JPH0225498B2 - - Google Patents

Info

Publication number
JPH0225498B2
JPH0225498B2 JP56179706A JP17970681A JPH0225498B2 JP H0225498 B2 JPH0225498 B2 JP H0225498B2 JP 56179706 A JP56179706 A JP 56179706A JP 17970681 A JP17970681 A JP 17970681A JP H0225498 B2 JPH0225498 B2 JP H0225498B2
Authority
JP
Japan
Prior art keywords
silicone rubber
rubber layer
printing plate
photosensitive
lithographic printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56179706A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5882247A (ja
Inventor
Takao Kinashi
Yoichi Shimokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP17970681A priority Critical patent/JPS5882247A/ja
Publication of JPS5882247A publication Critical patent/JPS5882247A/ja
Publication of JPH0225498B2 publication Critical patent/JPH0225498B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP17970681A 1981-11-11 1981-11-11 湿し水不要平版印刷版原板 Granted JPS5882247A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17970681A JPS5882247A (ja) 1981-11-11 1981-11-11 湿し水不要平版印刷版原板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17970681A JPS5882247A (ja) 1981-11-11 1981-11-11 湿し水不要平版印刷版原板

Publications (2)

Publication Number Publication Date
JPS5882247A JPS5882247A (ja) 1983-05-17
JPH0225498B2 true JPH0225498B2 (enrdf_load_stackoverflow) 1990-06-04

Family

ID=16070447

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17970681A Granted JPS5882247A (ja) 1981-11-11 1981-11-11 湿し水不要平版印刷版原板

Country Status (1)

Country Link
JP (1) JPS5882247A (enrdf_load_stackoverflow)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5426923B2 (enrdf_load_stackoverflow) * 1972-03-21 1979-09-06
JPS4968803A (enrdf_load_stackoverflow) * 1972-11-02 1974-07-03
JPS5525418B2 (enrdf_load_stackoverflow) * 1972-12-20 1980-07-05
JPS5589842A (en) * 1978-12-28 1980-07-07 Toray Ind Inc Retouching method for plate face of waterless lithographic printing plate
JPS55124148A (en) * 1979-03-16 1980-09-25 Toray Ind Inc Manufacture of lithographic printing original plate

Also Published As

Publication number Publication date
JPS5882247A (ja) 1983-05-17

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