JPH0222985Y2 - - Google Patents
Info
- Publication number
- JPH0222985Y2 JPH0222985Y2 JP1983184671U JP18467183U JPH0222985Y2 JP H0222985 Y2 JPH0222985 Y2 JP H0222985Y2 JP 1983184671 U JP1983184671 U JP 1983184671U JP 18467183 U JP18467183 U JP 18467183U JP H0222985 Y2 JPH0222985 Y2 JP H0222985Y2
- Authority
- JP
- Japan
- Prior art keywords
- furnace
- heat treatment
- tube
- heater section
- treatment furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010438 heat treatment Methods 0.000 claims description 11
- 239000010453 quartz Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Furnace Details (AREA)
Description
【考案の詳細な説明】
(1) 考案の技術分野
本考案は熱処理炉、特に反応管およびヒータ部
とを垂直に配置する縦型の熱処理炉に関する。[Detailed Description of the Invention] (1) Technical Field of the Invention The present invention relates to a heat treatment furnace, particularly a vertical heat treatment furnace in which a reaction tube and a heater section are arranged vertically.
(2) 技術の背景
熱処理炉はCVD装置あるいは拡散炉等に使用
されているが、半導体基板の熱処理にあたつては
特に炉内の温度分布を均一にし、また制度の高い
温度制御を行う必要がある。(2) Background of the technology Heat treatment furnaces are used in CVD equipment or diffusion furnaces, etc., but when heat treating semiconductor substrates, it is especially necessary to make the temperature distribution inside the furnace uniform and to perform highly accurate temperature control. There is.
(3) 従来技術と問題点
第１図は従来の縦型熱処理炉の構造を示す断面
図である。図中、１は石英管、２はヒータ部であ
る。(3) Prior Art and Problems Figure 1 is a sectional view showing the structure of a conventional vertical heat treatment furnace. In the figure, 1 is a quartz tube, and 2 is a heater section.
従来の縦型熱処理炉の場合、ヒータ部２の中に
入る内部治具例えば石英管１との間にすきまがあ
るため、上昇気流の発生により矢印で示すような
対流が起こる。そのため炉内の位置によつて温度
差が生ずるという欠点がある。 In the case of a conventional vertical heat treatment furnace, since there is a gap between the heater part 2 and the internal jig, for example, the quartz tube 1, convection as shown by the arrow occurs due to the generation of an upward air current. Therefore, there is a drawback that temperature differences occur depending on the position within the furnace.
(4) 考案の目的
本考案は石英管とヒータ部との間の空間をいく
つかの遮熱板でしきることによつて形成される各
部屋ごとで対流を起させ放熱がないようにして炉
内の温度分布を均一にすることを目的とするもの
である。(4) Purpose of the invention The present invention creates a furnace by dividing the space between the quartz tube and the heater part with several heat shield plates, thereby causing convection in each room to prevent heat radiation. The purpose is to make the temperature distribution uniform within the chamber.
(5) 考案の構成
上記の目的は、被処理物を収容する垂直に設置
される管と、前記管の周囲に配置されたヒータ部
とを備える縦型の熱処理炉において、前記管と前
記ヒータ部との間の空間に前記ヒータ部より部分
的に突出してなり、且つ前記管の直径方向に拡が
る遮熱板を複数枚配置したことを特徴とする熱処
理炉によつて達成される。(5) Structure of the device The above object is to provide a vertical heat treatment furnace that includes a vertically installed tube that accommodates a workpiece and a heater section that is arranged around the tube. This is achieved by a heat treatment furnace characterized in that a plurality of heat shield plates are disposed in a space between the heater section and the heater section, the heat shield plates partially protruding from the heater section and extending in the diametrical direction of the tube.
(6) 考案の実施例
以下図を用いて本考案の一実施例を説明する。
第２図ａは本考案の一実施例である縦型処理炉の
断面図、第２図ｂは第２図ａに於いてＡ−A′で
示す部分の断面図である。(6) Example of the invention An example of the invention will be explained using the following figures.
FIG. 2a is a cross-sectional view of a vertical processing furnace which is an embodiment of the present invention, and FIG. 2b is a cross-sectional view of a portion indicated by A-A' in FIG. 2a.
図中３は遮熱板であり、第１図と同一部位は同
一番号で示す。本考案に於いては第２図の如く炉
内の石英管１と、ヒータ部２との間の空間に一定
間隔をおいて遮熱板３を取り付けて、前記空間を
いくつかの部屋のように分ける。そして各部屋の
中で対流を起こさせて、温度変化を小さくし、炉
内の温度分布が均一になる様にしている。この様
にすることで対流の影響を受けず、炉のどの部分
に於いても温度を均一にすることが可能となる。 3 in the figure is a heat shield plate, and the same parts as in FIG. 1 are indicated by the same numbers. In the present invention, as shown in Fig. 2, heat shield plates 3 are installed at regular intervals in the space between the quartz tube 1 and the heater part 2 in the furnace, and the space is divided into several rooms. Divide into Convection is then generated within each chamber to reduce temperature changes and ensure uniform temperature distribution within the furnace. By doing this, it is not affected by convection, and the temperature can be made uniform in any part of the furnace.
