JP3065997B2 - Manufacturing method of color separation filter - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a color separation filter capable of forming a thin and uniform coating film with a small amount of a viscous liquid on an application surface of an application object having a relatively large application area. .

[0002]

2. Description of the Related Art Conventionally, a relatively large size (150.times.) Used for a color filter for LCD, a color image sensor, and the like.
As a method of forming a photosensitive resin film such as a water-soluble photosensitive resin or a pigment-dispersed photosensitive resin on a square substrate (150 mm or more), a spin that disperses the photosensitive resin over the entire surface of the substrate by centrifugal force. A coating method and a roll coating method of transferring a photosensitive resin by a roll have been known.

[0003]

Problems to be Solved by the Invention FIGS. 29 to 31, FIGS.
2 to 34 are diagrams for explaining problems of the conventional spin coating method and roll coating method. A relatively large size (300 × 320 ×
An example in which a photosensitive resin film having a film thickness of 1.0 μm ± 3% is formed on a substrate (1.1 ^t mm) (FIG. 29) will be described.

FIG. 30 is a graph showing the results of measuring the film thickness on the lattice, and FIG. 31 is a graph of measuring the film thickness continuously between the base points AB. As can be seen from these graphs, in the spin coating method, since the substrate is sucked by the spin chuck, the substrate in the sucking portion bends, so that the coating thickness increases at the sucked portion, and chuck unevenness (a) occurs. The chuck unevenness (a) has a great effect on the quality of the color filter when a plurality of small-sized color filters are formed on a large-sized substrate by multi-layering and then cut and separated. However, when a large-size LCD color filter having a screen size of 10 to 14 inches is formed on a large-sized substrate, it causes unevenness in brightness and density on the screen, which is difficult to avoid.

Further, there is a problem that fringes (b) in which the photosensitive resin is raised on the peripheral portion of the substrate are formed, and the adhesiveness at the time of exposure is deteriorated. Further, when the photosensitive resin is dropped on the substrate by the dropping nozzle, the film thickness at that portion becomes thick, that is, so-called dropping unevenness may occur. Furthermore, in the case of the solvent-based photosensitive resin (OFPR-800), 10 to 15 g / s (sheet) of the photosensitive resin is consumed,
In the case of a water-soluble photosensitive resin, 80 to 120 g / s of the photosensitive resin is consumed, depending on the color to be formed. Of these, the photosensitive resin applied to the substrate is 2 to 3% of the dropped photosensitive resin, so that expensive photosensitive resin cannot be effectively used, and there is a problem that the material cost increases.

On the other hand, when a photosensitive resin film having a film thickness of 1.0 μm ± 10% is formed on a substrate of the same size by a conventional roll coating method (FIG. 32), the above-mentioned solvent-based photosensitive resin is applied. As a result, the application amount of the photosensitive resin can be reduced to 5 g / s as compared with the spin coating method. However, streak-like unevenness (c) occurs in the roll application direction (arrow E). FIG. 33 is a graph showing the result of measuring the film thickness on the lattice, and FIG. 34 is a graph of continuously measuring the film thickness between the base points C and D. From these graphs, streak-like unevenness (c) is shown. Is recognized. The streak-like unevenness (c) occurs regardless of the type of the photosensitive resin. For this reason, the thickness variation of the coating film formed on the substrate plane becomes ± 10% or more and cannot be used as a filter for a high-quality display.

Japanese Patent Application Laid-Open No. 63-246820 discloses a method of applying a photosensitive resin on a flat object, first applying the photosensitive resin on the flat object with a roll coater, A method of applying the photosensitive resin by rotating a flat object at a predetermined number of revolutions is disclosed.

Japanese Patent Application Laid-Open No. 63-313159 discloses that
`` A resist coating unit having a transfer roller for applying a resist, a holding device provided to face the transfer roller, horizontally holding the substrate, and being rotatable, and a holding device and the resist coating unit A moving means for relatively moving the transfer roller to the coating surface of the substrate, and a rotating device for rotating the holding device holding the coated substrate ''. I have.

The above method and the above-mentioned apparatus are both intended to apply the photosensitive resin by the roll coating method before performing the spin coating method. However, as described above, the streak-like unevenness generated by the roll coating method is reduced. However, they are fixed during roll coating and cannot be smoothed even after spin coating. This is the same regardless of what kind of photosensitive resin is applied to what thickness. In particular, a water-soluble photosensitive resin having low viscosity and poor wettability to a substrate cannot be applied by a method including a roll coating method.

An object of the present invention is to solve the above-mentioned problems and reduce the amount of the viscous liquid to be applied.
An object of the present invention is to provide a method for producing a color separation filter capable of forming a uniform coating film.

[0011]

In order to solve the above-mentioned problems, a method of manufacturing a color separation filter according to the present invention is a method of manufacturing a color separation filter including at least two or more photosensitive pattern forming steps. The method of applying the photosensitive material in the photosensitive pattern forming step and the method of applying the photosensitive material in the second photosensitive pattern forming step include a method of applying the first photosensitive material and a method of applying the second photosensitive material, respectively. Wherein the first photosensitive material is coated by a linear member that faces the application surface at a predetermined interval in a direction orthogonal to the application direction of the photosensitive material on the application surface of the application object. Is arranged via a photosensitive material, the viscous liquid is stretched using the linear member, and the photosensitive material is applied to a part or the whole of the application surface of the application object,
A first coating step of forcibly flattening the coated surface of the photosensitive material, wherein a second photosensitive material coating method is performed by centrifugally applying the photosensitive material applied in the first coating step to an object to be coated. And a second coating step of uniformly dispersing the material on the entire surface of the object to be coated.

The photosensitive material is a photosensitive resin in which a pigment is dispersed.

