JPH0235447B2 - - Google Patents
Info
- Publication number
- JPH0235447B2 JPH0235447B2 JP61136182A JP13618286A JPH0235447B2 JP H0235447 B2 JPH0235447 B2 JP H0235447B2 JP 61136182 A JP61136182 A JP 61136182A JP 13618286 A JP13618286 A JP 13618286A JP H0235447 B2 JPH0235447 B2 JP H0235447B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- alignment
- projection lens
- reticle
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 58
- 230000004075 alteration Effects 0.000 claims description 53
- 238000001514 detection method Methods 0.000 claims description 22
- 201000009310 astigmatism Diseases 0.000 claims description 17
- 206010010071 Coma Diseases 0.000 claims description 13
- 235000012431 wafers Nutrition 0.000 description 66
- 238000012937 correction Methods 0.000 description 38
- 238000000034 method Methods 0.000 description 21
- 238000003384 imaging method Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 7
- 238000005259 measurement Methods 0.000 description 6
- 230000004907 flux Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000010276 construction Methods 0.000 description 2
- 210000001747 pupil Anatomy 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 101000857682 Homo sapiens Runt-related transcription factor 2 Proteins 0.000 description 1
- 102100025368 Runt-related transcription factor 2 Human genes 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000007405 data analysis Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61136182A JPS62293718A (ja) | 1986-06-13 | 1986-06-13 | 露光装置 |
| US07/333,727 US4888614A (en) | 1986-05-30 | 1989-04-03 | Observation system for a projection exposure apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61136182A JPS62293718A (ja) | 1986-06-13 | 1986-06-13 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62293718A JPS62293718A (ja) | 1987-12-21 |
| JPH0235447B2 true JPH0235447B2 (US20080293856A1-20081127-C00150.png) | 1990-08-10 |
Family
ID=15169258
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61136182A Granted JPS62293718A (ja) | 1986-05-30 | 1986-06-13 | 露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62293718A (US20080293856A1-20081127-C00150.png) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006501469A (ja) * | 2002-09-30 | 2006-01-12 | アプライド マテリアルズ イスラエル リミテッド | 斜めのビュー角度をもつ検査システム |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5260771A (en) * | 1988-03-07 | 1993-11-09 | Hitachi, Ltd. | Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same |
| US5094539A (en) * | 1988-03-07 | 1992-03-10 | Hitachi, Ltd. | Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same |
| US5231467A (en) * | 1990-09-20 | 1993-07-27 | Matsushita Electric Industrial Co., Ltd. | Reflective alignment position signal producing apparatus |
| US8432944B2 (en) * | 2010-06-25 | 2013-04-30 | KLA-Technor Corporation | Extending the lifetime of a deep UV laser in a wafer inspection tool |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3963353A (en) * | 1974-09-26 | 1976-06-15 | The Perkin-Elmer Corporation | Monolithic beam splitter mirror arrangement |
| JPS56110234A (en) * | 1980-02-06 | 1981-09-01 | Canon Inc | Projection printing device |
| US4357100A (en) * | 1979-01-11 | 1982-11-02 | Censor Patent- Und Versuchs-Anstalt | Arrangement for projection copying masks on to a work piece |
| JPS60186845A (ja) * | 1984-03-06 | 1985-09-24 | Nippon Kogaku Kk <Nikon> | 露光装置の位置合せ装置 |
-
1986
- 1986-06-13 JP JP61136182A patent/JPS62293718A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3963353A (en) * | 1974-09-26 | 1976-06-15 | The Perkin-Elmer Corporation | Monolithic beam splitter mirror arrangement |
| US4357100A (en) * | 1979-01-11 | 1982-11-02 | Censor Patent- Und Versuchs-Anstalt | Arrangement for projection copying masks on to a work piece |
| JPS56110234A (en) * | 1980-02-06 | 1981-09-01 | Canon Inc | Projection printing device |
| JPS60186845A (ja) * | 1984-03-06 | 1985-09-24 | Nippon Kogaku Kk <Nikon> | 露光装置の位置合せ装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006501469A (ja) * | 2002-09-30 | 2006-01-12 | アプライド マテリアルズ イスラエル リミテッド | 斜めのビュー角度をもつ検査システム |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62293718A (ja) | 1987-12-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |