JPH02260511A - Manufacture of surface reoxidation type semiconductor porcelain capacitor - Google Patents

Manufacture of surface reoxidation type semiconductor porcelain capacitor

Info

Publication number
JPH02260511A
JPH02260511A JP8177289A JP8177289A JPH02260511A JP H02260511 A JPH02260511 A JP H02260511A JP 8177289 A JP8177289 A JP 8177289A JP 8177289 A JP8177289 A JP 8177289A JP H02260511 A JPH02260511 A JP H02260511A
Authority
JP
Japan
Prior art keywords
semiconductor
powder
semiconductor porcelain
type semiconductor
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8177289A
Other languages
Japanese (ja)
Other versions
JPH0524649B2 (en
Inventor
Koichiro Tsujiku
浩一郎 都竹
Takuji Aoyanagi
青柳 卓司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Yuden Co Ltd
Original Assignee
Taiyo Yuden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Yuden Co Ltd filed Critical Taiyo Yuden Co Ltd
Priority to JP8177289A priority Critical patent/JPH02260511A/en
Publication of JPH02260511A publication Critical patent/JPH02260511A/en
Publication of JPH0524649B2 publication Critical patent/JPH0524649B2/ja
Granted legal-status Critical Current

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Abstract

PURPOSE:To manufacture a semiconductor porcelain capacitor with good efficiency without causing any increasing in variety of characteristics and deterioration of characteristics by performing heat treatment in a piled-up state so that powder exist between semiconductor porcelains. CONSTITUTION:At the time of heat treatment of a semiconductor porcelain in the atmosphere, powder of that, whose melting point is higher than heat treatment temperature by more than 100 deg.C, of an oxide, carbide and nitride of a metal, is prepared for performing heat treatment in a piled-up state so that powder may exist between the semiconductor porcelains. Accordingly, thermal conduction to each semiconductor porcelain and oxygen diffusion are uniformly performed. Thereby, an increase in variety of characteristics and deterioration of a characteristics are prevented: this results in a semiconductor porcelain capacitor with good efficiency.

Description

【発明の詳細な説明】 〔産〒1゜のfり用分野〕 本発明は、表面再酸化型半導体磁器コンデンサの製造方
法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of production] The present invention relates to a method for manufacturing a surface reoxidation type semiconductor ceramic capacitor.

〔従来の技術〕[Conventional technology]

表面再酸化型半導体磁器コンデンサは、−膜内には、次
の工程により製造される・。
The surface reoxidation type semiconductor ceramic capacitor is manufactured by the following steps in the film.

■ 例えばs Bs7i03を主成分とする原材料を混
合した後、バインダー等を添加して混練し、シート状に
押し出し成形した後、得られたシート、を打ち抜いて円
板状の成形体を得る。
(2) For example, after mixing raw materials containing s Bs7i03 as a main component, adding a binder and the like, kneading, extruding into a sheet, and punching out the obtained sheet to obtain a disc-shaped molded body.

■ 上記成形体を複数枚重ねてサヤ詰めし、大気中で焼
成したのち、得られた焼結体を還元性雰囲気中で熱処理
して半導体磁器を得る。
(2) A plurality of the above molded bodies are piled up and packed in pods, fired in the atmosphere, and then the obtained sintered body is heat treated in a reducing atmosphere to obtain semiconductor porcelain.

■ 上記半導体磁器を、大気中で再び熱処理して表面を
再酸化し、表面再酸化型半導体磁器を得る。
(2) The above-mentioned semiconductor porcelain is heat-treated again in the atmosphere to re-oxidize the surface to obtain a surface-reoxidized semiconductor porcelain.

■ 上記表面再酸化型半導体磁器の両主面の互いに対向
する位置に、それぞれAg電極層を形成して表面再酸化
型半導体磁器コンデンサを得る。
(2) Ag electrode layers are formed at mutually opposing positions on both main surfaces of the surface reoxidation type semiconductor ceramic capacitor to obtain a surface reoxidation type semiconductor ceramic capacitor.

上記製造方法により製造される表面再酸化型半導体磁器
コンデンサにおいては、半導体磁器を再び大気中で熱処
理する際の該半導体磁器の表面への酸素供給の度合い及
び熱処理温度の条件等により、上記半導体磁器の表面層
部分での酸素拡散の度合が大きく異なり、これにより、
その静電容量C[nF]、誘電損失jsnJ(%)、絶
縁抵抗IR[MΩ)等の特性が大きく変動する。
In the surface reoxidation type semiconductor ceramic capacitor manufactured by the above manufacturing method, depending on the degree of oxygen supply to the surface of the semiconductor ceramic and the conditions of the heat treatment temperature when the semiconductor ceramic is heat-treated in the atmosphere again, the semiconductor ceramic The degree of oxygen diffusion in the surface layer of
Its characteristics such as capacitance C [nF], dielectric loss jsnJ (%), and insulation resistance IR [MΩ) vary greatly.

このような観点から従来は、酸素拡散の度合いが個々の
半導体磁器毎にばらつくことのないよう、アルミナ、あ
るいはジルコニア等の耐火物からなる焼成用サヤの上に
、直接あるいは上記耐火物からなるセッターを介して、
互いに重ならないように上記半導体磁器を平詰めしたの
ち、これらのサヤを複数段重ねて大気中で熱処理するの
が一般的であった。
From this point of view, conventionally, in order to prevent the degree of oxygen diffusion from varying among individual semiconductor porcelains, a setter made of the above-mentioned refractory material was placed directly on top of the firing pod made of a refractory material such as alumina or zirconia. Via
It was common practice to pack the semiconductor porcelain pieces flat so that they did not overlap each other, and then stack these pods in multiple stages and heat-treat them in the atmosphere.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかしながら、上記従来の製造方法では、耐火物製の焼
成用サヤあるいはセッターの上に、互いに重ならないよ
うに半導体磁器を平詰めして熱処理していたため、ひと
サヤ当たりに処理できる半導体磁器の数が少なく、熱効
率、処理効率ともに低かった。
However, in the conventional manufacturing method described above, semiconductor porcelain was packed flat and heat-treated on top of a refractory firing pod or setter so that they did not overlap each other, so the number of semiconductor porcelains that could be processed per pod was limited. Both thermal efficiency and processing efficiency were low.

また、ひとサヤ当たりの処理量を増やすために、上記半
導体磁器毎複数枚重ねて熱処理することも検討されてい
るが、半導体磁器毎に特性が大きくばらつき、誘電損失
の増加や、絶縁抵抗の低下が否めなかった。
In addition, in order to increase the amount of processing per pod, it is being considered to heat treat multiple sheets of the semiconductor porcelain described above, but the characteristics of each semiconductor porcelain vary widely, resulting in an increase in dielectric loss and a decrease in insulation resistance. I couldn't deny it.

本発明の目的は、上記従来の問題点を解決して、特性バ
ラツキの増加や特性の悪化等を生ずることなく、表面再
酸化型半導体磁器コンデンサを効率良く得ることが可能
な製造方法を提供することにある。
An object of the present invention is to provide a manufacturing method capable of solving the above-mentioned conventional problems and efficiently obtaining a surface reoxidation type semiconductor ceramic capacitor without increasing variation in characteristics or deteriorating characteristics. There is a particular thing.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は、原材料を混合したのち成形して得られた成形
体を大気中で焼成し、還元性雰囲気中で熱処理したのち
再び大気中で熱処理して表面を再酸化し、得られた表面
再酸化型半導体磁器の表面に一対の電5極層を形成して
なる表面再酸化型半導体磁器コンデンサの製造方法にお
いて、上記半導体磁器を再び大気中で熱処理する際に、
金属の酸化物、炭化物、窒化物のうち融点が、上記熱処
理温度よりも100℃以上高いものの粉末を準備し、上
記半導体磁器同士の間に上記粉末が存在するように重ね
合せた状態で熱処理することを特徴とする表面再酸化型
半導体磁器コンデンサの製造方法である。
The present invention involves mixing raw materials, molding the resulting molded product, firing it in the air, heat-treating it in a reducing atmosphere, and then heat-treating it again in the air to re-oxidize the surface. In a method for manufacturing a surface re-oxidized semiconductor ceramic capacitor in which a pair of electrode pentode layers are formed on the surface of an oxidized semiconductor ceramic, when the semiconductor ceramic is heat-treated in the atmosphere again,
Prepare powders of metal oxides, carbides, and nitrides whose melting points are 100°C or more higher than the heat treatment temperature, and heat-treat the semiconductor porcelains in a stacked state so that the powders are present between the semiconductor porcelains. This is a method of manufacturing a surface reoxidation type semiconductor ceramic capacitor.

上記粉末の具体的な材料としては、例えばアルミナ、ジ
ルコニア、マグネシア、あるいはこれらの混合組成物が
挙げられる。
Specific materials for the powder include, for example, alumina, zirconia, magnesia, or a mixed composition thereof.

〔作 用〕[For production]

本発明の表面再酸化型半導体磁器コンデンサの製造方法
においては、半導体磁器同士の間に上記粉末が存在する
ように重ねた状態で再酸化のための熱処理を行なうよう
にしたので、各半導体磁器への熱伝導および酸素拡散が
均一に行われる。
In the method for manufacturing a surface reoxidation type semiconductor ceramic capacitor of the present invention, the heat treatment for reoxidation is performed while the semiconductor ceramics are stacked so that the powder is present between each semiconductor ceramic. uniform heat conduction and oxygen diffusion.

〔実施例〕〔Example〕

次に、本発明の表面再酸化型半導体磁器コンデンサの製
造方法の実施例を比較例と共に説明する。
Next, examples of the method for manufacturing a surface reoxidation type semiconductor ceramic capacitor of the present invention will be described together with comparative examples.

先ず、B*ri(h  92io1N、CtOz  5
mo1% 、Ti023tso 1%、の組成比からな
る半導体磁器の原料粉末を混合し、バインダーとしてメ
チルセルロース7v1%と、可塑剤としてグリセリンの
10wj%水溶液を添加し混練したのち、0.6mlの
厚さのシート状に押し出し成形した。次いで、上記シー
トを10mmφの円板形状に打ち抜き、得られた成形体
をアルミナ磁器製の焼成用サヤに詰めた後、大気中ts
oo℃で焼成して焼結体を得た。次に、上記焼結体を再
び焼成用サヤに詰め、82 10マ01%、th  9
0yo1%の還元雰囲気中1000 ”Cテ2 時間熱
処理し、半導体磁器を得た。
First, B*ri(h 92io1N, CtOz 5
Semiconductor porcelain raw material powder with a composition ratio of 1% MO and 1% Ti023TSO was mixed, and 7v1% methylcellulose as a binder and a 10wj% aqueous solution of glycerin as a plasticizer were added and kneaded. It was extruded into a sheet. Next, the above-mentioned sheet was punched out into a disc shape of 10 mmφ, and the obtained molded body was packed in an alumina porcelain firing pod, and then exposed to ts in the air.
A sintered body was obtained by firing at oo°C. Next, the above-mentioned sintered body was packed into the firing pod again, and 82 10 mm 01%, th 9
A heat treatment was performed for 2 hours at 1000''C in a reducing atmosphere of 0yo1% to obtain semiconductor porcelain.

更に平均粒径50jmのアルミナ粉末(融点:約201
5℃)および、平均粒径501のジルコニア粉末(融点
:約2677℃)を準備し、次のB−dの方法により上
記で得られた半導体磁器の表面に付着させた。
Furthermore, alumina powder with an average particle size of 50 m (melting point: approximately 201
5° C.) and zirconia powder (melting point: about 2677° C.) with an average particle size of 501° C. were prepared and adhered to the surface of the semiconductor ceramic obtained above by the following method B-d.

a、上記粉末の入った容器中に上記の半導体磁器を入れ
、該容器を振動させて、半導体磁器の表面に上記粉末を
付着させた。
a. The above semiconductor porcelain was placed in a container containing the above powder, and the container was vibrated to cause the above powder to adhere to the surface of the semiconductor porcelain.

b、粉砕したクマロン樹脂粉末と上記粉末とが入った容
器中に上記の半導体磁器を入れて混合し、発生した静電
気により該半導体磁器の表面に上記粉末および上記クマ
ロン樹脂粉末を付着させた。
b. The above semiconductor porcelain was placed in a container containing the pulverized coumaron resin powder and the above powder, and mixed, and the above powder and the coumaron resin powder were attached to the surface of the semiconductor porcelain by the generated static electricity.

C0上記粉末と有機バインダーであるPVA水溶液とを
混合し、この中に上記の半導体磁器を浸したのち引上げ
て乾燥させ、上記半導体磁器の表面に上記粉末を付着さ
せた。
The above C0 powder and an aqueous PVA solution as an organic binder were mixed, and the above semiconductor porcelain was immersed in the mixture and then pulled up and dried to adhere the above powder to the surface of the semiconductor porcelain.

d、上記粉末と有機バインダーであるPVA水溶液とを
混合した液を上記半導体磁器の表面に噴霧したのち乾燥
させ、上記半導体磁器の表面に上記粉末を付着させた。
d. A liquid mixture of the powder and an aqueous PVA solution as an organic binder was sprayed onto the surface of the semiconductor ceramic and dried to adhere the powder to the surface of the semiconductor ceramic.

上記で得られた半導体磁器を用いて、第1表に示す実施
例1〜4及び比較例1〜3の条件で再び大気中900℃
で2時間熱処理して表面再酸化型半導体磁器を得た。尚
、第1表において、スペーサーとは、上記粉末によって
形成されるスペーサーを意味する。上記で得られた表面
再酸化型半導体磁器の両生面にそれぞれ6m■φの円形
にAg電極材料ペーストを塗布し1.800℃で10分
間焼き付は処理して表面再酸化型半導体磁器コンデンサ
試゛料を得た。
Using the semiconductor porcelain obtained above, the temperature was increased to 900°C in the atmosphere again under the conditions of Examples 1 to 4 and Comparative Examples 1 to 3 shown in Table 1.
A heat treatment was performed for 2 hours to obtain a surface reoxidized semiconductor porcelain. In Table 1, the term "spacer" means a spacer formed from the above powder. Ag electrode material paste was applied in a circular shape of 6 m φ on both sides of the surface reoxidation type semiconductor porcelain obtained above, and baked at 1.800℃ for 10 minutes to test the surface reoxidation type semiconductor porcelain capacitor. I got a fee.

このようにして得られたコンデンサ試料6500個につ
いて、測定周波数1kHX、測定電圧0.4VC’静電
容量C[nF] 、g[lt失1*nδ(%) 、オよ
び直流50Vの電圧を15秒印加した後の絶縁抵抗IR
(MQIを測定し、平均値=1バラツキ(3σ/マ)、
およびひとサヤ当たりの処理量の比すなわち処理能力比
を求めて、その結果を第2表に示した。
For the 6,500 capacitor samples obtained in this way, the measurement frequency was 1kHz, the measurement voltage was 0.4VC', the capacitance C[nF], g[lt loss 1*nδ(%), O, and the voltage of 50V DC were measured at 15 Insulation resistance IR after applying for seconds
(Measure MQI, average value = 1 variation (3σ/ma),
The ratio of the throughput per pod, that is, the throughput ratio, was determined and the results are shown in Table 2.

第1表 第2表 第2表に示される通り、本発明の実施例1〜4で得られ
た試料はいずれも、静電容量、誘電損失、絶縁抵抗とと
もに比較例1に示す従来の平詰め方法による試料と同等
の特性を有し、また静電容量および誘電損失では、比較
例2〜3で得られた試料よりもバラツキが小さかった。
As shown in Table 1, Table 2, and Table 2, all the samples obtained in Examples 1 to 4 of the present invention have capacitance, dielectric loss, insulation resistance, and the conventional flat packing shown in Comparative Example 1. It had the same characteristics as the samples obtained by this method, and had smaller variations in capacitance and dielectric loss than the samples obtained in Comparative Examples 2 and 3.

