JPH02290277A - Method and apparatus for applying viscous liquid - Google Patents

Abstract

PURPOSE:To reduce the coating amount of a viscous liquid and to form a thin uniform film by dispersing the viscous liquid spread in a squeezee coating process to the surface of an object to be coated by centrifugal force. CONSTITUTION:A squeezee coating part 14 is constituted of a mounting table 16, a coating nozzle 18, a squeezee 22 and a squeezee washing tank 26 and a spin coating part 28 is constituted of a spin chuck 30 and a spin cup 32. When a substrate 34 is fed to the mounting table 16, the coating nozzle 18 moves in parallel to the end surface of the substrate 34 to drip a photosensitive resin 36. Next, the interval between the squeezee 22 and the substrate 34 is set to about 200mum and the squeezee 22 is moved at a speed of about 5cm/sec to spread the photosensitive resin dripped on the substrate 34 over the entire surface of the substrate 34. The substrate 34 fed to the spin coating part 28 is sucked by the spin chuck 30 and rotated at about 1900rpm only for 2-3sec to obtain a thin uniform photosensitive resin film on the substrate 34.

Description

Detailed Description of the Invention [Field of Industrial Application] The present invention is a method for applying a viscous liquid that can form a thin and uniform coating film on a relatively large coating surface of an object with a small amount of viscous liquid. The present invention relates to a method and a coating device.

(Prior art) Conventionally, photosensitive resins such as water-soluble bad-light resins and pigment-dispersed photosensitive resins have been used for relatively large square substrates (150 x 150 mm or more) used for color filters for LCDs, color image sensors, etc. As a method for forming a film, a spin coating method in which a photosensitive resin is dispersed over the entire surface of a substrate using centrifugal force, and a roll coating method in which a photosensitive resin is transferred using a roll are known.

[Problems to be Solved by the Invention] FIGS. 24 and 25 are diagrams for explaining problems with the conventional spin coating method and roll coating method.

By using the conventional Subin coating method, relatively large size (300
x320xl. 1'mm) film thickness 1.0μm
An example of forming a photosensitive resin film with ±3% will be explained (
Figure 24A). FIG. 24B is a graph showing the result of measuring the film thickness on a grid, and FIG. 24C is a graph showing the result of measuring the film thickness continuously between base points AB. As can be seen from these graphs, in the Subin coating method, the group +N is adsorbed using a spin chain, so the cleaning material at the adsorption part bends, and the coating thickness increases at the adsorption location, causing chunk unevenness (al). Regarding a), if a large size base is formed by attaching multiple small size color filters, etc., and then cut and separated for use, the quality of the color filters will not be greatly affected. Large size basis: If a color filter for a large LCD with a screen size of 10 to 14 inches is formed, uneven brightness of the screen, 'a
This causes unevenness in the temperature, which is difficult to avoid.

Further, there was a problem in that a fringe (b) in which the photosensitive resin was raised was formed around the periphery of the substrate, resulting in poor adhesion during exposure.

Furthermore, when a photosensitive resin is dropped using a dropping nozzle, the film thickness becomes thicker in that area, which is sometimes called unevenness.

Furthermore, in the case of a solvent-based photosensitive resin (OFPR-800), 10 to 15 g/s (sheet) of photosensitive resin is consumed, and in the case of a water-soluble photosensitive resin, the amount varies depending on the color to be formed. , consuming 80-120 g/s of photopolymer. Of these, the photosensitive resin applied to the substrate accounts for 2 to 3% of the dropped photosensitive resin, which poses a problem in that the expensive photosensitive resin cannot be used effectively and the material cost increases.

On the other hand, using the conventional roll coating method, a film ffl. When forming a photosensitive resin film at 0μm±1O% (Fig. 25A), when the above-mentioned solvent-based photosensitive resin is applied, the film speed is 5 g/s, compared to the spin coating method.
The amount of photosensitive resin applied can be small. However, streak-like unevenness (C) occurs in the coating direction of the roll (arrow E).

Fig. 25B is a graph showing the results of measuring 11 thicknesses on a grid, and Fig. 25C is a graph showing continuous film thickness measurements between base points C and D. Unevenness (C) is observed. This streak-like unevenness (Cl is
This occurs regardless of the type of photosensitive resin. For this reason, the base {
The thickness variation of the coating formed on the opposite plane is ±10
% or more and cannot be used as a filter for high-quality displays.

JP-A No. 63-246820 describes a method for applying a photosensitive resin onto a flat object, in which the photosensitive resin is first applied onto the flat object using a roll coater, and then the flat object is coated with the photosensitive resin. A method is disclosed in which the photosensitive resin is applied by rotating at a predetermined number of rotations.

Furthermore, Japanese Patent Application Laid-open No. 63-313159 describes, "a resist coating section having a transfer roller for coating a resist; a holding device that is provided facing the transfer roller and that holds the substrate horizontally and is rotatable; a moving device that relatively moves the holding device and the resist coating section to move the transfer roller to the coated surface of the substrate; and a rotating device that rotates the holding device that holds the coated substrate. A device equipped with the following is disclosed. The gist of both the method and the device is to apply the photosensitive resin by roll coating before performing the spin coating, but as mentioned above, the streak-like unevenness that occurs in the roll coating can be caused by the roll coating. It is fixed during coating, and cannot be smoothed even if a smooth coat is performed afterwards.

This is true no matter what kind of photosensitive resin is applied to what thickness. In particular, a water-soluble, anti-glare resin with low viscosity and poor wettability to the substrate cannot be coated by a method including a coating method.

SUMMARY OF THE INVENTION An object of the present invention is to provide a viscous liquid coating method and coating device that can solve the above-mentioned problems, reduce the amount of viscous liquid applied, and form a thin and uniform coating film. .