The photosensitive material is a red, blue or green photosensitive material.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the drawings and the like with reference to embodiments. FIG. 1 is a block diagram showing an embodiment of a method for applying a viscous liquid according to the present invention. The method for applying a viscous liquid according to the present invention includes a squeegee coating step 10 and a spin coating step 12.
The squeegee application step 10 is a step of dropping a viscous liquid onto an end of a surface to be coated of an object to be coated, and extending the dropped viscous liquid to a predetermined thickness on a part or the entire surface of the surface to be coated. In this step, the viscous liquid is previously spread on the application surface with a squeegee, so that the viscous liquid can be uniformly applied even if the amount of the viscous liquid applied in the subsequent step is reduced.

The viscous liquid may be any liquid having a viscosity of about 10 to 100 cps, and may be a solvent-based photosensitive resin, a water-soluble photosensitive resin, or a photosensitive resin in which a coloring material such as a pigment is dispersed in these photosensitive resins. A photosensitive resin such as a resin, various adhesives, a resin for forming a protective film, and an ink can be used.

The thickness of the layer applied in this step is 30 μm.
The thickness is preferably about m to 200 μm, and may be applied to the entire surface of the application surface, or may be applied only in a range of about 80 to 90% from the center of the application surface.

By performing the squeegee coating step 10,
Since the viscous liquid is not dropped on the effective portion of the coating surface, dropping unevenness does not occur. In addition, since the unevenness in the effective portion of the application surface can be forcibly flattened, the flow of the viscous liquid along the concave portion peculiar to the conventional application method does not occur.

The spin coating step 12 is a step of uniformly dispersing the viscous liquid stretched in the squeegee coating step 10 over the entire surface of the object to be coated by centrifugal force.
In this step, since the viscous liquid is applied in advance, the amount of the viscous liquid scattered is significantly reduced, the viscous liquid does not rebound, and defective projections and the like are reduced.

FIG. 2 is a perspective view showing a first embodiment of a viscous liquid coating apparatus according to the present invention. The coating apparatus according to the first embodiment is roughly divided into a squeegee coating section 14 and a spin coating section 28. The squeegee application section 14 includes a mounting table 16
, Squeegee 22, squeegee cleaning tank 26
And so on. The mounting table 16 is a table on which the automatically transported application object (hereinafter, referred to as a substrate) 34 is mounted and fixed. The application nozzle 18 is provided on the left side of the mounting table 16. The application nozzle 18 is provided with a photosensitive resin 36.
And can be moved at a constant speed in the y direction by a moving table 20 that is moved by a DC motor or the like.

The squeegee 22 is provided in the front-rear direction of the mounting table 16. The squeegee 22 includes a moving table 24 that is moved by a DC motor or the like provided in front of the mounting table 16.
Thereby, it is possible to move at a constant speed in the x direction. Also, z is adjusted so that the distance between the squeegee 22 and the substrate 34 can be adjusted as desired.
You can also move in the direction.

The squeegee washing tank 26 is provided on the right side of the mounting table 16. The squeegee cleaning tank 26 is a tank for washing the squeegee 22 with a cleaning agent and drying after each operation.

The spin coating unit 28 includes a spin chuck 30
And a spin cup 32 and the like. The spin chuck 30 is a portion that sucks and holds the substrate 34 and rotates at high speed. Since the spin chuck 30 employs the outer peripheral vacuum suction method, it is possible to prevent chuck unevenness in effective pixels. The spin cup 32 is formed of the photosensitive resin 3 scattered when the spin chuck 30 rotates.
6 is a container having a shape for accommodating 6.

Next, the operation of the viscous liquid coating apparatus of this embodiment will be described in more detail with reference to specific production examples. 300 × 320 × 1.1 ^t mm as the substrate 34
A description will be given of an example in which a pigment-dispersed photosensitive resin is applied as the photosensitive resin 36 to a thickness of 1.3 μm.

When the substrate 34 is conveyed onto the mounting table 16, the coating nozzle 18 drops 10 to 25 g of the photosensitive resin 36 while moving in parallel with the end surface of the substrate 34. Next, the distance between the squeegee 22 and the substrate 34 is set to 200 μm, and the squeegee 22 is moved at a speed of 5 cm / sec.
The photosensitive resin 36 dropped on the upper surface is stretched over the entire surface.

The substrate 34 on which the photosensitive resin 36 has been applied by the squeegee applying section 14 is transferred to the spin coating section 28 by an automatic transfer device (not shown). During this time, squeegee 22
Is washed in a squeegee washing tank 26 and dried. The substrate 34 transported to the spin coating unit 28 is
And then rotate at 1900 RPM for only 2-3 seconds. As a result, within the effective pixels of the substrate 34, on average 1.
A photosensitive resin film of 3 μm ± 2% was obtained.

FIGS. 3 and 4 show a second embodiment of the viscous liquid coating apparatus according to the present invention, and FIG. 5 is a diagram for explaining the operation sequence of the second embodiment. Second
In the coating apparatus of the embodiment, the squeegee coating section and the spin coating section are integrated. This is because in the apparatus of the embodiment shown in FIG. 2, it takes a long time to automatically transport the squeegee from the squeegee coating section to the spin coating section, and depending on the type of the photosensitive resin, the photosensitive resin may not be used due to drying, deterioration, and the like.

The photosensitive resin usable in the apparatus shown in FIG. 2 includes a water-soluble photosensitive resin (gelatin, casein, etc.), the above-mentioned water-soluble photosensitive resin in which a pigment is dispersed, a PVA (polyvinyl alcohol) aqueous solution, and an acrylic main component JDS. (Manufactured by Nippon Synthetic Rubber), CFP (manufactured by Chisso), which is an acrylic main component, and the like.
JSR-703 (made by Japan Synthetic Rubber), OMR-85, O
MR-83 (Tokyo Ohka), OFPR-800, OFP
R-2 (manufactured by Tokyo Ohka), PVA aqueous solution, acrylic-based JDS (manufactured by Japan Synthetic Rubber), acrylic-based CFP
(Made by Chisso).