また、ひとサヤ当たりの処理量の点では、従来の平詰め
方法に比べて7倍以上の処理量であった。
In addition, in terms of the throughput per pod, the throughput was more than seven times that of the conventional flat packing method.

上記実施例では、粉末としてアルミナあるいはジルコニ
アを用いたが、本発明はこれに限定されるものではなく
、金属あるいは金属の酸化物、炭化物、窒化物のうち、
融点が、該熱処理温度よりも 100℃以上高いものの
粉末の中から種々選択して用いることが可能である。
In the above embodiments, alumina or zirconia was used as the powder, but the present invention is not limited to this. Among metals, metal oxides, carbides, and nitrides,
It is possible to use various powders selected from powders having a melting point 100° C. or more higher than the heat treatment temperature.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、上記実施例の結果に示される通り、特
性バラツキの増加や特性の悪化等を生ずることなく、表
面再酸化型半導体磁器コンデンサを効率良く製造するこ
とができる。
According to the present invention, as shown in the results of the above examples, surface reoxidation type semiconductor ceramic capacitors can be efficiently manufactured without increasing variation in characteristics or deteriorating characteristics.

Claims (1)

【特許請求の範囲】[Claims]  半導体磁器の原材料を混合したのち成形し、得られた
成形体を大気中で焼成し、還元性雰囲気中で熱処理した
のち再び大気中で熱処理して表面を再酸化し、得られた
表面再酸化型半導体磁器の表面に一対の電極層を形成し
てなる表面再酸化型半導体磁器コンデンサの製造方法に
おいて、前記半導体磁器を再び大気中で熱処理する際に
、金属あるいは金属の酸化物、炭化物、窒化物のうち、
融点が、前記熱処理温度よりも100℃以上高いものの
粉末を準備し、前記半導体磁器同士の間に前記粉末が存
在するように重ね合せた状態で熱処理することを特徴と
する表面再酸化型半導体磁器コンデンサの製造方法。
The raw materials for semiconductor porcelain are mixed and then molded, the resulting molded body is fired in the air, heat treated in a reducing atmosphere, and then heat treated again in the air to reoxidize the surface. In a method for manufacturing a surface reoxidation type semiconductor ceramic capacitor in which a pair of electrode layers is formed on the surface of a type semiconductor ceramic, metals or metal oxides, carbides, and nitrides are removed when the semiconductor ceramic is heat-treated in the atmosphere again. Of things,
A surface reoxidation type semiconductor porcelain characterized by preparing a powder having a melting point higher than the heat treatment temperature by 100°C or more, and heat-treating the semiconductor porcelain in a stacked state so that the powder exists between the semiconductor porcelains. Method of manufacturing capacitors.
JP8177289A 1989-03-31 1989-03-31 Manufacture of surface reoxidation type semiconductor porcelain capacitor Granted JPH02260511A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8177289A JPH02260511A (en) 1989-03-31 1989-03-31 Manufacture of surface reoxidation type semiconductor porcelain capacitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8177289A JPH02260511A (en) 1989-03-31 1989-03-31 Manufacture of surface reoxidation type semiconductor porcelain capacitor

Publications (2)

Publication Number Publication Date
JPH02260511A true JPH02260511A (en) 1990-10-23
JPH0524649B2 JPH0524649B2 (en) 1993-04-08

Family

ID=13755766

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8177289A Granted JPH02260511A (en) 1989-03-31 1989-03-31 Manufacture of surface reoxidation type semiconductor porcelain capacitor

Country Status (1)

Country Link
JP (1) JPH02260511A (en)

Also Published As

Publication number Publication date
JPH0524649B2 (en) 1993-04-08

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