JPH03771B2 - - Google Patents

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Publication number
JPH03771B2
JPH03771B2 JP60285335A JP28533585A JPH03771B2 JP H03771 B2 JPH03771 B2 JP H03771B2 JP 60285335 A JP60285335 A JP 60285335A JP 28533585 A JP28533585 A JP 28533585A JP H03771 B2 JPH03771 B2 JP H03771B2
Authority
JP
Japan
Prior art keywords
heating element
element wire
furnace body
wires
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60285335A
Other languages
Japanese (ja)
Other versions
JPS62144333A (en
Inventor
Seishiro Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Sagami Ltd
Original Assignee
Tokyo Electron Sagami Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Sagami Ltd filed Critical Tokyo Electron Sagami Ltd
Priority to JP28533585A priority Critical patent/JPS62144333A/en
Publication of JPS62144333A publication Critical patent/JPS62144333A/en
Publication of JPH03771B2 publication Critical patent/JPH03771B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、反応管に収容された半導体ウエー
ハなどの被加熱物を加熱処理する加熱装置に係
り、特に、発熱素線の配置形態に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a heating device for heat-treating an object to be heated, such as a semiconductor wafer, housed in a reaction tube, and particularly relates to the arrangement of heating element wires.

〔従来の技術〕[Conventional technology]

従来、半導体処理において用いられる加熱装置
は、半導体ウエーハを収容する円筒状の反応管の
周面を覆う形態を持ち、その反応管の周面に対し
て均等な加熱を行うための発熱体を配設したもの
である。
Conventionally, heating devices used in semiconductor processing have a configuration that covers the circumferential surface of a cylindrical reaction tube that houses a semiconductor wafer, and a heating element is arranged to uniformly heat the circumferential surface of the reaction tube. It was established.

そして、半導体ウエーハの加熱処理は、半導体
ウエーハを収容した反応管を加熱装置の端面開口
部から挿入して行い、加熱処理を終了した半導体
ウエーハは反応管とともに加熱装置の端面開口部
から引出すようにしている。
The heat treatment of the semiconductor wafer is performed by inserting the reaction tube containing the semiconductor wafer through the end opening of the heating device, and the semiconductor wafer that has undergone the heat treatment is pulled out together with the reaction tube from the end opening of the heating device. ing.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところで、加熱装置に対して反応管を長手方向
に出入させることは、加熱装置の端面側に反応管
を出入させるための反応管の長さ以上のスペース
を必要とするとともに、その出入時間が長く、と
りわけ、冷却のために加熱装置から反応管を引き
出す際に、加熱装置の余熱が反応管内の半導体ウ
エーハに作用し、冷却速度に限界を生じる。
By the way, moving the reaction tube in and out of the heating device in the longitudinal direction requires a space larger than the length of the reaction tube on the end face side of the heating device, and also takes a long time to move the reaction tube in and out. In particular, when the reaction tube is pulled out from the heating device for cooling, residual heat from the heating device acts on the semiconductor wafer inside the reaction tube, putting a limit on the cooling rate.

半導体ウエーハの冷却について、半導体装置に
よつては、その急速冷却の効果が直接にその特性
に影響を与える場合があり、急速冷却の要請が高
まつている。
Regarding the cooling of semiconductor wafers, the effect of rapid cooling may directly affect the characteristics of some semiconductor devices, and the demand for rapid cooling is increasing.

このような要請を応えて、半導体ウエーハの急
速な加熱および冷却を実現するため、炉体を直径
方向に分割可能に構成し、炉体に対して反応管を
その直径方向に着脱するようにした加熱装置が提
案されている。
In response to these demands, in order to achieve rapid heating and cooling of semiconductor wafers, the furnace body was configured to be divisible in the diametrical direction, and the reaction tubes were attached to and removed from the furnace body in the diametrical direction. A heating device has been proposed.

そこで、この発明は、炉体の内壁面に設置され
る発熱素線の配置形態の改善を図つた加熱装置の
提供を目的とする。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a heating device that improves the arrangement of heat generating wires installed on the inner wall surface of a furnace body.

