JPH02249686A - Data recording medium for optical card - Google Patents
Data recording medium for optical cardInfo
- Publication number
- JPH02249686A JPH02249686A JP1073092A JP7309289A JPH02249686A JP H02249686 A JPH02249686 A JP H02249686A JP 1073092 A JP1073092 A JP 1073092A JP 7309289 A JP7309289 A JP 7309289A JP H02249686 A JPH02249686 A JP H02249686A
- Authority
- JP
- Japan
- Prior art keywords
- recording
- thin film
- erasing
- recording medium
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims description 43
- 239000000203 mixture Substances 0.000 claims abstract description 24
- 238000001816 cooling Methods 0.000 claims abstract description 18
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 9
- 229910052709 silver Inorganic materials 0.000 claims abstract description 9
- 229910052714 tellurium Inorganic materials 0.000 claims abstract description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 5
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 5
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 5
- 239000004332 silver Substances 0.000 claims abstract description 5
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 3
- 239000010409 thin film Substances 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 28
- 238000009792 diffusion process Methods 0.000 claims description 13
- 230000002265 prevention Effects 0.000 claims description 9
- 230000001678 irradiating effect Effects 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 abstract description 8
- 239000000956 alloy Substances 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 8
- 230000035945 sensitivity Effects 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 229910052735 hafnium Inorganic materials 0.000 abstract description 3
- 229910052737 gold Inorganic materials 0.000 abstract description 2
- 239000012528 membrane Substances 0.000 abstract 6
- 239000010410 layer Substances 0.000 description 42
- 239000010408 film Substances 0.000 description 30
- 239000011521 glass Substances 0.000 description 13
- 238000002425 crystallisation Methods 0.000 description 12
- 230000008025 crystallization Effects 0.000 description 12
- 239000011241 protective layer Substances 0.000 description 11
- 238000004544 sputter deposition Methods 0.000 description 11
- 229920000515 polycarbonate Polymers 0.000 description 10
- 239000004417 polycarbonate Substances 0.000 description 10
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 239000005297 pyrex Substances 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 230000003068 static effect Effects 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000000691 measurement method Methods 0.000 description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 5
- 239000004926 polymethyl methacrylate Substances 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 238000001953 recrystallisation Methods 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910002688 Ag2Te Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 229910001215 Te alloy Inorganic materials 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910052774 Proactinium Inorganic materials 0.000 description 1
- 229910017629 Sb2Te3 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000005280 amorphization Methods 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000004993 emission spectroscopy Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000013028 medium composition Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は光カード用情報記録媒体に関するもので、特に
レーザ光や電子線などのエネルギービームの照射により
、情報の記録を行う光カードに好適に使用される情報記
録媒体に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an information recording medium for optical cards, and is particularly suitable for optical cards that record information by irradiation with energy beams such as laser beams and electron beams. Regarding information recording media used for.
[従来の技術]
光情報記録媒体の記録方式で、結晶と非晶のような媒体
の相変化に伴う光学特性の差を記録に利用する方式は、
媒体自体の変形、蒸発による汚染などの問題がなく、保
護膜により耐久性を向上させることも可能であり、In
−8e系薄膜、Te低酸化物薄膜、5b−Te系薄膜、
Te−Ge系薄膜など種々の材料が提案されている。例
えば、Te−Ge−8n薄膜(特開昭61−3324号
公報など)、Teを主成分とするT e gos b
l08e1o記録薄膜(特開昭61−145737号公
報など)、5b2Seなどの組成の5b−8e膜(特開
昭60−15549号など)、またTe−5bの2元合
金記録膜(86年応用物理学会講演集 29a−ZE−
3,4)などが提案されている。[Prior Art] A recording method for optical information recording media that utilizes the difference in optical properties due to phase change between crystalline and amorphous media for recording.
There are no problems such as deformation of the medium itself or contamination due to evaporation, and it is possible to improve durability with a protective film.
-8e-based thin film, Te low oxide thin film, 5b-Te-based thin film,
Various materials such as Te-Ge thin films have been proposed. For example, Te-Ge-8n thin film (Japanese Unexamined Patent Publication No. 61-3324, etc.), Te gos b whose main component is Te
l08e1o recording thin film (Japanese Unexamined Patent Publication No. 145737/1986, etc.), 5b-8e film with composition such as 5b2Se (Japanese Unexamined Patent Application No. 60-15549, etc.), and Te-5b binary alloy recording film (published in Applied Physics in 1986). Academic conference collection 29a-ZE-
3, 4), etc. have been proposed.
[発明が解決しようとする課題]
しかしながら、上記従来技術による記録媒体には次のよ
うな問題点があった。[Problems to be Solved by the Invention] However, the recording medium according to the above-mentioned prior art has the following problems.
すなわち、Te−Ge−8nを記録膜としたものでは、
適切な消去特性と実用的な記録感度を両立させることが
困難で実用性に乏しく、またTe8oSb1oSe1o
記録薄膜、5b2Seなどの組成の5b−8e合金膜な
どでは、実用的な消去速度範囲で満足できる消去特性を
実現することが容易でなかったり、記録と消去の繰返し
に伴ってノイズが増加し記録の信号品質が低下する等の
問題があった。またSb2 Te3合金を記録膜に用い
たものは、結晶化温度が低く記録の保存性に問題がある
など実用性に乏しいものであった。That is, in the case of a recording film made of Te-Ge-8n,
It is difficult to achieve both appropriate erasing characteristics and practical recording sensitivity, and it is impractical, and Te8oSb1oSe1o
With recording thin films, such as 5b-8e alloy films with compositions such as 5b2Se, it is not easy to achieve satisfactory erasing characteristics in a practical erasing speed range, and noise increases with repeated recording and erasing. There were problems such as deterioration of signal quality. Furthermore, recording films using Sb2Te3 alloys had low crystallization temperatures and problems with storage stability of recordings, making them impractical.
更に、この様な記録媒体では用途によりかなり異なる特
性が要求されるため、例えば光カード用として媒体特性
を見た場合、必ずしも光ディスクに最適な媒体特性がそ
のまま好ましい特性であるとは言い難い。即ち、媒体の
送り速度(記録又は消去の速度)やビーム径が光カード
と光ディスクでは異なるため、非晶化や結晶化の最適条
件が大きく異なり、同じ媒体組成で両者の特性を共に満
足させることは容易ではない。Furthermore, since such recording media are required to have considerably different characteristics depending on their use, when looking at the medium characteristics for, for example, an optical card, it is difficult to say that the medium characteristics that are optimal for an optical disk are necessarily the preferable characteristics. In other words, since the medium feeding speed (recording or erasing speed) and beam diameter are different between optical cards and optical disks, the optimum conditions for amorphization and crystallization are significantly different, and it is difficult to satisfy both characteristics with the same medium composition. is not easy.
特に、Ag−8b−Teの3元系に限定すると、特開昭
62−152786号公報や特開昭64−10437号
公報の提案が見られるが、必ずしも光カード用記録媒体
として好ましい特性を持つとは言えない。In particular, when limiting to the Ag-8b-Te ternary system, proposals can be found in JP-A-62-152786 and JP-A-64-10437, but they do not necessarily have favorable characteristics as a recording medium for optical cards. It can not be said.