[Means for Solving the Problems] In order to solve the above-mentioned problems, the viscous liquid application method according to the present invention includes dropping a viscous liquid onto the edge of the surface to be coated of an object to be coated, and applying a portion of the surface to be coated. or a squeegee application step of stretching the dropped viscous liquid to a predetermined thickness over the entire surface;
The method includes a spin coating step in which the viscous liquid stretched in the squeegee coating step is uniformly dispersed over the entire surface of the object to be coated using centrifugal force.

Further, in the method for applying a viscous liquid according to the present invention, the first photosensitive resin is applied onto the object to be applied by the squeegee coating step and the spin coating step, and the first photosensitive resin is exposed and developed in a predetermined pattern. After forming the photosensitive resin pattern, the second
The photosensitive resin is applied in a predetermined pattern by the squeegee coating step and the spin coating step in which the distance between the object to be coated and the squeegee is made larger than in the first photosensitive oil squeegee coating step. After exposure and development, the first
The method can be configured to include a step of forming a second photosensitive resin pattern in a portion other than the photosensitive resin pattern.

Further, in the method for applying a viscous liquid according to the present invention, the first photosensitive resin is applied onto the object to be applied by the squeegee coating step and the spin coating step, and the first photosensitive resin is exposed and developed in a predetermined pattern. After forming the photosensitive resin pattern, the second photosensitive resin is applied through the squeegee coating process in which the distance between the object to be coated and the squeegee is made larger than in the squeegee coating process of the first photosensitive resin, and the spin process. A second photosensitive resin pattern is formed in a portion other than the first photosensitive resin pattern by applying a third photosensitive resin and exposing and developing it in a predetermined pattern. The first photosensitive resin is coated by the squeegee coating step and the spin coating step in which the distance between the coating object and the squeegee is made larger than the squeegee coating step, and the first photosensitive resin is exposed and developed in a predetermined pattern. It may also be configured to include a step of forming a third photosensitive resin pattern in a portion other than the second photosensitive resin pattern.

At this time, the photosensitive resin may be a water-soluble photosensitive resin.

On the other hand, the viscous liquid coating device according to the present invention includes a coating nozzle portion that drips the viscous liquid onto the edge of the surface of the object to be coated, and a coating nozzle portion that drips the viscous liquid onto the edge of the surface of the object to be coated, and a coating nozzle portion that drips the viscous liquid onto the end portion of the surface to be coated of the object to be coated. A squeegee unit that moves and stretches the dropped viscous liquid to a predetermined thickness, and a squeegee unit that fixes the object to be coated and rotates at high speed to uniformly spread the stretched viscous liquid over the entire surface of the surface to be coated. and a spin chunk section to be divided.

〔Example〕

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail below by way of embodiments with reference to the drawings and the like.

FIG. 1 is a bronch diagram showing an embodiment of the viscous liquid application method according to the present invention.

The viscous liquid coating method according to the present invention includes a squeegee coating step 10 and a spin coating step 12.

The squeegee coating step 10 is a step in which a viscous liquid is dropped onto the edge of the surface to be coated of the object to be coated, and the dropped viscous liquid is stretched to a predetermined thickness over a part or the entire surface of the surface to be coated.

In this step, by spreading the viscous liquid on the application surface in advance using a swipe, even if the amount of viscous liquid remaining to be applied in the subsequent step is reduced, uniform application can be achieved.

As a viscous liquid, t with a viscosity of about 10 to 100 cps is used.
Any type of night body is sufficient, such as solvent-based photosensitive resin, water｝sensitive photosensitive｛
Targeting photosensitive resins such as A fats or photosensitive resins in which coloring materials such as pigments are dispersed in these photosensitive resins, various adhesives, resins for forming protective films, inks, etc. I can do it.

The thickness of the layer applied in this step is between 30μm and 200μm.
m is preferable, and it may be applied to the entire surface to be applied,
The coating may be applied to only about 80 to 90% of the center of the coating surface.

By performing the squeegee coating step 10, the viscous liquid is not dripped onto the effective portion of the coating surface, so uneven dripping does not occur. Furthermore, since the unevenness within the effective portion of the coating surface can be forcibly flattened, the flow of viscous liquid along the depressions, which is characteristic of conventional coating methods, does not occur.

The spin coating step I2 is a step in which the viscous fluid stretched in the squeegee coating step 10 is uniformly dispersed over the entire surface of the object to be coated by centrifugal force.

In this step, since the viscous liquid is applied in advance, the amount of viscous liquid splashed is significantly reduced, the viscous liquid does not bounce back, and defects such as protrusions are reduced.

FIG. 2 is a perspective view showing a first embodiment of the viscous liquid coating apparatus according to the present invention. The coating device of the first embodiment is broadly divided into a squeegee coating section 14 and a spin coating section 28. Squeegee application part l4
is composed of a mounting table 16, a coating nozzle 18, a squeegee 22, a squeegee cleaning tank 26, and the like.

The mounting table l6 is used to store the automatically transported coating object (hereinafter referred to as
This is a stand on which a substrate 34 (referred to as a substrate) is placed and fixed.

The coating nozzle 18 is S! It is provided on the left side of the stand l6. The application nozzle 18 is a nozzle that drops the photosensitive resin 36, and can be moved at a constant speed in the y direction by a moving table 20 that is moved by a DC motor or the like.

The squeegees 22 are provided at the front and rear of the R stand 16. This squeegee 22 can be moved at a constant speed in the X direction by a moving table 24 that is moved by a DC motor or the like provided on the front side of the R stand l6.

It can also move in the Z direction so that the distance between the squeegee 22 and the substrate 34 can be adjusted as desired.

The squeegee cleaning tank 26 is provided on the right side of the mounting table 16. The squeegee cleaning tank 26 is a tank in which the squeegee 22 is cleaned with a cleaning agent and then dried every time one operation is completed.

The spin coating section 28 is composed of a spin chunk 30, a spin dump 32, and the like.

