JPH0242899B2 - - Google Patents

Info

Publication number
JPH0242899B2
JPH0242899B2 JP62253063A JP25306387A JPH0242899B2 JP H0242899 B2 JPH0242899 B2 JP H0242899B2 JP 62253063 A JP62253063 A JP 62253063A JP 25306387 A JP25306387 A JP 25306387A JP H0242899 B2 JPH0242899 B2 JP H0242899B2
Authority
JP
Japan
Prior art keywords
target
oxide
optical
thin film
magneto
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62253063A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0196382A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP25306387A priority Critical patent/JPH0196382A/ja
Publication of JPH0196382A publication Critical patent/JPH0196382A/ja
Publication of JPH0242899B2 publication Critical patent/JPH0242899B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)
JP25306387A 1987-10-07 1987-10-07 Ｂｉ３Ｆｅ５Ｏ１２薄膜製造用ターゲット及びその製造方法 Granted JPH0196382A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25306387A JPH0196382A (ja) 1987-10-07 1987-10-07 Ｂｉ３Ｆｅ５Ｏ１２薄膜製造用ターゲット及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25306387A JPH0196382A (ja) 1987-10-07 1987-10-07 Ｂｉ３Ｆｅ５Ｏ１２薄膜製造用ターゲット及びその製造方法

Publications (2)

Publication Number Publication Date
JPH0196382A JPH0196382A (ja) 1989-04-14
JPH0242899B2 true JPH0242899B2 (enrdf_load_stackoverflow) 1990-09-26

Family

ID=17245976

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25306387A Granted JPH0196382A (ja) 1987-10-07 1987-10-07 Ｂｉ３Ｆｅ５Ｏ１２薄膜製造用ターゲット及びその製造方法

Country Status (1)

Country Link
JP (1) JPH0196382A (enrdf_load_stackoverflow)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58164780A (ja) * 1982-03-23 1983-09-29 Hitachi Metals Ltd スパツタ用タ−ゲツトの作成方法

Also Published As

Publication number Publication date
JPH0196382A (ja) 1989-04-14

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term