A spin chuck 48 is provided in the spin cup 52 so as to be able to move up and down, and a coating nozzle 38 and a squeegee 42 are arranged at the position of the rising end of the spin chuck 48.

Next, the detailed structure of the coating apparatus of this embodiment and its operation will be described in accordance with the operation sequence shown in FIG.
This will be described in more detail. 300 × 32 as the substrate 56
An example will be described in which a glass of 0 × 1.1 ^t mm is used and a pigment-dispersed photosensitive resin is applied as the photosensitive resin 58 to a thickness of 1.3 μm.

First, the spin chuck 48 is raised (FIG. 5D). While the moving table 40 of the dropping nozzle 38 moves (FIG. 5A: t _{1 to} t ₄ ), the photosensitive resin 58 is dropped from the dropping nozzle 38 along the end surface of the substrate 56 (FIG. 5B). t ₂ ~t _3). Next, squeegee 42
Is moved at a constant speed (5 cm / sec) to extend the photosensitive resin 58 on the substrate 56 over the entire surface (FIG. 5C: t).
₅ ~t _8). At this time, the interval between the squeegee 42 and the substrate 56 is set to 200 μm.

After application by the squeegee 42, the spin chuck 5 is lowered into the spin cup 6 (FIG. 5).
_{(D): t 9 ~t 10} ), 1900R spin motor 50
Rotates at a high speed PM (Fig. _{5 (f): t 18 ~t} 19), then the rotational medium speed with 500 RPM (Fig. 5 (f): t ₂₀ ~t
₂₁ ). Thus, the acceleration time is less than 1 second (t ₁₇ ~t ₁₈₎
Therefore, no fringe occurs within 10 mm of the outer peripheral portion of the substrate.

During this time, the exhaust fan 54 rotates to exhaust the inside of the chuck cup 52 (FIG. 5 (e): from t ₁₃ ).
t _16). In this way, the air was evacuated from the spread and the diameter of the upper hood was increased (from φ10 cm to φ30 cm), so that the air flow slipped on the substrate surface and the film thickness step did not occur. The squeegee 42 is washed and dried in the squeegee washing tank 46 (FIG. 5 (h): t ₂₇ ).
~t _30).

The substrate 5 on which the photosensitive resin 58 is uniformly coated
6 is unloaded from the spin cup 52 by a transfer arm (not shown) (FIG. _{5 (g): t 23 ~t} 26). As a result, an average of 1.3 μm ± 2.0
% Of the photosensitive resin film was obtained. As described above, in the present invention, the utilization efficiency of the photosensitive resin (1/4 to 1/5 reduction from the conventional case) is high, and the variation in the film thickness formed on the substrate plane can be suppressed to about ± 2%.

6 to 15 show a third embodiment of the viscous liquid coating apparatus according to the present invention. FIG. 6 is a plan view of a main part, and FIG. 7 is a sectional view of FIG. 6VII-VII. 8, FIG. 8 is a sectional view of FIG. 6VIII-VIII, FIG. 9 is a plan view showing a part of the spin chuck, FIG. 10 is a side sectional view of FIG. 9, FIG. 11 shows a coating nozzle, and FIG. Illustrated diagram, FIG.
Is a partially enlarged view of the squeegee, FIG. 14 is a partially enlarged view showing a modification of the squeegee, FIG. 15 is a plan view showing a squeegee washing tank, and FIG. 16 is a side sectional view of the squeegee washing tank.

The coating apparatus according to the third embodiment has an integrated squeegee coating section and a spin coating section as in the apparatus according to the second embodiment, but has an improved structure in detail. is there. This coating apparatus basically fixes the substrate 74 by vacuum and spins a spin chuck 60 for spinning, a coating nozzle 60 for dropping the photosensitive resin 80 to the end of the substrate, and a photosensitive resin that is dropped. A squeegee 90 for extending 80 over the entire surface of the substrate and a squeegee cleaning unit 12 for cleaning the squeegee 90 to which the photosensitive resin 80 is attached
4 and chuck cleaning nozzles 140 and 142 for dropping the photosensitive resin 80 attached to the outer periphery of the spin chuck 60 and around the spinner cup 62 by a coating process.

The spin chuck 60 is provided in a spinner cup 62 as shown in FIGS. As shown in FIGS. 9 and 10, the spin chuck 60 includes a motor shaft 64, a chuck receiver 66, a lower chuck portion 68, a middle chuck portion 70, and an upper chuck portion 72. 9 and 10 show a substantially quarter portion of the spin chuck 60, and further omit a middle portion in the left-right direction. The motor shaft 64 has a large-diameter passage 64.
a and a small-diameter passage 64b are provided. Chuck holder 6
6 has a shape in which a circular plate portion 66b is provided on a cylindrical portion 66a, and a convex portion 66c on the circular plate is further provided thereon, and the inner wall of the cylindrical portion 66a is provided at the upper end of the motor shaft 64. Has been inserted. The chuck receiver 66 has a passage 66d connected to the passage 64a of the motor shaft 64, a passage 66e connected to the passage 64b, an annular passage 66f communicating with the passage 66e, and four radial passages communicating with the passage 66f. And a passage 66g. The chuck lower part 68 has a shape in which a side wall 68b is provided on the outer periphery of a square bottom plate 68a, and a coupling hole 68c provided in the center part is coupled to the disk part 66b of the chuck receiver 66. Chuck middle 70
Is a coupling hole 70 provided in the center of the square plate 70a.
b is connected to the convex portion 66c of the chuck receiver 66, and the plate 7
0a is inserted into the chuck lower part 68 with a gap. The chuck middle portion 70 has a convex portion 70c on the outer peripheral edge of the upper surface.
And a cross groove 70d passing through the center of the upper surface.
The chuck upper part 72 is mounted in the chuck middle part 70. The substrate 74 is supported by a convex portion 70c on the outer peripheral edge of the middle portion 70 of the chuck.