The spin chunk 30 is a part that attracts and holds the base 34 and rotates at high speed. The spin chuck 30 is
Since the outer periphery vacuum suction method is adopted, it is possible to prevent unevenness within the effective pixels.

The spin cutter 32 is a container shaped to accommodate the photosensitive resin 36 scattered when the spin cutter 30 rotates.

Next, the operation of the viscous liquid coating apparatus of this embodiment will be explained in more detail by giving a specific manufacturing example.

An example will be explained in which a base material 34 having a size of 300 x 320 x 1.1' mm is used, and a pigment-dispersed photosensitive resin is applied to a thickness of 1.3 μm as the photosensitive resin 36.

When the base 34 is conveyed onto the mounting table 16, the coating nozzle 18 drops 10 to 25 g of the photosensitive resin 36 while moving and supporting the base 34 in parallel with the end surface of the base 34.

Next, set the distance between the squeegee 22 and the substrate 34 to 200 μm.
, move at a speed of 5cm/sec, and move to base 3.
4. Spread the photosensitive resin 36 dropped onto the entire surface. The substrate 34 coated with the photosensitive resin 36 in the squeegee coating section 14 is conveyed to the pin coating section 28 by an automatic conveyance device (not shown).

During this time, the squeegee 22 is cleaned and dried in the squeegee cleaning tank 26.

The substrate 34 fed to the spin coating section 28 is adsorbed by the spinner knob 30 and then coated at 1900 PPM by 2
Rotate for ~3 seconds.

As a result, within the effective pixels of the substrate 34, an average of 1.3 μm±2
% photosensitive resin film was obtained.

3 and 4 are diagrams showing a second embodiment of the viscous liquid application device according to the present invention, and FIG. 5 is a diagram for explaining the operation sequence of the second implementation device. be.

The coating device of the second embodiment has a squeegee coating section and a spin coating section integrated. This is because, in the apparatus of the embodiment shown in FIG. 2, automatic conveyance from the squeegee coating section to the spin coating section takes time, and depending on the type of photosensitive resin, drying may be slow. This is because it may become unusable due to deterioration or the like.

Examples of photosensitive resins that can be used in the apparatus shown in FIG.
Aqueous solution, acrylic-based JDS (manufactured by Japan Synthetic Rubber),
Examples of photosensitive resins that can be used in the device shown in Figure 3 include CFP (manufactured by Chisso), which has acrylic as its main component, and JSR-
703 (made by Japan Synthetic Rubber), OMR-85, OMR
-83 (Tokyo Ohka'!), OFPR-800, OFPR
2 (manufactured by Tokyo Ohka), PVA aqueous solution, acrylic main component J
Examples include DS (manufactured by Japan Synthetic Rubber) and CFP (manufactured by Chisso), which has acrylic as its main component.

A spin chuck 48 is provided within the spin chuck 52 so as to be movable in the vertical direction, and a coating nozzle 38 and a squeegee 42 are disposed at the upper end of the spin chuck 4.

Next, the detailed structure and operation of the coating device of this embodiment will be explained in more detail according to the operation sequence shown in FIG.

An example will be explained in which the substrate 56 is made of glass measuring 300 x 320 x 1.1' mm, and the photosensitive resin 58 is coated with 1 g of pigment-dispersed photosensitive resin to a thickness of 1.3 μm.

First, the spin chuck 48 is raised (fifth
Figure (d)). While the moving table 40 of the dropping nozzle 3 is moving (Fig. 5 (
a): From t + to t4), the photosensitive resin 58 is dropped from the dropping nozzle 38 along the end surface of the substrate 56 (Fig. 5): L2 to t4).

Next, move the squeegee 42 at a constant speed (5 cm/sec).
to spread the photosensitive resin 58 on the substrate 56 over the entire surface (FIG. 5(C): ts~L,). At this time, the distance between the squeegee 42 and the substrate 56 is set to 200 μm.

After coating with the squeegee 42, the spin chunk 5 is lowered into the spin cup 6 (FIG. 5(d): t
．． ~t1. ), the subin motor 50 is rotated at a high speed of 190 RPM (Fig. 5 (fl:t+s~(1,)), and then rotated at a medium speed of 500 R.PM (Fig. 5 m: t
z. ~Mu21). In this way, the acceleration time is less than 1 second (
Since the short spin method (t1, to t1,) is adopted, fringes do not occur within 10 mm of the outer periphery of the substrate.

During this time, the exhaust fan 54 rotates, and the chucking force increases.
2 (Fig. 5(e): t+j~L l&
). In this way, since the air is exhausted from the spray nod, and the diameter of the anopah hood is increased (from φ10cm to φ30cm), the airflow slides on the base surface and the 11
There is no longer a difference in toilet thickness. Further, the squeegee 42 is cleaned and dried in the squeegee cleaning tank 46 (Fig. 5 (5)
:t. tr~L,. ).

The base Fi 56 uniformly coated with the photosensitive resin 58 is transported out of the spin cam 52 by a transport arm (not shown) (FIG. 5(g): tz3 to L26).

As a result, an average of 1.3 μm±
A 2.0% photosensitive resin film was obtained.

As described above, in the present invention, the utilization efficiency of the photosensitive resin is high (1/4 to 1/5 compared to the conventional method), and the variation in the thickness of the film formed on the plane of the substrate can be suppressed to about ±2%.

6 to 15 are diagrams showing a third embodiment of the viscous liquid applicator according to the present invention, in which FIG. 6 is a plan view of the main part, and FIG. ■Cross-sectional view, Figure 8 is a cross-sectional view from Figure 6-■, Figure 9 is a plan view showing a part of the spin chuck, Figure 10 is a side sectional view of Figure 9, and Figure 11 is a coating nozzle. 12 is a view showing a squeegee, FIG. 13 is a partially enlarged view of the squeegee, FIG. 14 is a partially enlarged view showing a modified example of the squeegee, and FIG. 15 is a squeegee cleaning tank. The plan view shown in FIG. 16 is a side sectional view of the squeegee cleaning tank.

