JPH02369U - - Google Patents

Info

Publication number
JPH02369U
JPH02369U JP7837388U JP7837388U JPH02369U JP H02369 U JPH02369 U JP H02369U JP 7837388 U JP7837388 U JP 7837388U JP 7837388 U JP7837388 U JP 7837388U JP H02369 U JPH02369 U JP H02369U
Authority
JP
Japan
Prior art keywords
base plate
outer ring
epitaxial growth
gap
reactor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7837388U
Other languages
English (en)
Japanese (ja)
Other versions
JPH06459Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7837388U priority Critical patent/JPH06459Y2/ja
Publication of JPH02369U publication Critical patent/JPH02369U/ja
Application granted granted Critical
Publication of JPH06459Y2 publication Critical patent/JPH06459Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
JP7837388U 1988-06-15 1988-06-15 縦型エピタキシャル成長装置 Expired - Lifetime JPH06459Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7837388U JPH06459Y2 (ja) 1988-06-15 1988-06-15 縦型エピタキシャル成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7837388U JPH06459Y2 (ja) 1988-06-15 1988-06-15 縦型エピタキシャル成長装置

Publications (2)

Publication Number Publication Date
JPH02369U true JPH02369U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-01-05
JPH06459Y2 JPH06459Y2 (ja) 1994-01-05

Family

ID=31303302

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7837388U Expired - Lifetime JPH06459Y2 (ja) 1988-06-15 1988-06-15 縦型エピタキシャル成長装置

Country Status (1)

Country Link
JP (1) JPH06459Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011104861A1 (ja) * 2010-02-26 2011-09-01 入江工研株式会社 ゲートバルブのシール構造
JP2013201421A (ja) * 2012-02-22 2013-10-03 Tokyo Electron Ltd 基板処理装置
JP2017197779A (ja) * 2016-04-25 2017-11-02 トヨタ自動車株式会社 成膜装置及び成膜方法
US11251019B2 (en) 2016-12-15 2022-02-15 Toyota Jidosha Kabushiki Kaisha Plasma device
JP2022532794A (ja) * 2019-05-22 2022-07-19 ラム リサーチ コーポレーション パージを伴う腐食性ガス用の蒸気アキュムレータ

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103295935B (zh) * 2012-02-22 2017-06-20 东京毅力科创株式会社 基板处理装置
JP6863199B2 (ja) 2017-09-25 2021-04-21 トヨタ自動車株式会社 プラズマ処理装置
KR102582274B1 (ko) * 2019-03-14 2023-09-25 주식회사 원익아이피에스 웨이퍼 공정용 열처리 장치 및 그의 캡 플랜지

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011104861A1 (ja) * 2010-02-26 2011-09-01 入江工研株式会社 ゲートバルブのシール構造
CN102762905A (zh) * 2010-02-26 2012-10-31 入江工研株式会社 插板阀的密封结构
JP5514893B2 (ja) * 2010-02-26 2014-06-04 入江工研株式会社 ゲートバルブのシール構造
JP2013201421A (ja) * 2012-02-22 2013-10-03 Tokyo Electron Ltd 基板処理装置
JP2017197779A (ja) * 2016-04-25 2017-11-02 トヨタ自動車株式会社 成膜装置及び成膜方法
US10385455B2 (en) 2016-04-25 2019-08-20 Toyota Jidosha Kabushiki Kaisha Film forming apparatus and film forming method
US11251019B2 (en) 2016-12-15 2022-02-15 Toyota Jidosha Kabushiki Kaisha Plasma device
JP2022532794A (ja) * 2019-05-22 2022-07-19 ラム リサーチ コーポレーション パージを伴う腐食性ガス用の蒸気アキュムレータ

Also Published As

Publication number Publication date
JPH06459Y2 (ja) 1994-01-05

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