The passage 64a of the motor shaft 64 is connected to a three-way valve (not shown), to which compressed air from an air pressure source or vacuum from a vacuum pump is selectively supplied.
The passage 64a communicates with the flow path 66d of the chuck receiver 66, the groove 70d of the middle part 70 of the chuck, and the gap between the convex part 70c of the middle part 70 of the chuck and the upper part 72 of the chuck. When cleaning the spin chuck 70 and the spinner cup 72, compressed air is supplied to prevent the cleaning liquid from entering. The passage 64b of the motor shaft 64 is supplied with compressed air from an air pressure source. The passage 64b includes a passage 66e, a passage 66f, a passage 66g, and a chuck lower portion 68 of the chuck receiver 66.
And the middle of the chuck 70, and compressed air is prevented from entering the photosensitive resin when the photosensitive resin is applied.

The application nozzle 76 can move at an arbitrary speed along the guide rod 78 as shown in FIGS. 6 and 11, and drops the photosensitive resin 80 on the end of the substrate 74. In this embodiment, the moving speed of the application nozzle 76 is set to around 100 mm / sec.

The sensors 82, 84, 86 and 88 are provided outside the application nozzle 76,
6 is detected. The outputs of the sensors 82 and 84 are delayed by a timer, and are used as signals for determining the timing of starting and ending the discharge of the photosensitive resin 80. The moving speed of the application nozzle 76 is determined by the sensor 82,
84, between sensors 84, 86 and sensors 86, 8
8 can be changed.

The squeegee 90 is for extending the photosensitive resin 80 dropped on the end of the substrate 74 over the entire surface of the substrate 74, and can move along guide rods 92 and 94 as shown in FIG. it can.

The squeegee 90 of this embodiment is designed to maintain the reproducibility of the gap amount even if the thickness of the substrate 74 varies. The squeegee 90 has a larger radius at both ends of the cylindrical squeegee portion 96 than the radius of the squeegee portion 96 by a predetermined gap amount δ as shown in FIGS. Provided guide portion 98 is provided. Since the guide portion 98 of the squeegee 90 moves in direct contact with both ends of the substrate 74, a predetermined gap amount δ can be provided between the squeegee portion 96 and the substrate 74.

If the weight of the squeegee 90 applied to both ends of the substrate 74 is heavy, the substrate 74 may be bent and the gap amount may fluctuate. Therefore, the structure is as follows. As shown in detail in FIG. 13, a shaft 100 is provided further outside the guide portion 98 of the squeegee 90. A support bar 104 is provided on the receiving portion 102 that moves on the guide bar 94, and an arm 106 is provided on the support bar 104. The arm 106 has a long hole 106a for allowing play in the direction of the arrow, and the shaft 100 is inserted into the long hole 106a. For this reason,
The weight applied to both ends of the substrate 74 is only the squeegee portion 96, the guide portion 98, and the shaft 100, and the substrate 74 does not bend and the gap amount δ does not change.

Further, the squeegee 90 can be structured as shown in FIG. 14 for the same purpose. Shafts 112 are provided on both sides of a guide portion 110 provided on the squeegee portion 108.
6 is provided. The shaft 116 is supported by an arm 118, and a weight 122 is provided at the other end of the shaft 116 via an arm 120 so as to balance the squeegee 108.

The squeegee cleaning unit 124 is provided in FIGS.
As shown in FIG. 16, it is arranged on the opposite side of the application nozzle 76 across the spinner cup 62. The cleaning tank 128 is supplied with a cleaning liquid 128 from a water supply pipe 126a.
Drained from 26b. A cleaning brush 130 made of nylon is rotatably arranged in the cleaning tank 126. A roller unit is disposed diagonally above the cleaning tank 126. In this roller unit, the squeezing roller 132 and the wiping roller 134 are connected by a frame 136 so that the wiping roller 134 can rotate about the axis of the squeezing roller 132. The cleaning tank 126, the squeezing roller 132, the wiping roller 134, etc.
The cleaning liquid 128 which is covered with 38 and overflows from the cleaning tank 126 is drained from a drain pipe 138a.

After the squeegee application is completed, the squeegee 90 moves to the position of the cleaning tank 126. When the squeegee part 96 moves to the upper part of the cleaning tank 126, the squeegee part 96 to which the photosensitive resin 80 has adhered is cleaned by the cleaning brush 130. Next, the squeegee section 96 rises, and the wiping roller 1 is moved.
34 rotates 90 degrees to wipe off the surface of the squeegee part 96. The cleaning liquid contained in the wiping roller 134 is
It is wiped while being squeezed by the squeezing roller 132. During this time, the inside of the cleaning tank 126 is drained, and the cleaning liquid is replaced by a water supply valve.

The chuck cleaning nozzles 140 and 142 are provided on the coating nozzle 76 side in the spinner cup 62 as shown in FIGS. These chuck cleaning nozzles 140 and 142 discharge a cleaning liquid (for example, pure water) onto the spin chuck 60, and at the same time, rotate the spin chuck 6.
The rotation is performed to clean the outer periphery of the spin chuck 60 and the photosensitive resin attached around the spinner cup 62 by the centrifugal force.

The tacts 144 and 146 are for carrying the substrate 74 into and out of the spin chuck 60 in the spinner cup 62 as shown in FIGS. 6 and 8. In this embodiment, both sides of the spinner cup 62 are used. First tact 144
A, 146A and the second tacts 144B, 146B are arranged to alternately carry in and carry out to improve efficiency.