〔問題点を解決するための手段〕[Means for solving problems]

この発明の加熱装置は、第1図に示すように、
円筒状炉体2A,2Bと、この炉体の内壁面に千
鳥状に設けられた発熱素線収納溝13と、この発
熱素線収納溝に嵌合して設けられた発熱素線14
と、この発熱素線の曲折部およびこの曲折部間に
設けられ上記発熱素線との対向位置に収納溝20
が形成され複数ラインの上記発熱素線を固定する
帯状固定片(固定片18)と、上記発熱素線を固
定する上記各固定片間に設けられ隣りに位置する
上記発熱素線間を一定の間隔に維持する帯状スペ
ーサ(スペーサ16)と、上記帯状固定片により
上記発熱素線を固定するとともに、上記固定片を
上記炉体の軸方向に連接させて配列する機構(固
定ボルト28およびナツト36)とを具備してな
るものである。
As shown in FIG. 1, the heating device of this invention has the following features:
Cylindrical furnace bodies 2A, 2B, heating element wire storage grooves 13 provided in a staggered manner on the inner wall surface of the furnace body, and heating element wires 14 provided to fit into the heating element wire storage grooves.
A storage groove 20 is provided at a bent portion of the heating element wire and a storage groove 20 provided between the bent portion and facing the heating element wire.
A band-shaped fixing piece (fixing piece 18) is formed and fixes a plurality of lines of the heat-generating wires, and a band-shaped fixing piece (fixing piece 18) is provided between each of the fixing pieces fixing the heat-generating wires to fix the heat-generating wires located next to each other. A mechanism (fixing bolts 28 and nuts 36) that fixes the heating element wires by a band-shaped spacer (spacer 16) that maintains the spacing and the band-shaped fixing piece, and also connects and arranges the fixing pieces in the axial direction of the furnace body. ).

〔作 用〕[Effect]

この発明の加熱装置では、被加熱物を収容する
炉体の内壁面に対して発熱素線を千鳥状に一定の
間隔で配設したので、発熱温度の均一化とともに
その安定化が図られる。
In the heating device of the present invention, the heat generating wires are arranged at regular intervals in a staggered manner on the inner wall surface of the furnace body that houses the object to be heated, so that the heat generation temperature can be made uniform and stabilized.

〔実施例〕〔Example〕

以下、この発明の実施例を図面を参照して説明
する。
Embodiments of the present invention will be described below with reference to the drawings.

第1図および第2図は、この発明の加熱装置の
実施例を示し、第1図は加熱装置の発熱素線の配
置、第2図は加熱装置の全体構造を示す。
1 and 2 show an embodiment of the heating device of the present invention, FIG. 1 shows the arrangement of the heat generating wires of the heating device, and FIG. 2 shows the overall structure of the heating device.

この加熱装置は、第2図に示すように、円筒状
の炉本体を縦方向に分割して2つの炉体2A,2
Bとし、各炉体2A,2Bは、支持台4の上面部
に一定の間隔で取り付けた支柱6に支持軸8を介
して個別に回動可能に支持されているとともに、
開閉機構10を介して開閉および所望の開度に保
持されるようになつている。
As shown in FIG. 2, this heating device is constructed by vertically dividing a cylindrical furnace body into two furnace bodies 2A, 2.
B, each of the furnace bodies 2A and 2B is individually rotatably supported via a support shaft 8 by support columns 6 attached at regular intervals to the upper surface of a support base 4, and
The opening/closing mechanism 10 allows the opening/closing mechanism to be opened/closed and maintained at a desired opening degree.

そして、各炉体2A,2Bの内部には被加熱物
としての半導体ウエーハを入れた円筒状の反応管
を収容する収容部12が形成されている。
Inside each of the furnace bodies 2A and 2B, a housing section 12 is formed to house a cylindrical reaction tube containing a semiconductor wafer as an object to be heated.

各炉体2A,2Bの収容部12は、セラミツク
などの断熱材によつて形成され、この収容部12
の内壁面には湾曲した内壁面に沿って発熱素線収
納溝13が形成されており、第1図に示すよう
に、その発熱素線収納溝13には千鳥状に折り曲
げられた発熱体としての発熱素線14が嵌合され
て配設されている。この場合、発熱素線14に
は、直径6.5mm程度の比較的太い素線が用いられ
ている。
The housing portion 12 of each furnace body 2A, 2B is formed of a heat insulating material such as ceramic.
A heating element wire storage groove 13 is formed along the curved inner wall surface of the heating element wire storage groove 13, and as shown in FIG. The heating element wires 14 are fitted and disposed. In this case, the heating element wire 14 is a relatively thick element wire with a diameter of about 6.5 mm.

そして、発熱素線14は、断熱材料によつて形
成された帯状のスペーサ16によつて一定の間隔
に配置されているとともに、発熱素線14の曲折
部およびこの曲折部間に設けられた帯状の固定片
18によつて炉体2A,2Bに固定されている。
The heating element wires 14 are arranged at regular intervals by band-shaped spacers 16 made of a heat insulating material, and the heating element wires 14 are arranged at regular intervals by band-shaped spacers 16 formed of a heat insulating material. It is fixed to the furnace bodies 2A, 2B by fixing pieces 18.