すなわち、特開昭62−152786号公報では、Ag
、Sb、Teの3元素も含む多数の元素の組み合わせ、
即ち結果的にほぼ全元素の可能な組み合わせを全て網羅
した材料で、良好な特性が得られると主張しているが、
実際の記録媒体では元素の種類とその組成を最適化する
ことにより初めて優れた特性を付与できるものであり、
かつごく一部の実施例を除き、実際にどの様な優れた特
性が発現できるのかの具体的な検討や開示が何等なされ
ていない。また本公報の趣旨では、高速での記録消去が
可能な媒体として重要な特性である高速結晶化速度を実
現することを主要な目的としており、この特性は光カー
ド用媒体としては必ずしも重要な特性とは言えず、場合
によっては好ましくない特性と言える。すなわち、光カ
ード用媒体では、比較的低速度で長時間のレーザ照射を
行い、かつ比較的大きいビーム径を有する光学系を用い
ているため、レーザ照射で与えられた熱を十分速やかに
除き難いという制約があり、これらの条件下でも再結晶
が生じにくく良好な非晶化記録が可能であるという特性
が重要となる。この場合、高速結晶化という特性はむし
ろ逆に作用し、せっかく形成した非晶状態が残った熱で
再結晶されるのを助長する方向にあるため好ましいとは
言い難い。That is, in JP-A-62-152786, Ag
, a combination of many elements including the three elements Sb and Te,
In other words, it is claimed that the result is a material that covers all possible combinations of almost all elements, and that good properties can be obtained.
In actual recording media, excellent properties can only be imparted by optimizing the types of elements and their composition.
Moreover, with the exception of a few examples, there has been no specific study or disclosure of what kind of excellent properties can actually be achieved. Furthermore, the purpose of this publication is to achieve a high crystallization speed, which is an important characteristic for a medium that can record and erase data at high speed, and this characteristic is not necessarily an important characteristic for an optical card medium. However, in some cases, it can be said to be an undesirable characteristic. In other words, since optical card media use an optical system that performs laser irradiation at a relatively low speed for a long time and has a relatively large beam diameter, it is difficult to remove the heat given by laser irradiation sufficiently quickly. Therefore, it is important to have the property that even under these conditions recrystallization is difficult to occur and good amorphous recording is possible. In this case, the characteristic of high-speed crystallization works in the opposite direction, and tends to promote recrystallization of the amorphous state formed by the remaining heat, which is not desirable.
また特開昭64−10437号公報では、Ag−8b−
Te3元系としているものの、組成を限定しない場合に
は前述したような特性の最適化が十分行われているとは
言い難く、組成を限定したとしても高速結晶化速度実現
を目的とした最適化であり、前述と同様な意味で光カー
ドに適した媒体とは言い難い。Furthermore, in Japanese Patent Application Laid-open No. 10437/1983, Ag-8b-
Although it is a Te ternary system, if the composition is not limited, it is difficult to say that the properties described above have been optimized sufficiently, and even if the composition is limited, optimization aimed at achieving a high crystallization rate is difficult. Therefore, in the same sense as mentioned above, it is difficult to say that it is a medium suitable for optical cards.
本発明は、かかる問題点を改善し、記録の感度が良好で
あり、かつ実用性のある消去特性を持つ、光カード用媒
体として良好な特性を備えた、信頼性の高い光カード用
情報記録媒体を提供することを目的とする。The present invention solves these problems and provides a highly reliable information recording medium for optical cards, which has good recording sensitivity and practical erasing characteristics, and has good characteristics as a medium for optical cards. The purpose is to provide a medium.
[課題を解決するための手段]
かかる本発明の目的は、基板上に形成された記録薄膜に
エネルギービームを照射し、直接又は間接に発生する熱
により、上記薄膜の光学特性を変化せしめて、情報の記
録を行う光カード用情報記録媒体において、該記録薄膜
が銀(Ag)、アンチモン(S b)およびテルル(T
e)の3元素から主としてなり、かつその組成が、一般
式%式%
X:薄膜中のAgの原子数%
y:薄膜中のsbの原子数%
2:薄膜中のTeの原子数%
と表した場合、2の範囲が20≦2≦38の場合には、
x、yの範囲がそれぞれ5≦X≦50,32≦y≦60
であり、2の範囲が38〈z≦55の場合には、X、y
の範囲がそれぞれ5≦X≦25.42≦y≦60であり
、かつx+y+z=100であることを特徴とする光カ
ード用情報記録媒体により達成される。[Means for Solving the Problems] An object of the present invention is to irradiate a recording thin film formed on a substrate with an energy beam and change the optical characteristics of the thin film by the heat generated directly or indirectly, In an information recording medium for an optical card that records information, the recording thin film is made of silver (Ag), antimony (Sb), and tellurium (T).
It mainly consists of the three elements e), and its composition is expressed by the general formula %. If the range of 2 is 20≦2≦38, then
The range of x and y is 5≦X≦50, 32≦y≦60, respectively.
, and if the range of 2 is 38〈z≦55, then X, y
This is achieved by an information recording medium for an optical card, characterized in that the ranges of 5≦X≦25.42≦y≦60 and x+y+z=100.
すなわち、本発明において使用される記録薄膜は、銀(
Ag)、アンチモン(s b)およびテルル(Te)の
3元素から主としてなり、かつその組成が、一般式
%式%
X:薄膜中のAgの原子数%
y:薄膜中のsbの原子数%
2:薄膜中のTeの原子数%
と表した場合、2の範囲が20≦2≦38の場合には、
x、 yの範囲がそれぞれ5≦X≦50,32≦y≦
60であり、2の範囲が38〈z≦55の場合には、x
、yの範囲がそれぞれ5≦X≦25.42≦y≦60で
あり、かっx+y+z=100を満足してなるものであ
る。That is, the recording thin film used in the present invention is made of silver (
Ag), antimony (sb), and tellurium (Te), and its composition is expressed by the general formula % X: number of Ag atoms in the thin film % y: number of sb atoms in the thin film % 2: When expressed as atomic number % of Te in the thin film, if the range of 2 is 20≦2≦38,
The range of x and y is 5≦X≦50, 32≦y≦, respectively.
60 and the range of 2 is 38〈z≦55, then x
, y are in the range of 5≦X≦25.42≦y≦60, and x+y+z=100.
