JPH0240738B2 - - Google Patents

Info

Publication number
JPH0240738B2
JPH0240738B2 JP62180387A JP18038787A JPH0240738B2 JP H0240738 B2 JPH0240738 B2 JP H0240738B2 JP 62180387 A JP62180387 A JP 62180387A JP 18038787 A JP18038787 A JP 18038787A JP H0240738 B2 JPH0240738 B2 JP H0240738B2
Authority
JP
Japan
Prior art keywords
gas
reflector
chamber
gas introduction
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62180387A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6425976A (en
Inventor
Norihiko Konno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuda Seisakusho Co Ltd
Original Assignee
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuda Seisakusho Co Ltd filed Critical Tokuda Seisakusho Co Ltd
Priority to JP18038787A priority Critical patent/JPS6425976A/ja
Publication of JPS6425976A publication Critical patent/JPS6425976A/ja
Publication of JPH0240738B2 publication Critical patent/JPH0240738B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP18038787A 1987-07-20 1987-07-20 Sputtering device Granted JPS6425976A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18038787A JPS6425976A (en) 1987-07-20 1987-07-20 Sputtering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18038787A JPS6425976A (en) 1987-07-20 1987-07-20 Sputtering device

Publications (2)

Publication Number Publication Date
JPS6425976A JPS6425976A (en) 1989-01-27
JPH0240738B2 true JPH0240738B2 (cs) 1990-09-13

Family

ID=16082341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18038787A Granted JPS6425976A (en) 1987-07-20 1987-07-20 Sputtering device

Country Status (1)

Country Link
JP (1) JPS6425976A (cs)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02225663A (ja) * 1989-02-27 1990-09-07 Tokuda Seisakusho Ltd スパッタ装置
DE69531313T2 (de) * 1994-04-28 2004-05-13 Ebara Corp. Regeneration einer Kryopumpe
GB2472101A (en) 2009-07-24 2011-01-26 Natural Adcampaign Ltd Advertising and display structures

Also Published As

Publication number Publication date
JPS6425976A (en) 1989-01-27

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