The coating device of the third embodiment, like the device of the second embodiment, has a squeegee coating section and a spin coating section integrated, but the detailed structure has been improved.

This coating device basically includes a spin chunk 60 that fixes the substrate 74 by vacuum and gives spin rotation, a coating nozzle 60 that drops the photosensitive resin 80 onto the edge of the substrate, and the dropped photosensitive resin 80. A squeegee 90 that stretches the resin 80 over the entire surface of the substrate, and a squeegee cleaning section 124 that cleans the squeegee 90 to which the photosensitive resin 80 is attached.
The outer periphery of spin chuck 60 and 8
It is composed of cleaning nozzles 140, 142, etc., which remove the photosensitive resin 80 attached around the spinner camp 62.

The spinner knob 60 is provided inside a spinner knob 62, as shown in FIGS. 7 and 8. As shown in FIGS. 9 and 10, the spinner lock 60 is composed of a motor shaft 64, a chuck receiver 66, a lower wheel 68, a lower wheel 70, an upper wheel 72, etc. . Note that FIGS. 9 and 10 show approximately 1/1 part of the spin chunk 60, and furthermore, the middle part in the left and right direction is omitted. The motor shaft 64 is provided with a large diameter passage 64a and a small diameter passage 64b.

The chunk receiver 66 has a shape in which a disk portion 66b is provided on a cylindrical portion 66a, and a convex portion 66c on the disk is further provided on the disk portion 66b, and the inner wall of the cylindrical portion 66a is connected to the motor shaft 6.
It is inserted into the upper end of 4. The channel receiver 66 has four radial sections: a passage 66d connected to the passage 64a of the motor shaft 64, a passage 66e connected to the passage 64b, an annular passage 66f communicating with the passage 66e, and a passage 66f communicating with the passage 66f. It has a passage 66g. Chuck lower part 68
has a shape in which a side wall 68b is provided on the outer periphery of a square bottom plate 68a, and a coupling hole 68c provided in the center.
is coupled to the disc portion 66b of the chuck receiver 66. In the chuck middle part 70, a coupling hole 70b provided in the center of a square temporary 70a is connected to a convex part 66c of the chuck receiver 66, and the temporary 70a is inserted into the chuck lower part 68 with a gap. The middle chunk 70 has a convex portion 70c on the outer peripheral edge of the upper surface and a cross-shaped groove 70d passing through the center of the upper surface. A chuck top 72 rests within the chunk middle 70 . The substrate 74 is supported by a convex portion 70c on the outer peripheral edge of the chuck middle portion 70.

The passage 64a of the motor shaft 64 is connected to a three-way valve (not shown), and is selectively supplied with compressed air from a pneumatic source or vacuum from a vacuum pump. The passage 64a communicates with the channel 66d of the chuck receiver 66, the groove 70d of the chunk middle part 70, and the gap between the convex part 70c of the chunk middle part 70 and the chuck upper part 72, so that the substrate 74 is attracted by the vacuum when applying the photosensitive resin. , spin chunk 7
0. When cleaning the subinacum 72, compressed air is supplied to prevent the cleaning liquid from entering.

The passage 64b of the motor shaft 64 is supplied with compressed air from an air pressure source. The passage 64b is the passage 6 of the chuck receiver 66.
6e, passage 66f1, passage 66g, communicating with the gap between the bottom part 68 of the chuck and the middle part 70 of the chuck, and prevents infiltration of the photosensitive resin by compressed air when applying the photosensitive resin.

As shown in FIGS. 6 and 11, the coating nozzle 76 can move at any speed along the guide bar 78, and drops the photosensitive resin 80 onto the end of the base 74. In this embodiment, the moving speed of the coating nozzle 76 is set to about 100 mm/sec.

The sensors 82, 84, 86, 88 are provided outside the coating nozzle 76 and detect the coating nozzle 76 without contact. The outputs of the sensor 82 and the sensor 84 are delayed by a timer and used as a signal to determine the timing of starting and ending the discharge of the photosensitive resin 80. Also,
The moving speed of the application nozzle 76 is between the sensors 82 and 84,
It is possible to change between sensors 84 and 86 and between sensors 86 and 88.

The squeegee 90 is for stretching the photosensitive resin 80 dropped onto the edge of the substrate 74 over the entire surface of the substrate 74, and can be moved along guide rods 92 and 94 as shown in FIG. can.

The squeegee 90 of this embodiment is designed to maintain the reproducibility of the gap amount even if there is variation in the thickness of the substrate 74. The squeegee 90 is shown in FIG. As shown in FIG. 13, guide portions at both ends of the cylindrical squeegee portion 96 have a radius larger than the radius of the squeegee portion 96 by a predetermined gap amount δ and are treated with Teflon to prevent wear. 98 are provided. Since the squeegee 90 moves with the guide part 9 directly in contact with both ends of the substrate 74, a predetermined gap amount δ is created between the squeegee part 96 and the substrate 74.
It is possible to have If the weight of the squeegee 90 applied to both ends of the substrate 74 is heavy, the substrate 74 may be bent and the gap amount may vary. For this reason, it has the following structure. As shown in detail in FIG. 13, a shaft 100 is provided further outside the guide portion 98 of the squeegee 90. A support part 104 is provided on the receiving part 102 that moves on the guide rod 94, and an arm 106 is provided on the support part 104. This arm 106 is provided with a long hole 106a to provide play in the direction of the arrow, and the shaft 100 is inserted into the long hole 106a. Therefore, the weight applied to both ends of the substrate 74 is reduced to the squeegee portions 96. Guide section 98. Only the shaft 100 is left, and the board 7
4 is bent and the gap amount δ does not change.