本発明者らが鋭意検討したところ、20≦2≦38の場
合には、Sb2TeとAg2Teを結ぶ線上の組成を中
心とした領域が良好であり、38〈2≦55の場合には
、5bTeとAgとを結ぶ線上の組成を中心とした領域
が光カード用媒体とし優れた特性を持つとの結論に至っ
た。Xやyの適切な範囲は2の各々の範囲に応じ異なる
が、いずれも程度の差があれ、Xが範囲外で多い場合に
は消去が困難になるなど本発明で述べるような優れた記
録特性が発現しにくくなり好ましくなく、またyが多い
場合には過剰なsbが析出するなど不可逆的な特性変化
が生じ易く、記録と消去の繰返し性が低下するなどして
好ましくない。またXやyが少ない場合には適切な結晶
化温度が得られなくなったりして好ましくない。As a result of intensive studies by the present inventors, in the case of 20≦2≦38, the region centered on the composition on the line connecting Sb2Te and Ag2Te is good, and in the case of 38<2≦55, the region with a composition centered on the line connecting Sb2Te and Ag2Te is good. It was concluded that the region centered on the composition on the line connecting Ag and Ag has excellent properties as a medium for optical cards. Appropriate ranges for X and y differ depending on each range in 2, but there are differences in degree, and if there are many Xs outside the range, it will be difficult to erase, etc. Excellent records as described in the present invention This is undesirable because it makes it difficult to develop the characteristics, and when y is large, irreversible changes in characteristics such as excessive sb precipitation tend to occur, and the repeatability of recording and erasing decreases, which is undesirable. Further, if the amount of X or y is small, it may become impossible to obtain an appropriate crystallization temperature, which is not preferable.
本発明の効果をより好ましく発現させるには、2の範囲
は25≦2≦38および38くz≦50としたほうがよ
り好ましい。25≦2≦38の場合には、7≦X≦40
.32≦y≦55の範囲であることがより好ましい。3
8〈z≦50の場合には、Xの範囲は7≦X≦25の範
囲であることがより好ましい。In order to more preferably exhibit the effects of the present invention, the range of 2 is more preferably 25≦2≦38 and 38×≦50. If 25≦2≦38, 7≦X≦40
.. More preferably, the range is 32≦y≦55. 3
When 8<z≦50, the range of X is more preferably within the range of 7≦X≦25.
記録薄膜の膜厚は、特に限定されないが、例えば記録膜
の表面と裏面での膜厚干渉効果を利用する場合には、7
0〜120 nmの範囲に設定できる。また、記録膜に
隣接して、例えばその裏面側に反射層としての役割も持
つ冷却層を設ける場合には、約半分の膜厚にして同様な
効果を期待できる。The thickness of the recording thin film is not particularly limited, but for example, when utilizing the film thickness interference effect on the front and back surfaces of the recording film,
It can be set in the range of 0 to 120 nm. Furthermore, when a cooling layer that also serves as a reflective layer is provided adjacent to the recording film, for example on the back side thereof, the same effect can be expected with a film thickness of about half.
記録薄膜に隣接して、好ましくはその裏面側に冷却層を
設けることができる。A cooling layer can be provided adjacent to the recording thin film, preferably on the back side thereof.
この冷却層は、記録層から生じる熱の拡散を容易にし、
記録時の溶融部分の冷却速度を速め、非晶マークの形成
を容易にするのに有効である。さらには、金属や金属合
金などの光学的に高い反射率を有する材料を用いれば、
反射層としての役割も付与することが可能であり、記録
層の膜厚を約半分にして、記録の感度を高めるなどの効
果も期待できる。冷却層の膜厚は特に限定されないが、
10〜80nmが実用的にも好ましい。冷却層の材料と
しては、Sb、Bi、Sn、Au、AI。This cooling layer facilitates the diffusion of heat generated from the recording layer,
This is effective in increasing the cooling rate of the melted portion during recording and facilitating the formation of amorphous marks. Furthermore, if materials with high optical reflectance such as metals and metal alloys are used,
It can also serve as a reflective layer, and can be expected to reduce the thickness of the recording layer by about half, increasing recording sensitivity. The thickness of the cooling layer is not particularly limited, but
10 to 80 nm is also preferable from a practical standpoint. Materials for the cooling layer include Sb, Bi, Sn, Au, and AI.
Ti、Ni、Cr、PbおよびHf等の金属又はそれら
の合金、あるいは金属の酸化物、炭化物、窒化物、カル
コゲン化物等のいずれかと金属との混合物などが使用で
きる。特にA u 、A 1 s Hf 。Metals such as Ti, Ni, Cr, Pb, and Hf, alloys thereof, or mixtures of metals with any of metal oxides, carbides, nitrides, chalcogenides, etc. can be used. Especially A u , A 1 s Hf .
NiおよびCrやそれらの合金等は、膜の形成が容易で
あり、材料選択により熱伝導度を広範囲に調整可能であ
るため、本発明の光記録媒体を種々の目的に沿って設計
する場合にその本来の優れた特性を発現させるのに有効
である。Ni, Cr, their alloys, etc. are easy to form into films, and their thermal conductivity can be adjusted over a wide range by material selection. It is effective in bringing out its original excellent characteristics.
本発明に用いられる基板としてはポリメチルメタフリレ
ート樹脂、ポリカーボネイト樹脂、エポキシ樹脂、ポリ
オレフィン樹脂、ポリ塩化ビニル樹脂、ポリエステル樹
脂、スチレン樹脂などの高分子樹脂やガラス板、あるい
はA1等の金属板が挙げられる。The substrate used in the present invention may be a polymer resin such as polymethyl methacrylate resin, polycarbonate resin, epoxy resin, polyolefin resin, polyvinyl chloride resin, polyester resin, or styrene resin, a glass plate, or a metal plate such as A1. Can be mentioned.
本発明の記録媒体は本来の特性を効果的に発現させるた
め、基板と記録層の間や媒体の表面等に保護層や、記録
層と冷却層の間に拡散防止層が形成できる。In order to effectively exhibit the original characteristics of the recording medium of the present invention, a protective layer can be formed between the substrate and the recording layer or on the surface of the medium, and a diffusion prevention layer can be formed between the recording layer and the cooling layer.
保護層は、5i02、ZrC,ITO,ZnS。The protective layer is 5i02, ZrC, ITO, and ZnS.
M g F 2等の無機膜やそれらの混合膜、紫外線硬
化膜等を、蒸着、スパッタ、スピンコード等の方法を用
いて形成したり、エポキシやポリカーボネイトなどの樹
脂、フィルム、ガラスなどを張合わせたり、ラミネート
しても良い。拡散防止層は耐湿熱性や耐酸化性などの効
果のみならず、記録層と反射層の間での元素拡散を抑制
し特性劣化を押さえる効果があり、保護層と同様な材料
が使用できる。Inorganic films such as M g F 2, mixed films thereof, ultraviolet cured films, etc. are formed using methods such as vapor deposition, sputtering, and spin cord, and resins such as epoxy and polycarbonate, films, and glass are laminated together. Or you can laminate it. The anti-diffusion layer not only has effects such as heat-and-moisture resistance and oxidation resistance, but also has the effect of suppressing elemental diffusion between the recording layer and the reflective layer and suppressing characteristic deterioration, and can be made of the same material as the protective layer.