第3図は、炉体2A,2Bに対する発熱素線1
4の固定を示す。即ち、炉体2A,2Bの内壁面
に形成されている発熱素線収納溝13に発熱素線
14を配設するとともに、この発熱素線14との
対向位置に収納溝20が形成されている固定片1
8の収納溝20を当て、さらにこの固定片18の
外面に金属性の押え板22を当て、この押え板2
2および固定片18に形成した透孔24および炉
体2A,2Bの透孔26に固定ボルト28に貫通
させ、炉体2A,2Bの補強板30の外面に突出
させた固定ボルト28にワツシヤ32および断熱
リング34を取り付けるとともに、固定ボルト2
8のねじ部にナツト36を取り付けて締め付けた
ものである。したがつて、固定片18とともに、
固定ボルト28、ワツシヤ32、断熱リング34
およびナツト36を以て炉体2A,2Bの内壁面
に発熱素線14が固定されるとともに、固定片1
8を炉体2A,2Bの軸方向に連接させて配列す
る機構を成している。
FIG. 3 shows the heating element wire 1 for the furnace bodies 2A and 2B.
4 is shown fixing. That is, the heating element wire 14 is disposed in the heating element wire storage groove 13 formed on the inner wall surface of the furnace bodies 2A, 2B, and the storage groove 20 is formed at a position facing the heating element wire 14. Fixed piece 1
8 and the metal holding plate 22 is placed on the outer surface of this fixing piece 18.
2 and the fixing bolt 28 is passed through the through hole 24 formed in the fixing piece 18 and the through hole 26 of the furnace bodies 2A, 2B, and a washer 32 is attached to the fixing bolt 28 that protrudes from the outer surface of the reinforcing plate 30 of the furnace bodies 2A, 2B. and the heat insulating ring 34, and the fixing bolt 2
A nut 36 is attached to the threaded part 8 and tightened. Therefore, together with the fixing piece 18,
Fixing bolt 28, washer 32, insulation ring 34
The heating element wire 14 is fixed to the inner wall surface of the furnace bodies 2A, 2B with the nuts 36, and the fixing piece 1
8 are connected and arranged in the axial direction of the furnace bodies 2A, 2B.

なお、発熱素線14の端子間には、駆動源とし
ての直流電源が接続され、その電流制御によつ
て、特定の温度で発熱させることができる。
Note that a DC power source as a driving source is connected between the terminals of the heating element wire 14, and by controlling the current, it is possible to generate heat at a specific temperature.

したがつて、発熱素線14は炉体2A,2Bの
被加熱物を収容する収容部12の内壁面に沿つて
組み込まれ、一定の間隔で配設されているので、
半導体ウエーハを収容した反応管などを均等に加
熱して所定の処理を行うことができる。
Therefore, the heat-generating wires 14 are installed along the inner wall surface of the housing section 12 that houses the objects to be heated in the furnace bodies 2A and 2B, and are arranged at regular intervals.
A predetermined process can be performed by uniformly heating a reaction tube containing a semiconductor wafer.

また、発熱素線14に6.5mm程度の太い形状の
ものを用いることができるので、固定手段によつ
て確実に炉体2A,2Bの内部に強固に固定で
き、炉内温度による変形を防止できるので、温度
分布を均一に維持することができるとともに、安
定した加熱状態を保持でき、加熱寿命を長くする
ことができる。
In addition, since the heating element wire 14 can have a thick shape of about 6.5 mm, it can be firmly fixed inside the furnace bodies 2A and 2B by the fixing means, and deformation due to the temperature inside the furnace can be prevented. Therefore, a uniform temperature distribution can be maintained, a stable heating state can be maintained, and the heating life can be extended.