Further, the squeegee 90 may have a structure as shown in FIG. 14 for the same purpose. Shafts 112 are provided on both sides of a guide portion 110 provided on the squeegee portion 108, and a crank-shaped shaft 116 is further provided via an arm 114. This shaft 116 is supported by an arm 118, and a weight 122 is provided at the other end of the shaft 116 via an arm 120 so as to balance the squeegee portion lO8.

As shown in FIGS. 6, 15, and 16, the squeegee cleaning section 124 includes a coating nozzle 7 separated by a spinner cup 62.
It is located on the opposite side of 6.

A cleaning liquid 128 is supplied to the cleaning tank 126 from a water supply pipe 126a, and is drained from a drain pipe 126b.

Inside the cleaning tank 126, a nylon cleaning brush 130 is rotatably arranged. A roller unit is arranged diagonally above the cleaning tank 126. This roller unit includes a squeeze roller 132 and a wiping roller 1.
34 are connected by a frame 136 so that the wiping opening roller 134 can rotate around the axis of the squeeze reroller 132. Cleaning tank 126 and squeezing reroller 132. The wiping opening roller 134 and the like are further covered with an outer case 138, and the cleaning device 1 that overflowed from the cleaning device 1126 is
28 is drained from the drain pipe 138a.

After finishing the squeegee application, the squeegee 90 moves to the cleaning tank 126 position. The squeegee part 96 is the cleaning tank 12
6, the cleaning brush 130 cleans the squeegee portion 96 to which the photosensitive resin 80 has adhered. Next, the squeegee portion 96 is raised, the wiping mouth roller 134 is rotated 90 degrees, and the surface of the squeegee portion 96 is wiped off. Further, the cleaning liquid contained in the wiping roller 134 is squeezed by the squeezing roller 132 and wiped off. During this time, the inside of the cleaning tank 126 is drained, and the cleaning liquid is replaced using the water supply valve.

The chunk cleaning nozzles 140, 142 are provided on the coating nozzle 76 side within the spinner canopy 62, as shown in FIG. 6 and FIG. 8. These chuck cleaning nozzles 140
, 142 is a cleaning solution (for example,
At the same time, the spin chuck 60 rotates and the centrifugal force removes the photosensitive resin attached to the outer periphery of the spin chuck 60 and around the spinner cup 62, thereby cleaning the spin chuck 60. .

As shown in FIGS. 6 and 8, the tacts 144 and 146 are for loading and unloading the substrate 74 into and out of the spinner canopy 60 in the spinner camp 62. On both sides, 1st takt 1
44A, 146A and second tacts 144B, 146B are arranged to carry out loading and unloading alternately to improve efficiency.

17, 5, and 18 are diagrams for explaining the characteristics of the third embodiment of the viscous liquid coating device according to the present invention,
FIG. 17 is a diagram showing the relationship between the gas pressure amount between the substrate and the squeegee and the minimum amount of photosensitive resin dripping, and FIG. 18 is a diagram showing the relationship between the squeegee feeding speed and the minimum amount of photosensitive resin dropping.

In order to increase the effective utilization rate of the photosensitive resin, it is necessary to find the minimum dropping amount of the photosensitive resin that can be applied uniformly over the entire surface of the substrate.

The size of base ten is 300X320X1. Pigment-dispersed water-soluble photosensitive resin was used for LL Shizuku, when raw glass was used (actual vA), and when a chromium pattern, which is a light-shielding layer to improve contrast, was attached to the surface of raw glass (dotted chain line). The following tests were conducted by applying (BLUE).

Keep the squeegee feed speed constant (73mm/see)
and set the gap amount between the base cloth and the squeegee to 0.10a.
iO. 1 5M, 0.2 011111, measure the minimum dropping amount of photosensitive resin required, and
The results shown in the figure were obtained. In this example, this result was used to determine the amount of photosensitive resin dropped based on the amount of gap between the substrate and the squeegee.

At the same time, set the amount of gap between i+ and the squeegee to 0.
IQan O. In the case of 15 mm and 0.20 am, the minimum pinching agitation of the photosensitive resin was measured by changing the speed of the squeegee. As shown in FIG. 18, it can be seen that when the feed speed of the squeegee is lowered, the minimum amount of photosensitive resin dropped decreases, and this becomes more noticeable as the gap amount increases. Also, for each gap amount, 40mm/se
It can be seen that at a feed rate of e or more, stable coating can be performed with a substantially constant dropping amount regardless of the feed rate of the squeegee. In the coating device of this embodiment, the feed speed of the squeegee is
The speed was set at approximately 60 mm/sec in consideration of throughput (mass production) and coating stability.

FIG. 19 is a process diagram for explaining the coating process of the third embodiment of the viscous liquid coating apparatus according to the present invention.

Note that this process diagram is based on the timing of sensor output, and the white arrow in the diagram indicates that the process is in progress.

The first tact 144A, 1.46A moves from the intermediate position to the washing chamber position (FIG. 19(a): L to t2),
By moving from the arm upper limit position shown in Fig. 8 to the arm lower limit position (Fig. 19 (al: L ff - L,) and closing the arm (Fig. 19 (al: t S - L,)
), grab the base 74 in the wash chamber. Next, the arm moves from the lower limit position to the upper limit position (Figure 19(a):
L,~t,) and moved from the washing chamber position to the coater chamber position (Fig. 19(a): tq~L,.)
, the arm moves from the upper limit position to the lower limit position (Fig. 19 (al: tz~'+2)), and opens the arm (Fig. 19 (a)
): t13-t14), Spincha, Ku60
Motokari 74 is granted above. Further, the arm moves from the lower limit position to the upper limit position (Fig. 19(a): L+s~t1,
), moves from the coater position to the intermediate position and waits (1st + [(a): t17~L II) o
The application nozzle 76 spits out the photosensitive resin for a predetermined period of time at the same timing (1υ1 as shown in FIG. (Figure 19 (C)
): L+q~t2. ). Next, the timing when the arm moves from the lower limit position to the upper limit position (Figure 19 (a): t+
Similarly to b), the photosensitive resin is moved from the origin position to the end position shown in FIG. 6 (FIG. 19 (C): t21 to t xi). Figure (cl: tz3~L2,). After this, the end position returns to the origin position (Figure 19 (C): Lzs~t
2&).