このような保護層および拡散防止層としては、例えば、
ZnSとM g F 2の混合膜は、耐熱性が良好で、
湿熱下での耐久性が優れており、さらには記録と消去の
繰返しによる記録層の劣化を抑制し、消去特性を改善す
るなどの効果があり好ましいものである。また、Zr、
Ta、TiおよびWから選ばれた少なくとも一種の金属
と、ケイ素、酸素および炭素を含む成分で構成される膜
は、各成分の好ましい含有量を上記金属が3〜40原子
%、Stが5〜30原子%、0が5〜70原子%。Such protective layers and diffusion prevention layers include, for example,
The mixed film of ZnS and MgF2 has good heat resistance,
It is preferable because it has excellent durability under moist heat, and further has the effect of suppressing deterioration of the recording layer due to repeated recording and erasing and improving erasing characteristics. Also, Zr,
A film composed of at least one metal selected from Ta, Ti, and W and a component containing silicon, oxygen, and carbon has a preferable content of each component of 3 to 40 at% of the above metal and 5 to 5 at% of St. 30 at%, 0 at 5 to 70 at%.
Cが3〜40原子%の範囲となすことにより、記録層の
膜質劣化や性能劣化を抑制できると共に記録層との接着
力を高める効果が期待でき好ましい。By setting C in the range of 3 to 40 atomic %, it is possible to suppress deterioration of the film quality and performance of the recording layer and to increase the adhesive force with the recording layer, which is preferable.
これらの保護層および拡散防止層により、耐久性や耐吸
湿性の向上、記録層の保護コート、基板からの剥離や盛
り上がり等の変形防止、融解、蒸発、拡散等による媒体
の消失防止、等の効果や更には非晶と結晶の可逆変化を
利用する場合の繰返し性の向上等の効果が期待できる。These protective layers and diffusion prevention layers improve durability and moisture absorption resistance, protect the recording layer, prevent deformation such as peeling or swelling from the substrate, and prevent loss of the medium due to melting, evaporation, diffusion, etc. Furthermore, effects such as improved repeatability when using reversible changes between amorphous and crystalline materials can be expected.
[製造方法]
本発明の記録媒体の作製法には種々の方法が挙げられる
が、ここでは−例としてマグネトロンスパッタ法につい
て説明する。[Manufacturing Method] Although there are various methods for manufacturing the recording medium of the present invention, a magnetron sputtering method will be described here as an example.
本発明の記録媒体は、1.2mm厚のパイレックスガラ
スやPMMA板、0.4mm厚のポリカーボネイト(以
下PCという)板、又は162mm厚、13cm直径、
1.6μmピッチのスパイラルグループ付きのポリカー
ボネイト(pc)製の基板を10〜150rpmで回転
させ、組成や膜厚の均一化を図りながら、例えば、保護
層、記録層、拡散防止層あるいは冷却層を各々目的に応
じて順次積層形成する。スパッタ条件は、例えばスパッ
タガスにアルゴンガスを用い、RF出力数十〜lkW、
真空度8xlO−”Pa 〜1xlQ−IPa程度の条
件範囲で行なうことができる。The recording medium of the present invention is a 1.2 mm thick Pyrex glass or PMMA plate, a 0.4 mm thick polycarbonate (hereinafter referred to as PC) plate, or a 162 mm thick and 13 cm diameter,
A polycarbonate (PC) substrate with spiral groups of 1.6 μm pitch is rotated at 10 to 150 rpm to form, for example, a protective layer, a recording layer, a diffusion prevention layer, or a cooling layer while uniforming the composition and film thickness. Each layer is sequentially layered depending on the purpose. The sputtering conditions are, for example, using argon gas as the sputtering gas, RF output of several tens to 1 kW,
This can be carried out under a vacuum degree of 8xlO-''Pa to 1xlQ-IPa.
保護層や拡散防止層は、5f02、ZrC,ITOlZ
nSおよびMgF2や、それらの混合組成のターゲット
を用いて、水晶振動子膜厚計でモニターしながら、単独
または同時スパッタして形成すれば良い。ここで、IT
O膜の場合にはスパッタガスをAr :O=9 : 1
(モル比)の混合ガスとし、RF又はDCのスパッタ
法を用いた。DCスパッタ法では、出力を200〜40
0Wとした。The protective layer and diffusion prevention layer are 5f02, ZrC, ITOlZ.
It may be formed by sputtering alone or simultaneously using a target having a composition of nS and MgF2, or a mixture thereof, while monitoring with a crystal resonator film thickness meter. Here, IT
In the case of O film, the sputtering gas is Ar:O=9:1
(molar ratio), and RF or DC sputtering was used. In the DC sputtering method, the output is 200 to 40
It was set to 0W.
記録層はAg、Sb、TeおよびAg−Te合金、5b
−Te合金などを水晶膜厚計でモニターしながら同時ス
パッタして所定組成の記録膜とする。ターゲット部材に
は、他に所定薄膜組成となるように勘案した(Ag、S
b、Te)の3元素ターゲットを用いても良い。Recording layer is Ag, Sb, Te and Ag-Te alloy, 5b
-Te alloy or the like is simultaneously sputtered while monitoring with a crystal film thickness meter to form a recording film of a predetermined composition. In addition, the target member was designed to have a predetermined thin film composition (Ag, S
A three-element target of b, Te) may also be used.
冷却層はAu、Sb、Sn、Bi、Pb、Al。The cooling layer is made of Au, Sb, Sn, Bi, Pb, and Al.
Ti、Ni、CrおよびHf等の金属やそれらの合金を
記録薄膜と同様に形成すれば良い。Metals such as Ti, Ni, Cr, and Hf, or alloys thereof may be formed in the same manner as the recording thin film.
これらのスパッタ条件は当然ながら装置により一定では
なく上記以外の条件で作製しても良いことは言うまでも
なく、作製方法としても、例えば真空蒸着法や電子ビー
ム蒸着法などの薄膜作製技術を用いて良いことは言うま
でもない。It goes without saying that these sputtering conditions are not constant depending on the equipment and may be fabricated under conditions other than those mentioned above.As for the fabrication method, for example, thin film fabrication techniques such as vacuum evaporation or electron beam evaporation may be used. Needless to say.
[用途]
このようにして得られた本発明の記録媒体は、特に光カ
ード用の情報記録媒体として好ましい特性を備えたもの
である。さらには、これ以外にも光学特性の差を記録に
利用するあらゆる用途、例えば、光ディスク、光テープ
、光フロッピー、マイクロフィッシュ、レーザC0M等
の情報記録媒体、にも適用可能なものである。[Applications] The recording medium of the present invention thus obtained has characteristics particularly suitable as an information recording medium for optical cards. Furthermore, it is also applicable to all other uses in which differences in optical properties are used for recording, such as information recording media such as optical disks, optical tapes, optical floppies, microfiche, and laser COMs.
[測定法]
■ 転移温度
ガラス基板上に作製した記録薄膜上に一対の電極を設け
、その一端に30にΩの抵抗を直列に接続する。残る電
極と抵抗の両端に5vの一定電圧を印加し、電圧計で抵
抗の両端電圧を測定し、これより薄膜の印加電圧と電流
を求め抵抗値を算出する。次に加熱炉を用い、温度制御
器で約り0℃/分の速度で基板全体を均一に加熱昇温し
ながら抵抗を測定し、高抵抗から低抵抗へ変化する温度
を求め転移温度とする。[Measurement method] (1) A pair of electrodes is provided on a recording thin film prepared on a transition temperature glass substrate, and a resistor of 30Ω is connected in series to one end of the electrode. A constant voltage of 5 V is applied across the remaining electrode and the resistor, and the voltage across the resistor is measured with a voltmeter. From this, the applied voltage and current of the thin film are determined to calculate the resistance value. Next, using a heating furnace, measure the resistance while uniformly heating the entire substrate at a rate of about 0°C/min with a temperature controller, and find the temperature at which the resistance changes from high resistance to low resistance, which is determined as the transition temperature. .