なお、実施例では、被加熱物として半導体ウエ
ーハを例に取つて説明したが、この発明の加熱装
置は、半導体ウエーハ以外の被加熱物についても
均等加熱を行うことができる。
Although the embodiments have been described using a semiconductor wafer as an example of an object to be heated, the heating apparatus of the present invention can uniformly heat objects to be heated other than semiconductor wafers.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、この発明によれば、炉体
の被加熱物を収容する内壁面に対して発熱素線を
千鳥状に折り曲げて一定の間隔で配設するととも
に強固に固定したので、発熱時の垂れ下がりなど
の発熱素線の変形を防止でき、発熱温度を均一化
できるとともに、発熱温度の安定化を図ることが
できる。
As explained above, according to the present invention, the heat-generating wires are bent in a staggered manner, arranged at regular intervals, and firmly fixed to the inner wall surface of the furnace housing the object to be heated. It is possible to prevent deformation of the heat-generating wires such as sagging over time, to make the heat-generating temperature uniform, and to stabilize the heat-generating temperature.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の加熱装置の実施例を示す斜
視図、第2図は第1図に示した加熱装置の全体構
成を示す斜視図、第3図は第1図に示した加熱装
置内の発熱素線の固定構造を示す断面図である。 2A,2B……炉体、12……収容部、13…
…発熱素線収納溝、14……発熱素線、16……
スペーサ、18……固定片(帯状固定片)、20
……収納溝、28……固定ボルト、36……ナツ
ト。
Fig. 1 is a perspective view showing an embodiment of the heating device of the present invention, Fig. 2 is a perspective view showing the overall configuration of the heating device shown in Fig. 1, and Fig. 3 is an inside view of the heating device shown in Fig. 1. FIG. 3 is a cross-sectional view showing a fixing structure of the heating element wire of FIG. 2A, 2B...furnace body, 12...accommodating section, 13...
...Heating element wire storage groove, 14...Heating element wire, 16...
Spacer, 18... Fixed piece (band-shaped fixed piece), 20
... Storage groove, 28 ... Fixing bolt, 36 ... Nut.

Claims (1)

【特許請求の範囲】 1 円筒状炉体と、 この炉体の内壁面に千鳥状に設けられた発熱素
線収納溝と、 この発熱素線収納溝に嵌合して設けられた発熱
素線と、 この発熱素線の曲折部およびこの曲折部間に設
けられ上記発熱素線との対向位置に収納溝が形成
され複数ラインの上記発熱素線を固定する帯状固
定片と、 上記発熱素線を固定する上記各固定片間に設け
られ隣りに位置する上記発熱素線間を一定の間隔
に維持する帯状スペーサと、 上記帯状固定片により上記発熱素線を固定する
とともに、上記固定片を上記炉体の軸方向に連接
させて配列する機構と、 を具備してなることを特徴とする加熱装置。
[Scope of Claims] 1. A cylindrical furnace body, heat generating wire storage grooves provided in a staggered manner on the inner wall surface of the furnace body, and heat generating wires provided to fit into the heat generating wire storage grooves. a bent portion of the heating element wire; and a belt-shaped fixing piece provided between the bent portions and having a storage groove formed at a position facing the heating element wire to fix a plurality of lines of the heating element wire; a band-shaped spacer provided between each of the fixing pieces for fixing the heating element wires and maintaining a constant interval between the heating element wires located next to each other; A heating device comprising: a mechanism that is arranged in a connected manner in the axial direction of a furnace body;
JP28533585A 1985-12-18 1985-12-18 Heater Granted JPS62144333A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28533585A JPS62144333A (en) 1985-12-18 1985-12-18 Heater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28533585A JPS62144333A (en) 1985-12-18 1985-12-18 Heater

Publications (2)

Publication Number Publication Date
JPS62144333A JPS62144333A (en) 1987-06-27
JPH03771B2 true JPH03771B2 (en) 1991-01-08

Family

ID=17690217

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28533585A Granted JPS62144333A (en) 1985-12-18 1985-12-18 Heater

Country Status (1)

Country Link
JP (1) JPS62144333A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2730102B2 (en) * 1988-11-18 1998-03-25 日本電気株式会社 Resistance heating furnace
SE530968C2 (en) * 2007-03-05 2008-11-04 Sandvik Intellectual Property Insert and heater for electric ovens
JP5096182B2 (en) 2008-01-31 2012-12-12 東京エレクトロン株式会社 Heat treatment furnace
JP4769842B2 (en) * 2008-04-08 2011-09-07 株式会社アルファ・オイコス High temperature furnace
JP2011091386A (en) * 2009-09-24 2011-05-06 Semiconductor Energy Lab Co Ltd Heat treatment apparatus, heat treatment method and method for manufacturing semiconductor device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5535437B2 (en) * 1974-03-15 1980-09-13
JPS5955011A (en) * 1982-09-22 1984-03-29 Fujitsu Ltd Heating equipment

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5815838Y2 (en) * 1978-08-29 1983-03-30 電元冶金工業株式会社 Support structure for electric furnace heating element

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5535437B2 (en) * 1974-03-15 1980-09-13
JPS5955011A (en) * 1982-09-22 1984-03-29 Fujitsu Ltd Heating equipment

Also Published As

Publication number Publication date
JPS62144333A (en) 1987-06-27

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