FIGS. 17 and 18 are diagrams for explaining the characteristics of the third embodiment of the viscous liquid coating apparatus according to the present invention. FIG. 17 shows the gap between the substrate and the squeegee and the minimum dropping amount of the photosensitive resin. FIG. 18 is a diagram showing the relationship between the squeegee feed speed and the minimum dropping amount of the photosensitive resin.

In order to increase the effective utilization of the photosensitive resin, it is necessary to find the minimum amount of the photosensitive resin that can be uniformly applied to the entire surface of the substrate. When the size of the substrate is 300 × 320 × 1.1 ^t mm and the elemental glass is used (solid line), and when the chrome pattern which is a light-shielding tank for improving the contrast is provided on the surface of the elemental glass (one point). (Dotted line), the pigment-dispersed water-soluble photosensitive resin (B
LUE), the following test was performed.

The feed speed of the squeegee is constant (73 mm / s
ec), the gap amount between the substrate and the squeegee is 0.1
At 0 mm, 0.15 mm, and 0.20 mm, the required minimum amount of the photosensitive resin dropped was measured, and the results shown in FIG. 17 were obtained. In this embodiment, the result is used to determine the drop amount of the photosensitive resin based on the gap amount between the substrate and the squeegee.

Next, when the gap amounts between the substrate and the squeegee were set to 0.10 mm, 0.15 mm, and 0.20 mm, the minimum drop amount of the photosensitive resin was measured by changing the speed of the squeegee. As shown in FIG. 18, when the feed speed of the squeegee is reduced, the minimum drop amount of the photosensitive resin is reduced, and it is clear that the larger the gap amount, the more remarkable.
In addition, it can be seen that at a feed speed of 40 mm / sec or more for each gap amount, application can be performed stably with a substantially constant drop amount regardless of the feed speed of the squeegee. In the coating apparatus of this embodiment, the feed speed of the squeegee is about 60 mm / s in consideration of throughput (mass productivity) and coating stability.
ec.

FIG. 19 is a process diagram for explaining a coating process of a third embodiment of the viscous liquid coating device according to the present invention. 20 and 21 show the left half of FIG.
FIG. 20 is an enlarged view of the right half, which will be described below with reference to FIG. Note that this process diagram is based on the timing at the time of sensor output, and the white arrow in the diagram indicates that the device is moving.

The first tacts 144A and 146A move from the intermediate position to the washing chamber position (FIG. 19 (a): t ₁ ).
t _2), to move the arm lower limit position from the arm upper limit position shown in FIG. 8 (FIGS. _{19 (a): t 3 ~t} 4), by closing the arm (FIG. _{19 (a): t 5 ~t} 6 2.) Grasp the substrate 74 in the cleaning chamber. Then, the arm is moved from the lower limit position to the upper limit position (FIG. _{19 (a): t 7 ~t} 8), moved from the washing chamber position to the coater chamber position (FIG. 19
_{(A): t 9 ~t 10} ), the arm is moved from the upper position to the lower limit position (FIG. _{19 (a): t 11 ~t} 12), open the arm (FIG. 19 (a): t ₁₃ ~t ₁₄ ), Spin chuck 60
The substrate 74 is placed thereon. Furthermore, the arm moves from the lower limit position to the upper limit position (FIG. _{19 (a): t 15 ~t} 16), and waits moves from the coater chamber located in an intermediate position (FIGS. _{19 (a): t 17 ~t} 18 ).

The application nozzle 76 has the first tact 144A,
In synchronization with the timing at which 46A moves from the washing chamber position to the coater chamber position (FIG. 19A: t ₁₀ ), the photosensitive resin is discharged for a predetermined time (FIG. 19).
_{(C): t 19 ~t 20} ). Next, in synchronization with the timing at which the arm moves from the lower limit position to the upper limit position (FIG. 19A: t ₁₆ ), the arm moves from the origin position to the end position shown in FIG. 6 (FIG. 19C: t ₂₁ ). ~t ₂₂₎ in this case, only perform discharging of the photosensitive resin a predetermined time (FIG. 19 (c):
t ₂₃ ~t _24). Thereafter, returning from the end position to the home position (FIG. _{19 (c): t 25 ~t} 26).

The squeegee 90 adjusts the position of the application nozzle 76.
Based on the output from the sensor to be detected, the origin position shown in FIG.
From the position to the end position (FIG. 19D: t)₂₇~ T
₂₈). At this time, the squeegee 90 moves from the lower limit position to the upper limit position.
(FIG. 19D: t)₂₉~ T₃₀). Next, apply
Move from the end position to the end point (FIG. 19 (d): t₃₁~
t ₃₂), And moves from the upper limit position to the lower limit position (FIG. 19).
(D): t₃₃~ T₃₄).

In the spin motor, the squeegee 90 moves to the end point.
Timing (FIG. 19D: t) ₃₂)
Data lock is released and it becomes free (Fig. 19
(E): t ₃₅~ T₃₆). At the same time, Spinner Cup 6
2 moves from the lower limit position to the upper limit position (FIG. 19 (f):
t₃₇~ T₃₈). The spin motor has a predetermined spin program
(FIG. 19 (e): t)₃₉~
t₄₀), The spinner cup 62 moves from the upper limit position to the lower limit position.
Move (FIG. 19 (f): t₄₃~ T₄₄). Spin motor
Is set to the origin and turned off (FIG. 19 (e): t₄₅). Mo
The data changes from the free state to the locked state (Fig. 1
9 (e): t₄₇~ T₄₈).

