JPH0226796B2 - - Google Patents
Info
- Publication number
- JPH0226796B2 JPH0226796B2 JP56183602A JP18360281A JPH0226796B2 JP H0226796 B2 JPH0226796 B2 JP H0226796B2 JP 56183602 A JP56183602 A JP 56183602A JP 18360281 A JP18360281 A JP 18360281A JP H0226796 B2 JPH0226796 B2 JP H0226796B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- waveguide
- structural member
- gas
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007789 gas Substances 0.000 claims description 50
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 39
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 30
- 229910052751 metal Inorganic materials 0.000 claims description 30
- 239000002184 metal Substances 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 28
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 20
- 238000001179 sorption measurement Methods 0.000 claims description 18
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 17
- 229910052782 aluminium Inorganic materials 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 12
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 10
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 229920002678 cellulose Polymers 0.000 claims description 8
- 239000001913 cellulose Substances 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 8
- 238000007747 plating Methods 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 5
- 229910017604 nitric acid Inorganic materials 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 5
- 229910052763 palladium Inorganic materials 0.000 claims description 4
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910000480 nickel oxide Inorganic materials 0.000 claims 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 description 32
- 239000001257 hydrogen Substances 0.000 description 31
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 18
- 229910002092 carbon dioxide Inorganic materials 0.000 description 18
- 238000002161 passivation Methods 0.000 description 15
- 239000000126 substance Substances 0.000 description 13
- 238000010494 dissociation reaction Methods 0.000 description 12
- 230000005593 dissociations Effects 0.000 description 12
- 150000002739 metals Chemical class 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 230000003647 oxidation Effects 0.000 description 8
- 238000007254 oxidation reaction Methods 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 230000007423 decrease Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 238000010943 off-gassing Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 241001246312 Otis Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 125000003636 chemical group Chemical group 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000000686 essence Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000005247 gettering Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000000415 inactivating effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/0315—Waveguide lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/207,576 US4393506A (en) | 1980-11-17 | 1980-11-17 | Sealed-off RF excited CO2 lasers and method of manufacturing such lasers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57112088A JPS57112088A (en) | 1982-07-12 |
| JPH0226796B2 true JPH0226796B2 (https=) | 1990-06-12 |
Family
ID=22771149
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56183602A Granted JPS57112088A (en) | 1980-11-17 | 1981-11-16 | Sealed rf excited co2 laser and method of producing same |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4393506A (https=) |
| EP (1) | EP0052501B1 (https=) |
| JP (1) | JPS57112088A (https=) |
| DE (1) | DE3167226D1 (https=) |
| IL (1) | IL64294A (https=) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3581779D1 (de) * | 1984-10-12 | 1991-03-28 | Hiromi Kawase | Metallionenlaser vom hohlkathodentyp. |
| DE3708314A1 (de) * | 1987-03-14 | 1988-09-22 | Deutsche Forsch Luft Raumfahrt | Mikrowellengepumpter hochdruckgasentladungslaser |
| US4911712A (en) * | 1988-04-14 | 1990-03-27 | Heraeus Lasersonics, Inc. | Medical laser probe |
| US5030217A (en) * | 1988-04-14 | 1991-07-09 | Heraeus Lasersonics, Inc. | Medical laser probe and method of delivering CO2 radiation |
| US4888786A (en) * | 1988-05-09 | 1989-12-19 | United Technologies Corporation | Laser gas composition control arrangement and method |
| EP0374287A1 (de) * | 1988-12-21 | 1990-06-27 | Coherent General, Inc. | Gaslaser |
| DE4128596A1 (de) * | 1991-08-28 | 1993-03-04 | Siemens Ag | Verfahren zur herstellung eines bandleiterlasers |
| US5883467A (en) * | 1997-09-09 | 1999-03-16 | Motorola, Inc. | Field emission device having means for in situ feeding of hydrogen |
| US7190707B2 (en) * | 2001-01-29 | 2007-03-13 | Cymer, Inc. | Gas discharge laser light source beam delivery unit |
| US8295319B2 (en) | 2010-11-23 | 2012-10-23 | Iradion Laser, Inc. | Ceramic gas laser having an integrated beam shaping waveguide |
| US8422528B2 (en) | 2011-02-24 | 2013-04-16 | Iradion Laser, Inc. | Ceramic slab, free-space and waveguide lasers |
| US10404030B2 (en) | 2015-02-09 | 2019-09-03 | Iradion Laser, Inc. | Flat-folded ceramic slab lasers |
| US10985518B2 (en) | 2016-09-20 | 2021-04-20 | Iradion Laser, Inc. | Lasers with setback aperture |
| US20210057864A1 (en) * | 2019-08-19 | 2021-02-25 | Iradion Laser, Inc. | Enhanced waveguide surface in gas lasers |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2080066A (en) * | 1933-10-31 | 1937-05-11 | Eastman Kodak Co | Film preserving package |
| DE1230146B (de) * | 1964-09-01 | 1966-12-08 | Patra Patent Treuhand | Optischer Sender oder Verstaerker mit gasfoermigem stimulierbarem Medium |
| US3394320A (en) * | 1965-04-20 | 1968-07-23 | Gustav K. Medicus | Gas lasers with improved capillary tube |
| FR2096664B2 (https=) * | 1970-05-12 | 1973-07-13 | Commissariat Energie Atomique | |
| DE2038777C3 (de) * | 1970-08-04 | 1975-06-26 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Abgeschlossener Kohlendioxid-Laser |
| DE2335206A1 (de) * | 1973-07-11 | 1975-01-30 | Kabel Metallwerke Ghh | Verfahren zur herstellung eines weitverkehrsrundhohlleiters |
| US3986897A (en) * | 1974-09-30 | 1976-10-19 | Motorola, Inc. | Aluminum treatment to prevent hillocking |
| US4017808A (en) * | 1975-02-10 | 1977-04-12 | Owens-Illinois, Inc. | Gas laser with sputter-resistant cathode |
| GB1526250A (en) * | 1976-11-05 | 1978-09-27 | Secr Defence | Waveguide lasers |
| US4229709A (en) * | 1978-06-12 | 1980-10-21 | Mcmahan William H | Laser device |
-
1980
- 1980-11-17 US US06/207,576 patent/US4393506A/en not_active Expired - Lifetime
-
1981
- 1981-11-16 IL IL64294A patent/IL64294A/xx unknown
- 1981-11-16 JP JP56183602A patent/JPS57112088A/ja active Granted
- 1981-11-16 EP EP81305407A patent/EP0052501B1/en not_active Expired
- 1981-11-16 DE DE8181305407T patent/DE3167226D1/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57112088A (en) | 1982-07-12 |
| EP0052501A2 (en) | 1982-05-26 |
| IL64294A (en) | 1985-04-30 |
| EP0052501B1 (en) | 1984-11-14 |
| DE3167226D1 (en) | 1984-12-20 |
| EP0052501A3 (en) | 1982-06-02 |
| US4393506A (en) | 1983-07-12 |
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