装置 Granted JPS5996271A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20462182A JPS5996271A (ja) 1982-11-24 1982-11-24 連続式スパツタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20462182A JPS5996271A (ja) 1982-11-24 1982-11-24 連続式スパツタ装置

Publications (2)

Publication Number Publication Date
JPS5996271A JPS5996271A (ja) 1984-06-02
JPH0242900B2 true JPH0242900B2 (enrdf_load_stackoverflow) 1990-09-26

Family

ID=16493503

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20462182A Granted JPS5996271A (ja) 1982-11-24 1982-11-24 連続式スパツタ装置

Country Status (1)

Country Link
JP (1) JPS5996271A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS5996271A (ja) 1984-06-02

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