The squeegee 90 moves from the origin position shown in FIG. 6 to the end position according to the output from the sensor that detects the position of the coating nozzle 76 (FIG. 19, same: t2. to tza).

At this time, the squeegee 90 moves from the lower limit position to the upper limit position (see FIG. 19 (at: t-tq)). Next, the squeegee 90 moves from the application end position to the end point (see FIG. 19 (d): L
31~L+z) and moves from the upper limit position to the lower limit position (Fig. 19(d): t3j~ also, 4).

In synchronization with the timing when the squeegee 90 moves to the end point (FIG. 19(a): tzz), the spin mode releases the motor rotation and becomes free (FIG. 19(e): t
zs~t3,). At the same time, the spinner cup 62 moves from the lower limit position to the upper limit position (FIG. 19(f): t
it~t,,). After the spin mode turns on and off according to a predetermined spin program (Fig. 19(e): t
39 to t411), the spinner cartridge 62 moves from the upper limit position to the lower limit position (Fig. 19 (fl: t43 to
t, 4). Soobin mo-yu returns to the origin and turns off (
Figure 19 (el:t4s). The motor changes from a free state to a locked state (Fig. 19(e): t4?~t
4a) - When the spin coating by the spin motor is completed, the second tactors 144B and 146B move from the intermediate position to the coater chamber position (FIG. 19(b): t49~),
By moving the arm from the upper limit position shown in FIG. 8 to the lower limit position of the arm (FIG. 19(b): tsl to L52) and closing the arm (FIG. 19(b) LSI to tsn), the substrate in the coater chamber is moved. Grab Mutan 74. Next, the arm moves from the lower limit position to the upper limit position (Fig. 19 (bl:ts
s to tsa), the arm moves from the coater chamber position to the dry chamber position (Fig. 19 (bl: ts'+ to Lss), and the arm moves from the upper limit position to the lower limit position (Fig. 19 (b)).
:tsq~L,. ) and open the arm (Fig. 19(b)
: tbI-Lbt), transfer the substrate 74 to a dry chamber. Furthermore, the arm moves from the lower limit position to the upper limit position (Fig. 19(b): t 4: +"" t 61),
Move from the dry chamber position to the intermediate position and wait (first
Figure 9(b): tas~L, 6).

On the other hand, the squeegee 90 is located above the squeegee cleaning tank 124 at the end position. The cleaning brush l30 is constantly rotating, and as the squeegee moves from the upper limit position to the lower position (FIG. 19(d): L3ff to t: +4),
The cleaning is started (Fig. 19 (turbidity: t.h'+), and just before the cleaning ends (19th period (turbidity: tba)), the water supply in the cleaning tank 126 is stopped (Fig. 19 (m:. L&J, start draining (Figure 19 (turbid: tv+).

At the timing when the second tacts 144B and 146B move into the drying chamber (Fig. 19 (b): the tssL wiping mouth roller moves from the origin position to the end position (Fig. 19 [g)
: tvs~tti), the cleaning liquid on the squeegee 90 is wiped off by the constantly rotating wiping mouth roller, and as it moves from the end position to the origin position (Fig. 19 (g): ttt~'
? +1), wiping ends. After this, draining of the cleaning tank is completed (Fig. 19 (turbidity: t, z)), and water supply is started (Fig. 19 (chain: m,.). After the substrate 74 is discharged from the spinner camp 62 (Figure 19(b): t
se), the spinner cup 62 rises (see Fig. 19 (
e): t 79 ~ t llo), the lock of Subinmo Yu becomes free (Fig. 19 (e): Mu 1, ~ Ll 1
2) The spin motor rotates according to the spin program (FIG. 19(e): t4i to ta3 to Lsa).

During this time, the chunk cleaning liquid is injected (FIG. 19(b): tll.-m.). The spinner cup 62 is lowered (FIG. 19(r): tss ~ t1&), and the spin motor is closed (FIG. 19(e): ts'+~).
L sll).

The spin chunk 60 is vacuumed at the first tact 144.
From the time when the substrate 74 enters the coater chamber by A, 146A (FIG. 19 (al: t+)) to the time when the substrate 74 leaves the coater chamber by the second tact 144B, 146B (first 911a (bl: ts.

) (Figure 19(i): t 91
- tqz).

The air of the spin chuck 60 is turned on for a predetermined time (FIG. 19(e): L46) at the same time as the start of the spin program during chuck cleaning (FIG. 19(e): L46).
): t'+i~LQ4), the outer peripheral air of the spindle sink 60 changes from the time when the arms of the first tacts 144A, 146A move to the upper limit 1 (FIG. 19(a): t+i), to the second tacts 144B, 146B. It is turned on until the arm moves to the upper garment position (Fig. 19 (b): t5.) (Fig. 19 [0: t95-L qb). *Also, the start of the spin program during chuck cleaning. At the time of (
It is turned on for a predetermined time in synchronization with FIG. 19(e): t4i) (FIG. 19(D: t*t~t,.).

One cycle from the time the substrate 74 is carried into the coater chamber until the end of the above-mentioned process is 80 seconds.

20th [F is the third viscous liquid coating device according to the present invention]
FIG. 2 is a process diagram showing an example of manufacturing a color (color separation) filter.

Red, green, and blue pigments were separated into a photosensitive resin at the composition ratios shown in Table 1 to obtain red, green, and blue colored photosensitive resins 80R. 800.80
Create B.

Table 1 (Unit: Weight %) As the base material 74, a glass substrate (AL material manufactured by Asahi Glass Co., Ltd.) having a thickness of 1.1 mm was used which had been thoroughly cleaned.