■ 組成
ガラス基板上に作製した記録薄膜を王水、硝酸等で溶解
させ基板から分離させた。この溶液を高周波誘導結合プ
ラズマ(ICP)発光分光分析法(セイコー電子(株)
SPS−1100型)により、各元素の含有量を求め、
組成比を算出した。(2) Composition The recording thin film prepared on the glass substrate was dissolved with aqua regia, nitric acid, etc. and separated from the substrate. This solution was analyzed using high-frequency inductively coupled plasma (ICP) emission spectrometry (Seiko Electronics Co., Ltd.).
SPS-1100 model) to determine the content of each element,
The composition ratio was calculated.
■ 動的記録・消去特性
PC製のグループ付基板上に記録薄膜を形成したものを
試料とした。評価装置は波長830 nmの半導体レー
ザを組み込んだ光ヘッドとディスク回転装置およびそれ
らの制御回路で主に構成されている。光ヘッドは回転す
るディスク基板を通して記録膜上に開口数0.5の対物
レンズでレーザ光を集光し、基板に刻まれたグループに
沿ってトラッキングするよう制御されている。記録は1
〜15mWの記録パワーで、周波数が0.2〜5MHz
、信号のデユーティを10〜90%とし、消去パワーは
1〜15mWの範囲で測定した。線速度は0.5〜12
m/秒とした。CNRは、記録信号を0.7mWで再生
し、30kHzのバンド幅としたスペクトラルアナライ
ザを用いRF倍信号ら求めた。消去率は記録と消去後の
キャリア信号の差から求めた。またキャリア周波数位置
でのノイズはその前後のノイズ値より補間で求めた。■ Dynamic recording/erasing characteristics The sample was a recording thin film formed on a PC grouped substrate. The evaluation device mainly consists of an optical head incorporating a semiconductor laser with a wavelength of 830 nm, a disk rotation device, and their control circuits. The optical head is controlled to focus a laser beam onto a recording film through a rotating disk substrate using an objective lens with a numerical aperture of 0.5, and to track the laser beam along a group carved on the substrate. The record is 1
~15mW recording power, frequency 0.2~5MHz
The signal duty was set to 10 to 90%, and the erase power was measured in the range of 1 to 15 mW. Linear speed is 0.5-12
m/sec. The CNR was determined from the RF multiplied signal by reproducing the recorded signal at 0.7 mW and using a spectrum analyzer with a bandwidth of 30 kHz. The erasure rate was determined from the difference between the recorded and erased carrier signals. In addition, the noise at the carrier frequency position was determined by interpolation from the noise values before and after that position.
■ 静的記録・消去特性
パイレックスガラス、P M M A 、 0 、 4
m m厚PC板の各基板上に記録薄膜を形成したもの
を試料とした。評価装置は波長830 nmの半導体レ
ーザを組み込んだ光ヘッドとその制御回路で主に構成さ
れている。光ヘッドはX−Yステージ上に保持された基
板を通して記録膜上に開口数0.5の対物レンズでレー
ザ光を集光するよう制御されている。光ヘッドに印加す
る記録または消去パルスで生じた、非晶と結晶間の可逆
的相転移に伴う反射光量の変化をRF倍信号して取出し
、繰返し耐久性や記録のコントラストを評価するように
なっている。記録と消去のパワーは1〜20mW範囲で
測定し、再生パワーは0.5mWとした。コントラスト
はRF比出力結晶と非晶でのレベル差と結晶状態との比
として求めた。■Static recording/erasing characteristics Pyrex glass, PMMA, 0, 4
A sample was prepared by forming a recording thin film on each substrate of a PC board having a thickness of mm. The evaluation device mainly consists of an optical head incorporating a semiconductor laser with a wavelength of 830 nm and its control circuit. The optical head is controlled to focus laser light onto the recording film through a substrate held on an XY stage using an objective lens with a numerical aperture of 0.5. Changes in the amount of reflected light due to the reversible phase transition between amorphous and crystal caused by recording or erasing pulses applied to the optical head are extracted as an RF multiplied signal to evaluate repeat durability and recording contrast. ing. The recording and erasing powers were measured in the range of 1 to 20 mW, and the reproducing power was 0.5 mW. The contrast was determined as the ratio between the level difference between the RF specific output crystal and the amorphous state and the crystalline state.
[実施例] 本発明を更に実施例に基づいて、詳細に説明する。[Example] The present invention will be further described in detail based on examples.
実施例1
製造方法で述べたスパッタ法により、パイレックスガラ
ス基板およびPMMA基板の夫々に保護層、記録層、拡
散防止層、冷却層および保護層をこの順に形成した。基
板は毎分40回転させて組成と膜厚の均一化を図った。Example 1 A protective layer, a recording layer, a diffusion prevention layer, a cooling layer, and a protective layer were formed in this order on each of a Pyrex glass substrate and a PMMA substrate by the sputtering method described in the manufacturing method. The substrate was rotated at 40 revolutions per minute to ensure uniform composition and film thickness.
真空度5X10−’Paで、基板上に5io2保護層を
約95nm形成し、その上にAg、Sb。A 5io2 protective layer with a thickness of about 95 nm was formed on the substrate at a vacuum degree of 5X10-'Pa, and Ag and Sb were deposited thereon.
Teとそれらの合金を水晶振動子膜厚計でモニタしなが
ら同時スパッタしAg25sb38Te37組成の記録
層を約95nm形成した。次いで約90nmの5i02
拡散防止層、約20nmのAu冷却層を順次形成し、最
後に5i02を約70nm形成した。この記録媒体の結
晶化温度は約130℃であった。パイレックスガラス基
板で測定法■で述べた静上記録・消去特性を評価した。A recording layer having a composition of Ag25sb38Te37 was formed to a thickness of about 95 nm by simultaneous sputtering while monitoring Te and its alloy with a crystal resonator film thickness meter. Then about 90 nm of 5i02
A diffusion prevention layer and an Au cooling layer of about 20 nm were sequentially formed, and finally, about 70 nm of 5i02 was formed. The crystallization temperature of this recording medium was about 130°C. The static recording and erasing characteristics described in measurement method 2 were evaluated using a Pyrex glass substrate.
15mW。15mW.