[0057] When the spin coating by the spin motor has been completed, the second tact 144B, 146B are moved from the intermediate position to the coater chamber position (FIG. 19 (b): t ₄₉ ~
t ₅₀ ), the arm is moved from the arm upper limit position to the arm lower limit position shown in FIG. 8 (FIG. 19B: t _{51 to} t ₅₂ ), and the arm is closed (FIG. 19B: t _{53 to} t ₅₄ ). ), Grasp the substrate 74 in the coater chamber. Then, the arm is moved from the lower limit position to the upper limit position (FIG. 19 (b): t ₅₅ ~
t ₅₆ ), the arm moves from the coater chamber position to the dry chamber position (FIG. 19B: t _{57 to} t ₅₈ ), and the arm moves from the upper limit position to the lower limit position (FIG. 19B: t _{59 to} t ₅₈ ). ₆₀ ),
The arm is opened (FIG. 19B: t _{61 to} t ₆₂ ), and the substrate 74 is moved to the dry chamber. Further, the arm moves from the lower limit position to the upper limit position (FIG. 19B: t _{63 to} t ₆₄ ), moves from the dry chamber position to the intermediate position, and stands by (FIG. 19).
(B): t _{65 to} t ₆₆ ).

On the other hand, the squeegee 90
It is located on the cleaning tank 124. Cleaning brush 130
Always rotating, squeegee moves from upper limit to lower limit
By moving (FIG. 19 (d): t₃₃~ T₃₄), Wash
Purification is started (FIG. 19 (g): t₆₇), End of cleaning (Fig. 1)
9 (g): t₆₈Stop water supply in cleaning tank 126 just before
(FIG. 19 (g): t₆₉), Start draining (FIG. 19)
(G): t₇₁). Second tact 144B, 146B is dry
At the timing of moving into the chamber (FIG. 19 (b):
t₅₈), Wiping roller moves from origin to end
(FIG. 19 (g): t ₇₅~ T₇₆), Constantly rotating
The cleaning liquid on the squeegee 90 is wiped off by the wiping roller.
The movement from the end position to the origin position (FIG. 19)
(G): t₇₇~ T₇₈), End the wiping. This
Then, the drainage of the cleaning tank is completed (FIG. 19 (g): t).₇₂), Salary
Water starts (FIG. 19 (g): t)₇₀). Spin naka
After the substrate 74 is discharged from the pump 62 (FIG. 19B):
t₅₈) And the spinner cup 62 rises (FIG. 19E):
t₇₉~ T₈₀), The lock of the spin motor becomes free
(FIG. 19 (e): t₈₁~ T₈₂), Follow the spin program
Thus, the spin motor rotates (FIG. 19 (e): t).₄₆~
t₈₃~ T₈₄). During this time, the chuck cleaning liquid is injected.
(FIG. 19 (h): t₈₉~ T₉₀). Spinner cup 62
Descend (FIG. 19 (f): t₈₅~ T ₈₆), The spin motor
Locked (FIG. 19 (e): t₈₇~ T₈₈).

[0059] vacuum of the spin chuck 60 is first tact 144A, when the substrate 74 enters the coater chamber by 146A (FIG. 19 (a): t ₁₀₎ from the second tact 144B, the substrate 74 from the coater chamber by 146B The switch is turned on until the point of exit (FIG. 19B: t ₅₀ ) (FIG. 19I: t _{91 to} t ₉₂ ).

The air of the spin chuck 60 starts the spin program at the time of cleaning the chuck (FIG. 19E):
It is turned on for a predetermined time in synchronization with t ₄₆ ) (FIG. 1).
_{9 (i): t 93 ~t} 94).

The outer peripheral air of the spin chuck 60 starts to move from the time when the arms of the first tacts 144A and 146A move to the upper limit position (FIG. 19A: t ₁₆ ).
When the arm of 146B moves to the upper limit position (FIG. 19)
(B): t ₅₀ ) (FIG. 19 (i): t)
₉₅ ~t _96). Further, it is turned on for a predetermined time in synchronization with the start of the spin program during chuck cleaning (FIG. 19 (e): t ₄₆ ) (FIG. 19 (i), t _{97 to} t ₉₈ ).
One cycle from when the substrate 74 is loaded into the coater chamber to when the above-described process is completed is 80 sec.

FIGS. 22 and 23 are process diagrams showing a third embodiment of the viscous liquid coating apparatus according to the present invention, in which a color (color separation) filter is manufactured as an example. The red, green, and blue pigments are dispersed in the photosensitive resin at the composition ratios shown in Table 1, respectively, to produce red, green, and blue colored photosensitive resins 80R, 80G, and 80B.

[0063]

[Table 1] (Unit: wt%) Red photosensitive resin (80R) Pyrazolone red (red pigment) ··· 10 polyvinyl alcohol / 5% stilbazolium quinolium (photosensitive resin) ··· 5 water ··· 85 green photosensitive resin (80G) lionol green 2Y-301 (green pigment) 9 polyvinyl alcohol / 5% stilbazolium quinolium (photosensitive resin) 5 water 86 blue photosensitive Resin (80B) Fast Dogen Blue 3 Polyvinyl alcohol / 5% stilbazolium quinolium (photosensitive resin) 5 Water 92

As the substrate 74, a substrate obtained by sufficiently cleaning a glass substrate (AL material made of Asahi Glass) having a thickness of 1.1 mm was used.

A red photosensitive resin 80R is dropped on the substrate 74 by a dropping nozzle 76 (FIG. 22A), and a squeegee 9
The squeegee was applied by a squeegee 96 with the gap amount G ₁ between the substrate 6 and the substrate 74 set to 0.1 mm (FIG. 22B). Furthermore, spin coating was performed so that the film thickness became 1.2 μm (FIG. 22C). Thereafter, the mask 15 is dried in an oven at a temperature of 70 ° C. for 30 minutes, and a mask 15 having a predetermined pattern is formed.
0 in contact with each other and exposure using a mercury lamp (FIG. 22).
(D)) Spray development with water is performed for 1 minute to form a red relief pixel in a region where a red pixel is to be formed. 22 was obtained (FIG. 22).
(E)).

