JPH023555B2 - - Google Patents
Info
- Publication number
- JPH023555B2 JPH023555B2 JP57143203A JP14320382A JPH023555B2 JP H023555 B2 JPH023555 B2 JP H023555B2 JP 57143203 A JP57143203 A JP 57143203A JP 14320382 A JP14320382 A JP 14320382A JP H023555 B2 JPH023555 B2 JP H023555B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- electrode material
- powder
- silicon
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007772 electrode material Substances 0.000 claims description 22
- 239000000843 powder Substances 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 15
- 229910052750 molybdenum Inorganic materials 0.000 claims description 11
- 229910052721 tungsten Inorganic materials 0.000 claims description 11
- 239000011521 glass Substances 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 9
- 238000002156 mixing Methods 0.000 claims description 6
- 239000011230 binding agent Substances 0.000 claims description 5
- 239000003960 organic solvent Substances 0.000 claims description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 17
- 229910052710 silicon Inorganic materials 0.000 description 17
- 239000010703 silicon Substances 0.000 description 17
- 238000000034 method Methods 0.000 description 10
- 239000000758 substrate Substances 0.000 description 9
- 150000002739 metals Chemical class 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 229910052814 silicon oxide Inorganic materials 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 229910000464 lead oxide Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- WUOACPNHFRMFPN-SECBINFHSA-N (S)-(-)-alpha-terpineol Chemical compound CC1=CC[C@@H](C(C)(C)O)CC1 WUOACPNHFRMFPN-SECBINFHSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- OVKDFILSBMEKLT-UHFFFAOYSA-N alpha-Terpineol Natural products CC(=C)C1(O)CCC(C)=CC1 OVKDFILSBMEKLT-UHFFFAOYSA-N 0.000 description 1
- 229940088601 alpha-terpineol Drugs 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 235000011837 pasties Nutrition 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000205 poly(isobutyl methacrylate) Polymers 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- -1 silicide compound Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- ZFZQOKHLXAVJIF-UHFFFAOYSA-N zinc;boric acid;dihydroxy(dioxido)silane Chemical compound [Zn+2].OB(O)O.O[Si](O)([O-])[O-] ZFZQOKHLXAVJIF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/45—Ohmic electrodes
- H01L29/456—Ohmic electrodes on silicon
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electrodes Of Semiconductors (AREA)
- Photovoltaic Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57143203A JPS5933869A (ja) | 1982-08-20 | 1982-08-20 | 半導体装置用電極材料 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57143203A JPS5933869A (ja) | 1982-08-20 | 1982-08-20 | 半導体装置用電極材料 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5933869A JPS5933869A (ja) | 1984-02-23 |
JPH023555B2 true JPH023555B2 (zh) | 1990-01-24 |
Family
ID=15333271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57143203A Granted JPS5933869A (ja) | 1982-08-20 | 1982-08-20 | 半導体装置用電極材料 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5933869A (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2008078374A1 (ja) * | 2006-12-25 | 2010-04-15 | ナミックス株式会社 | 太陽電池用導電性ペースト |
JP5144857B2 (ja) * | 2010-03-01 | 2013-02-13 | 株式会社ノリタケカンパニーリミテド | 太陽電池用導電性ペースト組成物 |
JP5416631B2 (ja) * | 2010-03-25 | 2014-02-12 | 株式会社日立製作所 | アルミニウム電極配線用のガラス組成物と導電性ペースト、そのアルミニウム電極配線を具備する電子部品、及び、この電子部品の製造方法 |
JP5480448B2 (ja) | 2010-05-04 | 2014-04-23 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 鉛−テルル−リチウム−酸化物を含有する厚膜ペーストと半導体デバイスの製造においてのそれらの使用 |
TWI745562B (zh) | 2017-04-18 | 2021-11-11 | 美商太陽帕斯特有限責任公司 | 導電糊料組成物及用其製成的半導體裝置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4963994A (zh) * | 1972-10-26 | 1974-06-20 | ||
JPS5384495A (en) * | 1976-12-29 | 1978-07-25 | Japan Solar Energy | Semiconductor electrode and method of forming same |
JPS5713164A (en) * | 1980-06-28 | 1982-01-23 | Matsushita Electric Ind Co Ltd | Paste of activating metallic material for electroless plating and plating method using said paste |
-
1982
- 1982-08-20 JP JP57143203A patent/JPS5933869A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4963994A (zh) * | 1972-10-26 | 1974-06-20 | ||
JPS5384495A (en) * | 1976-12-29 | 1978-07-25 | Japan Solar Energy | Semiconductor electrode and method of forming same |
JPS5713164A (en) * | 1980-06-28 | 1982-01-23 | Matsushita Electric Ind Co Ltd | Paste of activating metallic material for electroless plating and plating method using said paste |
Also Published As
Publication number | Publication date |
---|---|
JPS5933869A (ja) | 1984-02-23 |
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