280n秒の記録パルスと、4.7mW、2.5μ秒の
消去パルスで試料の同一箇所を繰返し交互に照射し、再
生パワー0.5mWでのRF倍信号変化を評価したとこ
ろ、約33%のコントラストで、104回以上安定して
記録・消去を繰返すことができた。次に記録を8.6m
W、2μ秒、消去を4mW、3μ秒として同様に評価し
たところ、コントラストが約34%で、104回以上の
記録・消去繰返しが可能であった。次にPMMA基板で
も記録を9.2mW、28On秒、消去を3゜2mW、
2.5μ秒とした条件と、記録を5.2mW、1.5μ
秒、消去を2mW、10μ秒とした条件のそれぞれで同
様に評価したところ、いずれもコントラストが25%以
上得られ、繰返しも104回以上か可能であった。この
ように本発明の記録媒体は、記録のコントラストが良好
で再生信号振幅が大きくとれ、記録のパルス幅を大きく
しても非晶マーク部の再結晶が生じにくく安定な記録が
可能であり、繰返し性も良好である。The same part of the sample was repeatedly and alternately irradiated with a 280 ns recording pulse and a 4.7 mW, 2.5 μs erasing pulse, and the RF signal change at a read power of 0.5 mW was evaluated. With contrast, we were able to stably repeat recording and erasing over 104 times. Next record is 8.6m
When similarly evaluated using W, 2 μsec, and erasing, 4 mW, 3 μsec, the contrast was about 34%, and it was possible to repeat recording and erasing 104 times or more. Next, on the PMMA board, record at 9.2 mW for 28 On seconds, and erase at 3°2 mW.
The conditions were 2.5μ seconds and the recording was 5.2mW, 1.5μ seconds.
When evaluation was made in the same manner under the conditions of 2 mW and 10 microseconds for erasing, a contrast of 25% or more was obtained in each case, and it was possible to repeat 104 times or more. As described above, the recording medium of the present invention has good recording contrast and a large reproduced signal amplitude, and even if the recording pulse width is increased, recrystallization of the amorphous mark portion is difficult to occur and stable recording is possible. The repeatability is also good.
実施例2
基板をプリグループ付きPC基板とし、記録層を(イ)
はA g 10 S 1) soT e 40. (
ロ)はAg3゜S b 33T e 37、(ハ)はA
g37Sb33Te3o1とした以外は実施例1と同じ
構成と組成の試料を作製し測定法■の動的記録・消去特
性を評価した。Example 2 The substrate is a PC board with a pre-group, and the recording layer is (A)
is A g 10 S 1) soT e 40. (
b) is Ag3゜S b 33T e 37, (c) is A
A sample having the same structure and composition as in Example 1 was prepared except that g37Sb33Te3o1 was used, and the dynamic recording/erasing characteristics of measurement method (2) were evaluated.
先ず、線速度0.5m/秒で結晶化による初期化を試み
た。試料(イ)と(ハ)は3.6mW。First, initialization by crystallization was attempted at a linear velocity of 0.5 m/sec. Samples (a) and (c) are 3.6 mW.
試料(ロ)は2.7mWとしたパワーでトラックに沿っ
て2回走査し、0.7mWで再生した所、RF信号レベ
ルは明らかに高反射率に変化し、良好な初期化ができた
。ノイズの増加は数dB以下でほとんどなかった。次い
で試料(イ)は線速度6m/秒、13mW、2.5MH
z、 デユーティ50%で記録し、消去は線速度0.5
m/秒、2゜4mWで行なった。線速度6m/秒で再生
したところ、記録のCNRが50 d B、消去率が2
5dB以上が得られた。次に線速度を0.5m/秒とし
、記録を7mW、o、2MHz、デユーティ10%、消
去を3mWの条件として各々記録消去したところ、線速
度6m/秒の再生でほぼ同様な記録のCNRが得られ、
消去も可能であった。更に、試料(ロ)、(ハ)は線速
度を0.5m/秒とし、(ロ)は記録を5.5mW、0
.2MHz、 デユーティ20%、消去を2.7mWの
条件で、(ハ)は記録を7mW、0.2MHz、デユー
ティ10%、消去を3mWの条件として各々記録消去し
た。When the sample (b) was scanned twice along the track with a power of 2.7 mW and reproduced with a power of 0.7 mW, the RF signal level clearly changed to a high reflectance, and good initialization was achieved. The increase in noise was only a few dB or less. Next, sample (a) was heated at a linear velocity of 6 m/sec, 13 mW, 2.5 MH
z, Record at 50% duty, erase at linear velocity 0.5
The measurement was performed at m/sec, 2°, and 4 mW. When reproduced at a linear velocity of 6 m/s, the recorded CNR was 50 dB and the erasure rate was 2.
More than 5 dB was obtained. Next, we set the linear velocity to 0.5 m/sec, recorded at 7 mW, o, 2 MHz, duty 10%, and erased under the conditions of 3 mW. When we performed recording and erasing, the CNR of almost the same recording was obtained by reproducing at a linear velocity of 6 m/sec. is obtained,
It was also possible to erase it. Furthermore, for samples (b) and (c), the linear velocity was set to 0.5 m/sec, and for (b), the recording was set to 5.5 mW, 0
.. Recording and erasing was performed under the conditions of 2 MHz, 20% duty, and 2.7 mW for erasing, and (c) recording was performed at 7 mW, 0.2 MHz, 10% duty, and 3 mW for erasing.
線速度6m/秒で再生したところ、(ロ)は記録のCN
Rが44dB、消去率が32dB以上、(ハ)は記録の
CNRが45 d B、消去率が26dB以上であった
。いずれもノイズはほとんど増加せず数dB以内であっ
た。これらの試料の同一トラックで更(、こ記録・消去
の繰返しを試みたところ、同様な特性での繰返しが可能
であった。この様に、本発明の記録媒体は安定な非晶化
記録が可能で消去特性も良好であり、特に光カード用媒
体で使用される低線速度としても良好な記録・消去特性
を持ち、コードデータ用の媒体として適用可能な優れた
記録と消去の特性を持つものである。When played back at a linear velocity of 6 m/s, (b) is the recorded CN.
The R was 44 dB and the erasure rate was 32 dB or more, and (c) the recording CNR was 45 dB and the erasure rate was 26 dB or more. In all cases, the noise hardly increased and was within several dB. When we tried to repeat recording and erasing on the same track of these samples, it was possible to repeat it with the same characteristics.In this way, the recording medium of the present invention has stable amorphous recording. It has good recording and erasing properties, especially at low linear speeds used in optical card media, and has excellent recording and erasing properties that can be used as code data media. It is something.
比較例1
記録層をAgを除いた5bs9Te4tとした以外は実
施例2と同様な構成でパイレックスガラス基板およびP
Cのディスク基板の夫々に媒体を形成した。Comparative Example 1 The same structure as in Example 2 was used except that the recording layer was 5bs9Te4t excluding Ag, using a Pyrex glass substrate and Pyrex glass substrate.
A medium was formed on each of the disk substrates of C.
パイレックスガラス基板で静上記録・消去特性を評価し
たところ、記録を8.4mW、500n秒、消去を4.
6mW、1μ秒とした場合、コントラストは少し低下し
約25%であったが、記録パルスの幅を広げ7mW、1
μ秒とし、消去を4゜8mW11μ秒として評価すると
、コントラストが大巾に低下し14%となった。またこ
の媒体の結晶化温度は70℃程度であり、記録の安定性
も低下していた。When static recording and erasing characteristics were evaluated on a Pyrex glass substrate, recording was performed at 8.4 mW for 500 ns, and erasing was performed at 4.0 mW.
