JPH0235447B2 - - Google Patents

Info

Publication number
JPH0235447B2
JPH0235447B2 JP61136182A JP13618286A JPH0235447B2 JP H0235447 B2 JPH0235447 B2 JP H0235447B2 JP 61136182 A JP61136182 A JP 61136182A JP 13618286 A JP13618286 A JP 13618286A JP H0235447 B2 JPH0235447 B2 JP H0235447B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61136182A
Other versions
JPS62293718A (en
Inventor
Akyoshi Suzuki
Hideki Ine
Masao Kosugi
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Priority to JP61136182A priority Critical patent/JPH0235447B2/ja
Publication of JPS62293718A publication Critical patent/JPS62293718A/en
Priority claimed from US07/333,727 external-priority patent/US4888614A/en
Publication of JPH0235447B2 publication Critical patent/JPH0235447B2/ja
Anticipated expiration legal-status Critical
Application status is Expired - Lifetime legal-status Critical

Links

JP61136182A 1986-06-13 1986-06-13 Expired - Lifetime JPH0235447B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61136182A JPH0235447B2 (en) 1986-06-13 1986-06-13

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP61136182A JPH0235447B2 (en) 1986-06-13 1986-06-13
US07/333,727 US4888614A (en) 1986-05-30 1989-04-03 Observation system for a projection exposure apparatus

Publications (2)

Publication Number Publication Date
JPS62293718A JPS62293718A (en) 1987-12-21
JPH0235447B2 true JPH0235447B2 (en) 1990-08-10

Family

ID=15169258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61136182A Expired - Lifetime JPH0235447B2 (en) 1986-06-13 1986-06-13

Country Status (1)

Country Link
JP (1) JPH0235447B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006501469A (en) * 2002-09-30 2006-01-12 アプライド マテリアルズ イスラエル リミテッド Inspection system with an oblique view angle

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5260771A (en) * 1988-03-07 1993-11-09 Hitachi, Ltd. Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same
US5094539A (en) * 1988-03-07 1992-03-10 Hitachi, Ltd. Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same
US5231467A (en) * 1990-09-20 1993-07-27 Matsushita Electric Industrial Co., Ltd. Reflective alignment position signal producing apparatus
US8432944B2 (en) * 2010-06-25 2013-04-30 KLA-Technor Corporation Extending the lifetime of a deep UV laser in a wafer inspection tool

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3963353A (en) * 1974-09-26 1976-06-15 The Perkin-Elmer Corporation Monolithic beam splitter mirror arrangement
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device
US4357100A (en) * 1979-01-11 1982-11-02 Censor Patent- Und Versuchs-Anstalt Arrangement for projection copying masks on to a work piece
JPS60186845A (en) * 1984-03-06 1985-09-24 Nippon Kogaku Kk <Nikon> Aligning device of exposure device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3963353A (en) * 1974-09-26 1976-06-15 The Perkin-Elmer Corporation Monolithic beam splitter mirror arrangement
US4357100A (en) * 1979-01-11 1982-11-02 Censor Patent- Und Versuchs-Anstalt Arrangement for projection copying masks on to a work piece
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device
JPS60186845A (en) * 1984-03-06 1985-09-24 Nippon Kogaku Kk <Nikon> Aligning device of exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006501469A (en) * 2002-09-30 2006-01-12 アプライド マテリアルズ イスラエル リミテッド Inspection system with an oblique view angle

Also Published As

Publication number Publication date
JPS62293718A (en) 1987-12-21

Similar Documents

Publication Publication Date Title
JPH02500751A (en)
DE8604803U1 (en)
JPH0349345Y2 (en)
JPH0318982Y2 (en)
JPH0354136Y2 (en)
BG44890A1 (en)
JPH0222902Y2 (en)
JPH029057B2 (en)
DE8612922U1 (en)
JPH0344441Y2 (en)
JPH0353839Y2 (en)
JPH0314241Y2 (en)
JPH0140505Y2 (en)
JPH0329378Y2 (en)
JPH0247137Y2 (en)
JPH0247961Y2 (en)
JPH01500884A (en)
JPH0311353Y2 (en)
JPH0370988B2 (en)
JPH0322041Y2 (en)
JPH01500048A (en)
JPH01503434A (en)
JPH0224630Y2 (en)
JPH0234422Y2 (en)
JPH0243880Y2 (en)

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term