Drop the red photosensitive resin 80R onto the substrate 74 through the nozzle 7.
6 (Fig. 20 (al), squeegee 96 and substrate 7
4 and gasob amount G+=O. lmm and squeegee 9
The coating was applied with a squeegee in step 6 (FIG. 20(b)). Furthermore, spin coating was performed, 1. The film thickness was set to 21 tm (FIG. 20(C)). After that, the temperature was 70°C.
After drying in an oven for 30 minutes, a mask 150 with a predetermined pattern is attached and exposed using a mercury lamp (
Figure 20 (dl), 1 minute of soot development with water,
A red relief pixel was formed in the region where the red pixel was to be formed, and then heated and cured at 150°C for 30 minutes to obtain a red relief pixel 80r in the region where the red pixel was to be formed (Fig. 20 (e). ))． Similarly, 80G of green photosensitive resin was dropped (squeegee 96
The gap amount G2 between the substrate 74 and the substrate 74 is set to a gap amount G, = 0.2 mm, which is larger than the gap amount G1 described above.
Squeegee coating was performed using a squeegee 96 (FIG. 20(f)).

Further, spin coating was performed to obtain a film thickness of 1.2 μm (Fig. 20 (section)).
After drying in an oven for 30 minutes, a mask 152 with a predetermined pattern is attached and exposed using a mercury lamp (
Figure 20 (h)), 1 minute of soot development with water,
A green relief pixel was formed in the area where the green pixel was to be formed, and further heat-cured at 150°C for 30 minutes to obtain a green relief pixel Bog in the area where the green pixel was to be formed (Fig. 20(i) )).

Furthermore, the blue photosensitive resin 80B was added to the green photosensitive resin 80B.
Similarly to G, after dropping, apply with a squeegee with a squeegee 96 with a gap I Off = 0.2 + nm, which is larger than the above-mentioned gasop amount GI (Fig. 20 0)), and as in the green relief image above, After exposure and development using a mask with a pattern of , the film was cured by heating to obtain a blue relief pixel 80b in an area where a blue pixel was to be formed.

Finally, apply a transparent resin to a thickness of 2 μm, and
After heating and curing at °C for 30 minutes, a 3I 119 was formed, and color separation was performed in which red relief pixels 80, 5 green relief pixels 80g, and blue relief drawings 80b were regularly arranged. A filter was prepared (Fig. 20 (k)
)).

Next, a comparison will be made between the coating results of the viscous liquid coating apparatus of this embodiment (squeegee coating tospin=1 point) and the conventional coating apparatus using a Svinco l.chip.

First, we will compare the effective shrinkage rates of photosensitive resins.

Table 2 As can be seen from Table 2, the effective utilization rate of the red photosensitive resin that forms the red pixel is high at 338%, but the green photosensitive resin that forms the green pixel {8 photosensitive resin that forms the blue pixel, the blue photosensitive resin that forms the blue pixel In the case of synthetic resins, the effective utilization rate was 8.8% in both cases. According to this principle, in the LCD manufacturing process, pixel patterns of three colors are formed on each substrate, but the first red pixel to be formed is coated with the gap star between the substrate and skin as Q, l m m. can.

However, the photosensitive Lfl resin of the second color (green pixel) and third color (blue pixel) is J! Since a photosensitive resin must be applied on the temporary surface, the gap between ganops is 0. If you apply spin coating after coating with a 1 mm thick coating, unevenness will occur. In order to eliminate unevenness, reduce the amount of gasop to 0. 2 Don't apply it at 1TI m+
This is because it must be J. However, 1 of 18 photoresin
・It can be seen that the value of 1/1 is reduced to about 1/4, and the effective interest rate is significantly increased.

FIGS. 21 and 22 are diagrams illustrating the film thickness Ji 'L characteristic of the third embodiment of the viscous liquid coating apparatus according to the present invention in comparison with the conventional example.

In the example shown in FIG. 21, the photosensitive resin is PVA-Stilbasol I! A negative photosensitive resin II with a viscosity of 40 to 45 cps was obtained by distributing ft F+. If it is 2M IN, the size is 300X300X1. l
Test 1 was conducted using Lmm.

As a result, the present invention (Fig. 21A) has a higher thickness of photosensitive resin in the center of the substrate than the conventional example (Fig. 21A).
It can be seen that it is noticeably smaller than in Figure 13). Also, 11 ta 11 in-plane haratsu = FI), φ300lnIn
The inscribed circle is ±55% in the conventional example, whereas
In the present invention, it is within 13.5%.

In the example shown in FIG. 22, the photosensitive resin is a novolanok type photosensitive + AI resin with a viscosity of 6 cps, and the substrate is similarly 300x300x1. ILLIl
Test I was conducted using the material of m.

As a result, the present invention (Fig. 22A) has a higher bulge of the photoresist at the center of the 1.1 roll than the conventional example (Fig. 22A).
It can be seen that the castle is a little smaller than in Figures 2 and 3). Also, 1
The in-plane variation in the thickness is within ±3% in the conventional example, while it is within ±2% in the present invention on an inscribed circle of φ300 squares.

FIG. 23 is a diagram illustrating the relationship between photosensitive resin droplets Fljt and foreign matter in the third embodiment of the viscous liquid coating apparatus according to the present invention in comparison with a conventional example.

+iil I If the photosensitive resin is coated with the same strip as in i, an example of only one spindle is 30
A photosensitive resin of g or more is required, and the photosensitive resin (aj
It can be seen that the number of foreign objects increases as the amount of drop increases. This 5'4 product brings much more photosensitive resin into the spinner than the photosensitive resin HL required for coating, and as the photosensitive resin scatters, it adheres to the substrate. It is something.

In this example, photosensitive III {fat? 4i weight is 30g
The number of foreign substances is hardly recognized.