When the recording pulse width was increased to 7 mW and 1 μsec, the contrast decreased slightly to about 25%.
When evaluating the erasure at 4°8 mW for 11 μ seconds, the contrast decreased significantly to 14%. Further, the crystallization temperature of this medium was about 70° C., and the recording stability was also reduced.
次にPC基板で動的記録・消去特性を評価した。Next, dynamic recording/erasing characteristics were evaluated using a PC board.
線速度0.5m/秒、3.3mWのパワーで2回走査し
初期化を行った後、線速度0.5m/秒で記録を6mW
、0.2MHz、デユーティ20%として記録後練速度
6m/秒で再生したところ、再生信号(キャリア)が低
下しており十分な記録のCNRが得られなかった。そこ
で、線速度を1m/秒とし記録を8mW、 0.3M
Hz、デユーティ20%、消去を2.5mWとして記録
消去を行ったところ、この線速度でも非晶マークの再結
晶と思われるキャリアの低下が見られ、線速度6m/秒
の再生で消去率は23dB程度得られたものの、記録の
CNRは36dBと小さかった。After initializing by scanning twice at a linear velocity of 0.5 m/sec and a power of 3.3 mW, recording was performed at a linear velocity of 0.5 m/sec and a power of 6 mW.
, 0.2 MHz, and a duty of 20%, and when reproduction was performed at a recording speed of 6 m/sec, the reproduced signal (carrier) was lowered and a sufficient recording CNR could not be obtained. Therefore, the linear velocity was set to 1 m/s, and the recording was 8 mW, 0.3 M.
When recording and erasing was performed at Hz, duty 20%, and erasure at 2.5 mW, a decrease in carriers, which was thought to be due to recrystallization of the amorphous mark, was observed even at this linear velocity, and the erasure rate was Although about 23 dB was obtained, the recording CNR was as small as 36 dB.
実施例3
基板を厚みQ、4mmのPC板とし、保護層および拡散
防止層を試料(ニ)は5i02膜とし、試料(ホ)はD
Cスパッタ法でITO膜とし、試料(へ)はZnSにM
g F 2を10mo1%添加した膜とした以外は、
実施例1と同様の構成で記録媒体を形成した。その後、
媒体側に粘着剤により、厚み0.3mmのPETフィル
ムを貼合わせ85゜5mmX54mmに打ち抜いてカー
ド用媒体に仕上げた。静上記録・消去特性の評価装置を
用いて、X−YステージをX方向に走査し、PC基板側
からの記録・消去を試みた。先ず、5〜10cm/秒程
度の線速度で消去パワーを3〜4mWとし、Y方向に微
小送りを行いながらX方向に繰返し走査しまとまった領
域を初期化した。その結果、いずれの試料もRF出力か
ら、高反射率となる結晶化が確認できた。この初期化し
た領域を線速度5〜10cm/秒程度で走査しながら、
5〜7mW。Example 3 The substrate was a PC board with a thickness Q of 4 mm, the protective layer and the diffusion prevention layer were 5i02 film for sample (d), and D for sample (e).
The ITO film was made by C sputtering method, and the sample was made of M on ZnS.
Except for the film containing 10mol1% of gF2.
A recording medium was formed with the same configuration as in Example 1. after that,
A PET film with a thickness of 0.3 mm was attached to the medium side using an adhesive and punched out to a size of 85° 5 mm x 54 mm to produce a card medium. Using a static recording/erasing characteristic evaluation device, the X-Y stage was scanned in the X direction, and recording/erasing from the PC board side was attempted. First, at a linear velocity of about 5 to 10 cm/sec and an erasing power of 3 to 4 mW, a large area was initialized by repeatedly scanning in the X direction while performing minute feeding in the Y direction. As a result, crystallization resulting in high reflectance was confirmed from the RF output of all samples. While scanning this initialized area at a linear velocity of about 5 to 10 cm/sec,
5-7mW.
1kHz、パルス幅1μ秒の条件で記録した所、試料(
ニ)〜(へ)のいずれも顕微鏡で明瞭な非晶マークが観
測され、良好かつ安定して記録できることが確認できた
。次いでX方向に戻し、同じ線速度で消去パワーを2.
5〜3.5mWとして連続照射しながら、記録マーク上
をなぞるように走査した所、顕微鏡で見てオーバラップ
した箇所の非晶マークが結晶化しているのが試料(ニ)
〜(へ)全てで確認できた。これより本発明の記録媒体
がカード用媒体として良好かつ安定した記録・消去が可
能であ、ることか分かる。When recording under the conditions of 1 kHz and pulse width of 1 μs, the sample (
Clear amorphous marks were observed under a microscope in all of (d) to (f), confirming that good and stable recording was possible. Next, return to the X direction and increase the erase power to 2.0 at the same linear velocity.
When the recording marks were scanned while being continuously irradiated at 5 to 3.5 mW, the amorphous marks in the overlapped areas were observed under a microscope to be crystallized (sample (d)).
~(to) I was able to confirm everything. This shows that the recording medium of the present invention is capable of good and stable recording and erasing as a card medium.
実施例4
パイレックスガラス基板で記録層をA g 3s S
b33Te32とし、冷却層を(ト)はAuを約20n
m、(チ)はHfを約40nm、(す)はAIを約40
nm、(ヌ)はN l 80 Cr 20合金を約40
nmとした以外は実施例1と同様な構成の試料を作製し
た。この試料の結晶化温度は約143℃であり、記録の
保存安定性には十分であった。測定法■で述べた静上記
録・消去特性を、記録を6〜9mW、1μ秒、消去を3
.5〜4.5mW、1μ秒として評価したところ、コン
トラストがいずれも25%以上が得られ、記録・消去の
繰返しも104回以上が可能であった。Example 4 A recording layer was formed using a Pyrex glass substrate.
b33Te32, and the cooling layer (g) is approximately 20n of Au.
m, (ch) is Hf about 40 nm, (su) is AI about 40 nm
nm, (nu) is about 40 Nl 80 Cr 20 alloy
A sample having the same configuration as in Example 1 was prepared except that the thickness was changed to nm. The crystallization temperature of this sample was about 143°C, which was sufficient for storage stability of the record. The static recording and erasing characteristics described in measurement method
.. When evaluated at 5 to 4.5 mW and 1 μsec, a contrast of 25% or more was obtained in all cases, and recording/erasing could be repeated 104 times or more.
実施例5
パイレックスガラス基板で記録層を(ル)はAg238
544Te33”オ) ′t Ag 15s b 52
T e 33−(ワ)はAg15Sb43Te42、と
した以外は実施例1と同様な構成の試料を作製した。測
定法■で述べた静上記録・消去特性を、記録を6〜9m
W。Example 5 The recording layer was made of Ag238 on a Pyrex glass substrate.
544Te33”o) ’t Ag 15s b 52
A sample having the same structure as in Example 1 was prepared except that T e 33-(wa) was Ag15Sb43Te42. The static recording/erasing characteristics described in measurement method
W.