(7) 考案の効果
以上説明した様に本考案によれば、例えば半導
体装置の製造に使用されるCVD装置、拡散炉に
おいて、炉内に複数の遮熱板を取り付けることに
よつて、炉内が各部屋に分かれヒータ部からの熱
と、内部治具からの輻射熱の逃げを小さくし、炉
全体の温度分布を向上させることができる。それ
に伴つて温度制御の精度も向上し、温度制御が容
易になる。(7) Effects of the invention As explained above, according to the invention, for example, in CVD equipment and diffusion furnaces used for manufacturing semiconductor devices, by installing a plurality of heat shield plates inside the furnace, The furnace is divided into separate rooms, which reduces the escape of heat from the heater section and radiant heat from the internal jig, and improves the temperature distribution throughout the furnace. Accompanying this, the accuracy of temperature control also improves, making temperature control easier.
第１図は従来の縦型熱処理炉の構造を示す断面
図、第２図ａは本考案の一実施例である縦型熱処
理炉の断面図、第２図ｂは第２図ａに於いてＡ−
A′で示す部分の断面図である。
１……石英管、２……ヒータ部、３……遮熱
板。
Fig. 1 is a sectional view showing the structure of a conventional vertical heat treatment furnace, Fig. 2a is a sectional view of a vertical heat treatment furnace which is an embodiment of the present invention, and Fig. 2b is the same as Fig. 2a. A-
FIG. 3 is a cross-sectional view of a portion indicated by A'. 1...Quartz tube, 2...Heater section, 3...Heat shield plate.
Claims (1)
記管の周囲に配置されたヒータ部とを備える縦型
の熱処理炉において、 前記管と前記ヒータ部との間の空間に前記ヒー
タ部より部分的に突出してなり、且つ前記管の直
径方向に拡がる遮熱板を複数枚配置したことを特
徴とする熱処理炉。[Claims for Utility Model Registration] A vertical heat treatment furnace comprising a vertically installed tube that accommodates an object to be treated and a heater section disposed around the tube, A heat treatment furnace characterized in that a plurality of heat shield plates are disposed in a space between the tubes, the heat shield plates partially protruding from the heater section and extending in the diameter direction of the tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18467183U JPS6092826U (en) | 1983-11-30 | 1983-11-30 | heat treatment furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18467183U JPS6092826U (en) | 1983-11-30 | 1983-11-30 | heat treatment furnace |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6092826U JPS6092826U (en) | 1985-06-25 |
| JPH0222985Y2 true JPH0222985Y2 (en) | 1990-06-21 |
Family
ID=30399354
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18467183U Granted JPS6092826U (en) | 1983-11-30 | 1983-11-30 | heat treatment furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6092826U (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3242281B2 (en) * | 1995-03-13 | 2001-12-25 | 東京エレクトロン株式会社 | Heat treatment equipment |
| JP6333128B2 (en) | 2014-09-03 | 2018-05-30 | 東京エレクトロン株式会社 | Magnetic annealing equipment |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4810193U (en) * | 1971-06-16 | 1973-02-03 |
-
1983
- 1983-11-30 JP JP18467183U patent/JPS6092826U/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4810193U (en) * | 1971-06-16 | 1973-02-03 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6092826U (en) | 1985-06-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0306967B1 (en) | Apparatus for performing heat treatment on semiconductor wafers | |
| JPH0855810A (en) | Diffusion furnace | |
| JP3137164B2 (en) | Heat treatment furnace | |
| KR100366395B1 (en) | Vertical heat treatment device | |
| JP2005277442A (en) | Plasma etching apparatus | |
| JPH0222985Y2 (en) | ||
| JPH045822A (en) | Apparatus and method for lamp annealing | |
| JPS57147237A (en) | Heat treatment device | |
| JPS6471119A (en) | Thermal treatment equipment for semiconductor wafer | |
| JPS5827006Y2 (en) | Wire annealing equipment | |
| JPS6319319Y2 (en) | ||
| JPS5824711B2 (en) | Furnace temperature control device | |
| JPS60182728A (en) | Vertical type furnace | |
| JPS6241977Y2 (en) | ||
| JPH03771B2 (en) | ||
| JPS57162329A (en) | Heat treatment of semiconductor substrate | |
| JP3099424B2 (en) | Single wafer heat treatment equipment | |
| JPH051798Y2 (en) | ||
| JPS60111420A (en) | Heat treatment furnace | |
| JP2598053Y2 (en) | Electric resistance furnace | |
| JPS61141123A (en) | Equipment for manufacturing semiconductor | |
| JPS61155297A (en) | Heat treating furnace | |
| CN205944051U (en) | Brilliant boat and boiler tube device that has this crystalline substance boat | |
| JPH0245913A (en) | Semiconductor manufacturing device | |
| JPH0126757Y2 (en) |