(Effects of the Invention) As explained in detail below, according to the present invention, the viscous liquid is stretched with a squeegee to a predetermined thickness in the spin coating 11; It is possible to reduce the amount significantly compared to the amount.Also,
Less unevenness in IIQ thickness, covering the entire coated surface,
A thin and uniform coating film can be formed.

Therefore, when applying expensive photosensitive resin JIH, it is possible to significantly reduce the material tl cost.

In addition, according to the present invention, water-cooled photosensitive resins, which have conventionally been difficult to form evenly, can be uniformly coated in a 4-way manner. There is no need for a solvent recovery device, etc., which is required when using a line, and it is advantageous for two-stop downs.

Furthermore, when a color filter is manufactured according to the present invention, it is possible to obtain a color filter of extremely high quality without uneven brightness or uneven color.

[Brief explanation of drawings]

FIG. 1 is a Bronok diagram showing an embodiment of the private liquid application method according to the present invention. FIG. 2 is a perspective view showing a first embodiment of a viscous liquid coating device according to the present invention. 3 and 4 are diagrams showing a second embodiment of the viscous liquid application device according to the present invention, and FIG. 5 is a diagram illustrating the operation sequence of the second implementation device. be. Figures 6 to 15 show the viscosity according to the present invention. FIG. 6 is a plan view of the main part, FIG. 7 is a plan view of the main part, and FIG.
Figure 8 is Figure 6 ■1■ Danji diagram, Figure 9 [. 10 is a side sectional view of FIG. 9, FIG. 11 is a diagram showing the coating nozzle, and FIG. 12 is a diagram showing a part of the 1-1 block. FIG. 13 shows the above-mentioned step. FIG. 14 is a partially enlarged view showing a modification of the above-mentioned Sue 1--FI, FIG. 15 is a plan view showing the Schino cleaning tank, and FIG. It is a 4jjll sectional view of a single-stage cleaning tank. 17 and 18 are diagrams for explaining features 1' of the third embodiment of the viscous liquid applicator according to the present invention. Fig. 18 is a diagram showing the relationship between the minimum amount of photosensitive resin dropped and the minimum amount of photosensitive resin dropped. FIG. 19 is a process diagram for explaining the coating process of the third embodiment of the viscous liquid coating apparatus according to the present invention. FIG. 20 shows the third part of the viscous liquid coating device according to the present invention.
FIG. 2 is a process diagram showing the steps for manufacturing a color (color separation) filter according to an embodiment of the present invention. FIGS. 21 and 22 are diagrams showing the film thickness distribution characteristics of the third embodiment of the viscous liquid coating device i6 according to the present invention in comparison with the conventional example. FIG. 23 shows the third part of the viscous i&body coating device according to the present invention.
FIG. 3 is a diagram illustrating the relationship between the photosensitivity +41 11H dropping tail and foreign matter according to the example of Example 1 in comparison with the conventional example. No. 241/l. l, No. 251d is a conventional spin knee r-
1~'tJ=O, 1, IKo monthbe'-1. It is a diagram for explaining the problem of the law. 10... Sue 1--ji coating process culm l2... Spin coating process l4... Sue 1--ji coating A1 section l6... Mounting table l8... Coating nozzle 20... Moving table 2
2...Sue 1-1-1ji 24...Moving platform 26...
Sugeige cleaning tank 28... spin coating 61130.
Spin Chanok 32...Spin Camp 34...
・Antagonist 36... Photosensitive resin agent Br. & Ili II + Hisao Figure 2 Figure 2 Figure Figure Figure Figure A Figure Notification. +4' Mitsuji L7L name +14 φ Butre 1, Dozu 1
258 Figure 25C Roll coat application 1 distribution POINT (nanoshu'/f)

Claims (5)

[Claims] (1) A squeegee application step of dropping a viscous liquid onto the edge of the surface to be coated of the object to be coated and stretching the dropped viscous liquid to a predetermined thickness on a part or the entire surface of the surface to be coated; and the squeegee coating step. A method for applying a viscous liquid comprising a spin coating step of uniformly dispersing the viscous liquid stretched in the process over the entire surface of the object to be coated using centrifugal force. (2) After applying the first photosensitive resin onto the object to be coated by the squeegee coating process and the spin coating process, and exposing and developing it in a predetermined pattern to form a first photosensitive resin pattern, A second photosensitive resin is applied in a predetermined pattern by the squeegee coating step and the spin coating step in which the distance between the object to be coated and the squeegee is made larger than in the squeegee coating step of the first photosensitive resin. A method for applying a viscous liquid, comprising the step of exposing and developing to form a second photosensitive resin pattern in a portion other than the first photosensitive resin pattern. (3) After applying the first photosensitive resin onto the object to be coated by the squeegee coating process and the spin coating process, and exposing and developing it in a predetermined pattern to form a first photosensitive resin pattern, The second photosensitive resin is applied by the squeegee coating step and the spin coating step in which the distance between the object to be coated and the squeegee is made larger than the squeegee coating step of the first photosensitive resin, and a predetermined pattern is applied. to form a second photosensitive resin pattern in a portion other than the first photosensitive resin pattern, and further apply a third photosensitive resin with a squeegee of the first photosensitive resin. The coating is performed by the squeegee coating step and the spin coating step in which the distance between the coating object and the squeegee is made larger than that of the first and second photosensitive resin patterns. A method for applying a viscous liquid, comprising the step of forming a third photosensitive resin pattern on a portion. (4) The method for applying a viscous liquid according to claim 2 or 3, wherein each of the photosensitive resins is a water-soluble photosensitive resin. (5) a coating nozzle unit that drops a viscous liquid onto the edge of the surface to be coated of the object to be coated; It consists of a squeegee part that stretches the coating to a predetermined thickness, and a spin chuck part that fixes the object to be coated and rotates it at high speed to uniformly disperse the stretched viscous liquid over the entire surface of the surface to be coated. Applicator for applying viscous liquids.