[0066] Similarly, the green photosensitive resin 80G dropwise (squeegee 96 and large gap amount G ₂ = 0.2 than the gap amount G ₁ described above the gap amount G ₂ of the substrate 74
mm and a squeegee 96 was applied using a squeegee 96 (FIG. 23).
(F)). Furthermore, spin coating was performed so that the film thickness became 1.2 μm (FIG. 23G). Thereafter, drying is performed in an oven at a temperature of 70 ° C. for 30 minutes, a mask 152 having a predetermined pattern is brought into close contact with the mask 152, and exposed using a mercury lamp (FIG. 23 (h)). A green relief pixel is formed in a region where a green pixel is to be formed, and further cured by heating at 150 ° C. for 30 minutes.
80 g of green relief pixels in the area where green pixels are to be formed
Was obtained (FIG. 23 (i)).

[0067] Further, similarly to the green-sensitive resin 80G blue photosensitive resin 80B, then was added dropwise, and the larger the gap amount G ₃ = 0.2 mm than the gap amount G ₁ described above, and squeegee coating squeegee 96 (FIG. 23 (j)),
Exposure and development were performed using a mask having a predetermined pattern in the same manner as the green relief image described above, followed by heat curing to obtain a blue relief pixel 80b in a region where a blue pixel was to be formed.

Finally, a transparent resin is applied to a thickness of 2 μm, and is cured by heating at 150 ° C. for 30 minutes to form a protective film to form a red relief pixel 80r and a green relief pixel 80r.
g, a color separation filter in which blue relief pixels 80b are regularly arranged was produced (FIG. 23 (k)).

Next, the results of application of the viscous liquid coating apparatus of this embodiment (squeegee coating + spin coating) and a conventional spin coating only coating apparatus will be compared.

First, the effective utilization rates of the photosensitive resins are compared.

[0071]

[Table 2] Spin coating usage rate Amount Usage rate Amount Red pixel 33.8% 42 yen 2.0% 466 yen Green pixel 8.8 160 2.0 445 Blue pixel 8.8 160 3.1 522 Total − 362-1433

As can be seen from Table 2, the effective utilization rate of the red photosensitive resin forming the red pixel is as high as 33.8%, but the green photosensitive resin forming the green pixel and the blue photosensitive resin forming the blue pixel are effective. In the case of the resin, the effective utilization rates were both 8.8%. The reason for this is that, in the LCD manufacturing process, three color pixel patterns are formed on the substrate, respectively, and the red pixels formed first can be applied with a gap between the substrate and the squeegee of 0.1 mm.

However, the photosensitive resin of the second color (green pixel) and the photosensitive resin of the third color (blue pixel) must be coated on a substrate on which a 1.2 μm red pixel pattern has already been formed. If the squeegee is applied with a gap amount of 0.1 mm and then the squeegee is applied, unevenness occurs.
Therefore, in order to eliminate this unevenness, the gap amount is set to 0.2.
This is because the squeegee must be applied in mm. However, it can be seen that the total cost of the photosensitive resin has been reduced to about 1/4, and the effective utilization rate has been significantly improved.

FIGS. 24 to 25 and FIGS. 26 to 27 are diagrams showing the film thickness distribution characteristics of the third embodiment of the viscous liquid coating apparatus according to the present invention in comparison with the conventional example. 24 to 25
In the example shown in (1), the photosensitive resin is a negative photosensitive resin in which a pigment is dispersed in a PVA-stilbazol group, and has a viscosity of 4
The one of 0 to 45 cps was used. Substrate size 300
A test was performed using one having a size of × 300 × 1.1 ^t mm.

As a result, it can be seen that the rise of the photosensitive resin at the center of the substrate is significantly reduced in the present invention (FIG. 24) as compared with the conventional example (FIG. 25). Also,
The in-plane variation of the film thickness is an inscribed circle of φ300 mm, which is ± 5.5% in the conventional example and ± 3.5% in the present invention.
Within.

In the examples shown in FIGS. 26 and 27, the photosensitive resin is a novolak-based positive photosensitive resin having a viscosity of 6 cp.
s, and the substrate is similarly 300 × 300 × 1.1
^The test was performed using a ^t mm. As a result, the swelling of the photosensitive resin at the center of the substrate is caused by the present invention (FIG. 2).
It can be seen that 6) is smaller than the conventional example (FIG. 27). In addition, the in-plane variation in the film thickness is within ± 3% in the related art with an inscribed circle of φ300 mm, but within ± 2% in the present invention.

FIG. 28 is a diagram showing the relationship between the amount of applied photosensitive resin and the amount of foreign matter according to the third embodiment of the viscous liquid coating apparatus according to the present invention, in comparison with a conventional example. Under the same conditions as described above, when the photosensitive resin is applied, in the case of the conventional spin coating only, the photosensitive resin of 30 g or more is required,
It can be seen that the number of foreign substances increases as the photosensitive resin drop amount increases. The extraneous substance brings a much larger amount of photosensitive resin into the spinner cup than the amount of photosensitive resin required for coating, and the photosensitive resin is re-adhered to the substrate by scattering. In this embodiment, the amount of the photosensitive resin to be dropped is 30 g or less, and the number of foreign substances is hardly recognized.

[0078]

As described above in detail, according to the present invention, the viscous liquid is previously stretched to a predetermined thickness by the squeegee before spin coating, so that the amount of the viscous liquid used in the present invention is smaller than that of the conventional viscous liquid. It can be greatly reduced. In addition, it is possible to form a coating film thinly and uniformly over the entire coating surface with less variation in film thickness. Therefore, when an expensive photosensitive resin is applied, the material cost can be significantly reduced.

Further, according to the present invention, a water-soluble photosensitive resin, which has conventionally been difficult to form a uniform coating film, can be uniformly applied. There is no need for a necessary solvent recovery device or the like, which is advantageous for cost reduction. Furthermore, when a color filter is manufactured according to the present invention, an extremely high-quality color filter free from unevenness in luminance and color density can be obtained.

