JPH0240371B2 - - Google Patents
Info
- Publication number
- JPH0240371B2 JPH0240371B2 JP57148992A JP14899282A JPH0240371B2 JP H0240371 B2 JPH0240371 B2 JP H0240371B2 JP 57148992 A JP57148992 A JP 57148992A JP 14899282 A JP14899282 A JP 14899282A JP H0240371 B2 JPH0240371 B2 JP H0240371B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- reaction
- reaction chamber
- reaction gas
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000006243 chemical reaction Methods 0.000 claims description 67
- 239000007789 gas Substances 0.000 claims description 64
- 239000012495 reaction gas Substances 0.000 claims description 24
- 239000012535 impurity Substances 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 7
- 238000001947 vapour-phase growth Methods 0.000 claims description 7
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 12
- 229910021417 amorphous silicon Inorganic materials 0.000 description 12
- 239000010408 film Substances 0.000 description 10
- 229910000077 silane Inorganic materials 0.000 description 10
- 239000007787 solid Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- ZOCHARZZJNPSEU-UHFFFAOYSA-N diboron Chemical compound B#B ZOCHARZZJNPSEU-UHFFFAOYSA-N 0.000 description 1
- 238000004868 gas analysis Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14899282A JPS5939339A (ja) | 1982-08-27 | 1982-08-27 | 気相成長反応装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14899282A JPS5939339A (ja) | 1982-08-27 | 1982-08-27 | 気相成長反応装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5939339A JPS5939339A (ja) | 1984-03-03 |
| JPH0240371B2 true JPH0240371B2 (US20100012521A1-20100121-C00001.png) | 1990-09-11 |
Family
ID=15465274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14899282A Granted JPS5939339A (ja) | 1982-08-27 | 1982-08-27 | 気相成長反応装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5939339A (US20100012521A1-20100121-C00001.png) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9162209B2 (en) * | 2012-03-01 | 2015-10-20 | Novellus Systems, Inc. | Sequential cascading of reaction volumes as a chemical reuse strategy |
| JP5867204B2 (ja) * | 2012-03-16 | 2016-02-24 | 株式会社アルバック | 真空処理装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50159493A (US20100012521A1-20100121-C00001.png) * | 1974-05-20 | 1975-12-24 | ||
| JPS51131813A (en) * | 1975-05-07 | 1976-11-16 | Mitsubishi Gas Chem Co Inc | Process for methanol production |
-
1982
- 1982-08-27 JP JP14899282A patent/JPS5939339A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50159493A (US20100012521A1-20100121-C00001.png) * | 1974-05-20 | 1975-12-24 | ||
| JPS51131813A (en) * | 1975-05-07 | 1976-11-16 | Mitsubishi Gas Chem Co Inc | Process for methanol production |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5939339A (ja) | 1984-03-03 |
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