JPH0226851B2 - - Google Patents
Info
- Publication number
- JPH0226851B2 JPH0226851B2 JP16705484A JP16705484A JPH0226851B2 JP H0226851 B2 JPH0226851 B2 JP H0226851B2 JP 16705484 A JP16705484 A JP 16705484A JP 16705484 A JP16705484 A JP 16705484A JP H0226851 B2 JPH0226851 B2 JP H0226851B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- pattern
- substrate
- layer
- section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 13
- 238000010894 electron beam technology Methods 0.000 claims description 11
- 239000011521 glass Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 39
- 230000000694 effects Effects 0.000 description 6
- 230000010363 phase shift Effects 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
- B29D11/00269—Fresnel lenses
Landscapes
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Surface Treatment Of Glass (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16705484A JPS6144628A (ja) | 1984-08-09 | 1984-08-09 | マイクロフレネルレンズの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16705484A JPS6144628A (ja) | 1984-08-09 | 1984-08-09 | マイクロフレネルレンズの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6144628A JPS6144628A (ja) | 1986-03-04 |
JPH0226851B2 true JPH0226851B2 (zh) | 1990-06-13 |
Family
ID=15842539
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16705484A Granted JPS6144628A (ja) | 1984-08-09 | 1984-08-09 | マイクロフレネルレンズの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6144628A (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6475704B1 (en) | 1997-09-12 | 2002-11-05 | Canon Kabushiki Kaisha | Method for forming fine structure |
JP2000098116A (ja) | 1998-09-18 | 2000-04-07 | Canon Inc | 素子又は素子作製用モールド型の作製方法 |
JP4711251B2 (ja) * | 2002-02-20 | 2011-06-29 | カールツァイス エスエムエス リミテッド | 欠陥フォトマスクを修理するための方法およびシステム |
JP4904742B2 (ja) * | 2004-09-16 | 2012-03-28 | 旭硝子株式会社 | パターンの形成方法およびパターンを有する物品 |
JP2006310678A (ja) * | 2005-05-02 | 2006-11-09 | Ricoh Opt Ind Co Ltd | 微細表面構造形成用基板、微細表面構造物品の製造方法及びその製造方法で製造された微細表面構造物品 |
JP5128808B2 (ja) * | 2006-12-06 | 2013-01-23 | スリーエム イノベイティブ プロパティズ カンパニー | フレネルレンズ |
-
1984
- 1984-08-09 JP JP16705484A patent/JPS6144628A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6144628A (ja) | 1986-03-04 |
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