JPH0233792B2 - - Google Patents

Info

Publication number

JPH0233792B2

JPH0233792B2 JP58013652A JP1365283A JPH0233792B2 JP H0233792 B2 JPH0233792 B2 JP H0233792B2 JP 58013652 A JP58013652 A JP 58013652A JP 1365283 A JP1365283 A JP 1365283A JP H0233792 B2 JPH0233792 B2 JP H0233792B2

Authority

JP

Japan

Prior art keywords

electrode

oxide

supported

metal

electrolysis

Prior art date

1983-02-01

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired - Lifetime

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• BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 54
• 239000011808 electrode reactant Substances 0.000 claims description 39
• AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 claims description 30
• 238000005868 electrolysis reaction Methods 0.000 claims description 29
• 239000000758 substrate Substances 0.000 claims description 22
• 230000007797 corrosion Effects 0.000 claims description 21
• 238000005260 corrosion Methods 0.000 claims description 21
• 239000000463 material Substances 0.000 claims description 19
• HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims description 18
• 229910000457 iridium oxide Inorganic materials 0.000 claims description 18
• 229910000428 cobalt oxide Inorganic materials 0.000 claims description 14
• IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 claims description 14
• 229910052741 iridium Inorganic materials 0.000 claims description 6
• GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 6
• 229910017052 cobalt Inorganic materials 0.000 claims description 4
• 239000010941 cobalt Substances 0.000 claims description 4
• GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 4
• PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 2
• 229910052748 manganese Inorganic materials 0.000 claims description 2
• 239000011572 manganese Substances 0.000 claims description 2
• 239000000243 solution Substances 0.000 description 26
• 238000000034 method Methods 0.000 description 20
• LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 12
• 229910001924 platinum group oxide Inorganic materials 0.000 description 12
• 229910052751 metal Inorganic materials 0.000 description 11
• 239000002184 metal Substances 0.000 description 11
• LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
• 150000001875 compounds Chemical class 0.000 description 10
• 230000000694 effects Effects 0.000 description 10
• 229910044991 metal oxide Inorganic materials 0.000 description 10
• 150000004706 metal oxides Chemical class 0.000 description 10
• QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
• 238000004519 manufacturing process Methods 0.000 description 8
• 239000000126 substance Substances 0.000 description 7
• RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
• 239000010936 titanium Substances 0.000 description 6
• 229910052719 titanium Inorganic materials 0.000 description 6
• 238000003411 electrode reaction Methods 0.000 description 5
• 238000005979 thermal decomposition reaction Methods 0.000 description 5
• VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
• ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
• 238000006243 chemical reaction Methods 0.000 description 4
• 239000000460 chlorine Substances 0.000 description 4
• 229910052801 chlorine Inorganic materials 0.000 description 4
• 230000000052 comparative effect Effects 0.000 description 4
• 229910052697 platinum Inorganic materials 0.000 description 4
• 230000008569 process Effects 0.000 description 4
• 239000002253 acid Substances 0.000 description 3
• 239000007864 aqueous solution Substances 0.000 description 3
• GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 3
• 238000009713 electroplating Methods 0.000 description 3
• 238000005516 engineering process Methods 0.000 description 3
• 239000007789 gas Substances 0.000 description 3
• 239000007788 liquid Substances 0.000 description 3
• 239000000203 mixture Substances 0.000 description 3
• -1 platinum group metals Chemical class 0.000 description 3
• KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
• VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
• FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
• 238000005275 alloying Methods 0.000 description 2
• QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
• 239000011248 coating agent Substances 0.000 description 2
• 238000000576 coating method Methods 0.000 description 2
• 150000001869 cobalt compounds Chemical class 0.000 description 2
• 230000007423 decrease Effects 0.000 description 2
• 230000001590 oxidative effect Effects 0.000 description 2
• 239000001301 oxygen Substances 0.000 description 2
• 229910052760 oxygen Inorganic materials 0.000 description 2
• 230000000149 penetrating effect Effects 0.000 description 2
• 238000007747 plating Methods 0.000 description 2
• DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 2
• NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
• 229910021380 Manganese Chloride Inorganic materials 0.000 description 1
• GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical compound Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 description 1
• 229910021607 Silver chloride Inorganic materials 0.000 description 1
• GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
• 238000002441 X-ray diffraction Methods 0.000 description 1
• FCUFAHVIZMPWGD-UHFFFAOYSA-N [O-][N+](=O)[Pt](N)(N)[N+]([O-])=O Chemical compound [O-][N+](=O)[Pt](N)(N)[N+]([O-])=O FCUFAHVIZMPWGD-UHFFFAOYSA-N 0.000 description 1
• 230000002378 acidificating effect Effects 0.000 description 1
• 230000009471 action Effects 0.000 description 1
• 230000004913 activation Effects 0.000 description 1
• 229910052785 arsenic Inorganic materials 0.000 description 1
• 230000015572 biosynthetic process Effects 0.000 description 1
• 239000003054 catalyst Substances 0.000 description 1
• 230000003197 catalytic effect Effects 0.000 description 1
• 239000011247 coating layer Substances 0.000 description 1
• 239000002131 composite material Substances 0.000 description 1
• 239000013078 crystal Substances 0.000 description 1
• 230000003247 decreasing effect Effects 0.000 description 1
• 238000005238 degreasing Methods 0.000 description 1
• 238000001035 drying Methods 0.000 description 1
• 238000002848 electrochemical method Methods 0.000 description 1
• 238000004070 electrodeposition Methods 0.000 description 1
• 230000002779 inactivation Effects 0.000 description 1
• 230000003993 interaction Effects 0.000 description 1
• 150000002504 iridium compounds Chemical class 0.000 description 1
• 239000011565 manganese chloride Substances 0.000 description 1
• 229940099607 manganese chloride Drugs 0.000 description 1
• 235000002867 manganese chloride Nutrition 0.000 description 1
• 150000002697 manganese compounds Chemical class 0.000 description 1
• WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
• HBEQXAKJSGXAIQ-UHFFFAOYSA-N oxopalladium Chemical compound [Pd]=O HBEQXAKJSGXAIQ-UHFFFAOYSA-N 0.000 description 1
• SJLOMQIUPFZJAN-UHFFFAOYSA-N oxorhodium Chemical compound [Rh]=O SJLOMQIUPFZJAN-UHFFFAOYSA-N 0.000 description 1
• 229910003445 palladium oxide Inorganic materials 0.000 description 1
• 230000035515 penetration Effects 0.000 description 1
• 239000012466 permeate Substances 0.000 description 1
• 239000011148 porous material Substances 0.000 description 1
• 239000000047 product Substances 0.000 description 1
• 239000002994 raw material Substances 0.000 description 1
• 229910003450 rhodium oxide Inorganic materials 0.000 description 1
• 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
• WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
• 230000008117 seed development Effects 0.000 description 1
• HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
• 239000011780 sodium chloride Substances 0.000 description 1
• 239000002904 solvent Substances 0.000 description 1
• 230000001502 supplementing effect Effects 0.000 description 1
• 238000007751 thermal spraying Methods 0.000 description 1
• OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
• 238000001291 vacuum drying Methods 0.000 description 1