JPH0231152U - - Google Patents

Info

Publication number
JPH0231152U
JPH0231152U JP10927288U JP10927288U JPH0231152U JP H0231152 U JPH0231152 U JP H0231152U JP 10927288 U JP10927288 U JP 10927288U JP 10927288 U JP10927288 U JP 10927288U JP H0231152 U JPH0231152 U JP H0231152U
Authority
JP
Japan
Prior art keywords
diffusion layer
layer region
epitaxial layer
regions
conductivity type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10927288U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10927288U priority Critical patent/JPH0231152U/ja
Publication of JPH0231152U publication Critical patent/JPH0231152U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の実施例に係るブリツジ型全波
整流回路用半導体素子の平面図、第2図は第1図
の―線に沿う断面図、第3図は第1図の―
線に沿う断面図、第4図は第1図の―線に
沿う断面図、第5図は第1図の―線に沿う断
面図である。第6図はブリツジ型全波整流回路の
回路図である。 2…半導体チツプ、4…第1のエピタキシヤル
層領域、6…第1の拡散層領域、8…第2の拡散
層領域、10,12,14…電極、16…第2の
エピタキシヤル層領域、18…第3の拡散層領域
、20…第4の拡散層領域、22,24,26…
電極。
FIG. 1 is a plan view of a semiconductor device for a bridge type full-wave rectifier circuit according to an embodiment of the present invention, FIG. 2 is a sectional view taken along the line - in FIG. 1, and FIG. 3 is a - in FIG. 1.
FIG. 4 is a cross-sectional view taken along the line --- in FIG. 1, and FIG. 5 is a cross-sectional view taken along the --- line in FIG. FIG. 6 is a circuit diagram of a bridge type full-wave rectifier circuit. 2... Semiconductor chip, 4... First epitaxial layer region, 6... First diffusion layer region, 8... Second diffusion layer region, 10, 12, 14... Electrode, 16... Second epitaxial layer region , 18...Third diffusion layer region, 20...Fourth diffusion layer region, 22, 24, 26...
electrode.

Claims (1)

【実用新案登録請求の範囲】 半導体チツプ内の一方側に一導電型の第1のエ
ピタキシヤル層領域と、これと反対の導電型の第
1および第2の拡散層領域とを設け、かつ、前記
第1のエピタキシヤル層領域と前記両拡散層領域
それぞれの窓開け部に電極を形成し、 前記半導体チツプ内の他方側に前記両拡散層領
域における導電型と同じ導電型の第2のエピタキ
シヤル層領域と、前記エピタキシヤル層領域にお
ける導電型と同じ導電型の第3および第4の拡散
層領域とを設け、かつ、前記第2のエピタキシヤ
ル層領域と前記第3および第4の拡散層領域それ
ぞれの窓開け部に電極を形成し、 前記一方側と他方側とを互いに絶縁分離し、か
つ前記第1および第3の拡散層領域それぞれの電
極どうしと、前記第2および第4の拡散層領域そ
れぞれの電極どうしとをそれぞれ接続したことを
特徴とするブリツジ型全波整流回路用半導体素子
[Claims for Utility Model Registration] A first epitaxial layer region of one conductivity type and first and second diffusion layer regions of the opposite conductivity type are provided on one side of a semiconductor chip, and electrodes are formed in the window openings of the first epitaxial layer region and both of the diffusion layer regions, and a second epitaxial layer of the same conductivity type as that of the two diffusion layer regions is formed on the other side of the semiconductor chip. an epitaxial layer region and third and fourth diffusion layer regions of the same conductivity type as the epitaxial layer region, and the second epitaxial layer region and the third and fourth diffusion layer regions are provided. An electrode is formed in the window opening of each layer region, the one side and the other side are insulated and separated from each other, and the electrodes of each of the first and third diffusion layer regions and the second and fourth diffusion layer regions are insulated from each other. A semiconductor element for a bridge type full-wave rectifier circuit, characterized in that electrodes in each diffusion layer region are connected to each other.
JP10927288U 1988-08-19 1988-08-19 Pending JPH0231152U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10927288U JPH0231152U (en) 1988-08-19 1988-08-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10927288U JPH0231152U (en) 1988-08-19 1988-08-19

Publications (1)

Publication Number Publication Date
JPH0231152U true JPH0231152U (en) 1990-02-27

Family

ID=31345365

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10927288U Pending JPH0231152U (en) 1988-08-19 1988-08-19

Country Status (1)

Country Link
JP (1) JPH0231152U (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4938583A (en) * 1972-08-09 1974-04-10
JPS5127985A (en) * 1974-09-03 1976-03-09 Asahi Optical Co Ltd Roshutsukeikairo oyobi roshutsukei
JPS5638465B2 (en) * 1975-07-07 1981-09-07

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4938583A (en) * 1972-08-09 1974-04-10
JPS5127985A (en) * 1974-09-03 1976-03-09 Asahi Optical Co Ltd Roshutsukeikairo oyobi roshutsukei
JPS5638465B2 (en) * 1975-07-07 1981-09-07

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