1μ秒、消去を3.5〜4.5mW、1μ秒として評価
したところ、コントラストがいずれも25%以上が得ら
れ、記録・消去の繰返しも104回以上が可能であった
。When evaluation was performed using 3.5 to 4.5 mW for 1 .mu.sec and erasing for 1 .mu.sec, a contrast of 25% or more was obtained in all cases, and recording and erasing could be repeated 104 times or more.
[発明の効果]
本発明による光カード用情報記録媒体は以下に述べるよ
うな優れた効果を奏するものである。[Effects of the Invention] The information recording medium for optical cards according to the present invention has excellent effects as described below.
■ 低線速度としても、記録のCNR特性や消去率の良
好な、媒体のノイズが小さい光カード用記録媒体が得ら
れる。(2) Even at low linear speeds, a recording medium for optical cards with good recording CNR characteristics and erasure rate and low medium noise can be obtained.
■ 記録のパルス幅を大きくしても良好な記録・消去の
繰返し特性を持ち、記録のコントラストが良好な光カー
ド用記録媒体が得られる。(2) A recording medium for optical cards with good recording/erasing repetition characteristics and good recording contrast even when the recording pulse width is increased can be obtained.
■ 冷却層を設けることにより、記録マーク形成の安定
性が増し、マーク端部のきれが良好でCNRの優れた光
カード用記録媒体が得られる。(2) By providing a cooling layer, the stability of recording mark formation is increased, and a recording medium for an optical card with good mark edge sharpness and excellent CNR can be obtained.
■ 結晶化転移温度が適切であり、既記録情報の長期保
存性に優れた光カード用記録媒体が得られる。(2) A recording medium for optical cards having an appropriate crystallization transition temperature and excellent long-term preservation of recorded information can be obtained.
Claims (1)
照射し、直接又は間接に発生する熱により、上記薄膜の
光学特性を変化せしめて、情報の記録を行う光カード用
情報記録媒体において、該記録薄膜が銀(Ag)、アン
チモン(Sb)およびテルル(Te)の3元素から主と
してなり、かつその組成が、一般式 Ag_xSb_yTe_z x:薄膜中のAgの原子数% y:薄膜中のSbの原子数% z:薄膜中のTeの原子数% と表した場合、zの範囲が20≦z≦38の場合には、
x、yの範囲がそれぞれ5≦x≦50、32≦y≦60
であり、zの範囲が38<z≦55の場合には、x、y
の範囲がそれぞれ5≦x≦25、42≦y≦60であり
、かつx+y+z=100であることを特徴とする光カ
ード用情報記録媒体。 2 記録薄膜に隣接して冷却層を設けてなる請求項1記
載の光カード用情報記録媒体。 3 記録薄膜と冷却層の間に拡散防止層を有してなる請
求項2記載の光カード用情報記録媒体。 4 冷却層がAu、Hf、Al、NiおよびCrの少な
くとも一種から主として構成されてなる請求項2または
3記載の光カード用情報記録媒体。[Claims] 1. Information for an optical card in which information is recorded by irradiating a recording thin film formed on a substrate with an energy beam and changing the optical characteristics of the thin film by the heat generated directly or indirectly. In the recording medium, the recording thin film mainly consists of three elements, silver (Ag), antimony (Sb), and tellurium (Te), and its composition has the general formula Ag_xSb_yTe_z x: number of Ag atoms in the thin film % y: thin film % of Sb atoms in the thin film: % of Te atoms in the thin film When the range of z is 20≦z≦38,
The range of x and y is 5≦x≦50, 32≦y≦60, respectively.
and when the range of z is 38<z≦55, x, y
An information recording medium for an optical card, wherein the ranges are 5≦x≦25, 42≦y≦60, and x+y+z=100. 2. The information recording medium for an optical card according to claim 1, further comprising a cooling layer adjacent to the recording thin film. 3. The information recording medium for an optical card according to claim 2, further comprising a diffusion prevention layer between the recording thin film and the cooling layer. 4. The information recording medium for an optical card according to claim 2 or 3, wherein the cooling layer is mainly composed of at least one of Au, Hf, Al, Ni, and Cr.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1073092A JP2830022B2 (en) | 1989-03-23 | 1989-03-23 | Optical information recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1073092A JP2830022B2 (en) | 1989-03-23 | 1989-03-23 | Optical information recording medium |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8067844A Division JPH08252980A (en) | 1996-03-25 | 1996-03-25 | Optical disk |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02249686A true JPH02249686A (en) | 1990-10-05 |
JP2830022B2 JP2830022B2 (en) | 1998-12-02 |
Family
ID=13508349
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1073092A Expired - Fee Related JP2830022B2 (en) | 1989-03-23 | 1989-03-23 | Optical information recording medium |
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Country | Link |
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JP (1) | JP2830022B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5171618A (en) * | 1990-01-31 | 1992-12-15 | Kabushiki Kaisha Toshiba | Recording medium for information |
US5568778A (en) * | 1994-01-19 | 1996-10-29 | Sahl; Johannes | Apparatus for feeding a workpiece including a rotor and endless belts |
US5709162A (en) * | 1994-09-23 | 1998-01-20 | Union Special Corporation | Semi-automatic method to attach circular collars to T-shirts |
US6192816B1 (en) * | 1999-10-15 | 2001-02-27 | Techstyle Corporation | Method and apparatus for forming and joining hems particularly on tubular trouser legs |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63304439A (en) * | 1987-06-05 | 1988-12-12 | Hitachi Ltd | Thin film for information recording |
JPS6463195A (en) * | 1987-09-04 | 1989-03-09 | Hitachi Ltd | Thin film for information recording |
JPH01277338A (en) * | 1988-04-28 | 1989-11-07 | Nippon Telegr & Teleph Corp <Ntt> | Optical recording medium |
JPH01303643A (en) * | 1988-06-01 | 1989-12-07 | Nippon Telegr & Teleph Corp <Ntt> | Laser recording medium |
-
1989
- 1989-03-23 JP JP1073092A patent/JP2830022B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63304439A (en) * | 1987-06-05 | 1988-12-12 | Hitachi Ltd | Thin film for information recording |
JPS6463195A (en) * | 1987-09-04 | 1989-03-09 | Hitachi Ltd | Thin film for information recording |
JPH01277338A (en) * | 1988-04-28 | 1989-11-07 | Nippon Telegr & Teleph Corp <Ntt> | Optical recording medium |
JPH01303643A (en) * | 1988-06-01 | 1989-12-07 | Nippon Telegr & Teleph Corp <Ntt> | Laser recording medium |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5171618A (en) * | 1990-01-31 | 1992-12-15 | Kabushiki Kaisha Toshiba | Recording medium for information |
US5568778A (en) * | 1994-01-19 | 1996-10-29 | Sahl; Johannes | Apparatus for feeding a workpiece including a rotor and endless belts |
US5709162A (en) * | 1994-09-23 | 1998-01-20 | Union Special Corporation | Semi-automatic method to attach circular collars to T-shirts |
US6192816B1 (en) * | 1999-10-15 | 2001-02-27 | Techstyle Corporation | Method and apparatus for forming and joining hems particularly on tubular trouser legs |
Also Published As
Publication number | Publication date |
---|---|
JP2830022B2 (en) | 1998-12-02 |
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