JPH0227829B2 - - Google Patents
Info
- Publication number
- JPH0227829B2 JPH0227829B2 JP55166236A JP16623680A JPH0227829B2 JP H0227829 B2 JPH0227829 B2 JP H0227829B2 JP 55166236 A JP55166236 A JP 55166236A JP 16623680 A JP16623680 A JP 16623680A JP H0227829 B2 JPH0227829 B2 JP H0227829B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- grooves
- substrate
- stripe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005253 cladding Methods 0.000 claims description 25
- 239000004065 semiconductor Substances 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 17
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 13
- 230000003287 optical effect Effects 0.000 claims description 10
- 230000010355 oscillation Effects 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims 2
- 239000012535 impurity Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2054—Methods of obtaining the confinement
- H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
Landscapes
- Semiconductor Lasers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16623680A JPS5789290A (en) | 1980-11-25 | 1980-11-25 | Semiconductor laser element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16623680A JPS5789290A (en) | 1980-11-25 | 1980-11-25 | Semiconductor laser element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5789290A JPS5789290A (en) | 1982-06-03 |
JPH0227829B2 true JPH0227829B2 (zh) | 1990-06-20 |
Family
ID=15827630
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16623680A Granted JPS5789290A (en) | 1980-11-25 | 1980-11-25 | Semiconductor laser element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5789290A (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2821150B2 (ja) * | 1988-10-21 | 1998-11-05 | シャープ株式会社 | 半導体レーザ素子 |
JP2923235B2 (ja) * | 1995-10-23 | 1999-07-26 | シャープ株式会社 | 半導体レーザ素子 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5156188A (ja) * | 1974-11-13 | 1976-05-17 | Hitachi Ltd | Handotaireezasochi |
JPS5158879A (zh) * | 1974-11-19 | 1976-05-22 | Nippon Telegraph & Telephone | |
JPS5290280A (en) * | 1976-01-22 | 1977-07-29 | Nec Corp | Semiconductor laser element |
JPS55125690A (en) * | 1979-03-22 | 1980-09-27 | Nec Corp | Semiconductor laser |
-
1980
- 1980-11-25 JP JP16623680A patent/JPS5789290A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5156188A (ja) * | 1974-11-13 | 1976-05-17 | Hitachi Ltd | Handotaireezasochi |
JPS5158879A (zh) * | 1974-11-19 | 1976-05-22 | Nippon Telegraph & Telephone | |
JPS5290280A (en) * | 1976-01-22 | 1977-07-29 | Nec Corp | Semiconductor laser element |
JPS55125690A (en) * | 1979-03-22 | 1980-09-27 | Nec Corp | Semiconductor laser |
Also Published As
Publication number | Publication date |
---|---|
JPS5789290A (en) | 1982-06-03 |
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