[Brief description of the drawings]

FIG. 1 is a block diagram showing an embodiment of a method for applying a viscous liquid according to the present invention.

FIG. 2 is a perspective view showing a first embodiment of a viscous liquid coating apparatus according to the present invention.

FIG. 3 is a view showing a second embodiment of the viscous liquid applying apparatus according to the present invention.

FIG. 4 is a view showing a second embodiment of the viscous liquid applying apparatus according to the present invention.

FIG. 5 is a diagram for explaining an operation sequence of the second embodiment. 6 to 15

FIG. 6 is a view showing a third embodiment of the viscous liquid applying apparatus according to the present invention, and is a plan view of a main part thereof.

FIG. 7 is a sectional view taken along VII-VII in FIG. 6;

FIG. 8 is a sectional view taken along line VIII-VIII in FIG.

FIG. 9 is a plan view showing a part of the spin chuck of FIG. 6;

FIG. 10 is a side sectional view of FIG. 9;

FIG. 11 is a diagram showing an application nozzle.

FIG. 12 is a diagram showing a squeegee.

FIG. 13 is a partially enlarged view of the squeegee of FIG.

FIG. 14 is a partially enlarged view showing a modification of the squeegee of FIG.

FIG. 15 is a plan view showing a squeegee cleaning tank.

FIG. 16 is a side sectional view of a squeegee cleaning tank.

FIG. 17 is a view for explaining the characteristics of the third embodiment of the viscous liquid application device according to the present invention,
FIG. 4 is a diagram showing a relationship between a gap amount between a substrate and a squeegee and a minimum drop amount of a photosensitive resin.

FIG. 18 is a view for explaining the characteristics of the third embodiment of the viscous liquid applying apparatus according to the present invention,
FIG. 4 is a diagram illustrating a relationship between a squeegee feed speed and a minimum amount of a photosensitive resin dropped.

FIG. 19 is a process diagram for describing a coating process of a third embodiment of the viscous liquid coating device according to the present invention.

FIG. 20 is a partially enlarged view of FIG. 19;

FIG. 21 is a partially enlarged view of FIG. 19;

FIG. 22 is a process diagram showing a process of manufacturing a color (color separation) filter in the third embodiment of the viscous liquid applying apparatus according to the present invention.

FIG. 23 is a process diagram showing a process of manufacturing a color (color separation) filter using the third embodiment of the viscous liquid applying apparatus according to the present invention.

FIG. 24 is a diagram showing a film thickness distribution characteristic of a third embodiment of the viscous liquid coating apparatus according to the present invention.

FIG. 25 is a diagram showing a film thickness distribution characteristic in a conventional example.

FIG. 26 is a diagram showing a film thickness distribution characteristic of a third embodiment of the viscous liquid coating device according to the present invention.

FIG. 27 is a diagram showing a film thickness distribution characteristic in a conventional example.

FIG. 28 is a diagram showing a relationship between a photosensitive resin dripping amount and a foreign substance according to a third embodiment of the viscous liquid applying apparatus according to the present invention in comparison with a conventional example.

FIG. 29 is a diagram for explaining a problem of the conventional spin coating method and roll coating method.

FIG. 30 is a diagram for explaining a problem of the conventional spin coating method and roll coating method.

FIG. 31 is a view for explaining a problem of the conventional spin coating method and roll coating method.

FIG. 32 is a diagram for explaining a problem of the conventional spin coating method and roll coating method.

FIG. 33 is a diagram for explaining a problem of the conventional spin coating method and roll coating method.

FIG. 34 is a diagram for explaining a problem of the conventional spin coating method and roll coating method.

[Explanation of symbols]

10: squeegee coating process, 12: spin coating process, 14
... Squeegee application part, 16 ... Placement table, 18 ... Application nozzle,
20: moving table, 22: squeegee, 24: moving table, 26 ...
Squeegee cleaning tank, 28: spin coating unit, 30: spin chuck, 32: spin cup, 34: substrate, 36: photosensitive resin

──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Mitsuru Iida 1-1-1, Ichigaya-Kaga-cho, Shinjuku-ku, Tokyo Inside Dai Nippon Printing Co., Ltd. (56) References JP-A-63-137768 (JP, A) JP-A-63-107769 (JP, A) JP-A-60-403 (JP, A) JP-A-1-150103 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) G02B 5 / 20 101 B05C 11/04 B05C 11/08 B05D 1/40 G03F 7/16

Claims (3)

(57) [Claims] 1. A method for manufacturing a color separation filter comprising at least two or more photosensitive pattern forming steps.
The method of applying the photosensitive material in the photosensitive pattern forming step and the method of applying the photosensitive material in the second photosensitive pattern forming step include a method of applying the first photosensitive material and a method of applying the second photosensitive material, respectively. A method of applying the first photosensitive material, wherein the first photosensitive material is applied in a direction orthogonal to a direction in which the photosensitive material is applied to the application surface of the application object in a direction orthogonal to the application surface at a predetermined interval. A member is disposed via a photosensitive material, the viscous liquid is stretched using the linear member, and the photosensitive material is applied to part or all of the application surface of the application object, and the photosensitive material is applied. A first coating step of forcibly flattening the coated surface of the first photosensitive material, and a second method of applying the photosensitive material, wherein the photosensitive material applied in the first coating step is applied to the object to be coated by centrifugal force. 2nd coating to disperse evenly over the entire surface And a process for applying a photosensitive material comprising the steps of: 2. The method according to claim 1, wherein the photosensitive material is a photosensitive resin in which a pigment is dispersed. 3. The photosensitive material according to claim 1, wherein the photosensitive material is a red, blue, or green photosensitive material.
A method for producing the color separation filter according to the above.